JP6428942B2 - 導電性基板、導電性基板の製造方法 - Google Patents
導電性基板、導電性基板の製造方法 Download PDFInfo
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- JP6428942B2 JP6428942B2 JP2017532504A JP2017532504A JP6428942B2 JP 6428942 B2 JP6428942 B2 JP 6428942B2 JP 2017532504 A JP2017532504 A JP 2017532504A JP 2017532504 A JP2017532504 A JP 2017532504A JP 6428942 B2 JP6428942 B2 JP 6428942B2
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- layer
- metal
- conductive substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Human Computer Interaction (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015152895 | 2015-07-31 | ||
JP2015152895 | 2015-07-31 | ||
PCT/JP2016/071703 WO2017022543A1 (ja) | 2015-07-31 | 2016-07-25 | 導電性基板、導電性基板の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2017022543A1 JPWO2017022543A1 (ja) | 2018-05-31 |
JP6428942B2 true JP6428942B2 (ja) | 2018-11-28 |
Family
ID=57944084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017532504A Active JP6428942B2 (ja) | 2015-07-31 | 2016-07-25 | 導電性基板、導電性基板の製造方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6428942B2 (zh) |
KR (1) | KR102587363B1 (zh) |
CN (1) | CN107850965B (zh) |
TW (1) | TWI702522B (zh) |
WO (1) | WO2017022543A1 (zh) |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004213114A (ja) | 2002-12-27 | 2004-07-29 | Pentel Corp | 静電容量型デジタル式タッチパネル |
CN101400826B (zh) * | 2006-03-15 | 2012-06-20 | 日本帕卡濑精株式会社 | 铜材料用表面处理液、铜材料的表面处理方法、带表面处理被膜的铜材料和层合构件 |
US8753933B2 (en) * | 2008-11-19 | 2014-06-17 | Micron Technology, Inc. | Methods for forming a conductive material, methods for selectively forming a conductive material, methods for forming platinum, and methods for forming conductive structures |
TWI425530B (zh) * | 2010-09-30 | 2014-02-01 | Far Eastern New Century Corp | 具有高光穿透度之透明導電膜及其製備方法 |
JP5473990B2 (ja) * | 2011-06-17 | 2014-04-16 | 日東電工株式会社 | 導電性積層体、パターン配線付き透明導電性積層体、および光学デバイス。 |
JP6099875B2 (ja) * | 2011-11-22 | 2017-03-22 | 東レ株式会社 | 積層体の製造方法 |
JP5775494B2 (ja) * | 2012-02-28 | 2015-09-09 | 富士フイルム株式会社 | 銀イオン拡散抑制層形成用組成物、銀イオン拡散抑制層用フィルム、配線基板、電子機器、導電膜積層体、およびタッチパネル |
JP2013206315A (ja) | 2012-03-29 | 2013-10-07 | Toppan Printing Co Ltd | フィルム状タッチパネルセンサー及びその製造方法 |
CN102621736A (zh) * | 2012-04-09 | 2012-08-01 | 友达光电股份有限公司 | 一种对触控面板中的黑矩阵进行图案化的方法 |
KR101521681B1 (ko) * | 2012-04-24 | 2015-05-19 | 삼성전기주식회사 | 터치패널 |
JP2013235315A (ja) * | 2012-05-07 | 2013-11-21 | Dainippon Printing Co Ltd | タッチパネルセンサ |
JP6047713B2 (ja) * | 2012-05-11 | 2016-12-21 | 石原ケミカル株式会社 | 無電解銅メッキ方法 |
JP5849059B2 (ja) * | 2012-07-06 | 2016-01-27 | 富士フイルム株式会社 | タッチパネル用導電性フィルムおよびタッチパネル |
JP5224203B1 (ja) * | 2012-07-11 | 2013-07-03 | 大日本印刷株式会社 | タッチパネルセンサ、タッチパネル装置および表示装置 |
WO2014035197A1 (ko) * | 2012-08-31 | 2014-03-06 | 주식회사 엘지화학 | 전도성 구조체 및 이의 제조방법 |
WO2014035207A1 (ko) * | 2012-08-31 | 2014-03-06 | 주식회사 엘지화학 | 전도성 구조체 및 이의 제조방법 |
JP2014219963A (ja) * | 2013-04-12 | 2014-11-20 | 信越ポリマー株式会社 | センサーシート作製用シート及びその製造方法、タッチパッド用センサーシート及びその製造方法 |
JP6129769B2 (ja) * | 2013-05-24 | 2017-05-17 | 富士フイルム株式会社 | タッチパネル用透明導電膜、透明導電膜の製造方法、タッチパネル及び表示装置 |
JP6369750B2 (ja) * | 2013-09-10 | 2018-08-08 | 日立金属株式会社 | 積層配線膜およびその製造方法ならびにNi合金スパッタリングターゲット材 |
KR102170097B1 (ko) * | 2013-10-31 | 2020-10-26 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 도전성 기판 및 도전성 기판 제조방법 |
TWM490025U (en) * | 2014-06-20 | 2014-11-11 | Koatech Tech Corporation | Display |
-
2016
- 2016-07-25 JP JP2017532504A patent/JP6428942B2/ja active Active
- 2016-07-25 CN CN201680043312.8A patent/CN107850965B/zh active Active
- 2016-07-25 WO PCT/JP2016/071703 patent/WO2017022543A1/ja active Application Filing
- 2016-07-25 KR KR1020187001675A patent/KR102587363B1/ko active IP Right Grant
- 2016-07-27 TW TW105123736A patent/TWI702522B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO2017022543A1 (ja) | 2017-02-09 |
TW201719361A (zh) | 2017-06-01 |
KR20180034401A (ko) | 2018-04-04 |
KR102587363B1 (ko) | 2023-10-10 |
JPWO2017022543A1 (ja) | 2018-05-31 |
CN107850965B (zh) | 2021-01-29 |
CN107850965A (zh) | 2018-03-27 |
TWI702522B (zh) | 2020-08-21 |
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