JP6397884B2 - レーザ生成プラズマ極端紫外線光源のターゲット - Google Patents

レーザ生成プラズマ極端紫外線光源のターゲット Download PDF

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Publication number
JP6397884B2
JP6397884B2 JP2016500295A JP2016500295A JP6397884B2 JP 6397884 B2 JP6397884 B2 JP 6397884B2 JP 2016500295 A JP2016500295 A JP 2016500295A JP 2016500295 A JP2016500295 A JP 2016500295A JP 6397884 B2 JP6397884 B2 JP 6397884B2
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Prior art keywords
pulse
target
target material
radiation
light beam
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Japanese (ja)
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JP2016512382A5 (enExample
JP2016512382A (ja
Inventor
ジェイ ラファック，ロバート
ジェイ ラファック，ロバート
タオ，イエジョン
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ASML Netherlands BV
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ASML Netherlands BV
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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0088—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam for preconditioning the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/0035—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state the material containing metals as principal radiation-generating components

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
  • Lasers (AREA)
JP2016500295A 2013-03-14 2014-02-18 レーザ生成プラズマ極端紫外線光源のターゲット Active JP6397884B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/830,461 2013-03-14
US13/830,461 US8872143B2 (en) 2013-03-14 2013-03-14 Target for laser produced plasma extreme ultraviolet light source
PCT/US2014/016967 WO2014143504A1 (en) 2013-03-14 2014-02-18 Target for laser produced plasma extreme ultraviolet light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018119462A Division JP6563563B2 (ja) 2013-03-14 2018-06-25 レーザ生成プラズマ極端紫外線光源のターゲット

Publications (3)

Publication Number Publication Date
JP2016512382A JP2016512382A (ja) 2016-04-25
JP2016512382A5 JP2016512382A5 (enExample) 2017-03-09
JP6397884B2 true JP6397884B2 (ja) 2018-09-26

Family

ID=50072135

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2016500295A Active JP6397884B2 (ja) 2013-03-14 2014-02-18 レーザ生成プラズマ極端紫外線光源のターゲット
JP2018119462A Active JP6563563B2 (ja) 2013-03-14 2018-06-25 レーザ生成プラズマ極端紫外線光源のターゲット
JP2019136363A Active JP6799645B2 (ja) 2013-03-14 2019-07-24 レーザ生成プラズマ極端紫外線光源のターゲット

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2018119462A Active JP6563563B2 (ja) 2013-03-14 2018-06-25 レーザ生成プラズマ極端紫外線光源のターゲット
JP2019136363A Active JP6799645B2 (ja) 2013-03-14 2019-07-24 レーザ生成プラズマ極端紫外線光源のターゲット

Country Status (5)

Country Link
US (4) US8872143B2 (enExample)
JP (3) JP6397884B2 (enExample)
KR (2) KR102292882B1 (enExample)
TW (2) TWI690243B (enExample)
WO (1) WO2014143504A1 (enExample)

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JP2018146988A (ja) * 2013-03-14 2018-09-20 エーエスエムエル ネザーランズ ビー．ブイ． レーザ生成プラズマ極端紫外線光源のターゲット

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WO2014120985A1 (en) * 2013-01-30 2014-08-07 Kla-Tencor Corporation Euv light source using cryogenic droplet targets in mask inspection
US8791440B1 (en) * 2013-03-14 2014-07-29 Asml Netherlands B.V. Target for extreme ultraviolet light source
US9338870B2 (en) 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
US9357625B2 (en) 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
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US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
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US9426872B1 (en) * 2015-08-12 2016-08-23 Asml Netherlands B.V. System and method for controlling source laser firing in an LPP EUV light source
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US10959318B2 (en) * 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
US10925142B2 (en) * 2018-07-31 2021-02-16 Taiwan Semiconductor Manufacturing Co., Ltd. EUV radiation source for lithography exposure process
US11153959B2 (en) * 2018-08-17 2021-10-19 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
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TWI861161B (zh) * 2019-08-15 2024-11-11 荷蘭商Ａｓｍｌ荷蘭公司 用於產生極紫外線輻射之裝置及方法
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JP7434096B2 (ja) 2020-07-30 2024-02-20 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
KR20220030350A (ko) 2020-08-27 2022-03-11 삼성전자주식회사 광원 및 이를 이용한 극자외선 광원 시스템
KR20220030382A (ko) 2020-08-28 2022-03-11 삼성전자주식회사 극자외선 노광 방법 및 이를 이용한 반도체 제조 방법

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018146988A (ja) * 2013-03-14 2018-09-20 エーエスエムエル ネザーランズ ビー．ブイ． レーザ生成プラズマ極端紫外線光源のターゲット
JP2019207423A (ja) * 2013-03-14 2019-12-05 エーエスエムエル ネザーランズ ビー．ブイ． レーザ生成プラズマ極端紫外線光源のターゲット

Also Published As

Publication number Publication date
JP6563563B2 (ja) 2019-08-21
JP2016512382A (ja) 2016-04-25
US20140264087A1 (en) 2014-09-18
US20150342016A1 (en) 2015-11-26
US8927952B2 (en) 2015-01-06
KR20200105546A (ko) 2020-09-07
KR102151765B1 (ko) 2020-09-04
KR20150131084A (ko) 2015-11-24
US20140264090A1 (en) 2014-09-18
US9107279B2 (en) 2015-08-11
JP2018146988A (ja) 2018-09-20
TW201444417A (zh) 2014-11-16
US8872143B2 (en) 2014-10-28
US9232624B2 (en) 2016-01-05
TWI636709B (zh) 2018-09-21
WO2014143504A1 (en) 2014-09-18
JP2019207423A (ja) 2019-12-05
TW201838483A (zh) 2018-10-16
KR102292882B1 (ko) 2021-08-24
TWI690243B (zh) 2020-04-01
JP6799645B2 (ja) 2020-12-16
US20150189729A1 (en) 2015-07-02

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