CN105190443B - 用于反射镜的热致动的装置 - Google Patents

用于反射镜的热致动的装置 Download PDF

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Publication number
CN105190443B
CN105190443B CN201480014966.9A CN201480014966A CN105190443B CN 105190443 B CN105190443 B CN 105190443B CN 201480014966 A CN201480014966 A CN 201480014966A CN 105190443 B CN105190443 B CN 105190443B
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CN
China
Prior art keywords
active surface
mirror
mirror substrate
reflecting mirror
optics active
Prior art date
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Active
Application number
CN201480014966.9A
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English (en)
Chinese (zh)
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CN105190443A (zh
Inventor
M.豪夫
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN105190443A publication Critical patent/CN105190443A/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
CN201480014966.9A 2013-03-14 2014-03-07 用于反射镜的热致动的装置 Active CN105190443B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361781280P 2013-03-14 2013-03-14
DE102013204427.5A DE102013204427A1 (de) 2013-03-14 2013-03-14 Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
US61/781,280 2013-03-14
DE102013204427.5 2013-03-14
PCT/EP2014/054487 WO2014139896A2 (en) 2013-03-14 2014-03-07 Arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
CN105190443A CN105190443A (zh) 2015-12-23
CN105190443B true CN105190443B (zh) 2019-04-23

Family

ID=51418762

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480014966.9A Active CN105190443B (zh) 2013-03-14 2014-03-07 用于反射镜的热致动的装置

Country Status (6)

Country Link
US (1) US9798254B2 (enExample)
JP (1) JP6483626B2 (enExample)
KR (1) KR102211633B1 (enExample)
CN (1) CN105190443B (enExample)
DE (1) DE102013204427A1 (enExample)
WO (1) WO2014139896A2 (enExample)

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DE102013219808A1 (de) * 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
DE102014223750A1 (de) * 2014-11-20 2016-05-25 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
CN106324792B (zh) * 2015-06-19 2020-11-03 中国科学院大连化学物理研究所 一种适用高功率激光使用的相变冷却反射镜
DE102015225509A1 (de) 2015-12-16 2017-06-22 Carl Zeiss Smt Gmbh Reflektives optisches Element
CN106125298A (zh) * 2016-08-31 2016-11-16 中国科学院长春光学精密机械与物理研究所 非接触式空间光学遥感器反射镜面形控制系统
CN110546573B (zh) * 2017-04-11 2022-10-04 Asml荷兰有限公司 光刻设备
CN107390346A (zh) * 2017-09-19 2017-11-24 北京仿真中心 一种低辐射红外场镜装置
DE102019219231A1 (de) 2019-12-10 2020-01-23 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102019219289A1 (de) 2019-12-11 2021-06-17 Carl Zeiss Smt Gmbh Optisches System, sowie Heizanordnung und Verfahren zum Heizen eines optischen Elements in einem optischen System
DE102020201724A1 (de) * 2020-02-12 2021-08-12 Carl Zeiss Smt Gmbh Optisches system und lithographieanlage
WO2022028710A1 (en) * 2020-08-07 2022-02-10 Carl Zeiss Smt Gmbh Optical system and method of operating an optical system
EP4244676A1 (en) * 2020-11-11 2023-09-20 ASML Netherlands B.V. A method and apparatus for thermally deforming an optical element
EP4002009A1 (en) * 2020-11-11 2022-05-25 ASML Netherlands B.V. A method and apparatus for thermally deforming an optical surface of an optical element
DE102021201258A1 (de) 2021-02-10 2022-08-11 Carl Zeiss Smt Gmbh Verfahren zum Heizen eines optischen Elements in einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System
DE102021213458A1 (de) 2021-11-30 2022-08-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithografie
DE102021214366A1 (de) * 2021-12-15 2023-06-15 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Vermeidung einer Degradation einer optischen Nutzoberfläche eines Spiegelmoduls, Projektionssystem, Beleuchtungssystem sowie Projektionsbelichtungsanlage
CN114924378B (zh) * 2022-05-30 2023-10-27 深圳综合粒子设施研究院 一种反射镜面形控制结构及光束线装置
DE102022211636A1 (de) 2022-11-04 2024-05-08 Carl Zeiss Smt Gmbh Optisches System, sowie Verfahren zum Betreiben eines optischen Systems
WO2024145826A1 (zh) * 2023-01-04 2024-07-11 深圳综合粒子设施研究院 反射镜的面形优化方法及装置
CN116203722A (zh) * 2023-01-04 2023-06-02 深圳综合粒子设施研究院 反射镜的面形优化方法及装置

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JP2004056125A (ja) * 2002-06-20 2004-02-19 Nikon Corp 個別アクチュエータを有する反射投影光学系
US6880942B2 (en) * 2002-06-20 2005-04-19 Nikon Corporation Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
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TWI475330B (zh) * 2010-07-30 2015-03-01 卡爾蔡司Ｓｍｔ有限公司 超紫外線曝光裝置
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Also Published As

Publication number Publication date
KR20150132203A (ko) 2015-11-25
DE102013204427A1 (de) 2014-09-18
US9798254B2 (en) 2017-10-24
JP6483626B2 (ja) 2019-03-13
JP2016517028A (ja) 2016-06-09
WO2014139896A2 (en) 2014-09-18
US20160041480A1 (en) 2016-02-11
CN105190443A (zh) 2015-12-23
KR102211633B1 (ko) 2021-02-04
WO2014139896A3 (en) 2014-11-06

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