JP6497414B2 - ガラス表面処理装置 - Google Patents
ガラス表面処理装置 Download PDFInfo
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- JP6497414B2 JP6497414B2 JP2017122328A JP2017122328A JP6497414B2 JP 6497414 B2 JP6497414 B2 JP 6497414B2 JP 2017122328 A JP2017122328 A JP 2017122328A JP 2017122328 A JP2017122328 A JP 2017122328A JP 6497414 B2 JP6497414 B2 JP 6497414B2
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- Prior art keywords
- glass
- chamber
- processing
- etching
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011521 glass Substances 0.000 title claims description 100
- 238000004381 surface treatment Methods 0.000 title claims description 15
- 238000012545 processing Methods 0.000 claims description 85
- 238000005530 etching Methods 0.000 claims description 79
- 238000004140 cleaning Methods 0.000 claims description 46
- 239000007788 liquid Substances 0.000 claims description 43
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 30
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 30
- 150000003839 salts Chemical class 0.000 claims description 22
- 150000004673 fluoride salts Chemical class 0.000 claims description 20
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 14
- 239000011775 sodium fluoride Substances 0.000 claims description 13
- 235000013024 sodium fluoride Nutrition 0.000 claims description 13
- 239000011698 potassium fluoride Substances 0.000 claims description 7
- 235000003270 potassium fluoride Nutrition 0.000 claims description 7
- 239000002699 waste material Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 230000001172 regenerating effect Effects 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 239000007921 spray Substances 0.000 description 64
- 239000000758 substrate Substances 0.000 description 62
- 238000000034 method Methods 0.000 description 28
- 230000008569 process Effects 0.000 description 20
- 239000000243 solution Substances 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 238000003860 storage Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 229910052708 sodium Inorganic materials 0.000 description 7
- 239000011734 sodium Substances 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 5
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- 238000007781 pre-processing Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 238000005488 sandblasting Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- 241000519695 Ilex integra Species 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004699 Ultra-high molecular weight polyethylene Substances 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical class F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 229920000785 ultra high molecular weight polyethylene Polymers 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Landscapes
- Surface Treatment Of Glass (AREA)
- Weting (AREA)
Description
12−導入部
14−前処理チャンバ
16−前洗浄チャンバ
18−フロスト加工チャンバ
20−第1の洗浄チャンバ
22−エッチングチャンバ
24−第2の洗浄チャンバ
26−排出部
30−搬送ローラ
40−送液ユニット
50−駆動ユニット
Claims (3)
- 搬入部から排出部までの間において順次的に搬送される板状のガラスに対して表面処理を行うように構成されたガラス表面処理装置であって、
搬送される前記ガラスに対して、フッ酸を含むエッチング液およびこのエッチング液に対して不溶性の粒状のケイフッ化物塩またはフッ化物塩の少なくともいずれか一方を混合した処理用混合液を接触させることによって、前記ガラスの表面に凹凸を形成するように構成された第1の処理チャンバと、
前記第1の処理チャンバを通過した前記ガラスを洗浄するように構成された第1の洗浄チャンバと、
前記第1の洗浄チャンバを通過した前記ガラスに対してフッ酸を含むエッチング液を接触させることによって、前記ガラスにエッチング処理を行うように構成された第2の処理チャンバと、
前記第2の処理チャンバを通過した前記ガラスを洗浄するように構成された第2の洗浄チャンバと、
を少なくとも備え、
前記第2の処理チャンバにおいて発生したフッ化物塩またはケイフッ化物塩の少なくとも一方を回収して前記第1の処理チャンバに供給する手段をさらに備えたことを特徴とするガラス表面処理装置。 - 前記処理用混合液に対して、フッ化カリウムおよびフッ化ナトリウムを添加する添加手段をさらに備えた請求項1に記載のガラス表面処理装置。
- 前記第2の処理チャンバにおいて発生したエッチング処理廃液から前記フッ化ナトリウムを再生する手段をさらに備えた請求項2に記載のガラス表面処理装置。
Priority Applications (1)
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JP2017122328A JP6497414B2 (ja) | 2017-06-22 | 2017-06-22 | ガラス表面処理装置 |
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JP2017122328A JP6497414B2 (ja) | 2017-06-22 | 2017-06-22 | ガラス表面処理装置 |
Publications (2)
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JP2019006621A JP2019006621A (ja) | 2019-01-17 |
JP6497414B2 true JP6497414B2 (ja) | 2019-04-10 |
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JP2017122328A Active JP6497414B2 (ja) | 2017-06-22 | 2017-06-22 | ガラス表面処理装置 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7268841B2 (ja) * | 2019-01-18 | 2023-05-08 | 株式会社大一商会 | 遊技機 |
JP7268839B2 (ja) * | 2019-01-18 | 2023-05-08 | 株式会社大一商会 | 遊技機 |
CN114751651B (zh) * | 2022-06-07 | 2023-09-22 | 广东山之风环保科技有限公司 | 一种ag效果的玻璃蒙砂液及其制备与应用 |
CN115925272A (zh) * | 2022-12-07 | 2023-04-07 | 蚌埠中光电科技有限公司 | 一种用于tft-lcd玻璃基板研磨前的化学处理工艺 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5998030B2 (ja) * | 2011-12-07 | 2016-09-28 | 日本板硝子株式会社 | 太陽電池用又はディスプレイ用ガラスとその製造方法 |
JP5518133B2 (ja) * | 2012-06-14 | 2014-06-11 | 株式会社Nsc | 化学研磨装置 |
US10690818B2 (en) * | 2014-10-31 | 2020-06-23 | Corning Incorporated | Anti-glare substrates with a uniform textured surface and low sparkle and methods of making the same |
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- 2017-06-22 JP JP2017122328A patent/JP6497414B2/ja active Active
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