JP6521003B2 - 蒸着マスク、蒸着マスクの製造方法、及び有機半導体素子の製造方法 - Google Patents

蒸着マスク、蒸着マスクの製造方法、及び有機半導体素子の製造方法 Download PDF

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JP6521003B2
JP6521003B2 JP2017160459A JP2017160459A JP6521003B2 JP 6521003 B2 JP6521003 B2 JP 6521003B2 JP 2017160459 A JP2017160459 A JP 2017160459A JP 2017160459 A JP2017160459 A JP 2017160459A JP 6521003 B2 JP6521003 B2 JP 6521003B2
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mask
metal
vapor deposition
deposition mask
resin
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JP2017210687A5 (enExample
JP2017210687A (ja
Inventor
小幡　勝也
勝也 小幡
武田　利彦
利彦 武田
祐行 西村
祐行 西村
飯田　満
満 飯田
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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  • Physical Vapour Deposition (AREA)
JP2017160459A 2017-08-23 2017-08-23 蒸着マスク、蒸着マスクの製造方法、及び有機半導体素子の製造方法 Active JP6521003B2 (ja)

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JP2017160459A JP6521003B2 (ja) 2017-08-23 2017-08-23 蒸着マスク、蒸着マスクの製造方法、及び有機半導体素子の製造方法

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JP2017160459A JP6521003B2 (ja) 2017-08-23 2017-08-23 蒸着マスク、蒸着マスクの製造方法、及び有機半導体素子の製造方法

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JP2013145781A Division JP6197423B2 (ja) 2013-07-11 2013-07-11 蒸着マスク、蒸着マスクの製造方法、及び有機半導体素子の製造方法

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JP2017210687A5 JP2017210687A5 (enExample) 2018-02-22
JP6521003B2 true JP6521003B2 (ja) 2019-05-29

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019180836A1 (ja) * 2018-03-20 2019-09-26 シャープ株式会社 蒸着マスクおよび蒸着マスクの製造方法
CN113388809B (zh) * 2021-06-21 2022-07-29 京东方科技集团股份有限公司 一种掩膜版

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003332057A (ja) * 2002-05-16 2003-11-21 Dainippon Printing Co Ltd 有機ｅｌ素子製造に用いる真空蒸着用多面付けマスク装置
US6897164B2 (en) * 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication
JP2005042147A (ja) * 2003-07-25 2005-02-17 Dainippon Screen Mfg Co Ltd 蒸着用マスクの製造方法および蒸着用マスク
JP5228586B2 (ja) * 2008-04-09 2013-07-03 株式会社Ｓｕｍｃｏ 蒸着用マスク、ならびにそれを用いる蒸着パターン作製方法、半導体ウェーハ評価用試料の作製方法、半導体ウェーハの評価方法および半導体ウェーハの製造方法
JP5899585B2 (ja) * 2011-11-04 2016-04-06 株式会社ブイ・テクノロジー マスクの製造方法
CN105296929B (zh) * 2012-01-12 2018-06-08 大日本印刷株式会社 拼版蒸镀掩模的制造方法及有机半导体元件的制造方法
JP6078747B2 (ja) * 2013-01-28 2017-02-15 株式会社ブイ・テクノロジー 蒸着マスクの製造方法及びレーザ加工装置

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