SG11201602162VA - End-hall ion source with enhanced radiation cooling - Google Patents

End-hall ion source with enhanced radiation cooling

Info

Publication number
SG11201602162VA
SG11201602162VA SG11201602162VA SG11201602162VA SG11201602162VA SG 11201602162V A SG11201602162V A SG 11201602162VA SG 11201602162V A SG11201602162V A SG 11201602162VA SG 11201602162V A SG11201602162V A SG 11201602162VA SG 11201602162V A SG11201602162V A SG 11201602162VA
Authority
SG
Singapore
Prior art keywords
ion source
radiation cooling
hall ion
enhanced radiation
enhanced
Prior art date
Application number
SG11201602162VA
Inventor
Harold R Kaufman
James R Kahn
Richard E Nethery
Original Assignee
Kaufman & Robinson Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaufman & Robinson Inc filed Critical Kaufman & Robinson Inc
Publication of SG11201602162VA publication Critical patent/SG11201602162VA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field
    • H01J27/146—End-Hall type ion sources, wherein the magnetic field confines the electrons in a central cylinder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/002—Cooling arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma Technology (AREA)
SG11201602162VA 2013-09-25 2014-07-29 End-hall ion source with enhanced radiation cooling SG11201602162VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/998,044 US8994258B1 (en) 2013-09-25 2013-09-25 End-hall ion source with enhanced radiation cooling
PCT/US2014/000171 WO2015047446A1 (en) 2013-09-25 2014-07-29 End-hall ion source with enhanced radiation cooling

Publications (1)

Publication Number Publication Date
SG11201602162VA true SG11201602162VA (en) 2016-04-28

Family

ID=52690357

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201602162VA SG11201602162VA (en) 2013-09-25 2014-07-29 End-hall ion source with enhanced radiation cooling

Country Status (8)

Country Link
US (2) US8994258B1 (en)
EP (1) EP3050071B1 (en)
JP (1) JP6655007B2 (en)
AU (1) AU2014328759B9 (en)
CA (1) CA2920813C (en)
IL (1) IL244155B (en)
SG (1) SG11201602162VA (en)
WO (1) WO2015047446A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2969372B1 (en) * 2010-12-21 2015-04-17 Commissariat Energie Atomique ELECTRONIC CYCLOTRON RESONANCE IONIZATION DEVICE
US8994258B1 (en) * 2013-09-25 2015-03-31 Kaufman & Robinson, Inc. End-hall ion source with enhanced radiation cooling
US9859098B2 (en) 2015-12-22 2018-01-02 Varian Semiconductor Equipment Associates, Inc. Temperature controlled ion source
US10347457B1 (en) 2017-12-19 2019-07-09 Varian Semiconductor Equipment Associates, Inc. Dynamic temperature control of an ion source
CA3103016C (en) 2018-06-20 2024-01-16 Board Of Trustees Of Michigan State University Single beam plasma source
CN109087840B (en) * 2018-09-27 2023-11-07 中山市博顿光电科技有限公司 Water-cooled radio frequency neutralizer
US11393652B2 (en) * 2019-01-25 2022-07-19 Muons, Inc. Bi-metallic anode for amplitude modulated magnetron

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3275829A (en) * 1960-08-15 1966-09-27 Special Devices Inc Cavity radiator with a pyrotechnic charge that remains intact during and after combustion
US4126489A (en) * 1973-07-17 1978-11-21 Varian Associates, Inc. Method of making cathode heaters
US4862032A (en) 1986-10-20 1989-08-29 Kaufman Harold R End-Hall ion source
JP2628533B2 (en) * 1988-10-25 1997-07-09 文夫 渡辺 Mass spectrometer residual gas analyzer
JPH03266336A (en) * 1990-03-15 1991-11-27 Fujitsu Ltd Gas ion source apparatus
US5402032A (en) * 1992-10-29 1995-03-28 Litton Systems, Inc. Traveling wave tube with plate for bonding thermally-mismatched elements
ES2092314T3 (en) * 1993-06-21 1996-11-16 Europ Propulsion REDUCED LENGTH PLASMA MOTOR WITH CLOSED ELECTRON DRIFT.
US6750600B2 (en) * 2001-05-03 2004-06-15 Kaufman & Robinson, Inc. Hall-current ion source
US6454910B1 (en) 2001-09-21 2002-09-24 Kaufman & Robinson, Inc. Ion-assisted magnetron deposition
US6608431B1 (en) * 2002-05-24 2003-08-19 Kaufman & Robinson, Inc. Modular gridless ion source
US7667379B2 (en) 2002-06-27 2010-02-23 Kaufman & Robinson, Inc. Industrial hollow cathode with radiation shield structure
US7342236B2 (en) 2004-02-23 2008-03-11 Veeco Instruments, Inc. Fluid-cooled ion source
US7116054B2 (en) * 2004-04-23 2006-10-03 Viacheslav V. Zhurin High-efficient ion source with improved magnetic field
US7566883B2 (en) 2005-02-18 2009-07-28 Veeco Instruments, Inc. Thermal transfer sheet for ion source
US7476869B2 (en) * 2005-02-18 2009-01-13 Veeco Instruments, Inc. Gas distributor for ion source
US7312579B2 (en) * 2006-04-18 2007-12-25 Colorado Advanced Technology Llc Hall-current ion source for ion beams of low and high energy for technological applications
EP2276054A1 (en) * 2009-07-13 2011-01-19 Applied Materials, Inc. Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield
WO2013120097A1 (en) * 2012-02-09 2013-08-15 Fluxion Inc. Compact, filtered ion source
US8994258B1 (en) 2013-09-25 2015-03-31 Kaufman & Robinson, Inc. End-hall ion source with enhanced radiation cooling

Also Published As

Publication number Publication date
AU2014328759B9 (en) 2019-02-14
US20180012722A1 (en) 2018-01-11
EP3050071A4 (en) 2017-05-03
IL244155B (en) 2019-10-31
AU2014328759B2 (en) 2018-12-20
IL244155A0 (en) 2016-04-21
EP3050071B1 (en) 2018-06-13
JP2016536740A (en) 2016-11-24
EP3050071A1 (en) 2016-08-03
US10068739B2 (en) 2018-09-04
CA2920813C (en) 2020-02-18
CA2920813A1 (en) 2015-04-02
JP6655007B2 (en) 2020-02-26
US20150084496A1 (en) 2015-03-26
WO2015047446A1 (en) 2015-04-02
US8994258B1 (en) 2015-03-31
AU2014328759A1 (en) 2016-03-03

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