JP6415057B2 - 露光装置、および物品の製造方法 - Google Patents

露光装置、および物品の製造方法 Download PDF

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JP6415057B2
JP6415057B2 JP2014022778A JP2014022778A JP6415057B2 JP 6415057 B2 JP6415057 B2 JP 6415057B2 JP 2014022778 A JP2014022778 A JP 2014022778A JP 2014022778 A JP2014022778 A JP 2014022778A JP 6415057 B2 JP6415057 B2 JP 6415057B2
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JP2015149450A (ja
JP2015149450A5 (enExample
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瑞真 村上
瑞真 村上
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Canon Inc
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JP2014022778A 2014-02-07 2014-02-07 露光装置、および物品の製造方法 Active JP6415057B2 (ja)

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JP2014022778A JP6415057B2 (ja) 2014-02-07 2014-02-07 露光装置、および物品の製造方法

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JP2014022778A JP6415057B2 (ja) 2014-02-07 2014-02-07 露光装置、および物品の製造方法

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JP2015149450A JP2015149450A (ja) 2015-08-20
JP2015149450A5 JP2015149450A5 (enExample) 2017-03-16
JP6415057B2 true JP6415057B2 (ja) 2018-10-31

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6313795B2 (ja) * 2016-03-03 2018-04-18 キヤノン株式会社 シャッタユニット、リソグラフィ装置、インプリント装置、及び物品の製造方法
CN107290938B (zh) 2016-03-31 2019-05-31 上海微电子装备（集团）股份有限公司 一种用于光刻机曝光的快门装置及其使用方法
JP6929142B2 (ja) * 2017-06-19 2021-09-01 キヤノン株式会社 露光装置、および物品の製造方法
JP6936672B2 (ja) * 2017-09-19 2021-09-22 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法
JP7352332B2 (ja) * 2018-05-14 2023-09-28 キヤノン株式会社 露光装置
JP7699031B2 (ja) * 2021-10-15 2025-06-26 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61278134A (ja) * 1985-06-03 1986-12-09 Hitachi Ltd シヤツタ制御装置
JPS6231834A (ja) * 1985-08-02 1987-02-10 Hitachi Ltd シヤツタ−制御装置
JPS62133718A (ja) * 1985-12-06 1987-06-16 Toshiba Corp 露光制御方法
JPH04361522A (ja) * 1991-06-10 1992-12-15 Hitachi Ltd シャッタ制御装置
JPH0555106A (ja) * 1991-08-28 1993-03-05 Canon Inc 露光量制御装置
JP4346320B2 (ja) * 2003-02-05 2009-10-21 大日本印刷株式会社 露光方法及び露光装置

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