JP6655007B2 - 放射冷却増進エンドホール・イオン源 - Google Patents

放射冷却増進エンドホール・イオン源 Download PDF

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Publication number
JP6655007B2
JP6655007B2 JP2016517532A JP2016517532A JP6655007B2 JP 6655007 B2 JP6655007 B2 JP 6655007B2 JP 2016517532 A JP2016517532 A JP 2016517532A JP 2016517532 A JP2016517532 A JP 2016517532A JP 6655007 B2 JP6655007 B2 JP 6655007B2
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Prior art keywords
ion source
pole piece
anode
cup
source device
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JP2016517532A
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Japanese (ja)
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JP2016536740A5 (enExample
JP2016536740A (ja
Inventor
カウフマン、ハロルド、アール．
カーン、ジェームズ、アール．
ネザリー、リチャード、イー．
Original Assignee
カウフマン アンド ロビンソン，インコーポレイテッド
カウフマン アンド ロビンソン，インコーポレイテッド
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/146—End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma Technology (AREA)
JP2016517532A 2013-09-25 2014-07-29 放射冷却増進エンドホール・イオン源 Active JP6655007B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/998,044 2013-09-25
US13/998,044 US8994258B1 (en) 2013-09-25 2013-09-25 End-hall ion source with enhanced radiation cooling
PCT/US2014/000171 WO2015047446A1 (en) 2013-09-25 2014-07-29 End-hall ion source with enhanced radiation cooling

Publications (3)

Publication Number Publication Date
JP2016536740A JP2016536740A (ja) 2016-11-24
JP2016536740A5 JP2016536740A5 (enExample) 2017-09-07
JP6655007B2 true JP6655007B2 (ja) 2020-02-26

Family

ID=52690357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016517532A Active JP6655007B2 (ja) 2013-09-25 2014-07-29 放射冷却増進エンドホール・イオン源

Country Status (8)

Country Link
US (2) US8994258B1 (enExample)
EP (1) EP3050071B1 (enExample)
JP (1) JP6655007B2 (enExample)
AU (1) AU2014328759B9 (enExample)
CA (1) CA2920813C (enExample)
IL (1) IL244155B (enExample)
SG (1) SG11201602162VA (enExample)
WO (1) WO2015047446A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2969372B1 (fr) * 2010-12-21 2015-04-17 Commissariat Energie Atomique Dispositif d’ionisation a la resonance cyclotron electronique
US8994258B1 (en) * 2013-09-25 2015-03-31 Kaufman & Robinson, Inc. End-hall ion source with enhanced radiation cooling
US9859098B2 (en) 2015-12-22 2018-01-02 Varian Semiconductor Equipment Associates, Inc. Temperature controlled ion source
US10347457B1 (en) 2017-12-19 2019-07-09 Varian Semiconductor Equipment Associates, Inc. Dynamic temperature control of an ion source
EP3810824B1 (en) 2018-06-20 2025-04-02 Board Of Trustees Of Michigan State University Ion source apparatus
CN109087840B (zh) * 2018-09-27 2023-11-07 中山市博顿光电科技有限公司 一种水冷式射频中和器
US11393652B2 (en) 2019-01-25 2022-07-19 Muons, Inc. Bi-metallic anode for amplitude modulated magnetron
WO2020198012A1 (en) 2019-03-26 2020-10-01 Board Of Trustees Of Michigan State University Single beam plasma source
CN111081510A (zh) * 2020-03-02 2020-04-28 成都国泰真空设备有限公司 一种霍尔离子源装置
CN111710580B (zh) * 2020-07-16 2025-03-04 中山市博顿光电科技有限公司 离子源电场结构及离子源装置
US12413148B2 (en) * 2021-05-20 2025-09-09 Kaufman & Robinson, Inc. Power efficient load current derived switch timing of switching resonant topology
US11823867B2 (en) * 2021-05-20 2023-11-21 Kaufman & Robinson, Inc. Load current derived switch timing of switching resonant topology
JP7695555B2 (ja) * 2021-12-24 2025-06-19 日本製鉄株式会社 接触熱コンダクタンス推定方法及び接触電気抵抗推定方法
JP7688272B2 (ja) * 2021-12-24 2025-06-04 日本製鉄株式会社 接触熱コンダクタンス推定方法及び接触電気抵抗推定方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3275829A (en) 1960-08-15 1966-09-27 Special Devices Inc Cavity radiator with a pyrotechnic charge that remains intact during and after combustion
US4126489A (en) * 1973-07-17 1978-11-21 Varian Associates, Inc. Method of making cathode heaters
US4862032A (en) 1986-10-20 1989-08-29 Kaufman Harold R End-Hall ion source
JP2628533B2 (ja) * 1988-10-25 1997-07-09 文夫 渡辺 質量分析型残留ガス分析計
JPH03266336A (ja) * 1990-03-15 1991-11-27 Fujitsu Ltd ガスイオン源装置
US5402032A (en) * 1992-10-29 1995-03-28 Litton Systems, Inc. Traveling wave tube with plate for bonding thermally-mismatched elements
EP0662195B1 (fr) * 1993-06-21 1996-08-28 Societe Europeenne De Propulsion Moteur a plasma de longueur reduite a derive fermee d'electrons
US6750600B2 (en) * 2001-05-03 2004-06-15 Kaufman & Robinson, Inc. Hall-current ion source
US6454910B1 (en) 2001-09-21 2002-09-24 Kaufman & Robinson, Inc. Ion-assisted magnetron deposition
US6608431B1 (en) * 2002-05-24 2003-08-19 Kaufman & Robinson, Inc. Modular gridless ion source
US7667379B2 (en) 2002-06-27 2010-02-23 Kaufman & Robinson, Inc. Industrial hollow cathode with radiation shield structure
US7342236B2 (en) 2004-02-23 2008-03-11 Veeco Instruments, Inc. Fluid-cooled ion source
US7116054B2 (en) * 2004-04-23 2006-10-03 Viacheslav V. Zhurin High-efficient ion source with improved magnetic field
US7566883B2 (en) 2005-02-18 2009-07-28 Veeco Instruments, Inc. Thermal transfer sheet for ion source
US7476869B2 (en) * 2005-02-18 2009-01-13 Veeco Instruments, Inc. Gas distributor for ion source
US7312579B2 (en) * 2006-04-18 2007-12-25 Colorado Advanced Technology Llc Hall-current ion source for ion beams of low and high energy for technological applications
EP2276054A1 (en) * 2009-07-13 2011-01-19 Applied Materials, Inc. Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield
WO2013120097A1 (en) * 2012-02-09 2013-08-15 Fluxion Inc. Compact, filtered ion source
US8994258B1 (en) * 2013-09-25 2015-03-31 Kaufman & Robinson, Inc. End-hall ion source with enhanced radiation cooling

Also Published As

Publication number Publication date
WO2015047446A1 (en) 2015-04-02
IL244155B (en) 2019-10-31
EP3050071B1 (en) 2018-06-13
AU2014328759B9 (en) 2019-02-14
JP2016536740A (ja) 2016-11-24
AU2014328759B2 (en) 2018-12-20
US10068739B2 (en) 2018-09-04
US8994258B1 (en) 2015-03-31
US20150084496A1 (en) 2015-03-26
US20180012722A1 (en) 2018-01-11
CA2920813A1 (en) 2015-04-02
CA2920813C (en) 2020-02-18
EP3050071A1 (en) 2016-08-03
EP3050071A4 (en) 2017-05-03
IL244155A0 (en) 2016-04-21
AU2014328759A1 (en) 2016-03-03
SG11201602162VA (en) 2016-04-28

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