JP2015149450A5 - - Google Patents
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- JP2015149450A5 JP2015149450A5 JP2014022778A JP2014022778A JP2015149450A5 JP 2015149450 A5 JP2015149450 A5 JP 2015149450A5 JP 2014022778 A JP2014022778 A JP 2014022778A JP 2014022778 A JP2014022778 A JP 2014022778A JP 2015149450 A5 JP2015149450 A5 JP 2015149450A5
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- 230000000903 blocking effect Effects 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 21
- 230000003287 optical effect Effects 0.000 claims description 15
- 238000001514 detection method Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014022778A JP6415057B2 (ja) | 2014-02-07 | 2014-02-07 | 露光装置、および物品の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014022778A JP6415057B2 (ja) | 2014-02-07 | 2014-02-07 | 露光装置、および物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015149450A JP2015149450A (ja) | 2015-08-20 |
| JP2015149450A5 true JP2015149450A5 (enExample) | 2017-03-16 |
| JP6415057B2 JP6415057B2 (ja) | 2018-10-31 |
Family
ID=53892577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014022778A Active JP6415057B2 (ja) | 2014-02-07 | 2014-02-07 | 露光装置、および物品の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6415057B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6313795B2 (ja) * | 2016-03-03 | 2018-04-18 | キヤノン株式会社 | シャッタユニット、リソグラフィ装置、インプリント装置、及び物品の製造方法 |
| CN107290938B (zh) | 2016-03-31 | 2019-05-31 | 上海微电子装备(集团)股份有限公司 | 一种用于光刻机曝光的快门装置及其使用方法 |
| JP6929142B2 (ja) * | 2017-06-19 | 2021-09-01 | キヤノン株式会社 | 露光装置、および物品の製造方法 |
| JP6936672B2 (ja) * | 2017-09-19 | 2021-09-22 | キヤノン株式会社 | インプリント装置、インプリント方法および物品製造方法 |
| JP7352332B2 (ja) * | 2018-05-14 | 2023-09-28 | キヤノン株式会社 | 露光装置 |
| JP7699031B2 (ja) * | 2021-10-15 | 2025-06-26 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61278134A (ja) * | 1985-06-03 | 1986-12-09 | Hitachi Ltd | シヤツタ制御装置 |
| JPS6231834A (ja) * | 1985-08-02 | 1987-02-10 | Hitachi Ltd | シヤツタ−制御装置 |
| JPS62133718A (ja) * | 1985-12-06 | 1987-06-16 | Toshiba Corp | 露光制御方法 |
| JPH04361522A (ja) * | 1991-06-10 | 1992-12-15 | Hitachi Ltd | シャッタ制御装置 |
| JPH0555106A (ja) * | 1991-08-28 | 1993-03-05 | Canon Inc | 露光量制御装置 |
| JP4346320B2 (ja) * | 2003-02-05 | 2009-10-21 | 大日本印刷株式会社 | 露光方法及び露光装置 |
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2014
- 2014-02-07 JP JP2014022778A patent/JP6415057B2/ja active Active
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