JP6566430B2 - 基板処理方法 - Google Patents
基板処理方法 Download PDFInfo
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- JP6566430B2 JP6566430B2 JP2017507853A JP2017507853A JP6566430B2 JP 6566430 B2 JP6566430 B2 JP 6566430B2 JP 2017507853 A JP2017507853 A JP 2017507853A JP 2017507853 A JP2017507853 A JP 2017507853A JP 6566430 B2 JP6566430 B2 JP 6566430B2
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- 239000000758 substrate Substances 0.000 title claims description 239
- 238000003672 processing method Methods 0.000 title 1
- 229910052731 fluorine Inorganic materials 0.000 claims description 126
- 239000011737 fluorine Substances 0.000 claims description 119
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 117
- 238000000034 method Methods 0.000 claims description 117
- 239000007789 gas Substances 0.000 claims description 79
- 229910052760 oxygen Inorganic materials 0.000 claims description 35
- 230000001590 oxidative effect Effects 0.000 claims description 30
- 230000003647 oxidation Effects 0.000 claims description 29
- 238000007254 oxidation reaction Methods 0.000 claims description 29
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 22
- 239000001301 oxygen Substances 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 239000004065 semiconductor Substances 0.000 claims description 19
- 238000004140 cleaning Methods 0.000 claims description 13
- 150000001875 compounds Chemical class 0.000 claims description 8
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims 3
- 230000006870 function Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 229910052732 germanium Inorganic materials 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 4
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 4
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 4
- 229910052785 arsenic Inorganic materials 0.000 description 4
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910004129 HfSiO Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910010041 TiAlC Inorganic materials 0.000 description 1
- 229910006501 ZrSiO Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000005527 interface trap Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003949 trap density measurement Methods 0.000 description 1
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Description
上部に酸化層が形成された基板を提供するステップと、
フッ素系層で前記酸化層を置換するステップと、
酸化雰囲気に前記フッ素系層を暴露するステップであって、前記フッ素系層は、前記酸化雰囲気による酸化に対して前記基板を保護する、ステップと、
プラズマプロセスを用いて、前記基板から前記フッ素系層を除去するステップと、
を有する。
上部にGeを含む酸化層が形成されたGe含有基板を提供するステップと、
a)NH3およびHF、またはb)NF3およびHFを含む清浄化ガスへの暴露により、前記Ge含有基板から前記酸化層を除去するステップであって、前記清浄化ガスへの暴露は、さらに、フッ素系層を用いて前記Ge含有基板をパッシベーションする、ステップと、
を有する。当該方法は、さらに、酸化雰囲気に前記フッ素系層を暴露するステップであって、前記フッ素系層は、前記酸化雰囲気による酸化に対して前記基板を保護する、ステップを有する。当該方法は、さらに、H2ガスを含むマイクロ波プラズマプロセスを用いて、前記Ge含有基板から前記フッ素系層を除去するステップと、マイクロ波プラズマプロセスを用いて、前記Ge含有基板上に酸素含有界面層を形成するステップと、前記酸素含有界面層上に高k膜を成膜するステップであって、前記Ge基板は、前記フッ素系層を除去するステップの前から、前記高k膜を成膜するステップの後まで、真空条件下に維持される、ステップと、を有する。
真空処理ツール内にパッシベーションされた基板を提供するステップであって、前記パッシベーションされた基板は、酸化雰囲気による酸化に対して前記パッシベーションされた基板を有効に保護するフッ素系層を有する、ステップと、
前記真空処理ツール内で、マイクロ波プラズマプロセスを用いて、前記パッシベーションされた基板から前記フッ素系層を除去し、これにより清浄な基板を形成するステップと、
真空条件下で、前記清浄な基板を処理するステップと、
を有する。
図9には、本発明の実施例による、基板を処理するためのRLSA(登録商標)プラズマを備えるマイクロ波プラズマ処理システムの概略図を示す。プラズマ処理システム510で生成されるプラズマは、低電子温度および高プラズマ密度であるという特徴を有する。プラズマ処理システム510は、プラズマ処理チャンバ550を有し、該プラズマ処理チャンバ550の上部には、基板558よりも大きな開口部551が設けられる。円筒状の誘電体上部板554は、石英、アルミニウム窒化物、またはアルミニウム酸化物で構成され、開口部551のカバーを提供する。
Claims (17)
- 基板を処理する方法であって、
上部に酸化層が形成された基板を提供するステップと、
フッ素系層で前記酸化層を置換するステップと、
酸化雰囲気に前記フッ素系層を暴露するステップであって、前記フッ素系層は、前記酸化雰囲気による酸化に対して前記基板を保護する、ステップと、
プラズマプロセスを用いて、前記基板から前記フッ素系層を除去するステップと、
を有し、
前記置換するステップは、
a)NH 3 およびHF、またはb)NF 3 およびHFを含む清浄化ガスに、前記酸化層を暴露するステップ
を有し、
前記暴露するステップは、前記フッ素系層で基板をパッシベーションする、方法。 - 基板を処理する方法であって、
上部に酸化層が形成された基板を提供するステップと、
フッ素系層で前記酸化層を置換するステップと、
酸化雰囲気に前記フッ素系層を暴露するステップであって、前記フッ素系層は、前記酸化雰囲気による酸化に対して前記基板を保護する、ステップと、
プラズマプロセスを用いて、前記基板から前記フッ素系層を除去するステップと、
を有し、
前記置換するステップは、
前記基板から前記酸化層を除去するステップと、
その後、前記フッ素系層で前記基板をパッシベーションするステップと、
を有し、
前記酸化層を除去するステップは、
a)NH 3 およびHF、またはb)NF 3 およびHFを含む清浄化ガスに、前記酸化層を暴露するステップと、
その後、前記基板を熱処理するステップと、
を有する、方法。 - 前記パッシベーションするステップは、
前記基板をフッ素含有プラズマに暴露するステップ
を有する、請求項2に記載の方法。 - 前記フッ素含有プラズマは、マイクロ波プラズマ源を用いて生成される、請求項3に記載の方法。
- 前記酸化雰囲気は、空気を含む、請求項1乃至4のいずれか一つに記載の方法。
- 前記除去するステップは、
H2、N2、Ar、NH3、またはこれらの2もしくは3以上の組み合わせを含有するプラズマに、前記フッ素系層を暴露するステップ
を有する、請求項1乃至5のいずれか一つに記載の方法。 - 前記基板は、Si、SiGe、Ge、または化合物半導体を有する、請求項1乃至6のいずれか一つに記載の方法。
- 基板を処理する方法であって、
上部に酸化層が形成された基板を提供するステップと、
フッ素系層で前記酸化層を置換するステップと、
酸化雰囲気に前記フッ素系層を暴露するステップであって、前記フッ素系層は、前記酸化雰囲気による酸化に対して前記基板を保護する、ステップと、
プラズマプロセスを用いて、前記基板から前記フッ素系層を除去するステップと、
前記除去するステップの後、前記基板上に酸素含有界面層を形成するステップと、
前記酸素含有界面層上に高k膜を成膜するステップと、
を有する、方法。 - 前記基板上に酸素含有界面層を形成するステップは、
O、O3、H2O、またはこれらの組み合わせを含む酸素含有プラズマに、前記基板を暴露するステップ
を有する、請求項8に記載の方法。 - 前記酸素含有プラズマは、マイクロ波プラズマ源を用いて形成される、請求項9に記載の方法。
- 前記基板は、前記フッ素系層を除去するステップの前から、前記高k膜を成膜するステップの後まで、真空条件下に維持される、請求項10に記載の方法。
- 基板を処理する方法であって、
上部にGeを含む酸化層が形成されたGe含有基板を提供するステップと、
a)NH3およびHF、またはb)NF3およびHFを含む清浄化ガスへの暴露により、前記Ge含有基板から前記酸化層を除去するステップであって、前記清浄化ガスへの暴露は、さらに、フッ素系層を用いて前記Ge含有基板をパッシベーションする、ステップと、
酸化雰囲気に前記フッ素系層を暴露するステップであって、前記フッ素系層は、前記酸化雰囲気による酸化に対して前記Ge含有基板を保護する、ステップと、
H2ガスを含むマイクロ波プラズマプロセスを用いて、前記Ge含有基板から前記フッ素系層を除去するステップと、
その後、マイクロ波プラズマプロセスを用いて、前記Ge含有基板上に酸素含有界面層を形成するステップと、
前記酸素含有界面層上に高k膜を成膜するステップであって、前記Ge含有基板は、前記フッ素系層を除去するステップの前から、前記高k膜を成膜するステップの後まで、真空条件下に維持される、ステップと、
を有する、方法。 - 基板を処理する方法であって、
真空処理ツール内にパッシベーションされた基板を提供するステップであって、前記パッシベーションされた基板は、酸化雰囲気による酸化に対して前記パッシベーションされた基板を有効に保護するフッ素系層を有する、ステップと、
前記真空処理ツール内で、マイクロ波プラズマプロセスを用いて、前記パッシベーションされた基板から前記フッ素系層を除去し、これにより清浄な基板を形成するステップと、
真空条件下で、前記清浄な基板を処理するステップと、
を有し、
前記パッシベーションされた基板を提供するステップは、
上部に酸化層が形成された前記基板を提供するステップと、
前記酸化層を前記フッ素系層で置換するステップと、
を有し、
前記置換するステップは、
a)NH 3 およびHF、またはb)NF 3 およびHFを含む清浄化ガスに、前記酸化層を暴露するステップ
を有し、
前記暴露するステップは、前記酸化層を除去し、前記フッ素系層を用いて前記基板をパッシベーションする、方法。 - 前記パッシベーションされた基板は、Si、SiGe、Ge、または化合物半導体を有する、請求項13に記載の方法。
- 前記基板は、前記フッ素系層を除去するステップの前から、前記清浄な基板を処理するステップの後まで、真空条件下に維持される、請求項13に記載の方法。
- 前記パッシベーションされた基板は、陥凹特徴部と、該陥凹特徴部内の金属コンタクトとを有する、請求項13に記載の方法。
- 前記除去するステップの後に、前記基板上に酸素含有界面層を形成するステップと、
前記酸素含有界面層上に高k膜を成膜するステップと、
を有する、請求項13に記載の方法。
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