JP6363215B2 - パターン形成体の製造方法 - Google Patents

パターン形成体の製造方法 Download PDF

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Publication number
JP6363215B2
JP6363215B2 JP2016550336A JP2016550336A JP6363215B2 JP 6363215 B2 JP6363215 B2 JP 6363215B2 JP 2016550336 A JP2016550336 A JP 2016550336A JP 2016550336 A JP2016550336 A JP 2016550336A JP 6363215 B2 JP6363215 B2 JP 6363215B2
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Japan
Prior art keywords
pattern
acrylate
meth
film
photocurable composition
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JP2016550336A
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Japanese (ja)
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JPWO2016047650A1 (ja
Inventor
雄一郎 後藤
雄一郎 後藤
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Fujifilm Corp
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Fujifilm Corp
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Publication of JPWO2016047650A1 publication Critical patent/JPWO2016047650A1/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
JP2016550336A 2014-09-25 2015-09-24 パターン形成体の製造方法 Active JP6363215B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014195479 2014-09-25
JP2014195479 2014-09-25
PCT/JP2015/076843 WO2016047650A1 (ja) 2014-09-25 2015-09-24 パターン形成体の製造方法

Publications (2)

Publication Number Publication Date
JPWO2016047650A1 JPWO2016047650A1 (ja) 2017-07-06
JP6363215B2 true JP6363215B2 (ja) 2018-07-25

Family

ID=55581174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016550336A Active JP6363215B2 (ja) 2014-09-25 2015-09-24 パターン形成体の製造方法

Country Status (3)

Country Link
JP (1) JP6363215B2 (zh)
TW (1) TWI644184B (zh)
WO (1) WO2016047650A1 (zh)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4324374B2 (ja) * 2002-03-29 2009-09-02 大日本印刷株式会社 微細凹凸パターン形成材料、微細凹凸パターン形成方法、転写箔、光学物品及びスタンパー
JP2010037541A (ja) * 2008-07-10 2010-02-18 Fujifilm Corp インプリント用硬化性組成物、パターン形成方法およびパターン
JP2010186979A (ja) * 2008-12-03 2010-08-26 Fujifilm Corp インプリント用硬化性組成物、パターン形成方法およびパターン
JP5619368B2 (ja) * 2009-03-26 2014-11-05 太陽ホールディングス株式会社 インクジェット用硬化性樹脂組成物
JP2010245130A (ja) * 2009-04-01 2010-10-28 Jsr Corp スタンパ及びこれを用いた光インプリントリソグラフィ方法
JP2011066273A (ja) * 2009-09-18 2011-03-31 Konica Minolta Holdings Inc 微細マスクパターンの形成方法、ナノインプリントリソグラフィ方法および微細構造体の製造方法
JP2014099525A (ja) * 2012-11-15 2014-05-29 Fujifilm Corp ナノインプリント方法およびそれを用いたパターン化基板の製造方法

Also Published As

Publication number Publication date
WO2016047650A1 (ja) 2016-03-31
TWI644184B (zh) 2018-12-11
TW201612657A (en) 2016-04-01
JPWO2016047650A1 (ja) 2017-07-06

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