JP6527674B2 - 基板処理装置、ノズルおよび基板処理方法 - Google Patents

基板処理装置、ノズルおよび基板処理方法 Download PDF

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Publication number
JP6527674B2
JP6527674B2 JP2014164247A JP2014164247A JP6527674B2 JP 6527674 B2 JP6527674 B2 JP 6527674B2 JP 2014164247 A JP2014164247 A JP 2014164247A JP 2014164247 A JP2014164247 A JP 2014164247A JP 6527674 B2 JP6527674 B2 JP 6527674B2
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Japan
Prior art keywords
substrate
liquid
discharge
discharge port
nozzle
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JP2014164247A
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English (en)
Japanese (ja)
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JP2015192980A (ja
Inventor
山下 永二
永二 山下
富藤 幸雄
幸雄 富藤
満之 羽方
満之 羽方
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Screen Holdings Co Ltd
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Screen Holdings Co Ltd
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Publication date
Application filed by Screen Holdings Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP2014164247A priority Critical patent/JP6527674B2/ja
Priority to CN201510055024.1A priority patent/CN104952765B/zh
Priority to TW104106752A priority patent/TWI546131B/zh
Priority to KR1020150035905A priority patent/KR20150111843A/ko
Publication of JP2015192980A publication Critical patent/JP2015192980A/ja
Application granted granted Critical
Publication of JP6527674B2 publication Critical patent/JP6527674B2/ja
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/022Cleaning travelling work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/024Cleaning by means of spray elements moving over the surface to be cleaned
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Cleaning By Liquid Or Steam (AREA)
JP2014164247A 2014-03-26 2014-08-12 基板処理装置、ノズルおよび基板処理方法 Active JP6527674B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014164247A JP6527674B2 (ja) 2014-03-26 2014-08-12 基板処理装置、ノズルおよび基板処理方法
CN201510055024.1A CN104952765B (zh) 2014-03-26 2015-02-03 基板处理装置、喷嘴以及基板处理方法
TW104106752A TWI546131B (zh) 2014-03-26 2015-03-04 基板處理裝置、噴嘴以及基板處理方法
KR1020150035905A KR20150111843A (ko) 2014-03-26 2015-03-16 기판 처리 장치, 노즐 및 기판 처리 방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014063434 2014-03-26
JP2014063434 2014-03-26
JP2014164247A JP6527674B2 (ja) 2014-03-26 2014-08-12 基板処理装置、ノズルおよび基板処理方法

Publications (2)

Publication Number Publication Date
JP2015192980A JP2015192980A (ja) 2015-11-05
JP6527674B2 true JP6527674B2 (ja) 2019-06-05

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JP2014164247A Active JP6527674B2 (ja) 2014-03-26 2014-08-12 基板処理装置、ノズルおよび基板処理方法

Country Status (3)

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JP (1) JP6527674B2 (zh)
KR (1) KR20150111843A (zh)
TW (1) TWI546131B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10797637B2 (en) 2016-11-01 2020-10-06 Snolar Technologies Ltd. System and method for debris removal
JP6845027B2 (ja) * 2017-01-26 2021-03-17 株式会社Screenホールディングス 現像方法および現像装置
JP7060415B2 (ja) * 2018-03-12 2022-04-26 株式会社Screenホールディングス 基板処理装置および基板処理方法
JP2019160958A (ja) * 2018-03-12 2019-09-19 株式会社Screenホールディングス 基板処理装置および基板処理方法
JP7237670B2 (ja) * 2019-03-15 2023-03-13 株式会社Screenホールディングス 基板処理装置および基板処理方法
JP7202229B2 (ja) * 2019-03-20 2023-01-11 株式会社Screenホールディングス 基板処理装置および基板処理方法
WO2021006399A1 (ko) * 2019-07-11 2021-01-14 엘지전자 주식회사 세정기 및 그를 갖는 세정 시스템
TWI821799B (zh) * 2020-12-28 2023-11-11 日商芝浦機械電子裝置股份有限公司 基板處理裝置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4064729B2 (ja) * 2001-06-08 2008-03-19 住友精密工業株式会社 基板処理装置
JP3774413B2 (ja) * 2002-03-04 2006-05-17 株式会社東芝 現像方法
JP2007266545A (ja) * 2006-03-30 2007-10-11 Dainippon Screen Mfg Co Ltd 基板処理装置
JP5368326B2 (ja) * 2010-01-15 2013-12-18 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP2013080808A (ja) * 2011-10-04 2013-05-02 Tokyo Electron Ltd 基板処理装置及び基板処理方法

Also Published As

Publication number Publication date
TWI546131B (zh) 2016-08-21
JP2015192980A (ja) 2015-11-05
TW201536437A (zh) 2015-10-01
KR20150111843A (ko) 2015-10-06

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