KR102211633B1 - 거울의 열적 작동을 위한 배열 - Google Patents

거울의 열적 작동을 위한 배열 Download PDF

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Publication number
KR102211633B1
KR102211633B1 KR1020157026654A KR20157026654A KR102211633B1 KR 102211633 B1 KR102211633 B1 KR 102211633B1 KR 1020157026654 A KR1020157026654 A KR 1020157026654A KR 20157026654 A KR20157026654 A KR 20157026654A KR 102211633 B1 KR102211633 B1 KR 102211633B1
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South Korea
Prior art keywords
mirror
optically effective
effective surface
cooling
mirror substrate
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Korean (ko)
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KR20150132203A (ko
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마르쿠스 하우프
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칼 짜이스 에스엠테 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
KR1020157026654A 2013-03-14 2014-03-07 거울의 열적 작동을 위한 배열 Active KR102211633B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361781280P 2013-03-14 2013-03-14
DE102013204427.5 2013-03-14
US61/781,280 2013-03-14
DE102013204427.5A DE102013204427A1 (de) 2013-03-14 2013-03-14 Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
PCT/EP2014/054487 WO2014139896A2 (en) 2013-03-14 2014-03-07 Arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
KR20150132203A KR20150132203A (ko) 2015-11-25
KR102211633B1 true KR102211633B1 (ko) 2021-02-04

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157026654A Active KR102211633B1 (ko) 2013-03-14 2014-03-07 거울의 열적 작동을 위한 배열

Country Status (6)

Country Link
US (1) US9798254B2 (enExample)
JP (1) JP6483626B2 (enExample)
KR (1) KR102211633B1 (enExample)
CN (1) CN105190443B (enExample)
DE (1) DE102013204427A1 (enExample)
WO (1) WO2014139896A2 (enExample)

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DE102013219808A1 (de) * 2013-09-30 2015-04-02 Heraeus Quarzglas Gmbh & Co. Kg Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung
DE102014223750A1 (de) * 2014-11-20 2016-05-25 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
CN106324792B (zh) * 2015-06-19 2020-11-03 中国科学院大连化学物理研究所 一种适用高功率激光使用的相变冷却反射镜
DE102015225509A1 (de) 2015-12-16 2017-06-22 Carl Zeiss Smt Gmbh Reflektives optisches Element
CN106125298A (zh) * 2016-08-31 2016-11-16 中国科学院长春光学精密机械与物理研究所 非接触式空间光学遥感器反射镜面形控制系统
US11720034B2 (en) 2017-04-11 2023-08-08 Asml Netherlands B.V. Lithographic apparatus and cooling method
CN107390346A (zh) * 2017-09-19 2017-11-24 北京仿真中心 一种低辐射红外场镜装置
DE102019219231A1 (de) 2019-12-10 2020-01-23 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102019219289A1 (de) 2019-12-11 2021-06-17 Carl Zeiss Smt Gmbh Optisches System, sowie Heizanordnung und Verfahren zum Heizen eines optischen Elements in einem optischen System
DE102020201724A1 (de) * 2020-02-12 2021-08-12 Carl Zeiss Smt Gmbh Optisches system und lithographieanlage
CN116324621A (zh) * 2020-08-07 2023-06-23 卡尔蔡司Smt有限责任公司 光学系统与操作光学系统的方法
EP4002009A1 (en) * 2020-11-11 2022-05-25 ASML Netherlands B.V. A method and apparatus for thermally deforming an optical surface of an optical element
CN116368436A (zh) * 2020-11-11 2023-06-30 Asml荷兰有限公司 用于使光学元件热变形的方法和设备
DE102021201258A1 (de) 2021-02-10 2022-08-11 Carl Zeiss Smt Gmbh Verfahren zum Heizen eines optischen Elements in einer mikrolithographischen Projektionsbelichtungsanlage, sowie optisches System
DE102021213458A1 (de) 2021-11-30 2022-08-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithografie
DE102021214366A1 (de) * 2021-12-15 2023-06-15 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Vermeidung einer Degradation einer optischen Nutzoberfläche eines Spiegelmoduls, Projektionssystem, Beleuchtungssystem sowie Projektionsbelichtungsanlage
CN114924378B (zh) * 2022-05-30 2023-10-27 深圳综合粒子设施研究院 一种反射镜面形控制结构及光束线装置
DE102022211636A1 (de) 2022-11-04 2024-05-08 Carl Zeiss Smt Gmbh Optisches System, sowie Verfahren zum Betreiben eines optischen Systems
CN116203722A (zh) * 2023-01-04 2023-06-02 深圳综合粒子设施研究院 反射镜的面形优化方法及装置
WO2024145826A1 (zh) * 2023-01-04 2024-07-11 深圳综合粒子设施研究院 反射镜的面形优化方法及装置

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JP2011512018A (ja) * 2007-10-09 2011-04-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学素子の温度制御装置
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Also Published As

Publication number Publication date
CN105190443A (zh) 2015-12-23
WO2014139896A3 (en) 2014-11-06
CN105190443B (zh) 2019-04-23
US20160041480A1 (en) 2016-02-11
DE102013204427A1 (de) 2014-09-18
KR20150132203A (ko) 2015-11-25
JP6483626B2 (ja) 2019-03-13
WO2014139896A2 (en) 2014-09-18
US9798254B2 (en) 2017-10-24
JP2016517028A (ja) 2016-06-09

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