JP6508896B2 - 光波面センサにおける光スポット重心位置取得方法、光波面計測方法およびプログラム - Google Patents

光波面センサにおける光スポット重心位置取得方法、光波面計測方法およびプログラム Download PDF

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Publication number
JP6508896B2
JP6508896B2 JP2014161973A JP2014161973A JP6508896B2 JP 6508896 B2 JP6508896 B2 JP 6508896B2 JP 2014161973 A JP2014161973 A JP 2014161973A JP 2014161973 A JP2014161973 A JP 2014161973A JP 6508896 B2 JP6508896 B2 JP 6508896B2
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Japan
Prior art keywords
light spot
microlens
light
wavefront
microlenses
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JP2014161973A
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English (en)
Japanese (ja)
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JP2016038300A (ja
JP2016038300A5 (enExample
Inventor
裕範 古河
裕範 古河
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014161973A priority Critical patent/JP6508896B2/ja
Priority to EP15002338.0A priority patent/EP2982946A1/en
Priority to US14/818,703 priority patent/US20160041063A1/en
Publication of JP2016038300A publication Critical patent/JP2016038300A/ja
Publication of JP2016038300A5 publication Critical patent/JP2016038300A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0221—Testing optical properties by determining the optical axis or position of lenses
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0207—Details of measuring devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Geometry (AREA)
  • Optics & Photonics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2014161973A 2014-08-08 2014-08-08 光波面センサにおける光スポット重心位置取得方法、光波面計測方法およびプログラム Active JP6508896B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014161973A JP6508896B2 (ja) 2014-08-08 2014-08-08 光波面センサにおける光スポット重心位置取得方法、光波面計測方法およびプログラム
EP15002338.0A EP2982946A1 (en) 2014-08-08 2015-08-05 Light spot centroid position acquisition method for wavefront sensor
US14/818,703 US20160041063A1 (en) 2014-08-08 2015-08-05 Light spot centroid position acquisition method for wavefront sensor, wavefront measurement method, wavefront measurement apparatus and storage medium storing light spot centroid position acquisition program

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014161973A JP6508896B2 (ja) 2014-08-08 2014-08-08 光波面センサにおける光スポット重心位置取得方法、光波面計測方法およびプログラム

Publications (3)

Publication Number Publication Date
JP2016038300A JP2016038300A (ja) 2016-03-22
JP2016038300A5 JP2016038300A5 (enExample) 2017-09-21
JP6508896B2 true JP6508896B2 (ja) 2019-05-08

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JP2014161973A Active JP6508896B2 (ja) 2014-08-08 2014-08-08 光波面センサにおける光スポット重心位置取得方法、光波面計測方法およびプログラム

Country Status (3)

Country Link
US (1) US20160041063A1 (enExample)
EP (1) EP2982946A1 (enExample)
JP (1) JP6508896B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL251636B (en) 2017-04-06 2018-02-28 Yoav Berlatzky Coherence camera system and method thereof
CN108181007B (zh) * 2017-12-19 2019-07-26 中国科学院长春光学精密机械与物理研究所 哈特曼波前探测器弱信号的光斑质心计算方法
CN111238664B (zh) * 2020-02-24 2021-03-30 中国科学院云南天文台 基于区域探测和重构的夏克哈特曼波前探测方法
CN113155755B (zh) * 2021-03-31 2022-05-24 中国科学院长春光学精密机械与物理研究所 微透镜阵列型成像光谱仪在线标定方法
CN116296288A (zh) * 2023-03-21 2023-06-23 深圳市都乐精密制造有限公司 一种快速应对多重结构功能光学系统的检测结构及方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2788597B1 (fr) * 1999-01-15 2001-02-23 Imagine Optic Sarl Procede et dispositif d'analyse de front d'onde a grande dynamique
JP2007069283A (ja) * 2005-09-05 2007-03-22 Nikon Corp 加工装置および加工装置を用いた製造方法
JP5452032B2 (ja) 2009-02-13 2014-03-26 株式会社日立製作所 波面収差測定方法及びその装置
US8622546B2 (en) * 2011-06-08 2014-01-07 Amo Wavefront Sciences, Llc Method of locating valid light spots for optical measurement and optical measurement instrument employing method of locating valid light spots
JP6000577B2 (ja) * 2012-03-09 2016-09-28 キヤノン株式会社 非球面計測方法、非球面計測装置、光学素子加工装置および光学素子の製造方法
JP5896792B2 (ja) * 2012-03-09 2016-03-30 キヤノン株式会社 非球面計測方法、非球面計測装置および光学素子加工装置
JP6494205B2 (ja) * 2013-07-31 2019-04-03 キヤノン株式会社 波面計測方法、形状計測方法、光学素子の製造方法、光学機器の製造方法、プログラム、波面計測装置

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Publication number Publication date
EP2982946A1 (en) 2016-02-10
JP2016038300A (ja) 2016-03-22
US20160041063A1 (en) 2016-02-11

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