JP6527674B2 - 基板処理装置、ノズルおよび基板処理方法 - Google Patents
基板処理装置、ノズルおよび基板処理方法 Download PDFInfo
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- JP6527674B2 JP6527674B2 JP2014164247A JP2014164247A JP6527674B2 JP 6527674 B2 JP6527674 B2 JP 6527674B2 JP 2014164247 A JP2014164247 A JP 2014164247A JP 2014164247 A JP2014164247 A JP 2014164247A JP 6527674 B2 JP6527674 B2 JP 6527674B2
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- 239000000758 substrate Substances 0.000 title claims description 265
- 238000012545 processing Methods 0.000 title claims description 141
- 238000003672 processing method Methods 0.000 title claims description 4
- 239000007788 liquid Substances 0.000 claims description 281
- 238000011144 upstream manufacturing Methods 0.000 claims description 28
- 230000032258 transport Effects 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 22
- 230000008569 process Effects 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 238000007599 discharging Methods 0.000 claims description 13
- 238000012546 transfer Methods 0.000 claims description 5
- 230000007723 transport mechanism Effects 0.000 claims description 3
- 238000011161 development Methods 0.000 description 13
- 238000001035 drying Methods 0.000 description 13
- 238000005192 partition Methods 0.000 description 8
- 238000004140 cleaning Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 5
- 238000011068 loading method Methods 0.000 description 5
- 230000018044 dehydration Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- 238000007664 blowing Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014164247A JP6527674B2 (ja) | 2014-03-26 | 2014-08-12 | 基板処理装置、ノズルおよび基板処理方法 |
CN201510055024.1A CN104952765B (zh) | 2014-03-26 | 2015-02-03 | 基板处理装置、喷嘴以及基板处理方法 |
TW104106752A TWI546131B (zh) | 2014-03-26 | 2015-03-04 | 基板處理裝置、噴嘴以及基板處理方法 |
KR1020150035905A KR20150111843A (ko) | 2014-03-26 | 2015-03-16 | 기판 처리 장치, 노즐 및 기판 처리 방법 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014063434 | 2014-03-26 | ||
JP2014063434 | 2014-03-26 | ||
JP2014164247A JP6527674B2 (ja) | 2014-03-26 | 2014-08-12 | 基板処理装置、ノズルおよび基板処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015192980A JP2015192980A (ja) | 2015-11-05 |
JP6527674B2 true JP6527674B2 (ja) | 2019-06-05 |
Family
ID=54432550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014164247A Active JP6527674B2 (ja) | 2014-03-26 | 2014-08-12 | 基板処理装置、ノズルおよび基板処理方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6527674B2 (zh) |
KR (1) | KR20150111843A (zh) |
TW (1) | TWI546131B (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10797637B2 (en) | 2016-11-01 | 2020-10-06 | Snolar Technologies Ltd. | System and method for debris removal |
JP6845027B2 (ja) * | 2017-01-26 | 2021-03-17 | 株式会社Screenホールディングス | 現像方法および現像装置 |
JP7060415B2 (ja) * | 2018-03-12 | 2022-04-26 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP2019160958A (ja) * | 2018-03-12 | 2019-09-19 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP7237670B2 (ja) * | 2019-03-15 | 2023-03-13 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP7202229B2 (ja) * | 2019-03-20 | 2023-01-11 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
WO2021006399A1 (ko) * | 2019-07-11 | 2021-01-14 | 엘지전자 주식회사 | 세정기 및 그를 갖는 세정 시스템 |
TWI821799B (zh) * | 2020-12-28 | 2023-11-11 | 日商芝浦機械電子裝置股份有限公司 | 基板處理裝置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4064729B2 (ja) * | 2001-06-08 | 2008-03-19 | 住友精密工業株式会社 | 基板処理装置 |
JP3774413B2 (ja) * | 2002-03-04 | 2006-05-17 | 株式会社東芝 | 現像方法 |
JP2007266545A (ja) * | 2006-03-30 | 2007-10-11 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP5368326B2 (ja) * | 2010-01-15 | 2013-12-18 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP2013080808A (ja) * | 2011-10-04 | 2013-05-02 | Tokyo Electron Ltd | 基板処理装置及び基板処理方法 |
-
2014
- 2014-08-12 JP JP2014164247A patent/JP6527674B2/ja active Active
-
2015
- 2015-03-04 TW TW104106752A patent/TWI546131B/zh active
- 2015-03-16 KR KR1020150035905A patent/KR20150111843A/ko active Search and Examination
Also Published As
Publication number | Publication date |
---|---|
TWI546131B (zh) | 2016-08-21 |
JP2015192980A (ja) | 2015-11-05 |
TW201536437A (zh) | 2015-10-01 |
KR20150111843A (ko) | 2015-10-06 |
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