JP6411211B2 - 線形主延在方向を備えたアノード - Google Patents
線形主延在方向を備えたアノード Download PDFInfo
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- JP6411211B2 JP6411211B2 JP2014523141A JP2014523141A JP6411211B2 JP 6411211 B2 JP6411211 B2 JP 6411211B2 JP 2014523141 A JP2014523141 A JP 2014523141A JP 2014523141 A JP2014523141 A JP 2014523141A JP 6411211 B2 JP6411211 B2 JP 6411211B2
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- anode
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- film
- track film
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- 238000001816 cooling Methods 0.000 claims description 71
- 239000000463 material Substances 0.000 claims description 68
- 239000003990 capacitor Substances 0.000 claims description 37
- 239000012528 membrane Substances 0.000 claims description 35
- 238000004519 manufacturing process Methods 0.000 claims description 32
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 17
- 229910052721 tungsten Inorganic materials 0.000 claims description 16
- 239000010937 tungsten Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 15
- 239000011159 matrix material Substances 0.000 claims description 14
- 239000003870 refractory metal Substances 0.000 claims description 11
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 10
- 239000012809 cooling fluid Substances 0.000 claims description 10
- 229910052750 molybdenum Inorganic materials 0.000 claims description 9
- 239000011733 molybdenum Substances 0.000 claims description 9
- 230000001154 acute effect Effects 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 5
- 229910001182 Mo alloy Inorganic materials 0.000 claims 1
- 229910001080 W alloy Inorganic materials 0.000 claims 1
- 150000002751 molybdenum Chemical class 0.000 claims 1
- 230000008901 benefit Effects 0.000 description 12
- 238000005219 brazing Methods 0.000 description 8
- 230000035882 stress Effects 0.000 description 8
- 239000000956 alloy Substances 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000005452 bending Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000005520 cutting process Methods 0.000 description 4
- 238000003801 milling Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000002041 carbon nanotube Substances 0.000 description 2
- 229910021393 carbon nanotube Inorganic materials 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
- H01J35/105—Cooling of rotating anodes, e.g. heat emitting layers or structures
- H01J35/106—Active cooling, e.g. fluid flow, heat pipes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/12—Cooling non-rotary anodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/06—Cathode assembly
- H01J2235/068—Multi-cathode assembly
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/081—Target material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/083—Bonding or fixing with the support or substrate
- H01J2235/084—Target-substrate interlayers or structures, e.g. to control or prevent diffusion or improve adhesion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/086—Target geometry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/12—Cooling non-rotary anodes
- H01J35/13—Active cooling, e.g. fluid flow, heat pipes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- X-Ray Techniques (AREA)
Description
・タングステン
・モリブデン
・タングステン50重量%以上のタングステン基合金
・モリブデン50重量%以上のモリブデン基合金
・タングステン50重量%以上のタングステン基複合体
・モリブデン50重量%以上のモリブデン基複合体
の1つから成るとさらに有利である。
・アノード体に冷却路を形成するステップと、
・アノード体の焦点軌道膜容量部の側面に高融点金属から成る少なくとも1つの基本マトリックスを有する材料から成り冷却路まで達する焦点軌道膜を設置するステップと、
・焦点軌道膜容量部に少なくとも焦点軌道膜を材料結合的に接続するステップと、
を有するX線装置用の線形主延在方向を備えたアノードの製造方法である。
20 アノード体
20a アノード体の第1部分
20b アノード体の第2部分
22 焦点軌道膜容量部
30 焦点軌道膜
40 冷却路
50 中間層
60 端子
Claims (9)
- アノード体(20)と焦点軌道膜(30)を有し、前記焦点軌道膜が前記アノード体(20)の焦点軌道膜容量部(22)において材料結合的に前記アノード体(20)に接続されているX線装置用の線形主延在方向を有するアノード(10)において、
前記アノード体(20)の内部に前記アノード体(20)および前記焦点軌道膜(30)の冷却用の少なくとも1つの冷却路(40)が配置され、少なくとも前記焦点軌道膜容量部(22)が高融点金属から成る少なくとも1つの基本マトリックスを備えるとともに前記焦点軌道膜(30)の材料の熱膨張係数との差が5×10 −6 1/K以下の熱膨張係数を有する材料から成り、前記焦点軌道膜容量部(22)が前記冷却路(40)に達しており、
前記焦点軌道膜(30)が、前記焦点軌道膜(30)の幅の5倍以上の長さを有し、
前記アノード体(20)が、モノリシックに形成されることを特徴とするX線装置用アノード(10)。 - 前記焦点軌道膜(30)および前記焦点軌道膜容量部(22)が、同じ材料から成ることを特徴とする請求項1記載のアノード(10)。
- 前記冷却路(40)が、前記アノード体(20)内に真空密に形成されることを特徴とする請求項1または2記載のアノード(10)。
- 前記アノード体(20)が、少なくとも前記焦点軌道膜容量部(22)の範囲で鋭角な側面を有し、この側面に前記焦点軌道膜(30)が少なくとも部分的に配置されることを特徴とする請求項1から3の1つに記載のアノード(10)。
- 前記焦点軌道膜容量部(22)が、以下の材料、すなわち
・タングステン、
・モリブデン、
・タングステン50重量%以上のタングステン合金、
・モリブデン50重量%以上のモリブデン合金、
・タングステン50重量%以上のタングステン複合材、
・モリブデン50重量%以上のモリブデン複合材、
の1つから成ることを特徴とする請求項1から4の1つに記載のアノード(10)。 - 前記焦点軌道膜(30)と前記焦点軌道膜容量部(22)との間の材料結合的接続を作るために、最大で1つの中間層(50)が配置されることを特徴とする請求項1から5の1つに記載のアノード(10)。
- 前記冷却路(40)の少なくとも1つの壁部分が、前記焦点軌道膜(30)と平行にされることを特徴とする請求項1から6の1つに記載のアノード(10)。
- 前記冷却路(40)が、冷却流体を直接案内するように形成されることを特徴とする請求項1から7の1つに記載のアノード(10)。
- ・モノリシックに形成されたアノード体(20)内に冷却路(40)を形成するステップと、
・前記アノード体(20)の焦点軌道膜容量部(22)の側面に焦点軌道膜(30)を設置するステップであって、前記焦点軌道膜容量部(22)が、高融点金属から成る少なくとも1つの基本マトリックスを有するとともに前記冷却路(40)の長さだけ延在しており、前記焦点軌道膜(30)が、前記焦点軌道膜(30)の幅の5倍以上の長さを有し、前記焦点軌道膜(30)の材料が、前記焦点軌道膜容量部(22)の材料の熱膨張係数との差が5×10 −6 1/K以下の熱膨張係数を有するステップと、
・少なくとも前記焦点軌道膜(30)を前記焦点軌道膜容量部(22)に材料結合的に接続するステップと、
を有するX線装置用の線形主延在方向を備えたアノード(10)の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ATGM446/2011 | 2011-08-05 | ||
ATGM446/2011U AT12862U1 (de) | 2011-08-05 | 2011-08-05 | Anode mit linearer haupterstreckungsrichtung |
PCT/AT2012/000204 WO2013020151A1 (de) | 2011-08-05 | 2012-08-02 | Anode mit linearer haupterstreckungsrichtung |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014524635A JP2014524635A (ja) | 2014-09-22 |
JP2014524635A5 JP2014524635A5 (ja) | 2015-07-16 |
JP6411211B2 true JP6411211B2 (ja) | 2018-10-24 |
Family
ID=47667381
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014523141A Active JP6411211B2 (ja) | 2011-08-05 | 2012-08-02 | 線形主延在方向を備えたアノード |
Country Status (7)
Country | Link |
---|---|
US (1) | US9564284B2 (ja) |
EP (1) | EP2740142B1 (ja) |
JP (1) | JP6411211B2 (ja) |
KR (1) | KR101919179B1 (ja) |
CN (1) | CN103733297B (ja) |
AT (1) | AT12862U1 (ja) |
WO (1) | WO2013020151A1 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
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US20150117599A1 (en) | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
US9992917B2 (en) | 2014-03-10 | 2018-06-05 | Vulcan GMS | 3-D printing method for producing tungsten-based shielding parts |
US10401309B2 (en) | 2014-05-15 | 2019-09-03 | Sigray, Inc. | X-ray techniques using structured illumination |
AT14991U1 (de) | 2015-05-08 | 2016-10-15 | Plansee Se | Röntgenanode |
US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
WO2018175570A1 (en) | 2017-03-22 | 2018-09-27 | Sigray, Inc. | Method of performing x-ray spectroscopy and x-ray absorption spectrometer system |
CN107481912B (zh) | 2017-09-18 | 2019-06-11 | 同方威视技术股份有限公司 | 阳极靶、射线光源、计算机断层扫描设备及成像方法 |
US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
US10845491B2 (en) | 2018-06-04 | 2020-11-24 | Sigray, Inc. | Energy-resolving x-ray detection system |
GB2591630B (en) | 2018-07-26 | 2023-05-24 | Sigray Inc | High brightness x-ray reflection source |
US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
CN112638261A (zh) | 2018-09-04 | 2021-04-09 | 斯格瑞公司 | 利用滤波的x射线荧光的系统和方法 |
US11056308B2 (en) | 2018-09-07 | 2021-07-06 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
WO2021011209A1 (en) | 2019-07-15 | 2021-01-21 | Sigray, Inc. | X-ray source with rotating anode at atmospheric pressure |
US11749489B2 (en) | 2020-12-31 | 2023-09-05 | Varex Imaging Corporation | Anodes, cooling systems, and x-ray sources including the same |
FR3132379A1 (fr) * | 2022-02-01 | 2023-08-04 | Thales | Procédé de fabrication d'une anode pour une source à rayons x de type cathode froide |
Family Cites Families (17)
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DE2811464A1 (de) * | 1977-03-17 | 1978-09-21 | Jacob Haimson | Verfahren und vorrichtung zum erzeugen von roentgenstrahlen aus verschiedenen richtungen ohne sich bewegende teile |
NL7706038A (nl) * | 1977-06-02 | 1978-12-05 | Philips Nv | Aftastende roentgenonderzoekinrichting. |
US4521903A (en) * | 1983-03-09 | 1985-06-04 | Micronix Partners | High power x-ray source with improved anode cooling |
JPS59162770U (ja) * | 1983-04-15 | 1984-10-31 | 三洋電機株式会社 | X線管球 |
FR2566960B1 (fr) * | 1984-06-29 | 1986-11-14 | Thomson Cgr | Tube a rayons x a anode tournante et procede de fixation d'une anode tournante sur un axe support |
DE19828956A1 (de) * | 1998-06-29 | 1999-10-21 | Siemens Ag | Direktgekühlte Anoden für Röntgenröhren mit isothermisch angeordneten Kühlflächen |
US6553096B1 (en) * | 2000-10-06 | 2003-04-22 | The University Of North Carolina Chapel Hill | X-ray generating mechanism using electron field emission cathode |
JP2002329470A (ja) * | 2001-05-01 | 2002-11-15 | Allied Material Corp | X線管用回転陽極及びその製造方法 |
JP2003290208A (ja) * | 2002-04-04 | 2003-10-14 | Mitsubishi Heavy Ind Ltd | 多線源型x線ct装置 |
US8094784B2 (en) * | 2003-04-25 | 2012-01-10 | Rapiscan Systems, Inc. | X-ray sources |
US8204173B2 (en) | 2003-04-25 | 2012-06-19 | Rapiscan Systems, Inc. | System and method for image reconstruction by using multi-sheet surface rebinning |
GB0309374D0 (en) * | 2003-04-25 | 2003-06-04 | Cxr Ltd | X-ray sources |
GB0812864D0 (en) * | 2008-07-15 | 2008-08-20 | Cxr Ltd | Coolign anode |
JP2005310433A (ja) * | 2004-04-19 | 2005-11-04 | Hitachi Zosen Corp | X線発生装置におけるターゲットの放熱機構 |
PT2501437T (pt) * | 2008-05-16 | 2016-07-13 | Advanced Fusion Systems Llc | Irradiador de impulsos de raios x |
US8576988B2 (en) * | 2009-09-15 | 2013-11-05 | Koninklijke Philips N.V. | Distributed X-ray source and X-ray imaging system comprising the same |
JP5322888B2 (ja) * | 2009-10-30 | 2013-10-23 | 株式会社東芝 | X線管 |
-
2011
- 2011-08-05 AT ATGM446/2011U patent/AT12862U1/de not_active IP Right Cessation
-
2012
- 2012-08-02 JP JP2014523141A patent/JP6411211B2/ja active Active
- 2012-08-02 KR KR1020147002804A patent/KR101919179B1/ko active IP Right Grant
- 2012-08-02 CN CN201280038560.5A patent/CN103733297B/zh active Active
- 2012-08-02 EP EP12775119.6A patent/EP2740142B1/de active Active
- 2012-08-02 WO PCT/AT2012/000204 patent/WO2013020151A1/de active Application Filing
- 2012-08-02 US US14/237,254 patent/US9564284B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
WO2013020151A1 (de) | 2013-02-14 |
KR20140088071A (ko) | 2014-07-09 |
US9564284B2 (en) | 2017-02-07 |
EP2740142B1 (de) | 2022-03-30 |
EP2740142A1 (de) | 2014-06-11 |
CN103733297A (zh) | 2014-04-16 |
US20140211924A1 (en) | 2014-07-31 |
CN103733297B (zh) | 2016-12-28 |
KR101919179B1 (ko) | 2018-11-15 |
JP2014524635A (ja) | 2014-09-22 |
AT12862U1 (de) | 2013-01-15 |
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