JP6530088B2 - ヒータとそれを備える定着装置、画像形成装置及び加熱装置 - Google Patents

ヒータとそれを備える定着装置、画像形成装置及び加熱装置 Download PDF

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Publication number
JP6530088B2
JP6530088B2 JP2017564313A JP2017564313A JP6530088B2 JP 6530088 B2 JP6530088 B2 JP 6530088B2 JP 2017564313 A JP2017564313 A JP 2017564313A JP 2017564313 A JP2017564313 A JP 2017564313A JP 6530088 B2 JP6530088 B2 JP 6530088B2
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Japan
Prior art keywords
layer
heater
heat
substrate
heat equalizing
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JP2017564313A
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English (en)
Japanese (ja)
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JPWO2017131041A1 (ja
Inventor
裕司 梅村
裕司 梅村
智克 青山
智克 青山
祥平 加藤
祥平 加藤
智博 森田
智博 森田
美穂 松田
美穂 松田
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Misuzu Industry Co., Ltd.
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Misuzu Industry Co., Ltd.
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Publication of JPWO2017131041A1 publication Critical patent/JPWO2017131041A1/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • G03G15/2003—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat using heat
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/20—Apparatus for electrographic processes using a charge pattern for fixing, e.g. by using heat
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0095—Heating devices in the form of rollers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/18—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being embedded in an insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
    • H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/004—Heaters using a particular layout for the resistive material or resistive elements using zigzag layout
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/005—Heaters using a particular layout for the resistive material or resistive elements using multiple resistive elements or resistive zones isolated from each other

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Heating Bodies (AREA)
  • Resistance Heating (AREA)
  • Fixing For Electrophotography (AREA)
JP2017564313A 2016-01-29 2017-01-25 ヒータとそれを備える定着装置、画像形成装置及び加熱装置 Active JP6530088B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016016545 2016-01-29
JP2016016545 2016-01-29
PCT/JP2017/002571 WO2017131041A1 (ja) 2016-01-29 2017-01-25 ヒータとそれを備える定着装置、画像形成装置及び加熱装置

Publications (2)

Publication Number Publication Date
JPWO2017131041A1 JPWO2017131041A1 (ja) 2018-11-22
JP6530088B2 true JP6530088B2 (ja) 2019-06-12

Family

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Family Applications (1)

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JP2017564313A Active JP6530088B2 (ja) 2016-01-29 2017-01-25 ヒータとそれを備える定着装置、画像形成装置及び加熱装置

Country Status (5)

Country Link
JP (1) JP6530088B2 (zh)
KR (1) KR20180106846A (zh)
CN (1) CN107615879B (zh)
TW (1) TWI724098B (zh)
WO (1) WO2017131041A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019112058A1 (ja) * 2017-12-08 2019-06-13 株式会社美鈴工業 ヒータ、定着装置、画像形成装置及び加熱装置
CN109587845A (zh) * 2018-10-24 2019-04-05 董林妤 一种免粘结剂板式加热器及其生产工艺
JP7497167B2 (ja) 2020-02-20 2024-06-10 キヤノン株式会社 定着装置及び画像形成装置
CN117518759A (zh) * 2023-12-21 2024-02-06 郑州中瓷科技有限公司 一种提高陶瓷加热条定影效果的工艺方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6385676A (ja) * 1986-09-30 1988-04-16 Hitachi Metals Ltd 電子写真用ヒ−トロ−ル
JPH0745357B2 (ja) * 1990-07-03 1995-05-17 工業技術院長 超電導繊維状単結晶およびその製造方法
JPH0745357A (ja) * 1993-07-29 1995-02-14 Taiyo Yuden Co Ltd セラミックヒーター
ES2137424T3 (es) * 1994-08-30 1999-12-16 Canon Kk Calentador y dispositivo de fijacion que lo incorpora.
JP3436437B2 (ja) * 1995-05-10 2003-08-11 ブラザー工業株式会社 定着用加熱ローラ
JP3736240B2 (ja) * 1999-11-29 2006-01-18 富士ゼロックス株式会社 定着装置及びこれを用いた画像形成装置
JP2003297535A (ja) * 2002-04-04 2003-10-17 Ibiden Co Ltd セラミックヒータ
JP2003133225A (ja) * 2002-07-15 2003-05-09 Ibiden Co Ltd 半導体製品加熱用ヒータ
JP2006267395A (ja) * 2005-03-23 2006-10-05 Canon Inc 基板、加熱体および像加熱装置
JP5117146B2 (ja) * 2006-12-15 2013-01-09 日本碍子株式会社 加熱装置
JP6228458B2 (ja) * 2011-11-15 2017-11-08 株式会社美鈴工業 ヒータ並びにそれを備える定着装置及び乾燥装置
JP6242181B2 (ja) * 2013-11-20 2017-12-06 キヤノン株式会社 定着装置
JP6385676B2 (ja) 2014-01-14 2018-09-05 株式会社Ｎｔｔドコモ ユーザ端末、無線基地局及び無線通信方法
JP6398487B2 (ja) * 2014-09-03 2018-10-03 東芝ライテック株式会社 ヒータおよび画像形成装置

Also Published As

Publication number Publication date
JPWO2017131041A1 (ja) 2018-11-22
CN107615879A (zh) 2018-01-19
TW201740227A (zh) 2017-11-16
TWI724098B (zh) 2021-04-11
KR20180106846A (ko) 2018-10-01
CN107615879B (zh) 2021-01-15
WO2017131041A1 (ja) 2017-08-03

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