JP6495894B2 - 透明な拡散性oled基材及び当該基材の製造方法 - Google Patents
透明な拡散性oled基材及び当該基材の製造方法 Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims description 60
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000010954 inorganic particle Substances 0.000 claims description 56
- 239000011230 binding agent Substances 0.000 claims description 42
- 239000011521 glass Substances 0.000 claims description 41
- 238000000034 method Methods 0.000 claims description 26
- 239000002245 particle Substances 0.000 claims description 21
- 210000003298 dental enamel Anatomy 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 16
- 230000003746 surface roughness Effects 0.000 claims description 12
- -1 titanium alkoxide Chemical class 0.000 claims description 11
- 239000002243 precursor Substances 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims description 8
- 239000011324 bead Substances 0.000 claims description 7
- 238000010304 firing Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000006185 dispersion Substances 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 239000004111 Potassium silicate Substances 0.000 claims description 3
- 239000004115 Sodium Silicate Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 claims description 3
- 229910052912 lithium silicate Inorganic materials 0.000 claims description 3
- 229910052913 potassium silicate Inorganic materials 0.000 claims description 3
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 claims description 3
- 235000019353 potassium silicate Nutrition 0.000 claims description 3
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical group [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 70
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000000605 extraction Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 238000001878 scanning electron micrograph Methods 0.000 description 4
- 238000000149 argon plasma sintering Methods 0.000 description 3
- 238000001354 calcination Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 239000012798 spherical particle Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000001856 Ethyl cellulose Substances 0.000 description 2
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 235000019325 ethyl cellulose Nutrition 0.000 description 2
- 229920001249 ethyl cellulose Polymers 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- YTTFFPATQICAQN-UHFFFAOYSA-N 2-methoxypropan-1-ol Chemical compound COC(C)CO YTTFFPATQICAQN-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910021488 crystalline silicon dioxide Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
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- G02—OPTICS
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- G02—OPTICS
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- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
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- G—PHYSICS
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- G—PHYSICS
- G02—OPTICS
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- G02B5/00—Optical elements other than lenses
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Description
(a)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材、
(b)無機粒子を含む粗い低屈折率層であって、該無機粒子はゾル−ゲル無機結合剤で基材の片面に付着していて、無機結合剤の表面近くの、又は表面の、又は表面から突出した無機粒子が0.15μmと3μmの間に含まれる算術平均偏差Raで特徴付けられる表面粗さを作り出していて、当該無機粒子と無機結合剤の両方が1.45と1.65の間の屈折率を有している、粗い低屈折率層、
(c)前記粗い低屈折率層(b)を覆っている、屈折率が1.8と2.1の間に含まれるエナメル製の高屈折率層、
を含む透明な拡散性OLED基材である。
(1)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材を用意する工程、
(2)屈折率が1.45と1.65の間の無機粒子を、屈折率が1.45と1.65の間の無機結合剤の少なくとも1種の前駆物質のゾルに分散させる工程、
(3)得られた分散液を前記基材の片面に塗布する工程、
(4)得られた層を加熱により乾燥及び焼成して、無機粒子と無機結合剤とを含む透明な粗い低屈折率層を得る工程、
(5)この粗い低屈折率層に屈折率が1.8と2.1の間の高屈折率ガラスフリットの層を適用する工程、
(6)前記粗い低屈折率層を覆う屈折率が1.8と2.1の間に含まれる高屈折率エナメル層が得られるように、前記ガラスフリットを乾燥及び溶融させる工程、
を含む。
Bi2O3: 55〜75wt%
BaO: 0〜20wt%
ZnO: 0〜20wt%
Al2O3: 1〜7wt%
SiO2: 5〜15wt%
B2O3: 5〜20wt%
Na2O: 0.1〜1wt%
CeO2: 0〜0.1wt%
の組成を有する。
本発明の代表的な態様としては、以下を挙げることができる:
《態様1》
次の連続した構成要素又は層、すなわち、
(a)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材(1)、
(b)無機粒子を含む粗い低屈折率層であって、当該無機粒子はゾル−ゲル無機結合剤で前記基材の片面に付着していて、当該無機結合剤の表面近くの、又は表面の、又は表面から突出した無機粒子が0.15μmと3μmの間に含まれる算術平均偏差R a で特徴付けられる表面粗さを作り出していて、当該無機粒子と無機結合剤の両方が1.45と1.65の間の屈折率を有している、粗い低屈折率層、
(c)前記粗い低屈折率層を覆っている、屈折率が1.8と2.1の間に含まれるエナメル製の高屈折率層、
を含む透明な拡散性OLED基材。
《態様2》
前記無機粒子が0.3μmと10μmの間、好ましくは0.5μmと8μmの間、より好ましくは0.8μmと7μmの間の平均相当球径を有する、態様1記載の基材。
《態様3》
前記無機粒子が中実のビーズである、態様1又は2記載の基材。
《態様4》
前記無機粒子が、相当球径が15μmより大きい、好ましくは12μmより大きい粒子を本質的に含まない、態様1〜3のいずれかに記載の基材。
《態様5》
前記基材、無機結合剤及び無機粒子の屈折率が1.50と1.60の間に含まれる、態様1〜4のいずれかに記載の基材。
《態様6》
前記高屈折率層の厚さが3μmと20μmの間、好ましくは4μmと15μmの間、より好ましくは5μmと12μmの間に含まれる、態様1〜5のいずれかに記載の基材。
《態様7》
前記高屈折率層の表面粗さが3nm未満、より好ましくは2nm未満、最も好ましくは1nm未満の算術平均偏差Raを有する、態様1〜6のいずれかに記載の基材。
《態様8》
前記高屈折率層が、それに分散した拡散性構成要素を本質的に含まず、特にそれに分散した拡散性の中実粒子を含まない、態様1〜7のいずれかに記載の基材。
《態様9》
前記無機粒子がシリカ粒子から選ばれている、態様1〜8のいずれかに記載の基材。
《態様10》
前記高屈折率のエナメル層の上に透明な導電性層を更に含む、態様1〜9のいずれかに記載の基材。
《態様11》
前記無機粒子の前記無機結合剤に対する体積比が0.3と3の間、好ましくは0.5と2の間、より好ましくは0.7と1.5の間に含まれる、態様1〜10のいずれかに記載の基材。
《態様12》
次の一連の工程、すなわち、
(1)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材を用意する工程、
(2)屈折率が1.45と1.65の間の無機粒子を、屈折率が1.45と1.65の間の無機結合剤の少なくとも1種の前駆物質のゾルに分散させる工程、
(3)得られた分散液を前記基材の片面に塗布する工程、
(4)得られた層を加熱により乾燥及び焼成して、無機粒子と無機結合剤とを含む透明な粗い低屈折率層を得る工程、
(5)この粗い低屈折率層に屈折率が1.8と2.1の間の高屈折率ガラスフリットの層を適用する工程、
(6)前記粗い低屈折率層を覆う屈折率が1.8と2.1の間に含まれる高屈折率エナメル層が得られるように、前記ガラスフリットを乾燥及び溶融させる工程、
を含む、態様1〜11のいずれかに記載の透明な拡散性基材の作製方法。
《態様13》
無機結合剤の前記少なくとも1種の前駆物質を、ケイ酸ナトリウム、ケイ酸カリウム、ケイ酸リチウム、テトラアルコキシシラン、チタンアルコキシド、アルミニウムアルコキシド、ジルコニウムアルコキシドからなる群より選ぶ、態様12記載の方法。
《態様14》
工程(4)における乾燥及び焼成を、少なくとも100℃、好ましくは100℃〜300℃、より好ましくは110〜200℃の温度での加熱により行う、態様12記載の方法。
《態様15》
前記無機粒子が0.3μmと10μmの間、好ましくは0.5μmと8μmの間、より好ましくは0.8μmと7μmの間の平均相当球径を有する、態様12〜14のいずれかに記載の方法。
Claims (16)
- 次の連続した構成要素又は層、すなわち、
(a)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材(1)、
(b)無機粒子を含む粗い低屈折率層であって、当該無機粒子はゾル−ゲル無機結合剤で前記基材の片面に付着していて、当該無機結合剤の表面近くの、又は表面の、又は表面から突出した無機粒子が0.15μmと3μmの間に含まれる算術平均偏差Raで特徴付けられる表面粗さを作り出していて、当該無機粒子と無機結合剤の両方が1.45と1.65の間の屈折率を有している、粗い低屈折率層、
(c)前記粗い低屈折率層を覆っている、屈折率が1.8と2.1の間に含まれるエナメル製の高屈折率層、
を含む透明な拡散性OLED基材。 - 前記無機粒子が0.3μmと10μmの間の平均相当球径を有する、請求項1記載の基材。
- 前記無機粒子が中実のビーズである、請求項1又は2記載の基材。
- 前記無機粒子が、相当球径が15μmより大きい粒子を含まない、請求項1〜3のいずれかに記載の基材。
- 前記基材、無機結合剤及び無機粒子の屈折率が1.50と1.60の間に含まれる、請求項1〜4のいずれかに記載の基材。
- 前記高屈折率層の厚さが3μmと20μmの間に含まれる、請求項1〜5のいずれかに記載の基材。
- 前記高屈折率層の表面粗さが3nm未満の算術平均偏差Raを有する、請求項1〜6のいずれかに記載の基材。
- 前記高屈折率層がそれに分散した拡散性構成要素を含まない、請求項1〜7のいずれかに記載の基材。
- 前記高屈折率層がそれに分散した拡散性の中実粒子を含まない、請求項1〜7のいずれかに記載の基材。
- 前記無機粒子がシリカ粒子から選ばれている、請求項1〜9のいずれかに記載の基材。
- 前記高屈折率のエナメル層の上に透明な導電性層を更に含む、請求項1〜10のいずれかに記載の基材。
- 前記無機粒子の前記無機結合剤に対する体積比が0.3と3の間に含まれる、請求項1〜11のいずれかに記載の基材。
- 次の一連の工程、すなわち、
(1)屈折率が1.45と1.65の間の無機ガラス製の透明な平坦基材を用意する工程、
(2)屈折率が1.45と1.65の間の無機粒子を、屈折率が1.45と1.65の間の無機結合剤の少なくとも1種の前駆物質のゾルに分散させる工程、
(3)得られた分散液を前記基材の片面に塗布する工程、
(4)得られた層を加熱により乾燥及び焼成して、無機粒子と無機結合剤とを含む透明な粗い低屈折率層を得る工程、
(5)この粗い低屈折率層に屈折率が1.8と2.1の間の高屈折率ガラスフリットの層を適用する工程、
(6)前記粗い低屈折率層を覆う屈折率が1.8と2.1の間に含まれる高屈折率エナメル層が得られるように、前記ガラスフリットを乾燥及び溶融させる工程、
を含む、請求項1〜12のいずれかに記載の透明な拡散性基材の作製方法。 - 無機結合剤の前記少なくとも1種の前駆物質を、ケイ酸ナトリウム、ケイ酸カリウム、ケイ酸リチウム、テトラアルコキシシラン、チタンアルコキシド、アルミニウムアルコキシド、ジルコニウムアルコキシドからなる群より選ぶ、請求項13記載の方法。
- 工程(4)における乾燥及び焼成を、少なくとも100℃での加熱により行う、請求項13記載の方法。
- 前記無機粒子が0.3μmと10μmの間の平均相当球径を有する、請求項13〜15のいずれかに記載の方法。
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PCT/EP2014/058738 WO2014183993A1 (en) | 2013-05-17 | 2014-04-29 | Transparent diffusive oled substrate and method for producing such a substrate |
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CN108474875B (zh) * | 2015-09-23 | 2022-02-11 | 康宁公司 | 使用纳米结构化涂层的oled的光提取 |
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