JP6633545B2 - 亜硝酸で後処理される複合ポリアミド膜 - Google Patents
亜硝酸で後処理される複合ポリアミド膜 Download PDFInfo
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- JP6633545B2 JP6633545B2 JP2016566746A JP2016566746A JP6633545B2 JP 6633545 B2 JP6633545 B2 JP 6633545B2 JP 2016566746 A JP2016566746 A JP 2016566746A JP 2016566746 A JP2016566746 A JP 2016566746A JP 6633545 B2 JP6633545 B2 JP 6633545B2
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- Prior art keywords
- acid
- thin film
- polyamide layer
- polyfunctional
- cooh
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- 239000004952 Polyamide Substances 0.000 title claims description 78
- 229920002647 polyamide Polymers 0.000 title claims description 78
- 239000012528 membrane Substances 0.000 title claims description 62
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 title claims description 31
- 239000002131 composite material Substances 0.000 title claims description 15
- 239000000178 monomer Substances 0.000 claims description 64
- -1 arene compounds Chemical class 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 39
- 150000001266 acyl halides Chemical class 0.000 claims description 37
- 239000010409 thin film Substances 0.000 claims description 37
- 125000000524 functional group Chemical group 0.000 claims description 30
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 29
- 150000001412 amines Chemical class 0.000 claims description 28
- 239000002253 acid Substances 0.000 claims description 27
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 27
- 125000004432 carbon atom Chemical group C* 0.000 claims description 24
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims description 17
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 15
- 150000003839 salts Chemical class 0.000 claims description 13
- 238000006243 chemical reaction Methods 0.000 claims description 10
- AUHZEENZYGFFBQ-UHFFFAOYSA-N 1,3,5-trimethylbenzene Chemical compound CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 claims description 9
- 150000008064 anhydrides Chemical class 0.000 claims description 8
- 150000003461 sulfonyl halides Chemical class 0.000 claims description 7
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 5
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 claims description 5
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- 238000011282 treatment Methods 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 125000005702 oxyalkylene group Chemical group 0.000 claims description 3
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- 150000002430 hydrocarbons Chemical group 0.000 claims 1
- 239000000243 solution Substances 0.000 description 56
- 239000012634 fragment Substances 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 239000004332 silver Substances 0.000 description 11
- 229910052709 silver Inorganic materials 0.000 description 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- UWCPYKQBIPYOLX-UHFFFAOYSA-N benzene-1,3,5-tricarbonyl chloride Chemical compound ClC(=O)C1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 UWCPYKQBIPYOLX-UHFFFAOYSA-N 0.000 description 7
- 239000008367 deionised water Substances 0.000 description 7
- 229910021641 deionized water Inorganic materials 0.000 description 7
- 229940018564 m-phenylenediamine Drugs 0.000 description 7
- 238000001728 nano-filtration Methods 0.000 description 7
- 229920002492 poly(sulfone) Polymers 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000000197 pyrolysis Methods 0.000 description 7
- 238000001223 reverse osmosis Methods 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000002843 carboxylic acid group Chemical group 0.000 description 5
- 239000000539 dimer Substances 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 125000000777 acyl halide group Chemical group 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 4
- 150000001555 benzenes Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000012954 diazonium Substances 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 150000003141 primary amines Chemical group 0.000 description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 238000012695 Interfacial polymerization Methods 0.000 description 3
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 150000001989 diazonium salts Chemical class 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000012454 non-polar solvent Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 3
- RFBZPOTVVHLWBP-UHFFFAOYSA-N 11-chloro-11-oxoundecanoic acid Chemical compound OC(=O)CCCCCCCCCC(Cl)=O RFBZPOTVVHLWBP-UHFFFAOYSA-N 0.000 description 2
- LDQMZKBIBRAZEA-UHFFFAOYSA-N 2,4-diaminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C(N)=C1 LDQMZKBIBRAZEA-UHFFFAOYSA-N 0.000 description 2
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 2
- KYMYMMHKBLBGKN-UHFFFAOYSA-N 2-hydrazinyloxybenzoic acid Chemical compound N(N)OC1=C(C(=O)O)C=CC=C1 KYMYMMHKBLBGKN-UHFFFAOYSA-N 0.000 description 2
- ZCLXQTGLKVQKFD-UHFFFAOYSA-N 3-hydroxybenzenesulfonic acid Chemical compound OC1=CC=CC(S(O)(=O)=O)=C1 ZCLXQTGLKVQKFD-UHFFFAOYSA-N 0.000 description 2
- IJFXRHURBJZNAO-UHFFFAOYSA-N 3-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1 IJFXRHURBJZNAO-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 238000012696 Interfacial polycondensation Methods 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- JSYBAZQQYCNZJE-UHFFFAOYSA-N benzene-1,2,4-triamine Chemical compound NC1=CC=C(N)C(N)=C1 JSYBAZQQYCNZJE-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 238000010504 bond cleavage reaction Methods 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000002338 electrophoretic light scattering Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- UQDUPQYQJKYHQI-UHFFFAOYSA-N methyl laurate Chemical compound CCCCCCCCCCCC(=O)OC UQDUPQYQJKYHQI-UHFFFAOYSA-N 0.000 description 2
- 238000001471 micro-filtration Methods 0.000 description 2
- DUWWHGPELOTTOE-UHFFFAOYSA-N n-(5-chloro-2,4-dimethoxyphenyl)-3-oxobutanamide Chemical compound COC1=CC(OC)=C(NC(=O)CC(C)=O)C=C1Cl DUWWHGPELOTTOE-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- GPSHWNLDDARPCO-UHFFFAOYSA-N 10-chloro-10-oxodecanoic acid Chemical compound OC(=O)CCCCCCCCC(Cl)=O GPSHWNLDDARPCO-UHFFFAOYSA-N 0.000 description 1
- QLDZETGUBDKZAV-UHFFFAOYSA-N 12-chloro-12-oxododecanoic acid Chemical compound OC(=O)CCCCCCCCCCC(Cl)=O QLDZETGUBDKZAV-UHFFFAOYSA-N 0.000 description 1
- BAHPQISAXRFLCL-UHFFFAOYSA-N 2,4-Diaminoanisole Chemical compound COC1=CC=C(N)C=C1N BAHPQISAXRFLCL-UHFFFAOYSA-N 0.000 description 1
- JVMSQRAXNZPDHF-UHFFFAOYSA-N 2,4-diaminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C(N)=C1 JVMSQRAXNZPDHF-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- QXSKFLYCTIMTEU-UHFFFAOYSA-N 2,4-dicarbonochloridoylcyclopentane-1-carboxylic acid Chemical compound OC(=O)C1CC(C(Cl)=O)CC1C(Cl)=O QXSKFLYCTIMTEU-UHFFFAOYSA-N 0.000 description 1
- LQACMMHGSYXMHY-UHFFFAOYSA-N 2-(2,4-dicarbonochloridoylphenoxy)acetic acid Chemical compound OC(=O)COC1=CC=C(C(Cl)=O)C=C1C(Cl)=O LQACMMHGSYXMHY-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- JDGZONSWIMFPDO-UHFFFAOYSA-N 2-(2-carboxy-4-hydroxyphenyl)-5-hydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC=C1C1=CC=C(O)C=C1C(O)=O JDGZONSWIMFPDO-UHFFFAOYSA-N 0.000 description 1
- QHXWVACOZJQROG-UHFFFAOYSA-N 2-(3,5-dicarbonochloridoylanilino)acetic acid Chemical compound OC(=O)CNC1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 QHXWVACOZJQROG-UHFFFAOYSA-N 0.000 description 1
- NVUJTTGXXGPDJC-UHFFFAOYSA-N 2-(3,5-dicarbonochloridoylphenoxy)acetic acid Chemical compound OC(=O)COC1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 NVUJTTGXXGPDJC-UHFFFAOYSA-N 0.000 description 1
- CUYHJSGIPAHGPC-UHFFFAOYSA-N 2-(3,5-dicarbonochloridoylphenyl)acetic acid Chemical compound OC(=O)CC1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 CUYHJSGIPAHGPC-UHFFFAOYSA-N 0.000 description 1
- KLSMJBWQMULWRH-UHFFFAOYSA-N 2-[(1,3-dioxo-2-benzofuran-5-carbonyl)amino]acetic acid Chemical compound OC(=O)CNC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 KLSMJBWQMULWRH-UHFFFAOYSA-N 0.000 description 1
- MWAGGKKAIHLNMM-UHFFFAOYSA-N 2-[(1,3-dioxo-2-benzofuran-5-yl)oxy]acetic acid Chemical compound OC(=O)COC1=CC=C2C(=O)OC(=O)C2=C1 MWAGGKKAIHLNMM-UHFFFAOYSA-N 0.000 description 1
- HIVUAOXLSJITPA-UHFFFAOYSA-N 2-amino-5-hydroxynaphthalene-1,7-disulfonic acid Chemical compound OC1=CC(S(O)(=O)=O)=CC2=C(S(O)(=O)=O)C(N)=CC=C21 HIVUAOXLSJITPA-UHFFFAOYSA-N 0.000 description 1
- RSWBDNVBJPQFAN-UHFFFAOYSA-N 2-amino-6-hydroxybenzenesulfonic acid Chemical compound NC1=CC=CC(O)=C1S(O)(=O)=O RSWBDNVBJPQFAN-UHFFFAOYSA-N 0.000 description 1
- ZMCHBSMFKQYNKA-UHFFFAOYSA-N 2-aminobenzenesulfonic acid Chemical compound NC1=CC=CC=C1S(O)(=O)=O ZMCHBSMFKQYNKA-UHFFFAOYSA-N 0.000 description 1
- LODHFNUFVRVKTH-ZHACJKMWSA-N 2-hydroxy-n'-[(e)-3-phenylprop-2-enoyl]benzohydrazide Chemical compound OC1=CC=CC=C1C(=O)NNC(=O)\C=C\C1=CC=CC=C1 LODHFNUFVRVKTH-ZHACJKMWSA-N 0.000 description 1
- IULJSGIJJZZUMF-UHFFFAOYSA-N 2-hydroxybenzenesulfonic acid Chemical compound OC1=CC=CC=C1S(O)(=O)=O IULJSGIJJZZUMF-UHFFFAOYSA-N 0.000 description 1
- 125000003504 2-oxazolinyl group Chemical class O1C(=NCC1)* 0.000 description 1
- BTPBBMFUXJXDGU-UHFFFAOYSA-N 3,5-bis(butoxycarbonyloxycarbonyl)benzoic acid Chemical compound CCCCOC(=O)OC(=O)C1=CC(C(O)=O)=CC(C(=O)OC(=O)OCCCC)=C1 BTPBBMFUXJXDGU-UHFFFAOYSA-N 0.000 description 1
- HQURVGSRQBOZEX-UHFFFAOYSA-N 3,5-diamino-2-hydroxybenzoic acid Chemical compound NC1=CC(N)=C(O)C(C(O)=O)=C1 HQURVGSRQBOZEX-UHFFFAOYSA-N 0.000 description 1
- NSWDWUHBMOIGOA-UHFFFAOYSA-N 3,5-diaminobenzenesulfonic acid Chemical compound NC1=CC(N)=CC(S(O)(=O)=O)=C1 NSWDWUHBMOIGOA-UHFFFAOYSA-N 0.000 description 1
- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 description 1
- ONCOEYBETSTLDD-UHFFFAOYSA-N 3,5-dicarbonochloridoyl-4-fluorobenzoic acid Chemical compound ClC(=O)C=1C=C(C(=O)O)C=C(C1F)C(=O)Cl ONCOEYBETSTLDD-UHFFFAOYSA-N 0.000 description 1
- KIUZEXLLVVHPJK-UHFFFAOYSA-N 3,5-dicarbonochloridoyl-4-hydroxybenzoic acid Chemical compound ClC(=O)C=1C=C(C(=O)O)C=C(C1O)C(=O)Cl KIUZEXLLVVHPJK-UHFFFAOYSA-N 0.000 description 1
- RJHRQMQWMHKSOY-UHFFFAOYSA-N 3,5-dicarbonochloridoylbenzoic acid Chemical compound OC(=O)C1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 RJHRQMQWMHKSOY-UHFFFAOYSA-N 0.000 description 1
- NFVVXABAENGSMQ-UHFFFAOYSA-N 3,5-dicarbonochloridoylcyclohexane-1-carboxylic acid Chemical compound OC(=O)C1CC(C(Cl)=O)CC(C(Cl)=O)C1 NFVVXABAENGSMQ-UHFFFAOYSA-N 0.000 description 1
- LYUYFIMVGAVQMZ-UHFFFAOYSA-N 3-(1,3-dioxo-2-benzofuran-4-yl)propanoic acid Chemical compound C(=O)(O)CCC1=C2C(C(=O)OC2=O)=CC=C1 LYUYFIMVGAVQMZ-UHFFFAOYSA-N 0.000 description 1
- GUABCUUAJVPSFC-UHFFFAOYSA-N 3-(1,3-dioxo-2-benzofuran-5-yl)propanoic acid Chemical compound OC(=O)CCC1=CC=C2C(=O)OC(=O)C2=C1 GUABCUUAJVPSFC-UHFFFAOYSA-N 0.000 description 1
- AJHPGXZOIAYYDW-UHFFFAOYSA-N 3-(2-cyanophenyl)-2-[(2-methylpropan-2-yl)oxycarbonylamino]propanoic acid Chemical compound CC(C)(C)OC(=O)NC(C(O)=O)CC1=CC=CC=C1C#N AJHPGXZOIAYYDW-UHFFFAOYSA-N 0.000 description 1
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- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 description 1
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- QMKYBPDZANOJGF-UHFFFAOYSA-N trimesic acid Natural products OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/56—Polyamides, e.g. polyester-amides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/027—Nanofiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0093—Chemical modification
- B01D67/00931—Chemical modification by introduction of specific groups after membrane formation, e.g. by grafting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
- B01D69/1251—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction by interfacial polymerisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/30—Cross-linking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/40—Details relating to membrane preparation in-situ membrane formation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Transplantation (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Polyamides (AREA)
Description
i)多官能性アミンモノマーを含む極性溶液及び多官能性ハロゲン化アシルモノマーを含む非極性溶液を多孔質支持体の表面に適用し、モノマーを界面重合して、薄フィルムポリアミド層を形成することと、
ii)薄フィルムポリアミド層を、以下の4つの官能基、
(a)−NR4R5及び−OHから選択される第1の官能基(w)、
(b)−NR4R5、−OH、−COOH、及び−SO3Hから選択される第2の官能基(x)、
(c)−H、−NR4R5、−OH、−COOH、及び−SO3Hから選択される第3の官能基(y)、
(d)−H、−CH3、−NR4R5、−OH、−COOH、及び−SO3Hから選択される第4の官能基(z)、
[式中、(R4)及び(R5)は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基から選択される]で総じて置換される1個または2個のベンゼン環を含む多官能性アレーン化合物で処理することと、
iii)薄フィルムポリアミド層を亜硝酸に曝露することと、を含み、
極性及び非極性溶液が、
(A)非極性溶液が、少なくとも50体積%のC5〜C20脂肪族炭化水素及び2〜25体積%のベンゼンまたは1つ以上のC1〜C6アルキル基で置換されたベンゼンをさらに含むこと、ならびに、
(B)非極性溶液が、少なくとも1つのカルボン酸官能基またはその塩で置換される、C2−C20炭化水素部分と、ハロゲン化アシル、ハロゲン化スルホニル、及び無水物から選択される少なくとも1つのアミン反応性官能基とを含む、酸含有モノマーをさらに含み、酸含有モノマーが、多官能性ハロゲン化アシルモノマーとは異なることのうちの少なくとも1つをさらに含む。
a)−NR4R5(アミン)及び−OH(ヒドロキシル)から選択される第1の官能基(w)、
b)−NR4R5(アミン)、−OH(ヒドロキシル)、−COOH(カルボン酸)、及び−SO3H(スルホン酸)から選択される第2の官能基(x)、
c)−H(水素)、−NR4R5(アミン)、−OH(ヒドロキシル)、−COOH(カルボン酸)、及び−SO3H(スルホン酸)から選択される第3の官能基(y)、
d)−H(水素)、−CH3(メチル)、−NR4R5(アミン)、−OH(ヒドロキシル)、−COOH(カルボン酸)、及び−SO3H(スルホン酸)から選択される第4の官能基(z)で総じて置換される、(融合しているか、または環間の直接結合、1〜6個の炭素原子を含むアルキレン基、及び1〜6個の炭素原子を含むオキシアルキレン基によって結合(L)され得る)1個または2個(好ましくは1個)のベンゼン環を含む、多官能性アレーン化合物で処理され、
(R4)及び(R5)は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基(好ましくは、1〜4個の炭素原子を有するアルキル基)から選択される。ベンゼン環(複数可)は、(w)、(x)、(y)、及び(z)に関して上に列挙されるもの、またはメチル基、エチル基、及びハロゲン等の他の基を含む追加の官能基で、さらに置換され得る。置換基(w)、(x)、(y)、及び(z)は、互いに対して、メタ、オルトまたはパラに位置し得る。適用可能な多官能性アレーン化合物は、式VII〜IX、
a)(w)は、−NR4R5及び−OHから選択され、
b)(x)は、−COOH及び−SO3Hから選択され、
c)(y)は、−H、−COOH、及び−SO3Hから選択され、
d)(z)は、−H、−CH、−COOH、及び−SO3Hから選択される。
a)(w)は、−NR4R5から選択され、
b)(x)は、−OHから選択され、
c)(y)は、−H、−COOH、及び−SO3Hから選択され、
d)(z)は、−H、−CH、−COOH、及び−SO3Hから選択される。
(態様1)
多孔質支持体及び薄フィルムポリアミド層を含む複合ポリアミド膜を作製する方法であって、
i)多官能性アミンモノマーを含む極性溶液及び多官能性ハロゲン化アシルモノマーを含む非極性溶液を多孔質支持体の表面に適用し、前記モノマーを界面重合して、薄フィルムポリアミド層を形成することと、
ii)前記薄フィルムポリアミド層を、以下の4つの官能基、
(a)−NR 4 R 5 及び−OHから選択される第1の官能基(w)、
(b)−NR 4 R 5 、−OH、−COOH、及び−SO 3 Hから選択される第2の官能基(x)、
(c)−H、−NR 4 R 5 、−OH、−COOH、及び−SO 3 Hから選択される第3の官能基(y)、
(d)−H、−CH 3 、−NR 4 R 5 、−OH、−COOH、及び−SO 3 Hから選択される第4の官能基(z)、
[式中、(R 4 )及び(R 5 )は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基から選択される]で総じて置換される1個または2個のベンゼン環を含む多官能性アレーン化合物で処理することと、
iii)前記薄フィルムポリアミド層を亜硝酸に曝露することと、を含み、
前記極性及び非極性溶液が、
(A)前記非極性溶液が、少なくとも50体積%のC 5 〜C 20 脂肪族炭化水素及び2〜25体積%のベンゼンまたは1つ以上のC 1 〜C 6 アルキル基で置換されたベンゼンをさらに含むこと、ならびに、
(B)前記非極性溶液が、少なくとも1つのカルボン酸官能基またはその塩で置換される、C 2− C 20 炭 化水素部分と、ハロゲン化アシル、ハロゲン化スルホニル、及び無水物から選択される少なくとも1つのアミン反応性官能基とを含む、酸含有モノマーをさらに 含み、前記酸含有モノマーが、前記多官能性ハロゲン化アシルモノマーとは異なること、のうちの少なくとも1つをさらに含む、方法。
(態様2)
前記多官能性アレーン化合物が、以下のうちの少なくとも1つによって表され、
(化1)
式中、(L)は、環間の結合、1〜6個の炭素原子を含むアルキレン基、及び1〜6個の炭素原子を含むオキシアルキレン基から選択される、態様1に記載の方法。
(態様3)
(A)前記非極性溶液が、少なくとも50体積%のC 5 〜C 20 脂肪族炭化水素及び2〜25体積%のベンゼンまたは1つ以上のC 1 〜C 6 アルキル基で置換されたベンゼンをさらに含み、
(B)前記非極性溶液が、少なくとも1つのカルボン酸官能基またはその塩で置換される、C 2− C 20 炭化水素部分と、ハロゲン化アシル、ハロゲン化スルホニル、及び無水物から選択される少なくとも1つのアミン反応性官能基とを含む、酸含有モノマーを含み、前記酸含有モノマーが、前記多官能性ハロゲン化アシルモノマーとは異なる、態様1に記載の方法。
(態様4)
前記薄フィルムポリアミド層を多官能性アレーン化合物で処理する前記ステップが、前記薄フィルムポリアミド層を亜硝酸に曝露する前記ステップの前に実行される、態様1に記載の方法。
(態様5)
前記非極性溶液が1,3,5−トリメチルベンゼンを含む、態様4に記載の方法。
(態様6)
前記薄フィルムポリアミド層を多官能性アレーン化合物で処理する前記ステップが、前記薄フィルムポリアミド層を亜硝酸に曝露する前記ステップの後に実行される、態様1に記載の方法。
(態様7)
前記非極性溶液が、少なくとも2つのアミン反応性官能基を含む酸含有モノマーを含む、態様1に記載の方法。
(態様8)
前記薄フィルムポリアミド層が、前記薄フィルムポリアミド層を亜硝酸に曝露する前記ステップの前に、RBSによって計測される、pH9.5で少なくとも0.18モル/kgの解離したカルボン酸含有量を有する、態様1に記載の方法。
(態様9)
(w)は−NR 4 R 5 及び−OHから選択され、(x)は−COOH及び−SO 3 Hから選択され、(y)は−H、−COOH、及び−SO 3 Hから選択され、(z)は−H、−CH、−COOH、及び−SO 3 Hから選択され、(R 4 )及び(R 5 )は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基から選択される、態様1に記載の方法。
(態様10)
(w)は−NR 4 R 5 から選択され、(x)は−OHから選択され、(y)は−H、−COOH、及び−SO 3 Hから選択され、(z)は−H、−CH、−COOH、及び−SO 3 Hから選択され、(R 4 )及び(R 5 )は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基から選択される、態様1に記載の方法。
(態様11)
(w)及び(x)は−NR 4 R 5 から選択され、(y)及び(z)は−Hから選択され、(R 4 )及び(R 5 )は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基から選択される、態様1に記載の方法。
(態様12)
前記非極性溶液が50〜90重量%のパラフィン、イソパラフィン、またはそれらの組み合わせを含む、態様1に記載の方法。
Claims (10)
- 多孔質支持体及び薄フィルムポリアミド層を含む複合ポリアミド膜を作製する方法であって、
i)多官能性アミンモノマーを含む極性溶液及び多官能性ハロゲン化アシルモノマーを含む非極性溶液を多孔質支持体の表面に適用し、前記モノマーを界面重合して、薄フィルムポリアミド層を形成することと、
ii)前記薄フィルムポリアミド層を、以下の4つの官能基、
(a)−NR4R5及び−OHから選択される第1の官能基(w)、
(b)−NR4R5、−OH、−COOH、及び−SO3Hから選択される第2の官能基(x)、
(c)−H、−NR4R5、−OH、−COOH、及び−SO3Hから選択される第3の官能基(y)、
(d)−H、−CH3、−CH、−NR4R5、−OH、−COOH、及び−SO3Hから選択される第4の官能基(z)、
[式中、(R4)及び(R5)は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基から選択される]で総じて置換され、ただし前記4つの置換基のうち少なくとも1つは−NR 4 R 5 である1個または2個のベンゼン環を含む多官能性アレーン化合物で処理することと、
iii)前記薄フィルムポリアミド層を亜硝酸に曝露することと、を含み、
前記非極性溶液が少なくとも50体積%のC5〜C20脂肪族炭化水素及び3〜15体積%のベンゼンまたは1つ以上のC1〜C6アルキル基で置換されたベンゼンをさらに含む、方法。 - 前記多官能性アレーン化合物が、以下のうちの少なくとも1つによって表され、
- 前記非極性溶液が、少なくとも1つのカルボン酸官能基またはその塩で置換されるC2−C20炭化水素部分と、ハロゲン化アシル、ハロゲン化スルホニル、及び無水物から選択される少なくとも1つのアミン反応性官能基とを含む酸含有モノマーを含み、前記酸含有モノマーが前記多官能性ハロゲン化アシルモノマーとは異なる、請求項1に記載の方法。
- 前記薄フィルムポリアミド層を多官能性アレーン化合物で処理するステップが、前記薄フィルムポリアミド層を亜硝酸に曝露するステップの前に実行される、請求項1に記載の方法。
- 前記非極性溶液が1,3,5−トリメチルベンゼンを含む、請求項4に記載の方法。
- 前記薄フィルムポリアミド層を多官能性アレーン化合物で処理するステップが、前記薄フィルムポリアミド層を亜硝酸に曝露するステップの後に実行される、請求項1に記載の方法。
- 前記非極性溶液が、少なくとも2つのアミン反応性官能基を含む酸含有モノマーを含む、請求項1に記載の方法。
- 前記薄フィルムポリアミド層が、前記薄フィルムポリアミド層を亜硝酸に曝露するステップの前に、RBSによって計測される、pH9.5で少なくとも0.18モル/kgの解離したカルボン酸含有量を有する、請求項1に記載の方法。
- (w)は−NR4R 5 から選択され、(x)は−COOH及び−SO3Hから選択され、(y)は−H、−COOH及び−SO3Hから選択され、(z)は−H、−CH、−COOH、及び−SO3Hから選択され、(R4)及び(R5)は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基から選択される、請求項1に記載の方法。
- (w)は−NR4R5から選択され、(x)は−OHから選択され、(y)は−H、−COOH、及び−SO3Hから選択され、(z)は−H、−CH、−COOH、及び−SO3Hから選択され、(R4)及び(R5)は独立して、−H、及び1〜10個の炭素原子を含むヒドロカルビル基から選択される、請求項1に記載の方法。
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US9808769B2 (en) | 2013-12-02 | 2017-11-07 | Dow Global Technologies Llc | Composite polyamide membrane post treated with nitrious acid |
CN106170333B (zh) | 2013-12-02 | 2019-02-15 | 陶氏环球技术有限责任公司 | 用二羟基芳基化合物和亚硝酸处理的复合聚酰胺膜 |
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AU2015259613A1 (en) | 2016-12-15 |
CN106232214B (zh) | 2021-01-15 |
AU2015259613B2 (en) | 2019-07-04 |
KR20170007761A (ko) | 2017-01-20 |
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ES2704238T3 (es) | 2019-03-15 |
EP3142777A1 (en) | 2017-03-22 |
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