JP6483626B2 - 特にマイクロリソグラフィー投影露光装置内のミラーの熱作動用装置 - Google Patents

特にマイクロリソグラフィー投影露光装置内のミラーの熱作動用装置 Download PDF

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JP6483626B2
JP6483626B2 JP2015562046A JP2015562046A JP6483626B2 JP 6483626 B2 JP6483626 B2 JP 6483626B2 JP 2015562046 A JP2015562046 A JP 2015562046A JP 2015562046 A JP2015562046 A JP 2015562046A JP 6483626 B2 JP6483626 B2 JP 6483626B2
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mirror
effective surface
mirror substrate
optical
region
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JP2016517028A (ja
JP2016517028A5 (enExample
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マルクス　ハウフ
ハウフ マルクス
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2015562046A 2013-03-14 2014-03-07 特にマイクロリソグラフィー投影露光装置内のミラーの熱作動用装置 Active JP6483626B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361781280P 2013-03-14 2013-03-14
DE102013204427.5 2013-03-14
DE102013204427.5A DE102013204427A1 (de) 2013-03-14 2013-03-14 Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
US61/781,280 2013-03-14
PCT/EP2014/054487 WO2014139896A2 (en) 2013-03-14 2014-03-07 Arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2016517028A JP2016517028A (ja) 2016-06-09
JP2016517028A5 JP2016517028A5 (enExample) 2017-04-13
JP6483626B2 true JP6483626B2 (ja) 2019-03-13

Family

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JP2015562046A Active JP6483626B2 (ja) 2013-03-14 2014-03-07 特にマイクロリソグラフィー投影露光装置内のミラーの熱作動用装置

Country Status (6)

Country Link
US (1) US9798254B2 (enExample)
JP (1) JP6483626B2 (enExample)
KR (1) KR102211633B1 (enExample)
CN (1) CN105190443B (enExample)
DE (1) DE102013204427A1 (enExample)
WO (1) WO2014139896A2 (enExample)

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DE102014223750A1 (de) * 2014-11-20 2016-05-25 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
CN106324792B (zh) * 2015-06-19 2020-11-03 中国科学院大连化学物理研究所 一种适用高功率激光使用的相变冷却反射镜
DE102015225509A1 (de) 2015-12-16 2017-06-22 Carl Zeiss Smt Gmbh Reflektives optisches Element
CN106125298A (zh) * 2016-08-31 2016-11-16 中国科学院长春光学精密机械与物理研究所 非接触式空间光学遥感器反射镜面形控制系统
KR102550337B1 (ko) 2017-04-11 2023-07-04 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 냉각 방법
CN107390346A (zh) * 2017-09-19 2017-11-24 北京仿真中心 一种低辐射红外场镜装置
DE102019219231A1 (de) 2019-12-10 2020-01-23 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102019219289A1 (de) 2019-12-11 2021-06-17 Carl Zeiss Smt Gmbh Optisches System, sowie Heizanordnung und Verfahren zum Heizen eines optischen Elements in einem optischen System
DE102020201724A1 (de) * 2020-02-12 2021-08-12 Carl Zeiss Smt Gmbh Optisches system und lithographieanlage
CN116324621A (zh) * 2020-08-07 2023-06-23 卡尔蔡司Smt有限责任公司 光学系统与操作光学系统的方法
CN116368436A (zh) * 2020-11-11 2023-06-30 Asml荷兰有限公司 用于使光学元件热变形的方法和设备
EP4002009A1 (en) * 2020-11-11 2022-05-25 ASML Netherlands B.V. A method and apparatus for thermally deforming an optical surface of an optical element
DE102021201258A1 (de) 2021-02-10 2022-08-11 Carl Zeiss Smt Gmbh Verfahren zum Heizen eines optischen Elements in einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System
DE102021213458A1 (de) 2021-11-30 2022-08-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithografie
DE102021214366A1 (de) * 2021-12-15 2023-06-15 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Vermeidung einer Degradation einer optischen Nutzoberfläche eines Spiegelmoduls, Projektionssystem, Beleuchtungssystem sowie Projektionsbelichtungsanlage
CN114924378B (zh) * 2022-05-30 2023-10-27 深圳综合粒子设施研究院 一种反射镜面形控制结构及光束线装置
DE102022211636A1 (de) 2022-11-04 2024-05-08 Carl Zeiss Smt Gmbh Optisches System, sowie Verfahren zum Betreiben eines optischen Systems
CN116203722A (zh) * 2023-01-04 2023-06-02 深圳综合粒子设施研究院 反射镜的面形优化方法及装置
WO2024145826A1 (zh) * 2023-01-04 2024-07-11 深圳综合粒子设施研究院 反射镜的面形优化方法及装置

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JPH0868898A (ja) * 1994-08-29 1996-03-12 Nikon Corp 反射鏡およびその製造方法
JP2004056125A (ja) * 2002-06-20 2004-02-19 Nikon Corp 個別アクチュエータを有する反射投影光学系
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Also Published As

Publication number Publication date
KR20150132203A (ko) 2015-11-25
DE102013204427A1 (de) 2014-09-18
CN105190443A (zh) 2015-12-23
US20160041480A1 (en) 2016-02-11
JP2016517028A (ja) 2016-06-09
US9798254B2 (en) 2017-10-24
CN105190443B (zh) 2019-04-23
WO2014139896A2 (en) 2014-09-18
KR102211633B1 (ko) 2021-02-04
WO2014139896A3 (en) 2014-11-06

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