JP6651314B2 - 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法 - Google Patents

反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法 Download PDF

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JP6651314B2
JP6651314B2 JP2015180419A JP2015180419A JP6651314B2 JP 6651314 B2 JP6651314 B2 JP 6651314B2 JP 2015180419 A JP2015180419 A JP 2015180419A JP 2015180419 A JP2015180419 A JP 2015180419A JP 6651314 B2 JP6651314 B2 JP 6651314B2
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film
mask
multilayer reflective
reflective
pattern
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JP2016126319A (ja
JP2016126319A5 (cg-RX-API-DMAC7.html
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弘文 小坂井
弘文 小坂井
笑喜　勉
勉 笑喜
竜男 淺川
竜男 淺川
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Hoya Corp
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Hoya Corp
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JP2015180419A 2014-12-26 2015-09-14 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法 Active JP6651314B2 (ja)

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JP2014265214 2014-12-26
JP2014265214 2014-12-26

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JP2016126319A JP2016126319A (ja) 2016-07-11
JP2016126319A5 JP2016126319A5 (cg-RX-API-DMAC7.html) 2018-08-23
JP6651314B2 true JP6651314B2 (ja) 2020-02-19

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6855190B2 (ja) * 2016-08-26 2021-04-07 Hoya株式会社 反射型マスク、並びに反射型マスクブランク及び半導体装置の製造方法
US11187972B2 (en) 2016-10-21 2021-11-30 Hoya Corporation Reflective mask blank, method of manufacturing reflective mask and method of manufacturing semiconductor device
JP7401356B2 (ja) * 2019-03-27 2023-12-19 Hoya株式会社 多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに半導体装置の製造方法
JP7409861B2 (ja) * 2019-12-18 2024-01-09 株式会社トッパンフォトマスク 反射型マスクブランク、反射型マスク、反射型マスクの製造方法、及び反射型マスクの修正方法
JP7610369B2 (ja) * 2020-08-03 2025-01-08 テクセンドフォトマスク株式会社 マスクブランク、及びマスクの製造方法
KR102522952B1 (ko) * 2020-09-02 2023-04-19 주식회사 에스앤에스텍 극자외선용 반사형 블랭크 마스크 및 그의 결함 검사 방법
CN112158794B (zh) * 2020-09-04 2024-03-22 杭州探真纳米科技有限公司 一种采用等离子体刻蚀制备原子力显微镜探针阶梯型基底的方法

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Publication number Priority date Publication date Assignee Title
JPH05113656A (ja) * 1991-10-23 1993-05-07 Toppan Printing Co Ltd 位相シフトマスクおよびその製造方法並びにそれに用いる位相シフトマスク用ブランク
JP4602430B2 (ja) * 2008-03-03 2010-12-22 株式会社東芝 反射型マスク及びその作製方法
WO2009136564A1 (ja) * 2008-05-09 2009-11-12 Hoya株式会社 反射型マスク、反射型マスクブランク及びその製造方法
US8562794B2 (en) * 2010-12-14 2013-10-22 Asahi Glass Company, Limited Process for producing reflective mask blank for EUV lithography and process for producing substrate with functional film for the mask blank
JP6157874B2 (ja) * 2012-03-19 2017-07-05 Hoya株式会社 Ｅｕｖリソグラフィー用多層反射膜付き基板及びｅｕｖリソグラフィー用反射型マスクブランク、並びにｅｕｖリソグラフィー用反射型マスク及び半導体装置の製造方法
JP6226517B2 (ja) * 2012-09-11 2017-11-08 芝浦メカトロニクス株式会社 反射型マスクの製造方法、および反射型マスクの製造装置
JP2016009744A (ja) * 2014-06-24 2016-01-18 凸版印刷株式会社 反射型マスクおよび反射型マスクブランク

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