JP6440498B2 - リソグラフィシステム、リソグラフィ方法、および物品の製造方法 - Google Patents

リソグラフィシステム、リソグラフィ方法、および物品の製造方法 Download PDF

Info

Publication number
JP6440498B2
JP6440498B2 JP2015000438A JP2015000438A JP6440498B2 JP 6440498 B2 JP6440498 B2 JP 6440498B2 JP 2015000438 A JP2015000438 A JP 2015000438A JP 2015000438 A JP2015000438 A JP 2015000438A JP 6440498 B2 JP6440498 B2 JP 6440498B2
Authority
JP
Japan
Prior art keywords
measurement
conditions
exposure
lithography
apparatuses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015000438A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016127165A5 (enExample
JP2016127165A (ja
Inventor
雅史 古徳
雅史 古徳
千徳　孝一
孝一 千徳
義人 多田
義人 多田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2015000438A priority Critical patent/JP6440498B2/ja
Publication of JP2016127165A publication Critical patent/JP2016127165A/ja
Publication of JP2016127165A5 publication Critical patent/JP2016127165A5/ja
Application granted granted Critical
Publication of JP6440498B2 publication Critical patent/JP6440498B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2015000438A 2015-01-05 2015-01-05 リソグラフィシステム、リソグラフィ方法、および物品の製造方法 Active JP6440498B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015000438A JP6440498B2 (ja) 2015-01-05 2015-01-05 リソグラフィシステム、リソグラフィ方法、および物品の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015000438A JP6440498B2 (ja) 2015-01-05 2015-01-05 リソグラフィシステム、リソグラフィ方法、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2016127165A JP2016127165A (ja) 2016-07-11
JP2016127165A5 JP2016127165A5 (enExample) 2018-02-01
JP6440498B2 true JP6440498B2 (ja) 2018-12-19

Family

ID=56359693

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015000438A Active JP6440498B2 (ja) 2015-01-05 2015-01-05 リソグラフィシステム、リソグラフィ方法、および物品の製造方法

Country Status (1)

Country Link
JP (1) JP6440498B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6521223B2 (ja) * 2015-02-25 2019-05-29 株式会社ニコン リソグラフィ装置の管理方法及び装置、並びに露光方法及びシステム
JP6736425B2 (ja) * 2016-08-29 2020-08-05 株式会社東芝 施設管理装置及び施設管理方法
JP6877541B2 (ja) * 2016-11-14 2021-05-26 ケーエルエー コーポレイション 一体型メトロロジツールを有する機能性が強化されたリソグラフィシステム

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11214296A (ja) * 1998-01-22 1999-08-06 Nikon Corp 回路パターン製造方法および装置
JP2000323383A (ja) * 1999-05-10 2000-11-24 Nec Yamagata Ltd 半導体装置の製造方法及び製造装置
JP2002221800A (ja) * 2001-01-26 2002-08-09 Nikon Corp 露光装置および露光システム並びに露光方法
JP2004342951A (ja) * 2003-05-19 2004-12-02 Matsushita Electric Ind Co Ltd 半導体露光工程における露光条件制御方法及び制御システム
JP2014212201A (ja) * 2013-04-18 2014-11-13 ルネサスエレクトロニクス株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
JP2016127165A (ja) 2016-07-11

Similar Documents

Publication Publication Date Title
US11599027B2 (en) Lithographic process and apparatus and inspection process and apparatus
US12050406B2 (en) Method for controlling a lithographic apparatus and associated apparatuses
EP3582011B1 (en) Information processing apparatus, method, program, lithography system, and manufacturing method of article
JP5908045B2 (ja) メトロロジ装置、リソグラフィ装置、リソグラフィセル及びメトロロジ方法
US9940703B2 (en) Method of measuring a property of a target structure, inspection apparatus, lithographic system and device manufacturing method
US10031429B2 (en) Method of obtaining position, exposure method, and method of manufacturing article
US11194258B2 (en) Method and apparatus for determining a fingerprint of a performance parameter
US20240168388A1 (en) Method for inferring a local uniformity metric
US20200089125A1 (en) Method for of Measuring a Parameter Relating to a Structure Formed Using a Lithographic Process
JP6440498B2 (ja) リソグラフィシステム、リソグラフィ方法、および物品の製造方法
CN109073987B (zh) 用于调节光刻设备的致动的方法
JP7339826B2 (ja) マーク位置決定方法、リソグラフィー方法、物品製造方法、プログラムおよびリソグラフィー装置
US20190041760A1 (en) Metrology method and lithographic method, lithographic cell and computer program
CN113168112A (zh) 测量与使用光刻过程形成的结构有关的聚焦参数的方法
CN108292111B (zh) 用于在光刻设备中处理衬底的方法和设备
EP3879342A1 (en) Method for inferring a local uniformity metric and associated appratuses
NL2020324A (en) Metrology Method and Method of Device Manufacture
NL2025112A (en) Method for inferring a local uniformity metric and associated appratuses
TW202541200A (zh) 計測方法、對位方法、處理方法、處理裝置、物品之製造方法、決定方法及程式
KR20230121053A (ko) 리소그래피 공정을 모니터링하는 방법

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171208

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20171208

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20181023

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20181120

R151 Written notification of patent or utility model registration

Ref document number: 6440498

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151