JP6593140B2 - フォトダイオード - Google Patents
フォトダイオード Download PDFInfo
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- JP6593140B2 JP6593140B2 JP2015240471A JP2015240471A JP6593140B2 JP 6593140 B2 JP6593140 B2 JP 6593140B2 JP 2015240471 A JP2015240471 A JP 2015240471A JP 2015240471 A JP2015240471 A JP 2015240471A JP 6593140 B2 JP6593140 B2 JP 6593140B2
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- 239000004065 semiconductor Substances 0.000 claims description 172
- 230000031700 light absorption Effects 0.000 claims description 69
- 239000000470 constituent Substances 0.000 claims description 22
- 229910021478 group 5 element Inorganic materials 0.000 claims description 16
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 8
- 229910052787 antimony Inorganic materials 0.000 claims description 8
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 8
- 229910052785 arsenic Inorganic materials 0.000 claims description 8
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 8
- 229910052733 gallium Inorganic materials 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 8
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 8
- 239000010410 layer Substances 0.000 description 206
- 229910005542 GaSb Inorganic materials 0.000 description 42
- 229910000673 Indium arsenide Inorganic materials 0.000 description 33
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 33
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 29
- 150000001875 compounds Chemical class 0.000 description 20
- 239000000758 substrate Substances 0.000 description 14
- 230000004888 barrier function Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000012010 growth Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910017115 AlSb Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035236—Superlattices; Multiple quantum well structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L31/03042—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds characterised by the doping material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the PIN type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/109—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the PN heterojunction type
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
Description
光吸収層13の第1超格子構造31のセル:InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:200セル。
中間層15の第2超格子構造33のセル:InSb(厚さ0.27nm)/InAs(厚さ5.06nm)/InSb(厚さ0.27nm)/GaSb(厚さ2.13nm)。
セル繰り返し:52セル。
p型半導体領域17の第3超格子構造35のセル:InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:50セル。
n型半導体領域19の第4超格子構造37のセル:InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:50セル。
n型コンタクト層21:InAs(厚さ:20nm)。
別のp型半導体領域24:Be添加GaSb(厚さ:1000nm)。
基板25のIII−V族化合物半導体:Te添加のn型GaSb。
光吸収層13は、InAsSbのバルク層を備えることができる。このInAsSb層は、離散化された量子レベルを形成しない程度の膜厚を有しており、赤外線に感応する。
GaSb:格子定数(0.60959nm)、バンドギャップ(0.726エレクトロンボルト)。
InAs:格子定数(0.60583nm)、バンドギャップ(0.354エレクトロンボルト)。
InSb:格子定数(0.64794nm)、バンドギャップ(0.17エレクトロンボルト)。
図4に示される例示によれば、ギャップEgは、0.02エレクトロンボルトから0.5エレクトロンボルトの範囲で変更されることができる。この実施例では、光吸収層13の第1超格子構造31、p型半導体領域17の第3超格子構造35、及びn型半導体領域19の第4超格子構造37は、互いに同じ層構造を有しており、中間層15の第2超格子構造33は、これらの超格子と異なる層構造を有して、伝導帯に井戸ポテンシャルを形成している。
実施例においては、以下の3つの構造、構造1、構造2、構造3を有するフォトダイオードを作製した。結晶成長には、分子線エピタキシー法が用いられた。これらの構造は、Te添加のn型GaSb基板上に形成された。具体的には、厚さ1000nmのBe添加のp型GaSb層がn型GaSb基板上に成長され、個々の構造がp型GaSb層上に成長され、また個々の構造上に厚さ20nmのn型InAs層が成長された。
n型半導体領域の第4超格子構造のセル(Siドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:50セル。
光吸収層の第1超格子構造のセル(Beドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:200セル。
中間層の第2超格子構造のセル(Beドープ):InSb(厚さ0.27nm)/InAs(厚さ5.06nm)/InSb(厚さ0.27nm)/GaSb(厚さ2.10nm)。
セル繰り返し:52セル。
p型半導体領域の第3超格子構造のセル(Beドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:200セル。
光吸収層の超格子構造のセル、p型半導体領域の超格子構造のセル及びn型半導体領域の超格子構造のセルは同じ構造を有する。pn接合は光吸収層とn型半導体領域との境界付近にある。中間層は、GaSb基板と光吸収層との間に位置する。この構造によれば、中間層がp型半導体領域から光吸収層に移動する電子のみを捕獲し、光吸収層で発生した光電流には影響せず、フォトダイオードの感度を低下させることを防ぐことが可能である。
n型半導体領域の超格子構造のセル(Siドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:50セル。
光吸収層の超格子構造のセル(Beドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:200セル。
p型半導体領域の超格子構造のセル(Beドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:200セル。
n型半導体領域の超格子構造のセル(Siドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:50セル。
正孔バリア層の超格子構造のセル(Siドープ):InSb(厚さ0.17nm)/InAs(厚さ3.03nm)/GaSb(厚さ0.305nm)/AlSb(厚さ1.53nm)/GaSb(厚さ0.305nm)。
セル繰り返し:60セル。
光吸収層の超格子構造のセル(Beドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:200セル。
電子バリア層の超格子構造のセル(アンドープ):InSb(厚さ0.27nm)/InAs(厚さ1.21nm)/GaSb(厚さ3.66nm)/InAs(厚さ1.21nm)/GaSb(厚さ3.66nm)。
セル繰り返し:16セル。
p型半導体領域の超格子構造のセル(Beドープ):InSb(厚さ0.27nm)/InAs(厚さ2.74nm)/GaSb(厚さ2.13nm)。
セル繰り返し:50セル。
比較のために、構造1(PtIN構造)、構造2(PIN構造)及び構造3(PbIbN構造)におけるp型半導体領域の超格子構造のセル、光吸収層の超格子構造のセル及びn型半導体領域の超格子構造のセルは、同じ構造を有する。図5に示されるように、構造1(PtIN構造)は、本実施形態の構造を実現する実施例であり、中間層の井戸ポテンシャルの深さ(バンドオフセット)△Ecは124meVである。構造2(PIN構造)は、図6に示されるように、最もシンプルな光検知構造を有する。構造3(PbIbN構造)は、図7に示されるように、電子及び正孔それぞれのための電子バリア層及び正孔バリア層を有しており、個々の接合におけるバンドオフセットは以下の値である。
△Ec(eb):218〜185meV。
△Ec(a):320〜287meV。
△Ec(hb):90〜110meV。
△Ec(n):6meV。
△Ev(hb):264meV。
△Ev(a):−2〜10meV。
△Ev(eb):2〜10meV。
△Ev(p):6meV。
Claims (4)
- フォトダイオードであって、
赤外線に感応するバンド構造を形成するように配列された第11半導体層及び第12半導体層を含む第1超格子構造を備える光吸収層と、
p型半導体領域と、
前記p型半導体領域と前記光吸収層との間に設けられた中間層と、
を備え、
前記中間層の伝導帯の底におけるエネルギーレベルは、前記p型半導体領域の伝導帯の底におけるエネルギーレベルより低く、
前記中間層の伝導帯の底におけるエネルギーレベルは、前記光吸収層の伝導帯の底におけるエネルギーレベルより低い、フォトダイオード。 - 前記光吸収層の前記第1超格子構造は、前記第11半導体層及び前記第12半導体層を含む単位セルの配列を含み、
前記第11半導体層は、III族構成元素としてガリウムを含むと共にV族元素としてアンチモンを含み、
前記第12半導体層は、III族構成元素としてインジウムを含むと共にV族元素としてヒ素を含み、
前記中間層は、第21半導体層及び第22半導体層を含む第2超格子構造を備え、前記中間層の前記伝導帯は、前記第2超格子構造によって提供され、
前記中間層の前記第2超格子構造は、第21半導体層及び第22半導体層を含む単位セルの配列を含み、
前記第21半導体層は、III族構成元素としてガリウムを含むと共にV族元素としてアンチモンを含み、
前記第22半導体層は、III族構成元素としてインジウムを含むと共にV族元素としてヒ素を含む、請求項1に記載されたフォトダイオード。 - 前記p型半導体領域の前記伝導帯は、第3超格子構造によって提供される、請求項1又は請求項2に記載されたフォトダイオード。
- 前記中間層は、p導電性を有する、請求項1から請求項3のいずれか一項に記載されたフォトダイオード。
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US15/373,318 US9941431B2 (en) | 2015-12-09 | 2016-12-08 | Photodiode having a superlattice structure |
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DE102017107918A1 (de) * | 2017-04-12 | 2018-10-18 | Osram Opto Semiconductors Gmbh | Halbleiterchip |
US10541341B2 (en) * | 2017-06-08 | 2020-01-21 | Sumitomo Electric Industries, Ltd. | Semiconductor light receiving device having a type—II superlattice |
JP6969199B2 (ja) * | 2017-08-03 | 2021-11-24 | 住友電気工業株式会社 | 受光素子 |
JP6972831B2 (ja) * | 2017-09-21 | 2021-11-24 | 富士通株式会社 | 赤外線検出器、撮像装置及び撮像システム |
KR102590315B1 (ko) | 2018-05-28 | 2023-10-16 | 삼성전자주식회사 | 유기 광전 소자 및 이를 포함하는 적층형 이미지 센서 |
JP7163803B2 (ja) * | 2019-02-01 | 2022-11-01 | 住友電気工業株式会社 | 半導体受光デバイス |
US11378701B2 (en) * | 2019-10-08 | 2022-07-05 | Redlen Technologies, Inc. | Low dark current radiation detector and method of making the same |
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