JP6610816B1 - シリコン単結晶引上装置 - Google Patents
シリコン単結晶引上装置 Download PDFInfo
- Publication number
- JP6610816B1 JP6610816B1 JP2019026542A JP2019026542A JP6610816B1 JP 6610816 B1 JP6610816 B1 JP 6610816B1 JP 2019026542 A JP2019026542 A JP 2019026542A JP 2019026542 A JP2019026542 A JP 2019026542A JP 6610816 B1 JP6610816 B1 JP 6610816B1
- Authority
- JP
- Japan
- Prior art keywords
- window glass
- single crystal
- inner cylinder
- graphite
- silicon single
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 133
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 133
- 239000010703 silicon Substances 0.000 title claims abstract description 133
- 239000013078 crystal Substances 0.000 title claims abstract description 125
- 239000005357 flat glass Substances 0.000 claims abstract description 248
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 164
- 229910002804 graphite Inorganic materials 0.000 claims description 164
- 239000010439 graphite Substances 0.000 claims description 164
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 45
- 239000010453 quartz Substances 0.000 claims description 44
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 43
- 229910052760 oxygen Inorganic materials 0.000 abstract description 43
- 239000001301 oxygen Substances 0.000 abstract description 43
- 239000007789 gas Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 15
- 230000000694 effects Effects 0.000 description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 4
- 238000009423 ventilation Methods 0.000 description 4
- 239000013065 commercial product Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000007524 flame polishing Methods 0.000 description 1
- 238000005247 gettering Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000002296 pyrolytic carbon Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019026542A JP6610816B1 (ja) | 2019-02-18 | 2019-02-18 | シリコン単結晶引上装置 |
KR1020200017193A KR102344205B1 (ko) | 2019-02-18 | 2020-02-12 | 실리콘 단결정 인상장치 |
CN202010096773.XA CN111575783B (zh) | 2019-02-18 | 2020-02-17 | 单晶硅提拉装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019026542A JP6610816B1 (ja) | 2019-02-18 | 2019-02-18 | シリコン単結晶引上装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP6610816B1 true JP6610816B1 (ja) | 2019-11-27 |
JP2020132462A JP2020132462A (ja) | 2020-08-31 |
Family
ID=68691963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019026542A Active JP6610816B1 (ja) | 2019-02-18 | 2019-02-18 | シリコン単結晶引上装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6610816B1 (zh) |
KR (1) | KR102344205B1 (zh) |
CN (1) | CN111575783B (zh) |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0688864B2 (ja) * | 1989-09-09 | 1994-11-09 | 信越半導体株式会社 | 単結晶引上装置用整流筒 |
JP2940437B2 (ja) | 1995-06-01 | 1999-08-25 | 信越半導体株式会社 | 単結晶の製造方法及び装置 |
JP3557756B2 (ja) * | 1995-10-14 | 2004-08-25 | 信越半導体株式会社 | 単結晶引上装置用整流筒の観察窓用石英製窓板の曇り防止構造 |
JP3550487B2 (ja) | 1997-11-06 | 2004-08-04 | 東芝セラミックス株式会社 | 横磁界下シリコン単結晶引上装置 |
JP3952356B2 (ja) | 2001-02-28 | 2007-08-01 | 信越半導体株式会社 | 半導体単結晶製造装置及びそれを用いた半導体単結晶の製造方法 |
JP2007314375A (ja) * | 2006-05-26 | 2007-12-06 | Shin Etsu Handotai Co Ltd | 単結晶製造装置 |
JP4917519B2 (ja) | 2007-11-29 | 2012-04-18 | コバレントマテリアル株式会社 | シリコン単結晶の製造方法 |
CN103290467B (zh) * | 2012-02-24 | 2016-04-13 | 宁夏盈谷实业股份有限公司 | 单晶炉水冷套结构 |
CN103774118B (zh) * | 2012-10-17 | 2016-03-02 | 理想能源设备(上海)有限公司 | 基片承载装置及金属有机化学气相沉积装置 |
JP6088864B2 (ja) * | 2013-03-13 | 2017-03-01 | 国立大学法人 鹿児島大学 | キャリブレーションシステム、およびキャリブレーション方法 |
JP5974978B2 (ja) * | 2013-05-29 | 2016-08-23 | 信越半導体株式会社 | シリコン単結晶製造方法 |
CN205394323U (zh) * | 2015-12-20 | 2016-07-27 | 重庆天和玻璃有限公司 | 一种窗框夹具 |
CN106917869B (zh) * | 2017-03-23 | 2019-10-08 | 上海交通大学 | 一种应用于高压容器的双锥面玻璃窗口 |
-
2019
- 2019-02-18 JP JP2019026542A patent/JP6610816B1/ja active Active
-
2020
- 2020-02-12 KR KR1020200017193A patent/KR102344205B1/ko active IP Right Grant
- 2020-02-17 CN CN202010096773.XA patent/CN111575783B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR20200100544A (ko) | 2020-08-26 |
JP2020132462A (ja) | 2020-08-31 |
CN111575783A (zh) | 2020-08-25 |
KR102344205B1 (ko) | 2021-12-28 |
CN111575783B (zh) | 2021-12-31 |
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