JP6556993B2 - 断面形成用途のプロセス自動化のためのパターン認識を伴う差分画像化 - Google Patents

断面形成用途のプロセス自動化のためのパターン認識を伴う差分画像化 Download PDF

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JP6556993B2
JP6556993B2 JP2014218879A JP2014218879A JP6556993B2 JP 6556993 B2 JP6556993 B2 JP 6556993B2 JP 2014218879 A JP2014218879 A JP 2014218879A JP 2014218879 A JP2014218879 A JP 2014218879A JP 6556993 B2 JP6556993 B2 JP 6556993B2
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image
sample
ion beam
milling
difference
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JP2015111108A5 (enExample
JP2015111108A (ja
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アレクサンダー・バクスバウム
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エフ・イ−・アイ・カンパニー
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/286—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/44—Sample treatment involving radiation, e.g. heat
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/226—Image reconstruction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/262—Non-scanning techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30466—Detecting endpoint of process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2014218879A 2013-10-29 2014-10-28 断面形成用途のプロセス自動化のためのパターン認識を伴う差分画像化 Expired - Fee Related JP6556993B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361897052P 2013-10-29 2013-10-29
US61/897,052 2013-10-29

Publications (3)

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JP2015111108A JP2015111108A (ja) 2015-06-18
JP2015111108A5 JP2015111108A5 (enExample) 2018-01-11
JP6556993B2 true JP6556993B2 (ja) 2019-08-07

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JP2014218879A Expired - Fee Related JP6556993B2 (ja) 2013-10-29 2014-10-28 断面形成用途のプロセス自動化のためのパターン認識を伴う差分画像化

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US (2) US9297727B2 (enExample)
EP (1) EP2869328A1 (enExample)
JP (1) JP6556993B2 (enExample)
CN (1) CN104795302B (enExample)

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JP6113842B2 (ja) 2012-07-16 2017-04-12 エフ・イ−・アイ・カンパニー 集束イオン・ビーム処理の終点決定
CN104795302B (zh) * 2013-10-29 2018-10-02 Fei 公司 具有用于横切应用的过程自动化的图案识别的差分成像
JP2018511036A (ja) * 2015-01-31 2018-04-19 エフ．ホフマン−ラ ロシュ アーゲーＦ． Ｈｏｆｆｍａｎｎ−Ｌａ Ｒｏｃｈｅ Ａｋｔｉｅｎｇｅｓｅｌｌｓｃｈａｆｔ メソダイセクションのためのシステムおよび方法
EP3104155A1 (en) * 2015-06-09 2016-12-14 FEI Company Method of analyzing surface modification of a specimen in a charged-particle microscope
US9576772B1 (en) 2015-08-31 2017-02-21 Fei Company CAD-assisted TEM prep recipe creation
CZ306807B6 (cs) * 2016-05-21 2017-07-12 Tescan Brno, S.R.O. Rastrovací elektronový mikroskop a způsob jeho provozu
EP3318862B1 (en) * 2016-11-04 2019-08-21 FEI Company Tomography sample preparation systems and methods with improved speed, automation, and reliability
DE112016007379B4 (de) * 2016-11-22 2025-06-18 Hitachi High-Tech Corporation Ladungsträgerstrahlvorrichtung und Probenbeobachtungsverfahren
KR102499036B1 (ko) 2017-09-22 2023-02-13 삼성전자주식회사 임계 치수 측정 시스템 및 임계 치수 측정 방법
JP6972157B2 (ja) * 2017-10-16 2021-11-24 株式会社日立ハイテク 撮像装置
WO2019108166A1 (en) * 2017-11-28 2019-06-06 Hewlett-Packard Development Company, L.P. Digital image analysis and processing for viewing by color-blind
CN108181624B (zh) * 2017-12-12 2020-03-17 西安交通大学 一种差分计算成像装置及方法
DE102018117492B3 (de) * 2018-07-19 2019-10-02 Carl Zeiss Microscopy Gmbh Verfahren zum Betreiben einer Mehrzahl von FIB-SEM-Systemen
US10811219B2 (en) * 2018-08-07 2020-10-20 Applied Materials Israel Ltd. Method for evaluating a region of an object
US12165840B2 (en) 2018-11-21 2024-12-10 Techinsights Inc. Ion beam delayering system and method, topographically enhanced delayered sample produced thereby, and imaging methods and systems related thereto
US11491575B2 (en) 2019-04-16 2022-11-08 Arcam Ab Electron beam melting additive manufacturing machine with dynamic energy adjustment
JP7360871B2 (ja) * 2019-09-24 2023-10-13 株式会社日立ハイテクサイエンス 荷電粒子ビーム照射装置、及び制御方法
DE102020100565A1 (de) 2020-01-13 2021-07-15 Aixtron Se Verfahren zum Abscheiden von Schichten
WO2022174187A2 (en) * 2021-02-15 2022-08-18 E.A. Fischione Instruments, Inc. System and method for uniform ion milling
WO2023053187A1 (ja) * 2021-09-28 2023-04-06 株式会社日立ハイテクサイエンス 加工方法及び荷電粒子ビーム装置
US12249482B2 (en) * 2021-12-16 2025-03-11 Fei Company Microscopy feedback for improved milling accuracy
US12288668B2 (en) 2023-05-11 2025-04-29 Applied Materials Israel Ltd. Entropy based image processing for focused ion beam delayer-edge slices detection

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NL1022426C2 (nl) 2003-01-17 2004-07-26 Fei Co Werkwijze voor het vervaardigen en transmissief bestralen van een preparaat alsmede deeltjes optisch systeem.
CA2587747C (en) 2004-11-15 2013-01-08 Fibics Incorporated System and method for focused ion beam data analysis
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US7535000B2 (en) * 2006-05-23 2009-05-19 Dcg Systems, Inc. Method and system for identifying events in FIB
EP1890136A1 (en) * 2006-08-16 2008-02-20 FEI Company Method for obtaining images from slices of a specimen
EP2149897A1 (en) 2008-07-31 2010-02-03 FEI Company Method for milling and end-pointing a sample
JP5649583B2 (ja) * 2008-10-31 2015-01-07 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 加工終点検出方法及び装置
EP2233907A1 (en) 2009-03-27 2010-09-29 FEI Company Forming an image while milling a work piece
JP2010271117A (ja) * 2009-05-20 2010-12-02 Elpida Memory Inc 試料の加工方法および試料の作製方法
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Publication number Publication date
CN104795302B (zh) 2018-10-02
CN104795302A (zh) 2015-07-22
US9297727B2 (en) 2016-03-29
US20160211113A1 (en) 2016-07-21
EP2869328A1 (en) 2015-05-06
JP2015111108A (ja) 2015-06-18
US9881766B2 (en) 2018-01-30
US20150136977A1 (en) 2015-05-21

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