JP6299668B2 - ヘイズの評価方法 - Google Patents

ヘイズの評価方法 Download PDF

Info

Publication number
JP6299668B2
JP6299668B2 JP2015098286A JP2015098286A JP6299668B2 JP 6299668 B2 JP6299668 B2 JP 6299668B2 JP 2015098286 A JP2015098286 A JP 2015098286A JP 2015098286 A JP2015098286 A JP 2015098286A JP 6299668 B2 JP6299668 B2 JP 6299668B2
Authority
JP
Japan
Prior art keywords
haze
scattered light
light intensity
standard
standard sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015098286A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016213411A5 (https=
JP2016213411A (ja
Inventor
久之 斉藤
久之 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2015098286A priority Critical patent/JP6299668B2/ja
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Priority to KR1020177032618A priority patent/KR102262072B1/ko
Priority to PCT/JP2016/001315 priority patent/WO2016181592A1/ja
Priority to CN201680027570.7A priority patent/CN107615468B/zh
Priority to US15/570,278 priority patent/US10234281B2/en
Priority to DE112016001802.9T priority patent/DE112016001802B4/de
Publication of JP2016213411A publication Critical patent/JP2016213411A/ja
Publication of JP2016213411A5 publication Critical patent/JP2016213411A5/ja
Application granted granted Critical
Publication of JP6299668B2 publication Critical patent/JP6299668B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D18/00—Testing or calibrating apparatus or arrangements provided for in groups G01D1/00 - G01D15/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N2015/1486—Counting the particles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2015098286A 2015-05-13 2015-05-13 ヘイズの評価方法 Active JP6299668B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2015098286A JP6299668B2 (ja) 2015-05-13 2015-05-13 ヘイズの評価方法
PCT/JP2016/001315 WO2016181592A1 (ja) 2015-05-13 2016-03-10 ヘイズの評価方法
CN201680027570.7A CN107615468B (zh) 2015-05-13 2016-03-10 雾度的评价方法
US15/570,278 US10234281B2 (en) 2015-05-13 2016-03-10 Method for evaluating haze
KR1020177032618A KR102262072B1 (ko) 2015-05-13 2016-03-10 헤이즈의 평가 방법
DE112016001802.9T DE112016001802B4 (de) 2015-05-13 2016-03-10 Verfahren zum Bewerten einer Trübung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015098286A JP6299668B2 (ja) 2015-05-13 2015-05-13 ヘイズの評価方法

Publications (3)

Publication Number Publication Date
JP2016213411A JP2016213411A (ja) 2016-12-15
JP2016213411A5 JP2016213411A5 (https=) 2017-11-30
JP6299668B2 true JP6299668B2 (ja) 2018-03-28

Family

ID=57249125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015098286A Active JP6299668B2 (ja) 2015-05-13 2015-05-13 ヘイズの評価方法

Country Status (6)

Country Link
US (1) US10234281B2 (https=)
JP (1) JP6299668B2 (https=)
KR (1) KR102262072B1 (https=)
CN (1) CN107615468B (https=)
DE (1) DE112016001802B4 (https=)
WO (1) WO2016181592A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020518812A (ja) 2017-05-05 2020-06-25 スリーエム イノベイティブ プロパティズ カンパニー 微小散乱測定システム、及びその使用方法
JP7054634B2 (ja) * 2018-02-21 2022-04-14 セーレン株式会社 測定装置
CN109916945A (zh) * 2019-04-10 2019-06-21 浙江众泰汽车制造有限公司 一种雾度评价装置及雾度评价方法
DE112021007875T5 (de) * 2021-06-24 2024-04-11 Beijing Tongmei Xtal Technology Co., Ltd. Verfahren und einrichtung zum detektieren von oberflächen-haze von materialien
JP7700751B2 (ja) * 2021-09-10 2025-07-01 株式会社Sumco 半導体ウェーハの評価方法および半導体ウェーハの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5198869A (en) * 1990-10-15 1993-03-30 Vlsi Standards, Inc. Reference wafer for haze calibration
JP2719257B2 (ja) 1991-12-18 1998-02-25 住友電気工業株式会社 分光分析装置
US5599464A (en) 1995-10-06 1997-02-04 Vlsi Standards, Inc. Formation of atomic scale vertical features for topographic instrument calibration
US5691812A (en) 1996-03-22 1997-11-25 Ade Optical Systems Corporation Calibration standard for calibrating a defect inspection system and a method of forming same
DE69930700T2 (de) * 1998-09-04 2006-11-09 Canon K.K. Halbleitersubstrat und Verfahren zu seiner Herstellung
JP3341212B2 (ja) * 2000-06-15 2002-11-05 スガ試験機株式会社 ヘーズ値測定装置及び測定方法
JP2002310902A (ja) * 2001-04-16 2002-10-23 Central Glass Co Ltd 波長選択性のある散乱光測定方法
FR2888833B1 (fr) * 2005-07-22 2007-08-24 Commissariat Energie Atomique Procede de realisation d'etalons de bruit de fond diffus comportant des nano-structures sur une couche mince isolante
KR100675216B1 (ko) * 2005-08-23 2007-01-29 삼성전기주식회사 헤이즈 측정 방법 및 그 장치
KR100871876B1 (ko) * 2006-09-26 2008-12-03 나노전광 주식회사 광검출기를 이용한 포토마스크 표면의 헤이즈 검출장치 및그 검출방법
US8194233B2 (en) * 2008-04-11 2012-06-05 Microsoft Corporation Method and system to reduce stray light reflection error in time-of-flight sensor arrays
JP5357509B2 (ja) * 2008-10-31 2013-12-04 株式会社日立ハイテクノロジーズ 検査装置、検査方法および検査装置の校正システム
WO2012073558A1 (ja) * 2010-11-29 2012-06-07 大日本印刷株式会社 評価用基板、欠陥検査方法及び欠陥検出装置

Also Published As

Publication number Publication date
KR102262072B1 (ko) 2021-06-09
DE112016001802B4 (de) 2024-07-18
US20180128606A1 (en) 2018-05-10
CN107615468B (zh) 2020-06-19
CN107615468A (zh) 2018-01-19
WO2016181592A1 (ja) 2016-11-17
US10234281B2 (en) 2019-03-19
KR20180006912A (ko) 2018-01-19
JP2016213411A (ja) 2016-12-15
DE112016001802T5 (de) 2018-01-25

Similar Documents

Publication Publication Date Title
JP6299668B2 (ja) ヘイズの評価方法
KR101360540B1 (ko) 분광학적 타원해석법을 이용한 전자 소자의 특성 평가 방법
CN104296969B (zh) 一种激光损伤阈值标定方法
WO2011013316A1 (ja) パターン形状選択方法、及びパターン測定装置
JP2016535258A (ja) 材料のマルチスケール均一性分析
CN114930154B (zh) 检测ocd计量机器学习的离群值和异常
US8742345B1 (en) Method for detecting electron beam of scanning electron microscope and for detecting fine patterns
EP3080568A1 (en) Apparatus and method for profiling a beam of a light emitting semiconductor device
JP6141884B2 (ja) ウェハ検査用に拡張された欠陥のサイジング範囲
TWI605248B (zh) 監控用於檢測半導體晶圓表面上的缺陷的表面檢查系統的操作狀況的方法
JP2017525945A (ja) サンプル及び／又はサンプル表面に形成された少なくとも１つのフィルムの特性及び／又はパラメータを測定するためのアレンジメント
JP2014504242A5 (https=)
CN105821537B (zh) 在纱线质量的光学检测器中监测纱线质量的方法及执行该方法的光学检测器
CN106128976B (zh) 一种监控侧墙刻蚀后残留的方法
US8743357B2 (en) Light source device, surface inspecting apparatus using the device, and method for calibrating surface inspecting apparatus using the device
JP5608722B2 (ja) 検査装置、および検査装置の調整方法
JP2015095602A5 (https=)
KR101418308B1 (ko) 엘이디 파장 측정 장치 및 이를 이용한 엘이디 파장 측정 방법
CN108240882A (zh) 像素级剪敏液晶标定与测量方法和系统
JP2024535266A (ja) インシトゥ光リフレクトメトリを使用する透過補正プラズマ発光
CN115727774A (zh) 红外光谱仪测量外延层厚度的校准方法及校准片
TWI506264B (zh) Method of Evaluating Powdery Dust Dispersion by Optical Telemetry
KR100955837B1 (ko) 표준 웨이퍼 제조 및 모니터링 방법
JP5483286B2 (ja) 検査装置用の標準ウエハ
JP2016114506A (ja) 薄膜付ウェーハの評価方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170419

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171018

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20171024

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171215

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20180130

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20180212

R150 Certificate of patent or registration of utility model

Ref document number: 6299668

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250