JP6557515B2 - 走査露光装置、走査露光方法、及びデバイス製造方法 - Google Patents

走査露光装置、走査露光方法、及びデバイス製造方法 Download PDF

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JP6557515B2
JP6557515B2 JP2015114158A JP2015114158A JP6557515B2 JP 6557515 B2 JP6557515 B2 JP 6557515B2 JP 2015114158 A JP2015114158 A JP 2015114158A JP 2015114158 A JP2015114158 A JP 2015114158A JP 6557515 B2 JP6557515 B2 JP 6557515B2
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substrate
distribution
scanning
scanning direction
scanning exposure
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JP2017003617A5 (enrdf_load_stackoverflow
JP2017003617A (ja
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深川　容三
容三 深川
肇 竹内
肇 竹内
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Canon Inc
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JP2015114158A 2015-06-04 2015-06-04 走査露光装置、走査露光方法、及びデバイス製造方法 Active JP6557515B2 (ja)

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JP2017003617A JP2017003617A (ja) 2017-01-05
JP2017003617A5 JP2017003617A5 (enrdf_load_stackoverflow) 2018-07-12
JP6557515B2 true JP6557515B2 (ja) 2019-08-07

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019053108A (ja) 2017-09-13 2019-04-04 東芝メモリ株式会社 露光装置及び面位置制御方法
JP2020112605A (ja) * 2019-01-08 2020-07-27 キヤノン株式会社 露光装置およびその制御方法、および、物品製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08316123A (ja) * 1995-05-19 1996-11-29 Nikon Corp 投影露光装置
JPH1097987A (ja) * 1996-09-25 1998-04-14 Canon Inc 走査型露光装置および方法
JPH11135420A (ja) * 1997-10-30 1999-05-21 Nikon Corp 投影露光装置
JP2003059817A (ja) * 2001-08-21 2003-02-28 Nikon Corp 露光方法及び露光装置並びにマイクロデバイス製造方法
JP4261810B2 (ja) * 2002-03-18 2009-04-30 キヤノン株式会社 露光装置、デバイス製造方法
US6853440B1 (en) * 2003-04-04 2005-02-08 Asml Netherlands B.V. Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination
JP2009164296A (ja) * 2007-12-28 2009-07-23 Canon Inc 露光装置およびデバイス製造方法

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