JP6629905B2 - 表面ドーピングによる電気的接触導電率の改善 - Google Patents
表面ドーピングによる電気的接触導電率の改善 Download PDFInfo
- Publication number
- JP6629905B2 JP6629905B2 JP2018073005A JP2018073005A JP6629905B2 JP 6629905 B2 JP6629905 B2 JP 6629905B2 JP 2018073005 A JP2018073005 A JP 2018073005A JP 2018073005 A JP2018073005 A JP 2018073005A JP 6629905 B2 JP6629905 B2 JP 6629905B2
- Authority
- JP
- Japan
- Prior art keywords
- aluminum
- doped
- base metal
- indium
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 112
- 229910052782 aluminium Inorganic materials 0.000 claims description 110
- 239000010953 base metal Substances 0.000 claims description 64
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 48
- 239000002019 doping agent Substances 0.000 claims description 47
- 229910052738 indium Inorganic materials 0.000 claims description 47
- 239000004020 conductor Substances 0.000 claims description 45
- 230000005540 biological transmission Effects 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- 238000005304 joining Methods 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 229910052718 tin Inorganic materials 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 239000000523 sample Substances 0.000 description 63
- 238000012360 testing method Methods 0.000 description 21
- 229910052751 metal Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 13
- 230000003647 oxidation Effects 0.000 description 13
- 238000007254 oxidation reaction Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- 229910003437 indium oxide Inorganic materials 0.000 description 9
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 7
- 238000002441 X-ray diffraction Methods 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000005382 thermal cycling Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000001000 micrograph Methods 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005297 material degradation process Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003209 petroleum derivative Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49174—Assembling terminal to elongated conductor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Conductive Materials (AREA)
- Contacts (AREA)
- Manufacturing & Machinery (AREA)
Description
11:第1のアルミニウムベース金属
12:第2のアルミニウムベース金属
13:電流
14:酸化アルミニウムコーティング
20:コネクタ
21:第1のアルミニウムベース金属
22:第2のアルミニウムベース金属
23:電流
24:インジウム導電性材料ドーパント
30:蒸発器
31:導電性ドーパント材料
32:ベース金属
33:ドープ表面
45:スクリュー
46:サンプルアッセンブリ
47:サンプル金属
48:スチールフレーム
49:ジルコニア絶縁材
Claims (7)
- 約1×106から約2.5×106シーメンス/平方メータ(S/m2)を導通することができる送電線コネクタであって、表面を有するベース金属を備え、該表面は、ベース金属以外の導電性材料ドーパントでドープされ、前記導電性材料ドーパントは、導電性酸化物を生成するものであり、前記導電性材料ドーパントは、前記ベース金属の表面に実質的に均一な酸化物層を構成し、前記ドープされる表面は、前記実質的に均一な酸化物層の存在下で導電性を保持し、前記送電線コネクタの接触抵抗は、周囲温度から約150℃までの熱サイクルを300サイクルまで受けた後にその増加が50%未満であり、前記表面は、約15ナノメータ(nm)から約200nmの深さにドープされる、前記送電線コネクタ。
- 前記ベース金属は、アルミニウム、銅、鉄、又はその混合物を含む、請求項1に記載の送電線コネクタ。
- 前記ベース金属は、アルミニウムを含む、請求項2に記載の送電線コネクタ。
- 前記導電性材料ドーパントは、インジウム、スズ、ニッケル又はその混合物を含む、請求項1に記載の送電線コネクタ。
- 前記導電性材料ドーパントは、インジウムである、請求項4に記載の送電線コネクタ。
- 請求項1から5のいずれか1項に記載の送電線コネクタに送電線を接合することを含む方法。
- 少なくとも1つの送電線と、請求項1から5のいずれか1項に記載の送電線コネクタとを備えた送電システム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261731563P | 2012-11-30 | 2012-11-30 | |
US61/731,563 | 2012-11-30 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015545130A Division JP6327531B2 (ja) | 2012-11-30 | 2013-11-22 | 表面ドーピングによる電気的接触導電率の改善 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018120869A JP2018120869A (ja) | 2018-08-02 |
JP6629905B2 true JP6629905B2 (ja) | 2020-01-15 |
Family
ID=50824339
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015545130A Active JP6327531B2 (ja) | 2012-11-30 | 2013-11-22 | 表面ドーピングによる電気的接触導電率の改善 |
JP2018073005A Active JP6629905B2 (ja) | 2012-11-30 | 2018-04-05 | 表面ドーピングによる電気的接触導電率の改善 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015545130A Active JP6327531B2 (ja) | 2012-11-30 | 2013-11-22 | 表面ドーピングによる電気的接触導電率の改善 |
Country Status (5)
Country | Link |
---|---|
US (1) | US9413092B2 (ja) |
EP (1) | EP2926406A4 (ja) |
JP (2) | JP6327531B2 (ja) |
CA (1) | CA2892094C (ja) |
WO (1) | WO2014085254A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114302764B (zh) * | 2019-09-11 | 2023-12-26 | 日本碍子株式会社 | 蜂窝结构体及尾气净化装置 |
Family Cites Families (27)
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JPS4910229B1 (ja) * | 1969-08-05 | 1974-03-08 | ||
JPS5019191B1 (ja) * | 1970-03-17 | 1975-07-04 | ||
US3647933A (en) * | 1969-09-19 | 1972-03-07 | Ngk Insulators Ltd | Jumper assembly connecting together two powerline conductor sections |
JPS5359880A (en) * | 1976-11-11 | 1978-05-30 | Nippon Telegr & Teleph Corp <Ntt> | Connector applied for aluminum conductor |
US4784707A (en) | 1986-02-07 | 1988-11-15 | Aluminum Company Of America | Method of making electrical connections using joint compound |
US5098485A (en) | 1990-09-19 | 1992-03-24 | Evans Findings Company | Method of making electrically insulating metallic oxides electrically conductive |
JPH0620727A (ja) * | 1992-07-01 | 1994-01-28 | Fujikura Ltd | 圧着接続コネクタ |
JPH0631073U (ja) * | 1992-09-22 | 1994-04-22 | 株式会社フジクラ | 圧着接続コネクタ |
US6599580B2 (en) | 1997-05-01 | 2003-07-29 | Wilson Greatbatch Ltd. | Method for improving electrical conductivity of a metal oxide layer on a substrate utilizing high energy beam mixing |
US6180869B1 (en) | 1997-05-06 | 2001-01-30 | Ebara Solar, Inc. | Method and apparatus for self-doping negative and positive electrodes for silicon solar cells and other devices |
US6096391A (en) | 1998-10-16 | 2000-08-01 | Wilson Greatbatch Ltd. | Method for improving electrical conductivity of metals, metal alloys and metal oxides |
AUPQ653700A0 (en) | 2000-03-28 | 2000-04-20 | Ceramic Fuel Cells Limited | Surface treated electrically conductive metal element and method of forming same |
JP2002298995A (ja) * | 2001-03-30 | 2002-10-11 | Jst Mfg Co Ltd | 樹脂ハンダを用いた同軸ケーブルの結束部材及び同軸ケーブルの電気コネクタ並びに結束部材の同軸ケーブル又は電気コネクタへの接続方法 |
US20020192492A1 (en) | 2001-05-11 | 2002-12-19 | Abys Joseph Anthony | Metal article coated with near-surface doped tin or tin alloy |
JP4056274B2 (ja) * | 2002-03-22 | 2008-03-05 | 旭電機株式会社 | 内面層形成方法および導電接続装置 |
US20050189041A1 (en) | 2002-08-21 | 2005-09-01 | Mantese Joseph V. | Metal alloys for forming conductive oxide coatings for electrical contacts |
US7959830B2 (en) | 2003-12-31 | 2011-06-14 | The Regents Of The University Of California | Articles comprising high-electrical-conductivity nanocomposite material and method for fabricating same |
US20060013942A1 (en) | 2004-07-16 | 2006-01-19 | Muffoletto Barry C | Method for improving electrical conductivity of metals, metal alloys and metal oxides by ion beam implantation |
US7528021B2 (en) | 2004-09-16 | 2009-05-05 | Samsung Electronics Co., Ltd. | Thin film transistor array panel and method of manufacturing the same |
US7371117B2 (en) * | 2004-09-30 | 2008-05-13 | Amphenol Corporation | High speed, high density electrical connector |
US7311553B2 (en) * | 2004-11-16 | 2007-12-25 | Hubbell Incorporated | Compression connector assembly |
WO2008027167A1 (en) | 2006-08-31 | 2008-03-06 | Antaya Technologies Corporation | Clad aluminum connector |
US7794291B2 (en) * | 2007-09-24 | 2010-09-14 | Classic Connectors, Inc. | Electrical transmission line repair service |
US7883381B2 (en) * | 2008-07-02 | 2011-02-08 | Tyco Electronics Brasil Ltda | Electrical cable connector |
JP4632380B2 (ja) * | 2009-06-04 | 2011-02-16 | 協和電線株式会社 | めっき被膜接続端子部材、これを用いた接続端子、これに用いられるめっき被膜材及び多層めっき材料、並びにめっき被膜接続端子部材の製造方法 |
JP5525951B2 (ja) * | 2010-07-22 | 2014-06-18 | 神鋼リードミック株式会社 | 接続用端子 |
JP5114607B2 (ja) * | 2011-02-23 | 2013-01-09 | 積水化学工業株式会社 | 導電性粒子、導電性粒子の製造方法、異方性導電材料及び接続構造体 |
-
2013
- 2013-11-22 WO PCT/US2013/071487 patent/WO2014085254A1/en active Application Filing
- 2013-11-22 EP EP13859450.2A patent/EP2926406A4/en not_active Ceased
- 2013-11-22 JP JP2015545130A patent/JP6327531B2/ja active Active
- 2013-11-22 US US14/087,407 patent/US9413092B2/en active Active
- 2013-11-22 CA CA2892094A patent/CA2892094C/en active Active
-
2018
- 2018-04-05 JP JP2018073005A patent/JP6629905B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
EP2926406A4 (en) | 2016-07-20 |
JP2016502245A (ja) | 2016-01-21 |
JP6327531B2 (ja) | 2018-05-23 |
EP2926406A1 (en) | 2015-10-07 |
JP2018120869A (ja) | 2018-08-02 |
CA2892094A1 (en) | 2014-06-05 |
CA2892094C (en) | 2021-08-31 |
WO2014085254A1 (en) | 2014-06-05 |
US20140151117A1 (en) | 2014-06-05 |
US9413092B2 (en) | 2016-08-09 |
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