JP6460055B2 - n型拡散層形成組成物、n型拡散層を有する半導体基板の製造方法、及び太陽電池素子の製造方法 - Google Patents
n型拡散層形成組成物、n型拡散層を有する半導体基板の製造方法、及び太陽電池素子の製造方法 Download PDFInfo
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- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- GRWFGVWFFZKLTI-UHFFFAOYSA-N rac-alpha-Pinene Natural products CC1=CCC2C(C)(C)C1C2 GRWFGVWFFZKLTI-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 229930006978 terpinene Natural products 0.000 description 1
- 150000003507 terpinene derivatives Chemical class 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- BRGJIIMZXMWMCC-UHFFFAOYSA-N tetradecan-2-ol Chemical compound CCCCCCCCCCCCC(C)O BRGJIIMZXMWMCC-UHFFFAOYSA-N 0.000 description 1
- ATZHWSYYKQKSSY-UHFFFAOYSA-N tetradecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCOC(=O)C(C)=C ATZHWSYYKQKSSY-UHFFFAOYSA-N 0.000 description 1
- XZHNPVKXBNDGJD-UHFFFAOYSA-N tetradecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCCOC(=O)C=C XZHNPVKXBNDGJD-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 230000009974 thixotropic effect Effects 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- 229940057402 undecyl alcohol Drugs 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229920001285 xanthan gum Polymers 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
- H01L21/2255—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/08—Frit compositions, i.e. in a powdered or comminuted form containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
- C03C8/16—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions with vehicle or suspending agents, e.g. slip
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/2225—Diffusion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L1/00—Compositions of cellulose, modified cellulose or cellulose derivatives
- C08L1/08—Cellulose derivatives
- C08L1/26—Cellulose ethers
- C08L1/28—Alkyl ethers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Description
<1>ドナー元素を含む化合物と、分散媒と、有機フィラーと、を含有するn型拡散層形成組成物。
<2>前記有機フィラーが粒子形状であり、平均粒子径が10μm以下である<1>に記載のn型拡散層形成組成物。
<3>前記有機フィラーの分解温度が700℃以下である<1>又は<2>に記載のn型拡散層形成組成物。
<4>前記ドナー元素を含む化合物は、リンを含有する化合物である<1>〜<3>のいずれか1項に記載のn型拡散層形成組成物。
<5>前記ドナー元素を含む化合物は、ガラス粒子の形態である<1>〜<4>のいずれか1項に記載のn型拡散層形成組成物。
<6>前記ガラス粒子が、P2O3及びP2O5からなる群より選択される1種以上のドナー元素含有物質と、SiO2、K2O、Na2O、Li2O、BaO、SrO、CaO、MgO、BeO、ZnO、PbO、CdO、V2O5、SnO、ZrO2及びMoO3からなる群より選択される1種以上のガラス成分物質と、を含有する<5>に記載のn型拡散層形成組成物。
<7>前記n型拡散層形成組成物中のガラス粒子の含有率が1質量%以上80質量%以下である<5>又は<6>に記載のn型拡散層形成組成物。
<8>前記ガラス粒子中のP2O3及びP2O5からなる群より選択される1種以上のドナー元素含有物質の含有率が0.01質量%以上10質量%以下である<5>〜<7>のいずれか1項に記載のn型拡散層形成組成物。
<9>前記n型拡散層形成組成物中の前記有機フィラーの含有率が1質量%以上50質量%以下である<1>〜<8>のいずれか1項に記載のn型拡散層形成組成物。
<10>半導体基板上の少なくとも一部に、<1>〜<9>のいずれか1項に記載のn型拡散層形成組成物を付与する工程と、熱処理を施して前記半導体基板中にn型拡散層を形成する工程と、を有する、n型拡散層を有する半導体基板の製造方法。
<11>半導体基板上の少なくとも一部に、<1>〜<9>のいずれか1項に記載のn型拡散層形成組成物を付与する工程と、熱処理を施して前記半導体基板中にn型拡散層を形成する工程と、前記n型拡散層上に電極を形成する工程と、を有する太陽電池素子の製造方法。
本発明のn型拡散層形成組成物は、ドナー元素を含む化合物と、分散媒と、有機フィラーとを含有する。更に付与性などを考慮してその他の添加剤を必要に応じて含有してもよい。ここで、n型拡散層形成組成物とは、ドナー元素を含有し、半導体基板に付与した後にこのドナー元素を熱拡散することでn型拡散層を形成することが可能な材料をいう。本発明のn型拡散層形成組成物はドナー元素を含む化合物及び有機フィラーを含有するため、不要な部位にn型拡散層を形成することなく所望の部位にのみn型拡散層を形成できるとともに、n型拡散層が細線状である場合に線幅の肥大を抑制しつつn型拡散層を形成することができる。
本発明のn型拡散層形成組成物は、ドナー元素を含む化合物を含む。ドナー元素とは、半導体基板中に拡散することによってn型拡散層を形成することが可能な元素である。ドナー元素としては第15族の元素が使用できる。安全性等の観点から、P(リン)が好適である。
ドナー元素を含む化合物としては特に制限はない。例えば、ドナー元素を含む金属酸化物を使用できる。ドナー元素を含む金属酸化物としては、P2O5、P2O3等の単独金属酸化物;リンシリサイド、リンをドープしたシリコン粒子、リン酸カルシウム、リン酸、リンを含有するガラス粒子等の無機リン化合物;ホスホン酸、亜ホスホン酸、ホスフィン酸、亜ホスフィン酸、ホスフィン、ホスフィンオキシド、リン酸エステル、亜リン酸エステル等の有機リン化合物を例示することができる。
n型拡散層形成組成物がドナー元素を含む化合物が分散媒に溶解した状態の場合、n型拡散層形成組成物の調製に用いるドナー元素を含む化合物の形状には特に制限はない。
上記では2成分を含む複合ガラスを例示したが、P2O5−SiO2−V2O5、P2O5−SiO2−CaO等、3成分以上の物質を含むガラス粒子でもよい。
最初に原料、例えば、前記ドナー元素含有物質とガラス成分物質を秤量し、るつぼに充填する。るつぼの材質としては白金、白金―ロジウム、イリジウム、アルミナ、石英、炭素等が挙げられるが、溶融温度、雰囲気、溶融物質との反応性等を考慮して適宜選ばれる。次に、電気炉でガラス組成に応じた温度で加熱して融液とする。このとき融液が均一となるよう攪拌することが望ましい。続いて得られた融液をジルコニア基板やカーボン基板等の上に流し出して融液をガラス化する。最後にガラスを粉砕し粉末状とする。粉砕にはジェットミル、ビーズミル、ボールミル等公知の方法が適用できる。
本発明のn型拡散層形成組成物は分散媒を含有する。
分散媒とは、組成物中において前記ドナー元素を含む化合物及び有機フィラーを分散又は溶解させる媒体である。具体的に分散媒は、少なくとも溶剤又は水を含むことが好ましい。また分散媒としては、溶剤又は水に加え、後述する有機バインダを含有するものであってもよい。
本発明のn型拡散層形成組成物は、有機フィラーを含有する。有機フィラーとは、粒子状または繊維状の形状を有する有機化合物である。本発明のn型拡散層形成組成物は有機フィラーを含有することで、n型拡散層形成組成物を半導体基板上に、細線状のパターン形状に所望のサイズで付与することが可能となる。つまり、有機フィラーを含有することで、細線状のパターン形状の肥大を防ぐことができる。これは有機フィラーが、n型拡散層形成組成物に適度なチキソ性を与えるためだと考えられる。また、有機フィラーを含有することで、ドナー元素の半導体基板への拡散を妨げることなく、所望の形状でn型拡散層を形成することができる。一方、有機フィラーに代えて無機フィラーを用いた場合は、熱拡散時においてもフィラーが消失することなく残存する。このため、ガラス粒子が溶融した際に不均一なガラス層となり、ドナー元素の半導体基板への拡散を妨げる傾向がある。
また、有機フィラーを構成する有機化合物としては、熱分解性の観点から、アクリル樹脂、セルロース樹脂及びポリスチレン樹脂からなる群より選ばれる少なくとも1種であることが好ましく、アクリル樹脂であることがより好ましい。
本発明のn型拡散層を有する半導体基板の製造方法は、半導体基板上の少なくとも一部に本発明のn型拡散層形成組成物を付与する工程と、熱処理を施して前記半導体基板中にn型拡散層を形成する工程と、を有する。
本発明の太陽電池素子の製造方法は、半導体基板上の少なくとも一部に本発明のn型拡散層形成組成物を付与する工程と、熱処理を施して前記半導体基板中にn型拡散層を形成する工程と、前記n型拡散層上に電極を形成する工程を有する。
例えば、n型拡散層形成組成物11を半導体基板上に幅150μmの線状に付与した場合、乾燥後に測定したn型拡散層形成組成物11の幅が250μm以下であることが好ましく、185μm以下であることがより好ましく、160μm以下であることがさらに好ましく、155μm以下であることがさらにより好ましい。
さらに、n型拡散層形成組成物11を付与して得られる細線の線幅の増加率は、所望の設定値の67%以内であることが好ましく、25%以内であることがより好ましく、5%以内であることがさらに好ましい。
この内部応力は、結晶の結晶粒界に損傷を与え、電力損失が大きくなるという課題があった。また、半導体基板の反りは、モジュール工程における太陽電池素子の搬送や、タブ線と呼ばれる銅線との接続において、太陽電池素子を破損させ易くしていた。近年では、スライス加工技術の向上から、半導体基板の厚みが薄型化されつつあり、更に太陽電池素子が割れ易い傾向にある。
本発明の太陽電池は、前記製造方法で製造された太陽電池素子の1種以上を含み、太陽電池素子の電極上に配線材料が配置されて構成される。太陽電池はさらに必要に応じて、配線材料を介して複数の太陽電池素子が連結され、さらに封止材で封止されて構成されていてもよい。前記太陽電池素子の製造方法で製造された太陽電池素子は、太陽電池の製造に用いられる。
前記配線材料及び封止材としては特に制限されず、当業界で通常用いられているものから適宜選択することができる。太陽電池の形状や大きさに特に制限はないが、0.5m2〜3m2であることが好ましい。
P2O5−SiO2−CaO系ガラス(P2O5:50%、SiO2:43%、CaO:7%)粉末1g、エチルセルロース0.3g、酢酸2−(2−ブトキシエトキシ)エチル8.6g、有機フィラー(PMMA樹脂フィラー、綜研化学株式会社製、MR、架橋粒子、平均粒子径0.1μm、分解温度400℃)0.1gを混合してペースト状のn型拡散層形成組成物を調製した。n型拡散層形成組成物の25℃でのせん断粘度は、せん断速度0.01/sで500Pa・s、10/sで50Pa・sを示し、TI値は1.00であった。なお、せん断速度は、粘弾性測定装置(Anton Paar(アントンパール)社製レオメーターMCR301)を用いて、25℃における値を測定した。
P2O5−SiO2−CaO系ガラス粒子(P2O5:50%、SiO2:43%、CaO:7%)1g、エチルセルロース0.3g、酢酸2−(2−ブトキシエトキシ)エチル6.7g、有機フィラー(PMMA樹脂フィラー、綜研化学株式会社製、MR、平均粒子径0.1μm)2gを用いた以外は実施例1と同様にしてペースト状のn型拡散層形成組成物を調製した。実施例1と同様の方法で測定したn型拡散層形成組成物のせん断粘度はせん断速度0.01/sで5000Pa・s、10/sで80Pa・sを示し、TI値は1.80であった。
平均粒子径が0.1μmの有機フィラーの代わりに、同種の平均粒子径が5.0μmの有機フィラーを用いた以外は、実施例1と同様にしてペースト状のn型拡散層形成組成物を調製した。実施例1と同様の方法で測定したn型拡散層形成組成物のせん断粘度はせん断速度0.01/sで300Pa・s、10/sで60Pa・sを示し、TI値は0.70であった。
P2O5−SiO2−CaO系ガラス粒子(P2O5:50%、SiO2:43%、CaO:7%)1g、酢酸2−(2−ブトキシエトキシ)エチル8.3g、有機フィラー(PMMA樹脂フィラー、綜研化学株式会社製、MR、粒子径0.1μm)0.7gを用いた以外は実施例1と同様にしてペースト状のn型拡散層形成組成物を調製した。実施例1と同様の方法で測定したn型拡散層形成組成物のせん断粘度は、せん断速度0.01/sで5000Pa・s、10/sで80Pa・sを示し、TI値は1.80であった。
P2O5−SiO2−CaO系ガラス粒子1g、エチルセルロース0.29g、酢酸2−(2−ブトキシエトキシ)エチル8.7g、有機フィラー(PMMA樹脂フィラー、綜研化学株式会社製、MR、平均粒子径0.1μm)0.01gを用いた以外は実施例1と同様にしてペースト状のn型拡散層形成組成物を調製した。実施例1と同様の方法で測定したn型拡散層形成組成物のせん断粘度は、せん断速度0.01/sで260Pa.s、10/sで80Pa・sを示し、TI値は0.51であった。
有機フィラーを添加せず、P2O5−SiO2−CaO系ガラス粒子(P2O5:50%、SiO2:43%、CaO:7%)1g、エチルセルロース0.68g、酢酸2−(2−ブトキシエトキシ)エチル8.32gを混合してペースト状のn型拡散層形成組成物を調製した。実施例1と同様の方法で測定したn型拡散層形成組成物のせん断粘度はせん断速度0.01/sで、200Pa・s、10/sで80Pa・sを示し、あまり変化が得られず、TI値は0.40と低かった。
Claims (10)
- ドナー元素を含む化合物と、分散媒と、平均粒子径が0.1μm以下である粒子形状の有機フィラーと、を含有するn型拡散層形成組成物。
- 前記有機フィラーの分解温度が700℃以下である請求項1に記載のn型拡散層形成組成物。
- 前記ドナー元素を含む化合物は、リンを含有する化合物である請求項1又は請求項2に記載のn型拡散層形成組成物。
- 前記ドナー元素を含む化合物は、ガラス粒子の形態である請求項1〜請求項3のいずれか1項に記載のn型拡散層形成組成物。
- 前記ガラス粒子が、P2O3及びP2O5からなる群より選択される1種以上のドナー元素含有物質と、SiO2、K2O、Na2O、Li2O、BaO、SrO、CaO、MgO、BeO、ZnO、PbO、CdO、V2O5、SnO、ZrO2及びMoO3からなる群より選択される1種以上のガラス成分物質と、を含有する請求項4に記載のn型拡散層形成組成物。
- 前記n型拡散層形成組成物中のガラス粒子の含有率が1質量%以上80質量%以下である請求項4又は請求項5に記載のn型拡散層形成組成物。
- 前記ガラス粒子中のP2O3及びP2O5からなる群より選択される1種以上のドナー元素含有物質の含有率が0.01質量%以上10質量%以下である請求項4〜請求項6のいずれか1項に記載のn型拡散層形成組成物。
- 前記n型拡散層形成組成物中の前記有機フィラーの含有率が1質量%以上50質量%以下である請求項1〜請求項7のいずれか1項に記載のn型拡散層形成組成物。
- 半導体基板上の少なくとも一部に、請求項1〜請求項8のいずれか1項に記載のn型拡散層形成組成物を付与する工程と、熱処理を施して前記半導体基板中にn型拡散層を形成する工程と、を有する、n型拡散層を有する半導体基板の製造方法。
- 半導体基板上の少なくとも一部に、請求項1〜請求項8のいずれか1項に記載のn型拡散層形成組成物を付与する工程と、熱処理を施して前記半導体基板中にn型拡散層を形成する工程と、前記n型拡散層上に電極を形成する工程と、を有する太陽電池素子の製造方法。
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