JP2016522452A - 反射防止層の製造法 - Google Patents
反射防止層の製造法 Download PDFInfo
- Publication number
- JP2016522452A JP2016522452A JP2016520355A JP2016520355A JP2016522452A JP 2016522452 A JP2016522452 A JP 2016522452A JP 2016520355 A JP2016520355 A JP 2016520355A JP 2016520355 A JP2016520355 A JP 2016520355A JP 2016522452 A JP2016522452 A JP 2016522452A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- nanostructure
- substrate
- refractive index
- plasma etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00865—Applying coatings; tinting; colouring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
- B29C2059/147—Low pressure plasma; Glow discharge plasma
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims (15)
- 基材(10)上に反射防止層を製造する方法であって、以下の方法工程:
− 第一のナノ構造(11)を、第一の材料において第一のプラズマエッチング処理により作り出す工程、ここで、前記第一の材料は、前記基材(10)の材料であるか又は前記基材(10)上に施与された第一の有機材料から成る層(1)の材料である、
− 第二の材料から成る層(2)を前記第一のナノ構造(11)上に施与する工程、ここで、前記第二の材料は有機材料である、及び
− 第二のナノ構造(12)を、前記第二の材料から成る層(2)において第二のプラズマエッチング処理により作り出す工程、ここで、前記第二の材料は、前記第二のプラズマエッチング処理の実施に際して、前記第一の材料より高いエッチング速度を有する、
を含む前記方法。 - 前記第一のナノ構造(11)が、100nm〜200nmの深さを有する、請求項1記載の方法。
- 前記第一のナノ構造(11)によって、前記基板との間隔の増大とともに屈折率が減少するように、屈折率勾配を前記第一の材料において発生させる、請求項1又は2記載の方法。
- 前記第一のナノ構造(11)が、1.25〜1.4の平均有効屈折率n1を有する、請求項1から3までのいずれか1項記載の方法。
- 前記第二の材料から成る層(2)を、200nm〜400nmの層厚で前記第一のナノ構造(11)上に施与する、請求項1から4までのいずれか1項記載の方法。
- 前記第二のナノ構造(12)が、100nm〜200nmの深さを有する、請求項1から5までのいずれか1項記載の方法。
- 前記第二のナノ構造(12)によって、前記基板(10)との間隔の増大とともに屈折率が減少するように、屈折率勾配を前記第二の材料から成る層(2)において発生させる、請求項1から6までのいずれか1項記載の方法。
- 前記第二のナノ構造(12)が、1.08〜1.25の平均有効屈折率n2を有する、請求項1から7までのいずれか1項記載の方法。
- 前記第一のナノ構造(11)及び/又は前記第二のナノ構造(12)が、それぞれ凸部、凹部及び/又は細孔の形の構造要素を有し、前記構造要素の幅が平均して150nm未満である、請求項1から8までのいずれか1項記載の方法。
- 前記第二の材料から成る層(2)を施与する前に、エッチング停止層(3)を前記第一のナノ構造(11)上に施与し、ここで、前記エッチング停止層(3)が30nm以下の厚みを有する、請求項1から9までのいずれか1項記載の方法。
- 前記第二のナノ構造(12)を作り出した後に、保護層(4)を前記第二のナノ構造(12)上に施与し、ここで、前記保護層(4)が30nm以下の厚みを有する、請求項1から10までのいずれか1項記載の方法。
- 前記第一の材料が、前記基材(10)の材料であり、かつ前記基材(10)が、PMMA、ポリカーボネート、シクロオレフィン、ポリアミド又はPTFEを有する、請求項1から11までのいずれか1項記載の方法。
- 前記第一の材料が、前記基材(10)上に施与された第一の有機材料から成る層(1)の材料である、請求項1から11までのいずれか1項記載の方法。
- 前記基材(10)が、湾曲した基材である、請求項1から13までのいずれか1項記載の方法。
- 前記基材(10)が、<1.7の屈折率nsを有する、請求項1から14までのいずれか1項記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013106392.6A DE102013106392B4 (de) | 2013-06-19 | 2013-06-19 | Verfahren zur Herstellung einer Entspiegelungsschicht |
DE102013106392.6 | 2013-06-19 | ||
PCT/EP2014/061379 WO2014202375A1 (de) | 2013-06-19 | 2014-06-02 | Verfahren zur herstellung einer entspiegelungsschicht |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016522452A true JP2016522452A (ja) | 2016-07-28 |
JP6415549B2 JP6415549B2 (ja) | 2018-10-31 |
Family
ID=50884395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016520355A Active JP6415549B2 (ja) | 2013-06-19 | 2014-06-02 | 反射防止層の製造法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9039906B2 (ja) |
EP (1) | EP3011370B1 (ja) |
JP (1) | JP6415549B2 (ja) |
KR (1) | KR20160021263A (ja) |
CN (1) | CN105378509B (ja) |
CA (1) | CA2913677A1 (ja) |
DE (1) | DE102013106392B4 (ja) |
SG (1) | SG11201510178YA (ja) |
WO (1) | WO2014202375A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018146624A (ja) * | 2017-03-01 | 2018-09-20 | Agc株式会社 | 透過型回折素子および反射防止構造 |
JP6611113B1 (ja) * | 2019-06-11 | 2019-11-27 | ナルックス株式会社 | 表面に微細凹凸構造を備えたプラスチック素子の製造方法 |
US10539716B2 (en) | 2015-01-27 | 2020-01-21 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Method for producing a reflection-reducing layer system and reflection-reducing layer system |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL166799A (en) | 2005-02-10 | 2014-09-30 | Lumus Ltd | Aluminum shale surfaces for use in a conductive substrate |
US10073264B2 (en) | 2007-08-03 | 2018-09-11 | Lumus Ltd. | Substrate-guide optical device |
US10048499B2 (en) | 2005-11-08 | 2018-08-14 | Lumus Ltd. | Polarizing optical system |
IL219907A (en) | 2012-05-21 | 2017-08-31 | Lumus Ltd | Integrated head display system with eye tracking |
DE102014100769B4 (de) | 2014-01-23 | 2019-07-18 | Carl Zeiss Ag | Verfahren zur Herstellung eines reflexionsmindernden Schichtsystems und reflexionsminderndes Schichtsystem |
IL232197B (en) | 2014-04-23 | 2018-04-30 | Lumus Ltd | Compact head-up display system |
DE102014105939B4 (de) | 2014-04-28 | 2019-08-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung einer Entspiegelungsschicht auf einer Silikonoberfläche und optisches Element |
IL235642B (en) | 2014-11-11 | 2021-08-31 | Lumus Ltd | A compact head-up display system is protected by an element with a super-thin structure |
IL236490B (en) * | 2014-12-25 | 2021-10-31 | Lumus Ltd | Optical component on a conductive substrate |
DE102015113542B4 (de) | 2015-08-17 | 2018-08-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Ausbilden einer Schicht mit hoher Lichttransmission und/oder niedriger Lichtreflexion |
JP6770576B2 (ja) * | 2015-08-21 | 2020-10-14 | セコ コーポレイション リミテッド | プラズマエッチングを用いた反射防止表面の製造方法 |
CN113835143B (zh) * | 2016-10-07 | 2023-12-05 | Agc株式会社 | 带防眩膜的基体、用于形成防眩膜的液态组合物和带防眩膜的基体的制造方法 |
CN108235739B (zh) | 2016-10-09 | 2021-03-16 | 鲁姆斯有限公司 | 使用矩形波导的孔径倍增器 |
KR102541662B1 (ko) | 2016-11-08 | 2023-06-13 | 루머스 리미티드 | 광학 컷오프 에지를 구비한 도광 장치 및 그 제조 방법 |
CN106738836A (zh) * | 2016-11-16 | 2017-05-31 | 天津津航技术物理研究所 | 一种提高pmma基板透过率的方法 |
DE102016125197B4 (de) * | 2016-12-21 | 2020-07-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung eines reflexionsmindernden Schichtsystems |
US10725209B2 (en) | 2017-01-17 | 2020-07-28 | The Penn State Research Foundation | Broadband and omnidirectional polymer antireflection coatings |
WO2018138714A1 (en) | 2017-01-28 | 2018-08-02 | Lumus Ltd. | Augmented reality imaging system |
KR102655450B1 (ko) | 2017-02-22 | 2024-04-05 | 루머스 리미티드 | 광 가이드 광학 어셈블리 |
CN113341566B (zh) | 2017-03-22 | 2023-12-15 | 鲁姆斯有限公司 | 交叠的反射面构造 |
IL251645B (en) | 2017-04-06 | 2018-08-30 | Lumus Ltd | Waveguide and method of production |
WO2019016813A1 (en) | 2017-07-19 | 2019-01-24 | Lumus Ltd. | LIQUID CRYSTAL LIGHTING ON SILICON VIA OPTICAL ELEMENT GUIDE OF LIGHT |
KR101976564B1 (ko) * | 2017-09-13 | 2019-05-10 | 한국기계연구원 | 이온빔을 이용한 나노 주름 구조가 형성된 폴리머 및 이의 제조방법 |
US10506220B2 (en) | 2018-01-02 | 2019-12-10 | Lumus Ltd. | Augmented reality displays with active alignment and corresponding methods |
US10551544B2 (en) | 2018-01-21 | 2020-02-04 | Lumus Ltd. | Light-guide optical element with multiple-axis internal aperture expansion |
DE102018203213A1 (de) | 2018-03-05 | 2019-09-05 | Robert Bosch Gmbh | Verfahren zum Herstellen zumindest einer eine Nanostruktur aufweisenden Schicht auf zumindest einem Elektronikelement eines Leiterplatten-Nutzens für ein Kamerasystem und Spritzgießvorrichtung mit einer Strukturplatte mit zumindest einer Nanonegativstruktur zum Herstellen einer eine Nanostruktur aufweisenden Schicht |
IL259518B2 (en) | 2018-05-22 | 2023-04-01 | Lumus Ltd | Optical system and method for improving light field uniformity |
KR20210013173A (ko) | 2018-05-23 | 2021-02-03 | 루머스 리미티드 | 부분 반사 내부면이 있는 도광 광학 요소를 포함한 광학 시스템 |
US11415812B2 (en) | 2018-06-26 | 2022-08-16 | Lumus Ltd. | Compact collimating optical device and system |
US11543583B2 (en) | 2018-09-09 | 2023-01-03 | Lumus Ltd. | Optical systems including light-guide optical elements with two-dimensional expansion |
US20200150313A1 (en) * | 2018-11-13 | 2020-05-14 | Quantum Innovations, Inc. | Anti-reflection lens and method for treating a lens to reduce reflections for placental mammals with dichromatic vision |
US11448797B1 (en) * | 2018-11-29 | 2022-09-20 | Quantum Innovations, Inc. | Viewing lens and method for treating lenses to minimize glare and reflections for birds with tetra-chromatic vision |
EP3903138B1 (en) | 2019-01-24 | 2023-03-08 | Lumus Ltd. | Optical systems including loe with three stage expansion |
WO2020183229A1 (en) | 2019-03-12 | 2020-09-17 | Lumus Ltd. | Image projector |
US11353630B2 (en) | 2019-03-18 | 2022-06-07 | Quantum Innovations, Inc. | Method for treating a lens to reduce light reflections for animals and devices that view through the ultra violet light spectrum |
CN110194436A (zh) * | 2019-06-12 | 2019-09-03 | 中国工程物理研究院激光聚变研究中心 | 一种在有机材料表面制备抗反射微纳结构的方法 |
EP3990967A4 (en) | 2019-06-27 | 2022-08-03 | Lumus Ltd. | APPARATUS AND METHODS FOR TRACKING THE EYE BASED ON IMAGING THE EYE THROUGH A LIGHT GUIDE OPTICAL ELEMENT |
BR112021025737A2 (pt) | 2019-07-04 | 2022-02-15 | Lumus Ltd | Sistema óptico e sistema óptico para exibir uma imagem a um olho de um usuário |
JP7396738B2 (ja) | 2019-12-05 | 2023-12-12 | ルーマス リミテッド | 相補的コーティング部分的反射器を用いた導光光学素子および低減された光散乱を有する導光光学素子 |
CN114746797A (zh) | 2019-12-08 | 2022-07-12 | 鲁姆斯有限公司 | 具有紧凑型图像投影仪的光学系统 |
CA3164587A1 (en) | 2019-12-30 | 2021-07-08 | Lumus Ltd. | Optical systems including light-guide optical elements with two-dimensional expansion |
KR102623956B1 (ko) | 2020-05-24 | 2024-01-10 | 루머스 리미티드 | 복합 도광 광학 요소의 제조 방법 |
DE102020118959B4 (de) * | 2020-07-17 | 2023-06-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Reflexionsminderndes Schichtsystem und Verfahren zur Herstellung eines reflexionsmindernden Schichtsystems |
DE202021104723U1 (de) | 2020-09-11 | 2021-10-18 | Lumus Ltd. | An ein optisches Lichtleiterelement gekoppelter Bildprojektor |
JP7490286B2 (ja) | 2021-02-25 | 2024-05-27 | ルーマス リミテッド | 矩形導波路を有する光学アパーチャ増倍器 |
DE102021112288A1 (de) | 2021-05-11 | 2022-11-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Schichtsystem mit Antibeschlag- und Antireflex-Eigenschaften und Verfahren zur Herstellung eines Schichtsystems |
CN117396792A (zh) | 2021-07-04 | 2024-01-12 | 鲁姆斯有限公司 | 具有提供视场的不同部分的堆叠光导元件的显示器 |
KR20240046489A (ko) | 2021-08-23 | 2024-04-09 | 루머스 리미티드 | 내장된 커플링-인 반사기를 갖는 복합 도광 광학 요소의 제조 방법 |
KR20230114096A (ko) * | 2022-01-24 | 2023-08-01 | 삼성전자주식회사 | 메타 광학 소자 및 이를 포함하는 전자 장치 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002261261A (ja) * | 2001-02-28 | 2002-09-13 | Toppan Printing Co Ltd | 撮像素子及びその製造方法 |
US20040125266A1 (en) * | 2002-10-30 | 2004-07-01 | Akihiro Miyauchi | Functioning substrate with a group of columnar micro pillars and its manufacturing method |
US20050233083A1 (en) * | 2002-09-09 | 2005-10-20 | Ulrike Schulz | Method for reducing boundary surface reflection of plastic substrates and substrate modified in such a manner and use thereof |
JP2008062561A (ja) * | 2006-09-08 | 2008-03-21 | Stanley Electric Co Ltd | 親水性積層膜を備えた物品の製造方法、および、親水性積層膜を備えた物品 |
US20090180188A1 (en) * | 2006-03-24 | 2009-07-16 | X-Fab Semiconductor Foundries Ag | Broadband antireflective optical components with curved surfaces and their production |
JP2009198626A (ja) * | 2008-02-20 | 2009-09-03 | Nissan Motor Co Ltd | 反射防止構造及び反射防止成形体 |
US20100033819A1 (en) * | 2007-02-27 | 2010-02-11 | Ulrike Schulz | Optical Element with an Anti-Fog Layer and Method for its Production |
US20110051246A1 (en) * | 2008-04-15 | 2011-03-03 | Ulrike Schulz | Reflection-Reducing Interference Layer System and Method for Producing It |
JP2011169961A (ja) * | 2010-02-16 | 2011-09-01 | Nissan Motor Co Ltd | 親水性反射防止構造及びその製造方法 |
JP2013083871A (ja) * | 2011-10-12 | 2013-05-09 | Tamron Co Ltd | 反射防止膜及び反射防止膜の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007304466A (ja) * | 2006-05-15 | 2007-11-22 | Matsushita Electric Ind Co Ltd | 光吸収性反射防止構造体、それを備えた光学ユニット及びレンズ鏡筒ユニット、並びにそれらを備えた光学装置 |
JP2011505267A (ja) * | 2007-11-08 | 2011-02-24 | エム. セイガー、ブライアン | 改善された反射防止用被覆 |
ITMI20101529A1 (it) * | 2010-08-09 | 2012-02-10 | Consiglio Nazionale Ricerche | Elementi ottici plastici con caratteristiche antiappannanti e metodo per la loro realizzazione |
CN103430055B (zh) * | 2011-03-14 | 2016-10-12 | 3M创新有限公司 | 多层纳米结构化制品 |
DE202011110173U1 (de) * | 2011-07-13 | 2013-03-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Optisches Element mit einer Antireflexionsbeschichtung |
-
2013
- 2013-06-19 DE DE102013106392.6A patent/DE102013106392B4/de not_active Expired - Fee Related
-
2014
- 2014-06-02 SG SG11201510178YA patent/SG11201510178YA/en unknown
- 2014-06-02 EP EP14727817.0A patent/EP3011370B1/de active Active
- 2014-06-02 JP JP2016520355A patent/JP6415549B2/ja active Active
- 2014-06-02 CA CA2913677A patent/CA2913677A1/en not_active Abandoned
- 2014-06-02 WO PCT/EP2014/061379 patent/WO2014202375A1/de active Application Filing
- 2014-06-02 KR KR1020167001246A patent/KR20160021263A/ko not_active Application Discontinuation
- 2014-06-02 CN CN201480034915.2A patent/CN105378509B/zh active Active
- 2014-06-19 US US14/309,582 patent/US9039906B2/en active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002261261A (ja) * | 2001-02-28 | 2002-09-13 | Toppan Printing Co Ltd | 撮像素子及びその製造方法 |
US20050233083A1 (en) * | 2002-09-09 | 2005-10-20 | Ulrike Schulz | Method for reducing boundary surface reflection of plastic substrates and substrate modified in such a manner and use thereof |
US20040125266A1 (en) * | 2002-10-30 | 2004-07-01 | Akihiro Miyauchi | Functioning substrate with a group of columnar micro pillars and its manufacturing method |
JP2009187025A (ja) * | 2002-10-30 | 2009-08-20 | Hitachi Ltd | 柱状微小突起群を備えた機能性基板とその製造方法 |
US20090180188A1 (en) * | 2006-03-24 | 2009-07-16 | X-Fab Semiconductor Foundries Ag | Broadband antireflective optical components with curved surfaces and their production |
JP2008062561A (ja) * | 2006-09-08 | 2008-03-21 | Stanley Electric Co Ltd | 親水性積層膜を備えた物品の製造方法、および、親水性積層膜を備えた物品 |
US20100033819A1 (en) * | 2007-02-27 | 2010-02-11 | Ulrike Schulz | Optical Element with an Anti-Fog Layer and Method for its Production |
JP2009198626A (ja) * | 2008-02-20 | 2009-09-03 | Nissan Motor Co Ltd | 反射防止構造及び反射防止成形体 |
US20110051246A1 (en) * | 2008-04-15 | 2011-03-03 | Ulrike Schulz | Reflection-Reducing Interference Layer System and Method for Producing It |
JP2011169961A (ja) * | 2010-02-16 | 2011-09-01 | Nissan Motor Co Ltd | 親水性反射防止構造及びその製造方法 |
JP2013083871A (ja) * | 2011-10-12 | 2013-05-09 | Tamron Co Ltd | 反射防止膜及び反射防止膜の製造方法 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10539716B2 (en) | 2015-01-27 | 2020-01-21 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Method for producing a reflection-reducing layer system and reflection-reducing layer system |
JP2018146624A (ja) * | 2017-03-01 | 2018-09-20 | Agc株式会社 | 透過型回折素子および反射防止構造 |
JP6611113B1 (ja) * | 2019-06-11 | 2019-11-27 | ナルックス株式会社 | 表面に微細凹凸構造を備えたプラスチック素子の製造方法 |
WO2020250300A1 (ja) * | 2019-06-11 | 2020-12-17 | ナルックス株式会社 | 表面に微細凹凸構造を備えたプラスチック素子の製造方法 |
US11978642B2 (en) | 2019-06-11 | 2024-05-07 | Nalux Co., Ltd. | Method for producing plastic element provided with fine surface roughness |
Also Published As
Publication number | Publication date |
---|---|
DE102013106392B4 (de) | 2017-06-08 |
US9039906B2 (en) | 2015-05-26 |
CA2913677A1 (en) | 2014-12-24 |
EP3011370B1 (de) | 2017-03-29 |
DE102013106392A1 (de) | 2014-12-24 |
US20140374377A1 (en) | 2014-12-25 |
WO2014202375A1 (de) | 2014-12-24 |
CN105378509B (zh) | 2017-06-20 |
KR20160021263A (ko) | 2016-02-24 |
SG11201510178YA (en) | 2016-01-28 |
CN105378509A (zh) | 2016-03-02 |
EP3011370A1 (de) | 2016-04-27 |
JP6415549B2 (ja) | 2018-10-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6415549B2 (ja) | 反射防止層の製造法 | |
US8192639B2 (en) | Reflection-reducing interference layer system and method for producing it | |
US10539716B2 (en) | Method for producing a reflection-reducing layer system and reflection-reducing layer system | |
US10656307B2 (en) | Optical element | |
JP5840448B2 (ja) | 反射防止膜及び反射防止膜の製造方法 | |
US8189261B2 (en) | Optical component and method for manufacturing the same | |
CN111183373B (zh) | 防反射薄膜及其制造方法、以及带防反射层的偏光板 | |
US20130170044A1 (en) | Method and structure of optical thin film using crystallized nano-porous material | |
JP4910619B2 (ja) | メガネレンズの製造方法 | |
JP2010102157A (ja) | 光学物品およびその製造方法 | |
JP2018527631A (ja) | 緩衝層を含む光学コーティング | |
WO2018089580A1 (en) | Coated glass articles and processes for producing the same | |
Song et al. | Antireflective grassy surface on glass substrates with self-masked dry etching | |
JP2013242541A (ja) | 反射低減干渉層システムを作製する方法及び反射低減干渉層システム | |
JP2007078780A (ja) | 光学物品およびその製造方法 | |
CN113253370B (zh) | 一种防眩光的宽角度宽波长减散射膜 | |
IL277055B1 (en) | Anti-reflection optical infrastructures and manufacturing methods | |
US10345494B2 (en) | Methods of reducing surface roughness of reflectance coatings for DUV mirrors | |
KR101360821B1 (ko) | 반사방지 효과와 내지문성을 구비한 투명기판 | |
JP2019070687A5 (ja) | ||
KR102168964B1 (ko) | 눈부심 방지 기능을 갖는 고투명 배리어 필름 및 그 제조방법 | |
CN113946001A (zh) | 减小反射的层系统和用于制造减小反射的层系统的方法 | |
RU2541227C1 (ru) | Способ получения упрочняющего теплоотражающего просветляющего покрытия для прозрачных пластиковых изделий | |
JP6664299B2 (ja) | 反射防止膜およびその製造方法、並びに光学部材 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170111 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170915 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171106 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180129 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180327 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180903 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20181002 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6415549 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |