JP6497391B2 - タッチパネル用導電性基板、タッチパネル用導電性基板の製造方法 - Google Patents
タッチパネル用導電性基板、タッチパネル用導電性基板の製造方法 Download PDFInfo
- Publication number
- JP6497391B2 JP6497391B2 JP2016538446A JP2016538446A JP6497391B2 JP 6497391 B2 JP6497391 B2 JP 6497391B2 JP 2016538446 A JP2016538446 A JP 2016538446A JP 2016538446 A JP2016538446 A JP 2016538446A JP 6497391 B2 JP6497391 B2 JP 6497391B2
- Authority
- JP
- Japan
- Prior art keywords
- copper plating
- layer
- copper
- plating film
- conductive substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 title claims description 236
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 229910052802 copper Inorganic materials 0.000 claims description 484
- 239000010949 copper Substances 0.000 claims description 484
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 477
- 238000007747 plating Methods 0.000 claims description 332
- 239000010408 film Substances 0.000 claims description 324
- 239000010953 base metal Substances 0.000 claims description 160
- 239000000463 material Substances 0.000 claims description 130
- 239000010409 thin film Substances 0.000 claims description 120
- 239000012212 insulator Substances 0.000 claims description 116
- 229910052717 sulfur Inorganic materials 0.000 claims description 51
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 43
- 239000011593 sulfur Substances 0.000 claims description 43
- 229910052751 metal Inorganic materials 0.000 claims description 35
- 239000002184 metal Substances 0.000 claims description 35
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 34
- 230000003746 surface roughness Effects 0.000 claims description 25
- 229910052759 nickel Inorganic materials 0.000 claims description 18
- 229920005989 resin Polymers 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 12
- 238000002834 transmittance Methods 0.000 claims description 11
- 239000004952 Polyamide Substances 0.000 claims description 2
- 150000001925 cycloalkenes Chemical class 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920006289 polycarbonate film Polymers 0.000 claims description 2
- 229920006267 polyester film Polymers 0.000 claims description 2
- 229920006290 polyethylene naphthalate film Polymers 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 238000000034 method Methods 0.000 description 101
- 238000005530 etching Methods 0.000 description 72
- 238000004544 sputter deposition Methods 0.000 description 55
- 239000000243 solution Substances 0.000 description 42
- 239000007789 gas Substances 0.000 description 28
- 230000008569 process Effects 0.000 description 28
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- 238000011156 evaluation Methods 0.000 description 18
- 238000000059 patterning Methods 0.000 description 17
- 229910052760 oxygen Inorganic materials 0.000 description 16
- 229910045601 alloy Inorganic materials 0.000 description 15
- 239000000956 alloy Substances 0.000 description 15
- 239000001301 oxygen Substances 0.000 description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 14
- 229910052799 carbon Inorganic materials 0.000 description 13
- 229910052739 hydrogen Inorganic materials 0.000 description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 12
- 239000000853 adhesive Substances 0.000 description 12
- 230000001070 adhesive effect Effects 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 12
- 150000002894 organic compounds Chemical class 0.000 description 11
- 125000004434 sulfur atom Chemical group 0.000 description 11
- 150000002431 hydrogen Chemical class 0.000 description 10
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 238000010030 laminating Methods 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 8
- 229910052786 argon Inorganic materials 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 7
- 238000009713 electroplating Methods 0.000 description 7
- 229910052742 iron Inorganic materials 0.000 description 7
- 230000001678 irradiating effect Effects 0.000 description 7
- 229910052748 manganese Inorganic materials 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 229910052750 molybdenum Inorganic materials 0.000 description 7
- -1 polyethylene terephthalate Polymers 0.000 description 7
- 229910052715 tantalum Inorganic materials 0.000 description 7
- 229910052719 titanium Inorganic materials 0.000 description 7
- 229910052718 tin Inorganic materials 0.000 description 6
- 229910052721 tungsten Inorganic materials 0.000 description 6
- 229910052720 vanadium Inorganic materials 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 238000003475 lamination Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 229910001092 metal group alloy Inorganic materials 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910018487 Ni—Cr Inorganic materials 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 238000009751 slip forming Methods 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- LMPMFQXUJXPWSL-UHFFFAOYSA-N 3-(3-sulfopropyldisulfanyl)propane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCSSCCCS(O)(=O)=O LMPMFQXUJXPWSL-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 229910017813 Cu—Cr Inorganic materials 0.000 description 2
- 229910017881 Cu—Ni—Fe Inorganic materials 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229910018054 Ni-Cu Inorganic materials 0.000 description 2
- 229910018481 Ni—Cu Inorganic materials 0.000 description 2
- 229910018605 Ni—Zn Inorganic materials 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 229910001080 W alloy Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- KHYBPSFKEHXSLX-UHFFFAOYSA-N iminotitanium Chemical compound [Ti]=N KHYBPSFKEHXSLX-UHFFFAOYSA-N 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910001000 nickel titanium Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002952 polymeric resin Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RIWZPKBKKYYMCQ-UHFFFAOYSA-N 1-(2-sulfopropyldisulfanyl)propane-2-sulfonic acid Chemical compound OS(=O)(=O)C(C)CSSCC(C)S(O)(=O)=O RIWZPKBKKYYMCQ-UHFFFAOYSA-N 0.000 description 1
- ZUFMFTGDCZKQRE-UHFFFAOYSA-N 2-hydroxy-3-[(2-hydroxy-3-sulfopropyl)disulfanyl]propane-1-sulfonic acid Chemical compound OS(=O)(=O)CC(O)CSSCC(O)CS(O)(=O)=O ZUFMFTGDCZKQRE-UHFFFAOYSA-N 0.000 description 1
- OBDVFOBWBHMJDG-UHFFFAOYSA-N 3-mercapto-1-propanesulfonic acid Chemical compound OS(=O)(=O)CCCS OBDVFOBWBHMJDG-UHFFFAOYSA-N 0.000 description 1
- YYILFFUYOXLCTG-UHFFFAOYSA-N 4-(4-sulfobutyldisulfanyl)butane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCCSSCCCCS(O)(=O)=O YYILFFUYOXLCTG-UHFFFAOYSA-N 0.000 description 1
- LUENVHHLGFLMFJ-UHFFFAOYSA-N 4-[(4-sulfophenyl)disulfanyl]benzenesulfonic acid Chemical compound C1=CC(S(=O)(=O)O)=CC=C1SSC1=CC=C(S(O)(=O)=O)C=C1 LUENVHHLGFLMFJ-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/303—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
- H01B3/305—Polyamides or polyesteramides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/208—Touch screens
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Landscapes
- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Human Computer Interaction (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Laminated Bodies (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014157061 | 2014-07-31 | ||
JP2014157061 | 2014-07-31 | ||
PCT/JP2015/071690 WO2016017773A1 (ja) | 2014-07-31 | 2015-07-30 | タッチパネル用導電性基板、タッチパネル用導電性基板の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2016017773A1 JPWO2016017773A1 (ja) | 2017-05-25 |
JP6497391B2 true JP6497391B2 (ja) | 2019-04-10 |
Family
ID=55217669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016538446A Active JP6497391B2 (ja) | 2014-07-31 | 2015-07-30 | タッチパネル用導電性基板、タッチパネル用導電性基板の製造方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6497391B2 (zh) |
KR (1) | KR102344716B1 (zh) |
CN (1) | CN106575172B (zh) |
TW (1) | TWI671663B (zh) |
WO (1) | WO2016017773A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018139018A (ja) * | 2015-07-31 | 2018-09-06 | 住友金属鉱山株式会社 | 導電性基板、導電性基板の製造方法 |
JP6597459B2 (ja) * | 2016-04-05 | 2019-10-30 | 住友金属鉱山株式会社 | 導電性基板、導電性基板の製造方法 |
JP6613995B2 (ja) * | 2016-04-05 | 2019-12-04 | 住友金属鉱山株式会社 | 硬化層を備えた基板を有する積層体フィルム |
JP6531699B2 (ja) * | 2016-04-05 | 2019-06-19 | 住友金属鉱山株式会社 | 導電性基板 |
JP6597487B2 (ja) * | 2016-06-15 | 2019-10-30 | 住友金属鉱山株式会社 | 電極基板フィルム及びその製造方法 |
JP7049759B2 (ja) * | 2016-07-12 | 2022-04-07 | 住友金属鉱山株式会社 | 積層体基板、導電性基板、積層体基板の製造方法、導電性基板の製造方法 |
JP6848243B2 (ja) * | 2016-07-25 | 2021-03-24 | 住友金属鉱山株式会社 | 導電性基板の製造方法 |
TWI732892B (zh) | 2016-07-26 | 2021-07-11 | 日商松下知識產權經營股份有限公司 | 透視型電極用積層板、透視型電極素材、組件及透視型電極用積層板之製造方法 |
JP7262218B2 (ja) * | 2018-12-17 | 2023-04-21 | 日東電工株式会社 | 保護フィルム付き導電性フィルム及び導電性フィルムの製造方法 |
JP7305342B2 (ja) * | 2018-12-17 | 2023-07-10 | 日東電工株式会社 | 導電性フィルム |
Family Cites Families (14)
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JP4086132B2 (ja) | 2001-11-16 | 2008-05-14 | 株式会社ブリヂストン | 透明導電性フィルムおよびタッチパネル |
JP4700332B2 (ja) * | 2003-12-05 | 2011-06-15 | イビデン株式会社 | 多層プリント配線板 |
TW200731886A (en) * | 2005-06-13 | 2007-08-16 | Ibiden Co Ltd | Printed wiring board |
US8568856B2 (en) * | 2005-10-05 | 2013-10-29 | Nippon Mining & Metals Co., Ltd. | Two-layer flexible substrate |
KR101135332B1 (ko) * | 2007-03-15 | 2012-04-17 | 닛코킨조쿠 가부시키가이샤 | 구리전해액 및 그것을 이용하여 얻어진 2층 플렉시블 기판 |
JP5300156B2 (ja) * | 2008-08-07 | 2013-09-25 | Jx日鉱日石金属株式会社 | 無電解めっきにより銅薄膜を形成しためっき物 |
JP5361579B2 (ja) | 2009-07-09 | 2013-12-04 | 信越ポリマー株式会社 | 大型ディスプレイ用のセンサパネル及びその製造方法 |
JP5267403B2 (ja) * | 2009-09-29 | 2013-08-21 | 大日本印刷株式会社 | タッチパネル用電極フィルム、該タッチパネル用電極フィルムの製造方法及びタッチパネル |
JP5645581B2 (ja) * | 2010-10-05 | 2014-12-24 | 富士フイルム株式会社 | タッチパネル |
JP2013069261A (ja) | 2011-09-08 | 2013-04-18 | Dainippon Printing Co Ltd | タッチパネル用電極基材、及びタッチパネル、並びに画像表示装置 |
CN102637637B (zh) * | 2012-04-28 | 2014-03-26 | 深圳市华星光电技术有限公司 | 一种薄膜晶体管阵列基板及其制作方法 |
JP5224203B1 (ja) * | 2012-07-11 | 2013-07-03 | 大日本印刷株式会社 | タッチパネルセンサ、タッチパネル装置および表示装置 |
CN104584143B (zh) * | 2012-08-31 | 2016-08-17 | Lg化学株式会社 | 导电结构和制造该导电结构的方法 |
JP5706386B2 (ja) * | 2012-10-16 | 2015-04-22 | 住友金属鉱山株式会社 | 2層フレキシブル基板、並びに2層フレキシブル基板を基材としたプリント配線板 |
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