JP6415549B2 - 反射防止層の製造法 - Google Patents
反射防止層の製造法 Download PDFInfo
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- JP6415549B2 JP6415549B2 JP2016520355A JP2016520355A JP6415549B2 JP 6415549 B2 JP6415549 B2 JP 6415549B2 JP 2016520355 A JP2016520355 A JP 2016520355A JP 2016520355 A JP2016520355 A JP 2016520355A JP 6415549 B2 JP6415549 B2 JP 6415549B2
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00865—Applying coatings; tinting; colouring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
- B29C2059/147—Low pressure plasma; Glow discharge plasma
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Description
Claims (12)
- 基材(10)上に反射防止層を製造する方法であって、以下の方法工程:
− 第一のナノ構造(11)を、第一の材料において第一のプラズマエッチング処理により作り出す工程、ここで、前記第一の材料は、前記基材(10)の材料であるか又は前記基材(10)上に施与された第一の有機材料から成る層(1)の材料である、
− 第二の材料から成る層(2)を前記第一のナノ構造(11)上に施与する工程、ここで、前記第二の材料は有機材料である、及び
− 第二のナノ構造(12)を、前記第二の材料から成る層(2)において第二のプラズマエッチング処理により作り出す工程、ここで、前記第二の材料を前記第二のプラズマエッチング処理する際のエッチング速度は、前記第一の材料を前記第二のプラズマエッチング処理する際のエッチング速度より高い、
を含む前記方法。 - 前記第一のナノ構造(11)が、100nm〜200nmの深さを有する、請求項1記載の方法。
- 前記第一のナノ構造(11)が、1.25〜1.4の平均有効屈折率n1を有する、請求項1又は2記載の方法。
- 前記第二の材料から成る層(2)を、200nm〜400nmの層厚で前記第一のナノ構造(11)上に施与する、請求項1から3までのいずれか1項記載の方法。
- 前記第二のナノ構造(12)が、100nm〜200nmの深さを有する、請求項1から4までのいずれか1項記載の方法。
- 前記第二のナノ構造(12)が、1.08〜1.25の平均有効屈折率n2を有する、請求項1から5までのいずれか1項記載の方法。
- 前記第二の材料から成る層(2)を施与する前に、エッチング停止層(3)を前記第一のナノ構造(11)上に施与し、ここで、前記エッチング停止層(3)が30nm以下の厚みを有する、請求項1から6までのいずれか1項記載の方法。
- 前記第二のナノ構造(12)を作り出した後に、保護層(4)を前記第二のナノ構造(12)上に施与し、ここで、前記保護層(4)が30nm以下の厚みを有する、請求項1から7までのいずれか1項記載の方法。
- 前記第一の材料が、前記基材(10)の材料であり、かつ前記基材(10)が、PMMA、ポリカーボネート、シクロオレフィン、ポリアミド又はPTFEを有する、請求項1から8までのいずれか1項記載の方法。
- 前記第一の材料が、前記基材(10)上に施与された第一の有機材料から成る層(1)の材料である、請求項1から8までのいずれか1項記載の方法。
- 前記基材(10)が、湾曲した基材である、請求項1から10までのいずれか1項記載の方法。
- 前記基材(10)が、<1.7の屈折率nsを有する、請求項1から11までのいずれか1項記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013106392.6A DE102013106392B4 (de) | 2013-06-19 | 2013-06-19 | Verfahren zur Herstellung einer Entspiegelungsschicht |
DE102013106392.6 | 2013-06-19 | ||
PCT/EP2014/061379 WO2014202375A1 (de) | 2013-06-19 | 2014-06-02 | Verfahren zur herstellung einer entspiegelungsschicht |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016522452A JP2016522452A (ja) | 2016-07-28 |
JP6415549B2 true JP6415549B2 (ja) | 2018-10-31 |
Family
ID=50884395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016520355A Active JP6415549B2 (ja) | 2013-06-19 | 2014-06-02 | 反射防止層の製造法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9039906B2 (ja) |
EP (1) | EP3011370B1 (ja) |
JP (1) | JP6415549B2 (ja) |
KR (1) | KR20160021263A (ja) |
CN (1) | CN105378509B (ja) |
CA (1) | CA2913677A1 (ja) |
DE (1) | DE102013106392B4 (ja) |
SG (1) | SG11201510178YA (ja) |
WO (1) | WO2014202375A1 (ja) |
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DE102014100769B4 (de) | 2014-01-23 | 2019-07-18 | Carl Zeiss Ag | Verfahren zur Herstellung eines reflexionsmindernden Schichtsystems und reflexionsminderndes Schichtsystem |
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-
2013
- 2013-06-19 DE DE102013106392.6A patent/DE102013106392B4/de not_active Expired - Fee Related
-
2014
- 2014-06-02 CA CA2913677A patent/CA2913677A1/en not_active Abandoned
- 2014-06-02 JP JP2016520355A patent/JP6415549B2/ja active Active
- 2014-06-02 WO PCT/EP2014/061379 patent/WO2014202375A1/de active Application Filing
- 2014-06-02 CN CN201480034915.2A patent/CN105378509B/zh active Active
- 2014-06-02 KR KR1020167001246A patent/KR20160021263A/ko not_active Application Discontinuation
- 2014-06-02 SG SG11201510178YA patent/SG11201510178YA/en unknown
- 2014-06-02 EP EP14727817.0A patent/EP3011370B1/de active Active
- 2014-06-19 US US14/309,582 patent/US9039906B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2016522452A (ja) | 2016-07-28 |
US20140374377A1 (en) | 2014-12-25 |
SG11201510178YA (en) | 2016-01-28 |
CN105378509A (zh) | 2016-03-02 |
DE102013106392A1 (de) | 2014-12-24 |
WO2014202375A1 (de) | 2014-12-24 |
CN105378509B (zh) | 2017-06-20 |
EP3011370B1 (de) | 2017-03-29 |
CA2913677A1 (en) | 2014-12-24 |
EP3011370A1 (de) | 2016-04-27 |
DE102013106392B4 (de) | 2017-06-08 |
KR20160021263A (ko) | 2016-02-24 |
US9039906B2 (en) | 2015-05-26 |
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