JP6420228B2 - 被覆粒子の製造方法、並びに機能材料の製造方法 - Google Patents
被覆粒子の製造方法、並びに機能材料の製造方法 Download PDFInfo
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- 125000003118 aryl group Chemical group 0.000 description 1
- 239000004637 bakelite Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- UNXHWFMMPAWVPI-UHFFFAOYSA-N butane-1,2,3,4-tetrol Chemical compound OCC(O)C(O)CO UNXHWFMMPAWVPI-UHFFFAOYSA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000012377 drug delivery Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- IZLAVFWQHMDDGK-UHFFFAOYSA-N gold(1+);cyanide Chemical compound [Au+].N#[C-] IZLAVFWQHMDDGK-UHFFFAOYSA-N 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- AFEBXVJYLNMAJB-UHFFFAOYSA-N hydrazine;nitric acid Chemical compound NN.O[N+]([O-])=O AFEBXVJYLNMAJB-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 239000002440 industrial waste Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000002608 ionic liquid Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000005551 mechanical alloying Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000010303 mechanochemical reaction Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002006 petroleum coke Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000009700 powder processing Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000013558 reference substance Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229920000785 ultra high molecular weight polyethylene Polymers 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
- B01J2/003—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic followed by coating of the granules
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/10—Carbon fluorides, e.g. [CF]nor [C2F]n
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/20—Graphite
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/26—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/28—After-treatment, e.g. purification, irradiation, separation or recovery
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/52—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating using reducing agents for coating with metallic material not provided for in a single one of groups C23C18/32 - C23C18/50
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2203/00—Processes utilising sub- or super atmospheric pressure
- B01J2203/06—High pressure synthesis
- B01J2203/065—Composition of the material produced
- B01J2203/0655—Diamond
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Geology (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemically Coating (AREA)
- Coating By Spraying Or Casting (AREA)
Description
上記炭素粒子は、爆轟法によって製造されたものであり、該炭素粒子の製造方法は、
3個以上のニトロ基を有する芳香族化合物を含む原料物質の周囲に常温、常圧で液体である爆発性物質を配置する工程と、
前記爆発性物質を爆轟させる工程とを含むことを特徴とする。以下、工程順に説明する。
上記素地材に、上記被覆粒子を溶射することによって、表面に被覆粒子を担持した機能材料を製造できる。
上記素地材に、上記被覆粒子を圧延することによって、表面に被覆粒子を担持した機能材料を製造できる。
上記被覆粒子を分散させたメッキ浴に、上記素地材を浸漬してメッキすることによって、素地材の表面に被覆粒子を担持した機能材料を製造できる。
本実験例では、原料物質としてTNTを用いて、かつ、爆発性物質としてヒドラジン系液体爆薬を用いて、爆轟法により炭素粒子を製造した。具体的には、TNTは、市販されている円柱状の成型体(中国化薬製TNTの円柱形溶填物、直径10cm×長さ20cm)を用いた。TNT成型体の質量は2.52kg、密度は1.60g/cm3であった。また、硝酸ヒドラジンと抱水ヒドラジンを質量比3:1で混合して、0.93kgのヒドラジン系液体爆薬を調製した。
本実験例では、上記実験例1に対して、原料物質として、質量2.52kg、密度1.60g/cm3のTNT成型体の代わりに、質量3.82kg、密度1.61g/cm3のTNT成型体(中国化薬製TNTの円柱形溶填物、直径10cm×長さ30cm)を用いたこと、爆発性物質であるヒドラジン系液体爆薬の使用量を0.93kgから1.29kgに変更したこと以外は、上記実験例1と同じ条件で炭素粒子を製造した。
本実験例では、上記実験例1に対して、原料物質として、質量2.52kg、密度1.60g/cm3のTNT成型体の代わりに、質量6.30kg、密度1.59g/cm3のTNT成型体(中国化薬製TNTの円柱形溶填物、直径10cm×長さ50cm)を用いたこと、爆発性物質であるヒドラジン系液体爆薬の使用量を0.93kgから2.17kgに変更したこと、冷却材である蒸留水の使用量を200Lから220Lに変更したこと以外は、実験例1と同じ条件で炭素粒子を製造した。
ダイヤモンドと積層構造をもったグラファイト質の炭素の格子像が観察できるCCDカメラと撮影倍率を有するTEMを用いて得られた炭素粒子を観察した。TEMの具体的な測定条件は次の通りである。
・TEMの装置名:日本電子製透過型電子顕微鏡JEM−ARM200F
・測定方法:懸濁法、分散溶媒:メタノール
・加速電圧:200kV
・CCDカメラ:Gatan製UltraScan
・撮影倍率:30万倍、80万倍
・写真倍率:220万倍、A4サイズに印刷時は590万倍
実験例3(3#5)で得られた炭素粒子のうち、100μm篩通過分のXRDを測定し、チャートを図5に示す。X線回折の測定条件を以下に示す。
・X線回折装置の装置名:リガク製水平型X線回折装置SmartLab
・測定方法:θ−2θ
・X線源:Cu−Kα線
・励起電圧−電流:45kV−200mA
・発散スリット:2/3°
・散乱スリット:2/3°
・受光スリット:0.6mm
(b)上記アクリル樹脂粒子としては、根上工業株式会社製の「SE−010T」(平均粒径φ22μm、比重1.21g/cm3)、または東洋紡株式会社製の「タフチックAR650M」(平均粒径φ30μm、比重1.35g/cm3)、または根上工業株式会社製の「J−4PY」(平均粒径φ2.2μm、比重1.21g/cm3)を用いた。
(c)上記高分子量ポリエチレン樹脂粒子としては、三井化学株式会社製の「ミペロンPM−200」(平均粒径φ10μm、比重0.94g/cm3)を用いた。
(d)上記PTFE粒子としては、名古屋合成株式会社製の「分散液用潤滑粉」(平均粒径φ0.3μm、比重は不明)を用いた。
(e)上記SiC粒子としては、信濃電気製錬株式会社製の「SSC−A15」(平均粒径φ18.6μm、比重1.91g/cm3)を用いた。
(f)上記不活性アルミナ粒子としては、ユニオン昭和株式会社製の「VERSAL−Gシリーズ・VGL-25」(平均粒径約φ15μm、比重1.93g/cm3)、電気化学工業株式会社製の「DAW−03」(平均粒径約φ4.3μm、比表面積0.5m2/g)、電気化学工業株式会社製の「ASFP−20」(平均粒径約φ0.27μm、比表面積12.5m2/g)、または昭和電工株式会社製の「AS−10」(平均粒径φ約39μm、嵩密度1.8〜2.4g/cm3)を用いた。
(g)上記SUS316L型ステンレス鋼粒子としては、山陽特殊製鋼株式会社製の噴霧(アトマイズ)粉末を用いた。合金名はPSS316Lで、粒度は目開きが45μmの篩下で且つ目開きが10μmの篩上(−45/+10μm)である。
(h)上記銅粒子としては、福田金属箔粉工業株式会社製のアトマイズ球状銅粉末「Cu−At−200」を用いた。平均粒径は不明であるが、粒径φ45μm以下が55.7%である。見掛け密度は4.66g/cm3である。
(i)上記黄銅粒子としては、福田金属箔粉工業株式会社製のアトマイズ球状ブロンズ粉末「BRO-At-200」を用いた。平均粒径は不明であるが、粒径φ45μm以下が82.7%である。見掛け密度は4.96g/cm3、成分中の錫(Sn)量は9.63%である。
(j)上記アルミニウム粒子としては、ミナルコ株式会社製のアトマイズアルミニウム粉末「350F」を用いた。平均粒径はφ14.47μmである。
(k)上記マルエージング鋼粒子としては、サンドビック株式会社製ものを用いた。合金名は18Ni300である。粒径はφ38μm以下が99.5%であり、平均粒径はφ32.4μmである。
(b−1)アクリル樹脂粒子「SE−010T」を500g、実験例2(3#4)で得られた炭素粒子を2質量%とした。試算膜厚は13nmである。
(b−2)アクリル樹脂粒子「タフチックAR650M」を500g、実験例2(3#4)で得られた炭素粒子を5質量%とした。試算膜厚は112nmである。
(b−3)アクリル樹脂粒子「J−4PY」を230g、実験例3(3#5)で得られた炭素粒子を5質量%とした。試算膜厚は7nmである。
(c)高分子量ポリエチレン樹脂粒子「ミペロンPM−200」を250g、実験例3(3#5)で得られた炭素粒子を2質量%とした。試算膜厚は10nmである。
(d)上記PTFE粒子を200g、実験例3(3#5)で得られた炭素粒子を5質量%とした。試算膜厚は2nmである。
(e)SiC粒子「SSC−A15」を500g、実験例3(3#5)で得られた炭素粒子を2質量%とした。試算膜厚は39nmである。
(f−1)不活性アルミナ粒子「VERSAL−Gシリーズ・VGL−25」を500g、実験例3(3#5)で得られた炭素粒子を5質量%とした。「VERSAL−Gシリーズ・VGL−25」は粒径分布が示されていないため正確に判らないが、平均粒径(d50)を15μmと仮定した場合の試算膜厚は80nmである。
(f−2)不活性アルミナ粒子「DAW−03」を250g、実験例3(3#5)で得られた炭素粒子を質量5%とした。試算膜厚は21nmである。
(f−3)不活性アルミナ粒子「ASFP−20」を100g、実験例3(3#5)で得られた炭素粒子を質量5%とした。試算膜厚は2nmである。
(f−4)不活性アルミナ粒子「AS−10」を100g、実験例3(3#5)で得られた炭素粒子を質量5%とした。試算膜厚は207nmである。
(g)SUS316L型ステンレス鋼粒子を500g、実験例3(3#5)で得られた炭素粒子を2質量%とした。試算膜厚は174nmである。
(h)銅粒子を500g、実験例3(3#5)で得られた炭素粒子を0.5質量%とした。試算膜厚は67nmである。
(i)黄銅粒子を500g、実験例3(3#5)で得られた炭素粒子を0.5質量%とした。試算膜厚は29nmである。
(j)アルミニウム粒子を250g、実験例3(3#5)で得られた炭素粒子を5質量%とした。試算膜厚は123nmである。
(k)マルエージング鋼粒子を500g、実験例3(3#5)で得られた炭素粒子を0.5質量%とした。試算膜厚は72nmである。
12 爆発性物質
20 爆発容器
22 伝爆薬
24 雷管や導爆線
30 冷却容器
32 冷却材
34 架台
36 穴あき円板
Claims (5)
- 3個以上のニトロ基を有する芳香族化合物を含む原料物質の周囲に常温、常圧で液体である爆発性物質を配置する工程と、
前記爆発性物質を爆轟させる工程と、
得られた炭素粒子を、機械的複合化法によって基材粒子の表面に被覆する工程と
を含むことを特徴とする被覆粒子の製造方法。 - 前記炭素粒子を、フッ化処理した後、機械的複合化法によって基材粒子の表面に被覆する請求項1に記載の被覆粒子の製造方法。
- 請求項1または2に記載の製造方法で得られた被覆粒子を、素地材の表面に担持することを特徴とする機能材料の製造方法。
- 請求項1または2に記載の製造方法で得られた被覆粒子を、素地材の表面に担持した後、フッ化処理することを特徴とする機能材料の製造方法。
- 前記被覆粒子を、溶射、圧延、またはメッキにより前記素地材の表面に担持する請求項3または4に記載の機能材料の製造方法。
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PCT/JP2016/085595 WO2017094788A1 (ja) | 2015-12-01 | 2016-11-30 | 被覆粒子 |
EP16870725.5A EP3385222A4 (en) | 2015-12-01 | 2016-11-30 | COATED PARTICLE |
KR1020187015457A KR20180080267A (ko) | 2015-12-01 | 2016-11-30 | 피복 입자 |
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