JP6375387B2 - 真空処理システム、及び処理システムを取り付けるための方法 - Google Patents

真空処理システム、及び処理システムを取り付けるための方法 Download PDF

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Publication number
JP6375387B2
JP6375387B2 JP2016559546A JP2016559546A JP6375387B2 JP 6375387 B2 JP6375387 B2 JP 6375387B2 JP 2016559546 A JP2016559546 A JP 2016559546A JP 2016559546 A JP2016559546 A JP 2016559546A JP 6375387 B2 JP6375387 B2 JP 6375387B2
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Japan
Prior art keywords
chamber
processing
substrate
roll
processing system
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JP2016559546A
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English (en)
Japanese (ja)
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JP2017509797A5 (https=
JP2017509797A (ja
Inventor
フロリアン リース，
フロリアン リース，
シュテファン ハイン，
シュテファン ハイン，
ユルゲン ヘンリッヒ，
ユルゲン ヘンリッヒ，
アンドレアス ザウアー，
アンドレアス ザウアー，
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Applied Materials Inc
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Applied Materials Inc
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2016559546A 2014-04-02 2014-04-02 真空処理システム、及び処理システムを取り付けるための方法 Active JP6375387B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/056605 WO2015149849A1 (en) 2014-04-02 2014-04-02 Vacuum processing system and method for mounting a processing system

Publications (3)

Publication Number Publication Date
JP2017509797A JP2017509797A (ja) 2017-04-06
JP2017509797A5 JP2017509797A5 (https=) 2017-05-25
JP6375387B2 true JP6375387B2 (ja) 2018-08-15

Family

ID=50440648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016559546A Active JP6375387B2 (ja) 2014-04-02 2014-04-02 真空処理システム、及び処理システムを取り付けるための方法

Country Status (7)

Country Link
US (1) US10648072B2 (https=)
EP (1) EP3126541A1 (https=)
JP (1) JP6375387B2 (https=)
KR (1) KR102196407B1 (https=)
CN (1) CN106164330B (https=)
TW (1) TWI727921B (https=)
WO (1) WO2015149849A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6803917B2 (ja) * 2016-02-12 2020-12-23 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 真空処理システム及び真空処理を行う方法
US10304716B1 (en) * 2017-12-20 2019-05-28 Powertech Technology Inc. Package structure and manufacturing method thereof
JP6791389B2 (ja) * 2018-03-30 2020-11-25 Ｊｆｅスチール株式会社 方向性電磁鋼板の製造方法および連続成膜装置
US20220186360A1 (en) * 2019-03-05 2022-06-16 Xefco Pty Ltd Improved vapour deposition system, method and moisture control device
JP7554777B2 (ja) * 2020-01-06 2024-09-20 日本スピンドル製造株式会社 塗工装置、仕切部材及び塗工方法
WO2021185444A1 (en) * 2020-03-18 2021-09-23 Applied Materials, Inc. Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system
KR102896631B1 (ko) * 2020-06-04 2025-12-04 엘리베이티드 머티어리얼스 저머니 게엠베하 진공 챔버에서 기판을 코팅하기 위한 기상 증착 장치 및 방법
WO2022040075A1 (en) * 2020-08-21 2022-02-24 Applied Materials, Inc. Processing system for processing a flexible substrate and method of measuring at least one of a property of a flexible substrate and a property of one or more coatings on the flexible substrate
WO2022225731A1 (en) * 2021-04-21 2022-10-27 Applied Materials, Inc. Material deposition apparatus, method of depositing material on a substrate, and material deposition system
EP4490737A1 (en) * 2022-03-08 2025-01-15 10X Genomics, Inc. In situ code design methods for minimizing optical crowding

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0466999A1 (en) * 1990-07-18 1992-01-22 Engineering Films-Establishment Process and apparatus for the surfacing of tape substrates of reels
JP3332700B2 (ja) * 1995-12-22 2002-10-07 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
US20040089237A1 (en) * 2002-07-17 2004-05-13 Pruett James Gary Continuous chemical vapor deposition process and process furnace
JP4591080B2 (ja) 2004-12-27 2010-12-01 富士電機システムズ株式会社 薄膜形成装置
US7799182B2 (en) * 2006-12-01 2010-09-21 Applied Materials, Inc. Electroplating on roll-to-roll flexible solar cell substrates
EP1988186A1 (en) * 2007-04-24 2008-11-05 Galileo Vacuum Systems S.p.A. Multichamber vacuum deposition system
EP2257986A4 (en) * 2008-03-04 2012-06-13 Solexant Corp PROCESS FOR THE MANUFACTURE OF SOLAR CELLS
US8117987B2 (en) * 2009-09-18 2012-02-21 Applied Materials, Inc. Hot wire chemical vapor deposition (CVD) inline coating tool
US9303316B1 (en) * 2010-01-15 2016-04-05 Apollo Precision Kunming Yuanhong Limited Continuous web apparatus and method using an air to vacuum seal and accumulator
JP2012136724A (ja) 2010-12-24 2012-07-19 Kobe Steel Ltd 巻取り式連続成膜装置
JP2013196848A (ja) * 2012-03-16 2013-09-30 Nitto Denko Corp 有機ｅｌ素子の製造方法及び製造装置

Also Published As

Publication number Publication date
CN106164330B (zh) 2021-01-26
JP2017509797A (ja) 2017-04-06
KR102196407B1 (ko) 2020-12-29
KR20160142363A (ko) 2016-12-12
WO2015149849A1 (en) 2015-10-08
CN106164330A (zh) 2016-11-23
TW201606110A (zh) 2016-02-16
US10648072B2 (en) 2020-05-12
TWI727921B (zh) 2021-05-21
US20170152593A1 (en) 2017-06-01
EP3126541A1 (en) 2017-02-08

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