JP6373035B2 - ガス処理装置 - Google Patents
ガス処理装置 Download PDFInfo
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- JP6373035B2 JP6373035B2 JP2014073931A JP2014073931A JP6373035B2 JP 6373035 B2 JP6373035 B2 JP 6373035B2 JP 2014073931 A JP2014073931 A JP 2014073931A JP 2014073931 A JP2014073931 A JP 2014073931A JP 6373035 B2 JP6373035 B2 JP 6373035B2
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- Prior art keywords
- gas
- electrode
- catalyst
- electrodes
- processing apparatus
- Prior art date
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- Exhaust Gas Treatment By Means Of Catalyst (AREA)
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Description
前記電極間に導入される処理対象のガスが流れる、前記電極間に形成される蛇行した蛇行流路と、
前記蛇行流路に配置される処理対象のガスの分解反応を促進する触媒が固定された触媒体と、を備えることを特徴とするガス処理装置である。
図1は、本実施形態のガス処理装置10の断面を模式的に表した図である。ガス処理装置10は、処理対象ガスを含むガスが供給される流路内に配置される。そして、ガス処理装置10は、図1において、ガス処理装置10に対して矢印A方向に供給される処理対象ガスを含むガスを、ガス処理装置10において発生させるプラズマと、触媒体4の機能によって処理する装置である。
次に、第2実施形態を説明する。図2は、本実施形態におけるガス処理装置10の断面の一部を模式的に表した図である。なお、以下の説明において第1の実施形態と共通する構成については、同じ符号を付して説明を省略する。
次に、第3実施形態を説明する。図3は、本実施形態のガス処理装置の10の断面の一部を模式的に表した図である。なお、以下の説明において第1の実施形態と共通する構成については、同じ符号を付して説明を省略する。
本実施形態は、触媒体4であるフィルタとガス誘導板7を交互に複数枚重ねることで、蛇行流路を形成するものである。図4は本実施形態のガス処理装置10の構成を示す分解斜視図である。
無機微粒子として、市販のジルコニア微粒子(日本電工株式会社製、PCS)を溶媒であるメタノールに対して10.0質量%加えて、塩酸を用いてpHを3.0に調整した。調整後ビーズミルにより平均粒子径20nmに粉砕分散し、ジルコニア微粒子分散液を作製した。
平行平板電極間に下方から順次に触媒体である金微粒子を担持したアルミナ織物、ガス誘導板、金微粒子を担持したアルミナ織物、ガス誘導板、と交互に図4のように多段に積層したものを挿入した。金微粒子を担持したアルミナ織物(触媒体)は2段目、4段目、6段目、8段目、10段目とした。ガスの経路は入口の1段目から入り、出口の11段目から排出される。実施例1では重ねるガス誘導板7の開口部70の数を、図4と同じく3つとした。つまり、電極の対向方向に延びる隔壁を2つ配置した場合と同様の構造とした。この場合、電極間に導入されたガスは、1段目から入って上方向、下方向、上方向と蛇行して11段目から排出される。
開口部70を4つ有するガス誘導板7を用いて蛇行流路を構成した。つまり、電極対向方向に延びる隔壁を3つ配置した場合と同様の構造とした。それ以外は、実施例1と同様にして分解反応を行った。
開口部70を5つ有するガス誘導板7を用いて蛇行流路を構成した。つまり、電極対向方向に延びる隔壁を4つ配置した場合と同様の構造とした。それ以外は、実施例1と同様にして分解反応を行った。
金微粒子を担持したアルミナ織物のみを実施例と同数になるように1段目から5段目まで積層し、さらにガスを通すための6段目にスペーサ12を図5のように1段分積層して、ガスの経路が6段目に形成される導入口から導入され、6段目の排出口から排出される構成とした。ガス流れ方向に垂直に配列する隔壁はなく、矢印で示すような蛇行しない流路とした。流量は実施例と同様に250L/minにして分解反応を行った。
2:接地電極
3:誘電体
4:触媒体
5:隔壁
6:電源
7:ガス誘導板
70:開口部
71:導入口用誘導板
72:排出口用誘導板
74:連結用開口部
8:側壁部
10:ガス処理装置
Claims (5)
- 第1の電極板と、前記第1の電極板に対向する第2の電極板と、両電極板の互いに対向する対向面をそれぞれ覆う誘電体と、を備える電極間にプラズマを発生させるプラズマ発生部と、
前記電極間に導入される処理対象のガスが流れる、前記電極間に形成される蛇行した蛇行流路と、
前記蛇行流路に配置される処理対象のガスの分解反応を促進する触媒が固定された触媒体と、を備え、
前記電極間に、複数の開口部が並んで形成されるガス誘導板と、前記開口部を塞ぐように配置される、前記触媒体である通気性を有するフィルタシートと、が交互に重ねられ、重なった複数の前記ガス誘導板の前記両電極板の対向方向に重なる開口部によって前記両電極板の対向方向に沿った流路が複数形成され、隣り合う前記流路が互いに連結されて前記蛇行流路を構成することを特徴とするガス処理装置。 - 前記フィルタシートの形態が、繊維構造体、ハニカム構造体、多孔質構造体であることを特徴とする請求項1に記載のガス処理装置。
- 重なった前記ガス誘導板のうち、前記第1の電極板を覆う前記誘電体に接する前記ガス誘導板と、前記第2の電極板を覆う前記誘電体に接するガス誘導板と、が、前記隣り合う流路を連結する連結用開口部を有することを特徴とする請求項1に記載のガス処理装置。
- 前記第1の電極板を覆う前記誘電体に接する前記ガス誘導板と、前記第2の電極板を覆う前記誘電体に接するガス誘導板のいずれかが前記電極間にガスを取り込む導入口を形成し、前記第1の電極板を覆う前記誘電体に接する前記ガス誘導板と、前記第2の電極板を覆う前記誘電体に接するガス誘導板のいずれかが前記電極間からガスを排出する排出口を形成することを特徴とする請求項3に記載のガス処理装置。
- 前記第1の電極板と前記第2の電極板の距離が、1mm以上10mm以下であることを
特徴とする請求項1から4のいずれか一つに記載のガス処理装置。
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