JP6245833B2 - Wire saw manufacturing method - Google Patents
Wire saw manufacturing method Download PDFInfo
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- JP6245833B2 JP6245833B2 JP2013083332A JP2013083332A JP6245833B2 JP 6245833 B2 JP6245833 B2 JP 6245833B2 JP 2013083332 A JP2013083332 A JP 2013083332A JP 2013083332 A JP2013083332 A JP 2013083332A JP 6245833 B2 JP6245833 B2 JP 6245833B2
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- wire saw
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- wire
- abrasive grains
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- 238000004519 manufacturing process Methods 0.000 title claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 92
- 239000006061 abrasive grain Substances 0.000 claims description 82
- 238000004070 electrodeposition Methods 0.000 claims description 62
- 238000005520 cutting process Methods 0.000 claims description 57
- 229910052759 nickel Inorganic materials 0.000 claims description 46
- 238000007747 plating Methods 0.000 claims description 42
- 238000002347 injection Methods 0.000 claims description 28
- 239000007924 injection Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 27
- 238000004381 surface treatment Methods 0.000 claims description 20
- 239000002245 particle Substances 0.000 claims description 17
- 230000005484 gravity Effects 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 6
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 94
- 239000002184 metal Substances 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 19
- 239000000047 product Substances 0.000 description 15
- 239000010432 diamond Substances 0.000 description 14
- 229910003460 diamond Inorganic materials 0.000 description 14
- 238000005498 polishing Methods 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 238000005530 etching Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 239000002783 friction material Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 6
- 238000005488 sandblasting Methods 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005480 shot peening Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
- B23D61/00—Tools for sawing machines or sawing devices; Clamping devices for these tools
- B23D61/18—Sawing tools of special type, e.g. wire saw strands, saw blades or saw wire equipped with diamonds or other abrasive particles in selected individual positions
- B23D61/185—Saw wires; Saw cables; Twisted saw strips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/007—Use, recovery or regeneration of abrasive mediums
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Description
本発明はシリコン,水晶,サファイア等の硬質脆性材料のインゴット等から,シリコンウェハーや水晶振動子,基板等の製品を切り出す際に使用するワイヤソー,及び前記ワイヤソーの製造方法に関し,より詳細には,ピアノ線や硬鋼線等の芯線にダイヤモンド等の砥粒を電着によって付着させた固定砥粒型のワイヤソー,及びその製造方法に関する。 The present invention relates to a wire saw used for cutting a product such as a silicon wafer, a crystal resonator, and a substrate from an ingot of a hard brittle material such as silicon, crystal, and sapphire, and a method for manufacturing the wire saw. The present invention relates to a fixed abrasive type wire saw in which abrasive grains such as diamond are attached to a core wire such as a piano wire or a hard steel wire by electrodeposition, and a manufacturing method thereof.
シリコン,水晶,サファイアのインゴット等の硬質脆性材料からシリコンウェハー,水晶振動子,基板等の製品を切り出す際,従来より「ワイヤソー」が使用されている。 Conventionally, when cutting products such as silicon wafers, crystal units and substrates from hard and brittle materials such as silicon, quartz and sapphire ingots, "wire saws" have been used.
このワイヤソーを使用した切断方法としては,表面に砥粒を備えていないピアノ線等から成るワイヤソーを使用し,このワイヤソーに砥粒と水や油の懸濁液であるスラリーをかけながら高速でワークに接触させることでワイヤソーとワーク間で転動する砥粒によってワークの切断を行う「遊離砥粒方式」と,芯線に予めダイヤモンド等の砥粒を表面に付着させておいたワイヤソーを使用し,このワイヤソーに潤滑及び冷却を行うための水や油等の冷却媒体をかけながらワークに高速で接触させることにより切断を行う「固定砥粒方式」がある。 As a cutting method using this wire saw, a wire saw made of piano wire or the like that does not have abrasive grains on its surface is used, and a work piece is applied at a high speed while applying a slurry that is a suspension of abrasive grains and water or oil to this wire saw. Using a "free abrasive grain method" in which the workpiece is cut by abrasive grains rolling between the wire saw and the workpiece, and a wire saw in which diamond or other abrasive grains are previously attached to the core wire, There is a “fixed abrasive method” in which the wire saw is cut by bringing it into contact with the workpiece at high speed while applying a cooling medium such as water or oil for lubrication and cooling.
また,このような固定砥粒方式で使用するワイヤソーに対する砥粒の付着方法として,樹脂製ボンド等による砥粒の接着,電気めっきによる砥粒の電着,ボンドによる接着と電着との組み合わせ等が提案されている。 In addition, the method of adhering abrasive grains to the wire saw used in such a fixed abrasive system includes adhesion of abrasive grains by resin bond, electrodeposition of abrasive grains by electroplating, combination of adhesion by bond and electrodeposition, etc. Has been proposed.
一例として,ボンドによる接着と電着を組み合わせたものとして,導電性を有する芯線の外周面に有機接着剤により螺旋状に接着剤層を形成し,この接着剤層に砥粒を付着させて砥粒を芯線の表面に一次固定すると共に,その上から更に電着により形成した金属めっき層で砥粒を二次固定するものがある(特許文献1)。 As an example, as a combination of bonding by bonding and electrodeposition, an adhesive layer is formed in a spiral shape with an organic adhesive on the outer peripheral surface of a conductive core wire, and abrasive grains are adhered to the adhesive layer to form an abrasive. There is one in which the grains are primarily fixed to the surface of the core wire and the abrasive grains are secondarily fixed from above by a metal plating layer formed by electrodeposition (Patent Document 1).
ワイヤソーで切断する半導体,水晶,サファイア等の硬質脆性材料は,多くが高価な材料であり,切断に際し,可能な限り多くの製品を切り出せるようにすることが求められる。 Hard brittle materials such as semiconductors, quartz and sapphire that are cut with a wire saw are expensive materials, and it is required to cut out as many products as possible when cutting.
ここで,図6(A)に示すようにワイヤソー1によってシリコン単結晶インゴット等のワークWから製品を切り出す場合,図6(B)に拡大図で示すようにワイヤソー1が通過する部分のインゴットは切削されて無くなることから,この切断時に生じる損耗分を切断代δとして確保する必要がある。 Here, when a product is cut out from a workpiece W such as a silicon single crystal ingot by the wire saw 1 as shown in FIG. 6 (A), the ingot of the portion through which the wire saw 1 passes is shown in FIG. 6 (B) as an enlarged view. Since it is lost by cutting, it is necessary to secure the amount of wear generated during the cutting as the cutting allowance δ.
また,ワイヤソーで切り出した製品は表面が粗くなっているため,切断後,表面を研磨する必要があるため,この研磨による損耗分を,研磨代tとして確保しておく必要がある。 Further, since the surface of a product cut out with a wire saw is rough, it is necessary to polish the surface after cutting. Therefore, it is necessary to secure the amount of wear due to this polishing as the polishing allowance t.
そのため,ワークWの切断に使用されるワイヤソー1の間隔dは,最終製品の厚さXに,切断代δと研磨代tを加えた間隔で設定されていることから,同じサイズのワークからより多くの製品を切り出そうとした場合,使用するワイヤソー1の線径を細くして切断代δを小さくし,及び/又は,切断後の製品の表面粗れを小さなものとして研磨代tを小さくすれば,ワイヤソーの間隔dが狭まり,同じ大きさのワークWより切り出すことのできる製品数が増える。 Therefore, the interval d of the wire saw 1 used for cutting the workpiece W is set to an interval obtained by adding the cutting allowance δ and the polishing allowance t to the thickness X of the final product. When trying to cut out many products, the wire saw 1 to be used is thinned to reduce the cutting allowance δ and / or the surface roughness of the product after cutting is reduced to reduce the polishing allowance t. As a result, the distance d between the wire saws is reduced, and the number of products that can be cut out from the workpiece W of the same size is increased.
しかし,線径の小さなワイヤソー1は強度が低く短寿命であると共に,断線等も生じ易いため,材質や構造の見直し等によってワイヤソーの強度改善を図ることなく単純にワイヤソーの線径のみを細くしたとすれば,ワイヤソーの頻繁な交換が必要となり,その度に作業が中断されて作業性が低下するだけでなく,高価なワイヤソーの交換に伴い製品の製造コストが嵩むこととなる。 However, the wire saw 1 with a small wire diameter has a low strength and a short service life, and also easily breaks. Therefore, the wire saw diameter is simply reduced without improving the wire saw strength by reviewing the material and structure. If this is the case, frequent replacement of the wire saw is required, and the work is interrupted each time, resulting in a decrease in workability. In addition, replacement of the expensive wire saw increases the manufacturing cost of the product.
また,仮にワイヤソーの線径を細くして切断代δを減少することに成功したとしても,切断後に得られる断面の粗さが増加する場合には,前述した研磨代tを多く取ることが必要となり,切り出せる製品数の増加が望めないだけでなく,研磨作業に要する時間と労力を増大させることとなり,生産性が低下する。特に切断時にチッピング等の不良が生じれば,折角製品として切り出したとしても不良品として出荷することができなくなり,更に歩留まりが悪くなる。 Even if the wire saw is reduced in diameter by reducing the wire diameter of the wire saw, if the roughness of the cross section obtained after cutting increases, it is necessary to increase the polishing allowance t described above. As a result, not only can the number of products that can be cut out be increased, but also the time and labor required for the polishing work are increased, resulting in a decrease in productivity. In particular, if a defect such as chipping occurs at the time of cutting, it cannot be shipped as a defective product even if it is cut out as a folded product, and the yield is further deteriorated.
ここで,電着によって砥粒を付着させた後,未使用状態にあるワイヤソーでは,芯線2上に形成された砥粒電着層3は,図7に示すように砥粒31がめっき金属32’中に埋もれた状態となっており,この状態で使用を開始すると,砥粒31を覆う部分のめっき金属32’がワークW表面との接触により除去されてやがて砥粒31が表面に露出して切り刃が形成されることで大きな切削力が発揮されることとなるから,このような切り刃が形成される前の使用開始時点において,ワイヤソー1による切削力は比較的低いものとなっている。 Here, in the wire saw in an unused state after the abrasive grains are attached by electrodeposition, the abrasive grain electrodeposited layer 3 formed on the core wire 2 has the abrasive grains 31 made of plated metal 32 as shown in FIG. When the use is started in this state, the portion of the plated metal 32 ′ covering the abrasive grains 31 is removed by contact with the surface of the workpiece W, and the abrasive grains 31 are exposed to the surface. Since a large cutting force is exerted by forming the cutting blade, the cutting force by the wire saw 1 is relatively low at the start of use before such a cutting blade is formed. Yes.
そのため,砥粒31がめっき金属32’で覆われた状態で行われる切断と,その後,砥粒31が露出して本来の切削力が発揮された状態で行われる切断では,切削量に大きな差が生じるために,切断方向に対するワークWの送り込み速度を一定として切断を行うと,ワイヤソー1の交換直後にあっては,ワークWがワイヤソー1に対し必要以上の力で押し付けられることとなり,ワイヤソー1の断線や,ワークWに必要以上のダメージを与えて断面が粗くなる等の初期不良が生じ易い。 Therefore, there is a large difference in the cutting amount between the cutting performed with the abrasive grains 31 covered with the plated metal 32 ′ and the cutting performed with the abrasive grains 31 exposed and the original cutting force exerted thereafter. Therefore, if the workpiece W is cut at a constant feed speed in the cutting direction, the workpiece W is pressed against the wire saw 1 with an excessive force immediately after the wire saw 1 is replaced. The initial failure such as disconnection of the wire or damage to the workpiece W more than necessary to make the cross section rough is likely to occur.
このような初期不良の発生を回避する方法としては,めっきにより砥粒電着層3を形成した後,切断に使用する前に,予め砥粒31の表面を覆うめっき金属32’を除去しておくことも考えられ,このような方法として,例えば,Al2O3やSiC砥石を使用したワイヤソーの表面研磨,Al2O3砥粒を使用したサンドブラストによるエッチング,酸等の薬品に浸漬して行うエッチングが考えられる。 As a method for avoiding the occurrence of such an initial failure, after forming the abrasive electrodeposition layer 3 by plating, before using it for cutting, the plating metal 32 'covering the surface of the abrasive grains 31 is removed in advance. As such a method, for example, surface polishing of a wire saw using Al 2 O 3 or SiC grindstone, etching by sand blasting using Al 2 O 3 abrasive grains, immersion in chemicals such as acid, etc. Etching to be performed is conceivable.
しかし,上記の方法で砥粒31を露出させた場合,砥石による研磨やサンドブラストによるエッチングでは,砥粒電着層3に大きな外力を加えて砥粒を覆う部分のめっき金属32’を削り落とすことによって砥粒31を露出させることとなるため,この方法で処理を行うと,砥粒31を覆う部分のめっき金属32’だけでなく,砥粒電着層3自体を剥離させてしまったり,あるいは砥粒31を脱落させてしまうことになり,処理後のワイヤソー1の性能を低下させる。 However, when the abrasive grains 31 are exposed by the above method, in the polishing by the grindstone or the etching by sandblasting, a large external force is applied to the abrasive electrodeposition layer 3 to scrape off the plated metal 32 'covering the abrasive grains. Since the abrasive grains 31 are exposed by the above method, if the treatment is performed by this method, not only the plating metal 32 'covering the abrasive grains 31, but also the abrasive electrodeposition layer 3 itself may be peeled off, or The abrasive grains 31 will fall off, and the performance of the wire saw 1 after processing will be reduced.
また,処理後に芯線2上に残るめっき金属32’の表面が梨地となる等,無数の傷を残すこととなるために,ワイヤソー1の使用中,この傷を起点として砥粒電着層3が破壊されて剥離したり,ワイヤソー1の断線等が生じ易くなる。 In addition, since the surface of the plated metal 32 ′ remaining on the core wire 2 after the treatment is left with a number of scratches and the like, the abrasive electrodeposition layer 3 starts from the scratch during use of the wire saw 1. It breaks and peels off, and the wire saw 1 is easily broken.
これに対し,酸等の薬品を使用したエッチングでは,砥粒電着層3に対し機械的な力は加わらないが,薬品による蝕刻によって表面が粗くなる(無数の傷が付く)ため,砥粒電着層3の強度の低下やワイヤソー1の寿命低下が生じる点は,前述した砥石による研磨やサンドブラストによるエッチングの場合と同様である。 On the other hand, in etching using chemicals such as acid, no mechanical force is applied to the abrasive electrodeposition layer 3, but the surface becomes rough (countless scratches) by etching with chemicals. The point that the strength of the electrodeposition layer 3 is reduced and the life of the wire saw 1 is reduced is the same as in the case of the above-described polishing by a grindstone or the etching by sandblasting.
しかも,薬品によるエッチングでは,金属部分が略均一に蝕刻されることから,砥粒31上を覆うめっき金属32’だけでなく,砥粒31を固定するための土台として残すべき部分のめっき金属32’にも蝕刻が及び,砥粒の保持力が低下してエッチング中及びワイヤソーとしての使用中に砥粒が脱落し易くなる点でも,ワイヤソーの寿命を短くすることとなる。 In addition, in the etching with chemicals, the metal portion is etched substantially uniformly, so that not only the plating metal 32 ′ covering the abrasive grains 31 but also the plating metal 32 of the portion to be left as a base for fixing the abrasive grains 31. Also, the life of the wire saw is shortened in that it is also etched, and the holding power of the abrasive grains is reduced so that the abrasive grains easily fall off during etching and use as a wire saw.
このように,砥粒31を露出させるためにワイヤソー1に対して行うことが想定される前述の処理は,いずれもワイヤソー1の強度低下に繋がる処理であり,上記処理後のワイヤソー1を,処理前のワイヤソー1と同程度の強度に維持しようとすれば,ワイヤソー1の線径を太くする必要がある。 As described above, any of the above-described processes assumed to be performed on the wire saw 1 in order to expose the abrasive grains 31 is a process that leads to a decrease in the strength of the wire saw 1. In order to maintain the same strength as the previous wire saw 1, it is necessary to increase the wire diameter of the wire saw 1.
従って,ワイヤソー1に電着した砥粒31を予め露出させておくための処理として上記で想定した処理と,ワイヤソー1の細径化は,相反する要求であって両立させることはできず,従って,歩留まりの向上という要求に対しても対応し得ない。 Therefore, the process assumed above as a process for pre-exposing the abrasive grains 31 electrodeposited on the wire saw 1 and the reduction in the diameter of the wire saw 1 are contradictory requirements and cannot be made compatible. , Cannot meet the demand for yield improvement.
そこで本発明は,芯線に電着した砥粒が,その一部分を露出させた構造を有するものでありながら,ワイヤソーの強度や寿命が向上されたワイヤソー,及び前記ワイヤソーの製造方法を提供することを目的とする。 Therefore, the present invention provides a wire saw with improved strength and life of a wire saw, and a method of manufacturing the wire saw, wherein the abrasive grains electrodeposited on the core wire have a structure in which a part thereof is exposed. Objective.
以下に課題を解決するための手段を,発明を実施するための形態で使用する符号と共に記載する。この符号は,特許請求の範囲の記載と発明を実施するための形態の記載との対応を明らかにするためのものであり,言うまでもなく,本願発明の技術的範囲の解釈に制限的に用いられるものではない。 Means for solving the problems will be described below together with reference numerals used in the embodiments for carrying out the invention. This code is used to clarify the correspondence between the description of the scope of claims and the description of the mode for carrying out the invention. Needless to say, it is used in a limited manner for the interpretation of the technical scope of the present invention. It is not a thing.
また,本発明のワイヤソー1の製造方法は,電着によって芯線2に平均粒子径8〜35μmの砥粒31が分散されたニッケルめっき層である砥粒電着層3をスパイラル状に形成する工程と,
前記砥粒電着層3が形成された前記芯線2に,硬度がHV500〜1000,比重2.0〜3.0,平均粒子径10〜62μmのセラミック系の球状ショットを噴射圧力0.15〜0.30MPaで噴射すると共に衝突させる表面処理工程を含み,
前記表面処理工程において,前記球状ショットとの衝突によって前記砥粒31の一部分を前記ニッケルめっき層上に露出させて前記砥粒電着層3に切り刃31aを形成すると共に,
前記ショットとの衝突により前記砥粒31の基部で前記ニッケルめっき層を強化し,かつ,前記ニッケルめっき層を,硬度が上昇した厚さ4〜10μmに形成したことを特徴とする(請求項1)。
In addition, the method for manufacturing the wire saw 1 of the present invention is a process of forming an abrasive electrodeposition layer 3 that is a nickel plating layer in which abrasive grains 31 having an average particle diameter of 8 to 35 μm are dispersed in the core wire 2 by electrodeposition in a spiral shape. When,
A ceramic spherical shot having a hardness of HV 500 to 1000, a specific gravity of 2.0 to 3.0, and an average particle diameter of 10 to 62 μm is sprayed on the core wire 2 on which the abrasive grain electrodeposition layer 3 is formed at an injection pressure of 0.15. Including a surface treatment step of injecting and colliding with 0.30 MPa,
In the surface treatment step, a portion of the abrasive grain 31 is exposed on the nickel plating layer by collision with the spherical shot to form a cutting edge 31a in the abrasive electrodeposition layer 3,
By colliding with previous SL shot enhance the nickel plating layer at the base of the abrasive grains 31, and the nickel plating layer, characterized in that the hardness was formed to a thickness 4~10μm elevated (claim 1 ).
なお,上記製造方法において,前述した砥粒電着層3の電着はスルファミン酸浴により行うことが好ましい(請求項2)。 In the above production method, the above-mentioned electrodeposition of the abrasive electrodeposition layer 3 is preferably carried out using a sulfamic acid bath (claim 2 ).
以上説明した本発明の構成により,本発明のワイヤソー1によれば,以下の顕著な効果を得ることができた。 With the configuration of the present invention described above, according to the wire saw 1 of the present invention, the following remarkable effects can be obtained.
所定の硬度,比重,粒径,材質の球状ショットを噴射して表面処理を行うことにより,ニッケルより露出させた砥粒31の一部分によって切り刃31aを形成すると共に,球状ショットとの衝突により前記砥粒31の基部を芯線2上に固定するニッケル層32の硬度が向上することにより,本発明のワイヤソー1にあっては使用開始当初から高い切削性が発揮され,初期不良の発生が抑制されると共に,ニッケル層32の強化によって砥粒電着層3の剥離や,砥粒31の脱落を生じ難くすることができただけでなく,ワイヤソー1全体の強度の向上を図ることができた。 By performing a surface treatment by injecting a spherical shot of a predetermined hardness, specific gravity, particle size, and material, a cutting blade 31a is formed by a part of the abrasive grains 31 exposed from the nickel, and the collision with a spherical shot causes the above-mentioned By improving the hardness of the nickel layer 32 that fixes the base of the abrasive grain 31 onto the core wire 2, the wire saw 1 of the present invention exhibits high machinability from the beginning of use and suppresses the occurrence of initial defects. In addition, the strengthening of the nickel layer 32 not only made it difficult for the abrasive electrodeposited layer 3 to peel off or the abrasive grains 31 to fall off, but also improved the strength of the wire saw 1 as a whole.
その結果,本発明のワイヤソー1にあっては,同一線径の従来のワイヤソーに比較して強度が高く,その結果,従来のものよりも線径の細いものを使用してワークWの切断を行うことができるため,図6(B)を参照して説明した切断代δを狭くして,同じ大きさのインゴットからより沢山の製品を切り出すことが可能となった。 As a result, in the wire saw 1 of the present invention, the strength is higher than that of a conventional wire saw having the same wire diameter, and as a result, the workpiece W is cut using a wire wire having a smaller diameter than the conventional wire saw. Since this can be performed, the cutting allowance δ described with reference to FIG. 6B can be narrowed, and more products can be cut out from the ingot of the same size.
また,同一径の既知のワイヤソーと比較した場合,寿命を1.5倍に伸ばすことができ,また,インゴットに対するワイヤソーの接触速度を上昇させることが可能であることから,切断に要する時間の短縮も可能であった。 In addition, when compared with known wire saws of the same diameter, the service life can be extended by 1.5 times, and the contact speed of the wire saw with the ingot can be increased, so that the time required for cutting is shortened. Was also possible.
しかも,本発明のワイヤソー1では,使用開始から切り刃31aが露出しており,初期不良が原因となる切断面の粗れが生じず,切断後の断面が綺麗でチッピング等の発生も少なく,真っ直ぐに切断できることから,切断後,研磨により除去する研磨代t〔図6(B)参照〕についても小さく設定することができ,この点でも歩留まりの向上と,研磨処理の時間及び労力の低減が可能となった。 Moreover, in the wire saw 1 of the present invention, the cutting blade 31a is exposed from the start of use, the cutting surface is not rough due to the initial failure, the cross section after cutting is clean, and there is little occurrence of chipping, Since cutting can be performed straight, the polishing allowance t (see FIG. 6B) to be removed by polishing after cutting can be set small. In this respect as well, the yield can be improved and the time and labor of the polishing process can be reduced. It has become possible.
なお,砥粒電着層3の形成を,スルファミン酸浴により行った場合,このようにして形成したニッケルめっき層は高硬度であると共に,内部応力が低く,内部応力が原因で生じる砥粒電着層3の剥離も防止でき,ワイヤソー1の一層の長寿命化を図ることができた。 When the electrodeposited abrasive layer 3 is formed using a sulfamic acid bath, the nickel plating layer thus formed has high hardness and low internal stress. Separation of the deposition layer 3 could be prevented, and the life of the wire saw 1 could be further extended.
次に,本発明の実施形態につき添付図面を参照しながら以下説明する。 Next, embodiments of the present invention will be described below with reference to the accompanying drawings.
図1において,符号1は本発明のワイヤソーである。 In FIG. 1, reference numeral 1 denotes a wire saw of the present invention.
このワイヤソー1は,母材となる芯線2と,この芯線2の表面にニッケルめっきによって砥粒31を電着することにより形成された砥粒電着層3を備えている。 The wire saw 1 includes a core wire 2 as a base material and an abrasive electrodeposition layer 3 formed by electrodepositing abrasive grains 31 on the surface of the core wire 2 by nickel plating.
前述の芯線2としては,砥粒電着型のワイヤソーに一般的に使用されているピアノ線の他,硬鋼線等の鋼線を使用することが可能である。また,従来の一般的なワイヤソーにあっては,必要な強度を確保するために線径0.2mmを越える太さの芯線2が使用されていたが,本発明のワイヤソー1にあっては,後述するように,砥粒電着層3に対する表面処理によってニッケル層32が強化され,その結果,ワイヤソー1の強度についても向上させることができることから,芯線として0.2mm以下,好ましくは0.05〜0.2mmのものを使用することができ,このように使用する芯線の線径を細くすることで,インゴットの切断代δ〔図6(B)参照〕を少なくし,同一サイズのインゴットからより多数の製品の切り出しを行うことができるようにした。 As the above-described core wire 2, it is possible to use a steel wire such as a hard steel wire in addition to a piano wire generally used for an abrasive electrodeposition type wire saw. Moreover, in the conventional general wire saw, the core wire 2 having a wire diameter exceeding 0.2 mm was used in order to ensure the necessary strength. However, in the wire saw 1 of the present invention, As will be described later, the nickel layer 32 is reinforced by the surface treatment on the abrasive electrodeposition layer 3 and, as a result, the strength of the wire saw 1 can be improved, so that the core wire is 0.2 mm or less, preferably 0.05. The diameter of the core wire to be used in this way is reduced to reduce the ingot cutting allowance δ (see FIG. 6B), and from an ingot of the same size. A larger number of products can be cut out.
この芯線2上に形成される砥粒電着層3は,図1に示すように平均粒径8〜35μmの砥粒31と,前記砥粒31の基部を芯線上に固着する,厚さ4〜10μmのニッケル層32によって構成されている。 As shown in FIG. 1, the electrodeposited abrasive grain layer 3 formed on the core wire 2 has an abrasive grain 31 having an average grain size of 8 to 35 μm and a base portion of the abrasive grain 31 fixed on the core wire. It is constituted by a nickel layer 32 of 10 μm.
この砥粒電着層3に設ける砥粒としては,ダイヤモンド砥粒,cBN(立方晶窒化硼素)砥粒等の超硬質砥粒の他,切断対象とするワークの材質に対応し,Al2O3,SiC等のセラミック系砥粒を使用することも可能であり,本実施形態にあっては,ダイヤモンド砥粒を使用している。 As the abrasive grains provided in the abrasive grain electrodeposition layer 3, not only ultra-hard abrasive grains such as diamond abrasive grains and cBN (cubic boron nitride) abrasive grains but also the material of the workpiece to be cut, Al 2 O 3. It is also possible to use ceramic abrasive grains such as SiC, and diamond abrasive grains are used in this embodiment.
砥粒が分散されたニッケルめっき層の電着は,既知の電気めっき法により行うことが可能である。ニッケルめっきは,めっき浴の種類に応じて得られるニッケルめっき膜の硬さに違いが生じるが,得られるニッケルめっき膜は硬質である程好ましい。 Electrodeposition of the nickel plating layer in which the abrasive grains are dispersed can be performed by a known electroplating method. In nickel plating, the hardness of the nickel plating film obtained varies depending on the type of plating bath, but the nickel plating film obtained is preferably as hard as possible.
また,形成されためっき層の内部応力が大きいと,形成されためっき層が芯線2より剥離し易くなることから,本実施形態にあっては,形成されるめっき層の硬度が高く,しかも,内部応力の小さいめっき層を形成することが可能なスルファミン酸浴中で成膜を行い,硬度がHV400〜500程度のニッケルめっき層を形成している。 In addition, since the formed plating layer is easily peeled off from the core wire 2 when the internal stress of the formed plating layer is large, the hardness of the formed plating layer is high in this embodiment, Film formation is performed in a sulfamic acid bath capable of forming a plating layer having a low internal stress, and a nickel plating layer having a hardness of about HV 400 to 500 is formed.
砥粒電着層3は,後述する表面処理を行う前の状態にあっては,図7に示すようにめっき金属32’であるニッケル中に砥粒31が埋もれた状態で分散されている。 In the state before the surface treatment described later is performed, the abrasive grain electrodeposition layer 3 is dispersed in a state where the abrasive grains 31 are buried in nickel as the plating metal 32 'as shown in FIG.
このように,めっき金属32’であるニッケルと,分散粒子である砥粒31とを複合化させて芯線2に付着させる方法としては,連続的に成長するめっきの表面に懸濁させた分散粒子を吸着させ,析出した金属によって連続的にめっき膜中に取り込む「懸濁共析」と,水平に配置しためっき面に分散粒子を沈降させて芯線表面に粒子を強制的に接触させておき複合させる「沈降共析」が考えられるが,本願では,断面が円形を成す線材である芯線2の全周に砥粒電着層3を形成する必要があることから,懸濁共析によって砥粒電着層3の形成を行っている。 As described above, as a method of combining nickel as the plating metal 32 ′ and abrasive grains 31 as the dispersed particles and attaching them to the core wire 2, dispersed particles suspended on the surface of the continuously growing plating are used. "Suspension eutectoid" in which the deposited metal is adsorbed and continuously taken into the plating film by the deposited metal, and the dispersed particles settle on the horizontal plating surface and the particles are forcibly brought into contact with the core wire surface. In this application, it is necessary to form the abrasive electrodeposition layer 3 on the entire circumference of the core wire 2 which is a wire having a circular cross section. The electrodeposition layer 3 is formed.
前述した砥粒電着層3は,図1及び図7に示す実施形態では,芯線2の表面全体を完全に覆うように形成するものとしているが,図11に示すように,芯線2の表面にスパイラル状に形成することもできる。 In the embodiment shown in FIGS. 1 and 7, the above-described abrasive electrodeposition layer 3 is formed so as to completely cover the entire surface of the core wire 2, but as shown in FIG. 11, the surface of the core wire 2 is formed. It can also be formed in a spiral shape.
このように,砥粒電着層3をスパイラル状に形成すれば(図11参照),潤滑,冷却媒体としてワイヤソー1に注がれる水や油等が砥粒電着層3の非形成部に保持され易く,また,切断時に生じた切削屑等が砥粒電着層3の非形成部を介して排出され易くなることから,更なる切削能力の向上と寿命の向上が得られ,特に,砥粒電着層3の非形成部分にフッ素樹脂等の低摩擦材料層4を設けた構成にあっては,摩擦の低減とも相俟ってより一層の高速切削とワイヤソーの長寿命化を図ることができる。 In this way, when the abrasive electrodeposition layer 3 is formed in a spiral shape (see FIG. 11), water, oil, or the like poured into the wire saw 1 as a lubricating and cooling medium is applied to the non-formed portion of the abrasive electrodeposition layer 3. Since it is easy to be held, and the cutting waste generated at the time of cutting is easily discharged through the non-formed part of the abrasive electrodeposition layer 3, further improvement in cutting ability and life can be obtained. In the configuration in which the low friction material layer 4 such as a fluororesin is provided on the non-formed portion of the abrasive electrodeposition layer 3, further reduction in friction and longer life of the wire saw are achieved. be able to.
更に,芯線2の表面に下地ニッケルめっき層5を形成しておくことで,低摩擦材料層4の形成時に焼き付け等を行い,また,低摩擦材料をスパイラル状に切削剥離等する際に砥石が芯線2に対し与えるダメージを低減させることができる。 Further, by forming the base nickel plating layer 5 on the surface of the core wire 2, baking is performed when the low friction material layer 4 is formed, and the grinding stone is removed when the low friction material is cut and peeled spirally. Damage to the core wire 2 can be reduced.
このようにスパイラル状に砥粒電着層3を形成するために,この実施形態にあっては,絶縁性を有し,且つ,摩擦係数の低い材料,例えばフッ素樹脂から成る低摩擦材料層4を,芯線の表面にスパイラル状に付着させ,この低摩擦材料層4の非形成部分に対し,前述した砥粒電着層3を電着によって形成することができる。 In this embodiment, in order to form the abrasive electrodeposition layer 3 in a spiral shape, in this embodiment, a low friction material layer 4 made of a material having an insulating property and a low friction coefficient, for example, a fluororesin. Can be attached to the surface of the core wire in a spiral shape, and the above-described abrasive electrodeposition layer 3 can be formed on the non-formed portion of the low friction material layer 4 by electrodeposition.
一例として,本実施形態にあっては前述の低摩擦材料層4の形成に先立ち,芯線2の表面に一様に20μm程度の下地ニッケルめっき層5を形成し,この下地ニッケルめっき層5の表面全体に,フッ素樹脂を焼き付けコーティングした後,砥粒電着層3を形成する部分のフッ素樹脂膜を砥石車によってスパイラル状に削り落とし,削り落とされずに残ったフッ素樹脂膜を前述の低摩擦材料層4とすることができる。 As an example, in this embodiment, prior to the formation of the above-described low friction material layer 4, a base nickel plating layer 5 of about 20 μm is uniformly formed on the surface of the core wire 2, and the surface of the base nickel plating layer 5 is formed. After the entire surface is baked and coated with fluororesin, the portion of the fluororesin film on which the abrasive electrodeposition layer 3 is formed is spirally scraped off by a grinding wheel, and the remaining fluororesin film is not scraped off as described above. It can be layer 4.
低摩擦材料のコーティング前に形成された下地ニッケルめっき層5は,フッ素樹脂を焼き付けコーティングする際の熱から芯線2を保護すると共に,フッ素樹脂膜の一部分を切削除去する際に,芯線2に対し切削が及ぶことを防止する効果を有する。 The base nickel plating layer 5 formed before the coating of the low friction material protects the core wire 2 from the heat generated when the fluororesin is baked and coated, and cuts and removes a part of the fluororesin film against the core wire 2. It has the effect of preventing cutting.
このようにして表面に露出させた部分の下地ニッケルめっき層5上に,本実施形態では,表面凹凸を無くすためのニッケルめっきを行った後,前述した砥粒電着層3を電着によって形成することで,スパイラル状に砥粒電着層3を形成することもできる。 In this embodiment, after the nickel plating for eliminating surface irregularities is performed on the underlying nickel plating layer 5 exposed on the surface in this way, the above-described abrasive electrodeposition layer 3 is formed by electrodeposition. By doing so, the abrasive electrodeposition layer 3 can also be formed in a spiral shape.
電着によって形成した直後の砥粒電着層3は,図7に模式的に示すようにめっき金属32’であるニッケルが砥粒31を覆った状態となっており,切断時にワークWを切削する作用を有するダイヤモンド砥粒31が表面に露出していない状態にある。 The abrasive electrodeposition layer 3 immediately after electrodeposition is in a state in which nickel as a plating metal 32 'covers the abrasive grains 31 as schematically shown in FIG. 7, and the workpiece W is cut during cutting. In this state, the diamond abrasive grains 31 having the function to act are not exposed on the surface.
そこで,電着によって砥粒電着層3を形成した後,ワイヤソー1の表面に対して球状ショットを噴射,衝突させる表面処理を行うことにより,図1又は図11に示すように,ダイヤモンド砥粒31の一部分を露出させて切り刃31aを形成すると共に,球状ショットとの衝突によって硬化された4〜10μmのニッケル層32によってダイヤモンド砥粒31の基部を芯線2上に固定している。 Then, after forming the abrasive electrodeposition layer 3 by electrodeposition, the surface of the wire saw 1 is subjected to a surface treatment for injecting and colliding a spherical shot, so that diamond abrasive grains are obtained as shown in FIG. 1 or FIG. A part of 31 is exposed to form a cutting edge 31a, and the base portion of the diamond abrasive grain 31 is fixed on the core wire 2 by a nickel layer 32 of 4 to 10 μm hardened by collision with a spherical shot.
使用する球状ショットとしては,硬度がHV500〜1000,比重が2.0〜3.0,平均粒子径が10〜62μmの範囲のものが使用可能であり,上記硬度及び比重に該当する材質として,セラミック系(ガラスを含む)ビーズが使用可能である。 As the spherical shot to be used, those having a hardness of HV500 to 1000, a specific gravity of 2.0 to 3.0, and an average particle diameter of 10 to 62 μm can be used. As a material corresponding to the above hardness and specific gravity, Ceramic (including glass) beads can be used.
また,球状ショットの噴射圧力は,0.15MPa未満では砥粒31の露出とニッケル層32の硬度上昇が得られず,一方,0.30MPaを越えると砥粒電着層3に対し与えるダメージが大きく,砥粒31の脱落量が多くなると共にニッケル層32の剥離が生じることから,0.15〜0.30MPaとする。 Further, when the spray pressure of the spherical shot is less than 0.15 MPa, the exposure of the abrasive grains 31 and the increase in the hardness of the nickel layer 32 cannot be obtained. On the other hand, when the spray pressure exceeds 0.30 MPa, the abrasive electrodeposition layer 3 is damaged. The amount of abrasive grains 31 is large and the nickel layer 32 is peeled off. Therefore, the pressure is set to 0.15 to 0.30 MPa.
この噴射圧力は,使用する球状ショットとの関係において0.15MPa〜0.30MPaの範囲より最適となる噴射圧力を選択することが好ましく,この最適な噴射圧力は,使用する球状ショットの比重,硬度が大きくなる程,低圧側にシフトし,球状ショットの比重,硬度が低くなる程,高圧側にシフトする傾向にある。 It is preferable to select an optimum injection pressure from the range of 0.15 MPa to 0.30 MPa in relation to the spherical shot to be used. The optimum injection pressure is determined based on the specific gravity and hardness of the spherical shot to be used. The higher the value, the lower the pressure, and the lower the specific gravity and hardness of the spherical shot, the higher the pressure.
線材であるワイヤソー1の表面全体に均一に球状ショットを噴射,衝突させることができるようにするためには,球状ショットの噴射は,ワイヤソー1の全方向から行うことが必要で,本実施形態にあっては,図2に示すように,ワイヤソー1を中心に約120°毎の等角度で3本の噴射ノズル6を配置し,各噴射ノズル6よりそれぞれ圧縮気体,例えば圧縮空気と共に球状ショットを噴射,衝突させることで,ワイヤソーの周面全体に球状ショットを噴射,衝突させることができるようにした。 In order to uniformly inject and collide a spherical shot over the entire surface of the wire saw 1 that is a wire rod, it is necessary to inject the spherical shot from all directions of the wire saw 1. In this case, as shown in FIG. 2, three injection nozzles 6 are arranged at an equal angle of about 120 ° around the wire saw 1, and a spherical shot is obtained from each injection nozzle 6 together with a compressed gas, for example, compressed air. By injecting and colliding, a spherical shot can be injected and collided over the entire circumference of the wire saw.
なお,図2に示した例では3本の噴射ノズル6を使用した加工例を示しているが,更に多数の噴射ノズル6を設けて処理を行うものとしても良く,また,ワイヤソー1を,軸線を中心に回転させながら噴射ノズル6の中心を通過させることにより,ワイヤソー1の表面全周に亘り,より一層均一な処理を行うことができるようにしても良い。 In the example shown in FIG. 2, a processing example using three injection nozzles 6 is shown. However, the processing may be performed by providing a larger number of injection nozzles 6. By passing through the center of the injection nozzle 6 while rotating around the center of the wire, it may be possible to perform a more uniform process over the entire surface of the wire saw 1.
図3中の符号7は,このようなワイヤソー1に対する球状ショットの噴射,衝突を行うための加工装置であり,内部に作業空間を備えたキャビネット71内には,図4に示すように,ワイヤソー1を載置するT字状の載置台72を,キャビネット71の側面に形成されたワイヤ導入孔73からワイヤ引き出し孔(図示せず)間に所定間隔で配置すると共に,この載置台72上に,ワイヤソー1を誘導するための円筒管74を取り付けている。 Reference numeral 7 in FIG. 3 is a processing device for injecting and colliding a spherical shot with respect to such a wire saw 1, and in a cabinet 71 having an internal work space, as shown in FIG. A T-shaped mounting table 72 for mounting 1 is disposed at a predetermined interval between a wire introduction hole 73 formed on the side surface of the cabinet 71 and a wire drawing hole (not shown), and on the mounting table 72. A cylindrical tube 74 for guiding the wire saw 1 is attached.
この円筒管74は一部途切れており,この途切れた部分に向かって噴射ノズル6を配置することで,キャビネット71内に導入されたワイヤソー1に対し球体ショットを衝突させることができるようになっている。 This cylindrical tube 74 is partially interrupted, and by placing the spray nozzle 6 toward this interrupted portion, a spherical shot can be made to collide with the wire saw 1 introduced into the cabinet 71. Yes.
なお,図4に示す実施形態にあっては,載置台72上に単一の円筒管74を取り付けて,1本のワイヤソー1のみが加工されるように構成されているが,この載置台72に対する前記円筒管74の取り付けは,図5に示すように複数本平行に行うものとしても良く,このように構成することで複数本のワイヤソー1を平行して同時に給送すると共に加工することで,生産性を大幅に向上させることができる。 In the embodiment shown in FIG. 4, a single cylindrical tube 74 is attached on the mounting table 72 so that only one wire saw 1 is processed. As shown in FIG. 5, a plurality of the cylindrical tubes 74 may be attached in parallel to each other. With this configuration, a plurality of wire saws 1 are simultaneously fed and processed in parallel. , Productivity can be greatly improved.
このようにして,砥粒電着層3に対し球状ショットを噴射することで,図7に示すようにめっき金属32’であるニッケル中に埋もれていたダイヤモンド砥粒31は,図1に示すようにその一部分が露出して切り刃31aを形成すると共に,前記ダイヤモンド砥粒31の基部を固定するニッケル層32の硬度が上昇し,これにより,ダイヤモンド砥粒31の脱落が防止されるだけでなく,ワイヤソー1全体が強化される。 By injecting a spherical shot onto the abrasive electrodeposition layer 3 in this way, the diamond abrasive grains 31 buried in the nickel as the plating metal 32 'as shown in FIG. A portion thereof is exposed to form a cutting edge 31a, and the hardness of the nickel layer 32 for fixing the base of the diamond abrasive grains 31 is increased. This prevents not only the diamond abrasive grains 31 from falling off. The entire wire saw 1 is strengthened.
以下に,本発明のワイヤソーの製造実施例を説明する。 Below, the manufacture example of the wire saw of this invention is described.
〔実施例1〕
砥粒電着層の形成
直径0.12mmの硬鋼線を芯線とし,その表面全体に平均粒子径30μmのダイヤモンド砥粒を分散させた砥粒電着層を,スルファミン酸浴による電着によって形成して,直径0.12mmのダイヤモンド電着ワイヤソーを得た。
[Example 1]
Formation of an electrodeposited abrasive layer An electrodeposited abrasive layer with a 0.12mm diameter hard steel wire as the core and dispersed diamond abrasive grains with an average particle size of 30μm over the entire surface is formed by electrodeposition using a sulfamic acid bath. As a result, a diamond electrodeposited wire saw having a diameter of 0.12 mm was obtained.
なお,砥粒の未付着部分における芯線表面に形成されたニッケルめっきの厚さは約5μmであり,後述する表面処理前における砥粒電着層の母層金属であるニッケル層の硬度は,HVで450であった。 The thickness of the nickel plating formed on the surface of the core wire in the unadhered portion of the abrasive grains is about 5 μm, and the hardness of the nickel layer as the parent metal of the abrasive electrodeposition layer before the surface treatment described later is HV It was 450.
表面処理条件
上記の砥粒電着層が形成されたダイヤモンド電着ワイヤに対し,球状ショットを噴射して,表面処理を行った。
Surface treatment conditions Surface treatment was performed by injecting spherical shots onto the diamond electrodeposited wire on which the above-mentioned abrasive electrodeposition layer was formed.
球状ショットの投射は,市販のショットピーニング装置(不二製作所製「SC-4S-303(微粉用)」)を使用し,ノズル孔の直径が7mmのノズル3本を,ワイヤソーを中心として120°の等角度で配置すると共に位置固定し,ノズル距離130mmとして球状ショットの噴射を行った。ワイヤソーの給送速度は15m/minである。 A spherical shot is projected using a commercially available shot peening machine ("SC-4S-303 (for fine powders)" manufactured by Fuji Seisakusho). Three nozzles with a nozzle hole diameter of 7 mm are centered on a wire saw at 120 °. Were fixed at the same angle and the position was fixed, and a spherical shot was sprayed at a nozzle distance of 130 mm. The feeding speed of the wire saw is 15 m / min.
球状ショットとして,セラミック系の硬質ビーズ(不二機販製「FHB」シリーズ)♯400(粒子径53〜38μm)を使用し,噴射圧力を0.15MPa,0.20MPa,0.25MPaで処理した場合のそれぞれについて,処理後の砥粒電着層の表面状態を評価した。 As a spherical shot, ceramic hard beads (FHB series manufactured by Fujiki Sales) # 400 (particle size 53-38 μm) were used, and the injection pressure was 0.15 MPa, 0.20 MPa, and 0.25 MPa. In each case, the surface state of the treated electrodeposited abrasive layer was evaluated.
なお,実施例1で使用した球状ショットの組成及び物性を表1に示す。 Table 1 shows the composition and physical properties of the spherical shot used in Example 1.
試験結果
上記で説明した実施例1の製造条件に従い得られた砥粒電着層の状態を確認した結果を,表2に示す。
Test results Table 2 shows the results of confirming the state of the abrasive electrodeposition layer obtained according to the production conditions of Example 1 described above.
以上の結果,変化させた噴射圧力0.15〜0.25MPaの全範囲において,砥粒の一部分が露出したことによる切り刃の形成と,ニッケル層の硬度上昇が確認された。 As a result of the above, it was confirmed that the cutting edge was formed and the hardness of the nickel layer was increased by exposing a part of the abrasive grains in the entire range of the changed injection pressure of 0.15 to 0.25 MPa.
もっとも,噴射圧力0.15MPaで表面処理を行った場合,砥粒の露出は行われているものの,露出状態に若干の不足が見られると共に,ニッケル層の硬度の上昇も,0.20MPaで噴射を行った場合に比較して低いものであり,表面処理を行っていないワイヤソーに比較して性能の向上が得られるものの,噴射圧力を0.20MPaとして表面処理を行った場合に比較して,効果の向上が低いものであった。 However, when the surface treatment is performed at an injection pressure of 0.15 MPa, although the abrasive grains are exposed, there is a slight shortage in the exposed state, and the nickel layer hardness increases by 0.20 MPa. Compared with the case where the surface treatment is performed with an injection pressure of 0.20 MPa, although the performance is improved as compared with the wire saw not subjected to the surface treatment. The improvement in the effect was low.
一方,噴射圧力を0.25MPaとした例でも,砥粒の露出による切り刃の形成と,ニッケル層の硬度の向上が確認されており,未処理のワイヤソーに比較して性能の向上が見られるものの,僅かに脱落した砥粒の発生と,砥粒電着層に僅かではあるが剥離が確認されており,表面処理が幾分過剰に行われていることが確認された。 On the other hand, even in the case where the injection pressure is 0.25 MPa, the formation of the cutting edge due to the exposure of the abrasive grains and the improvement of the hardness of the nickel layer have been confirmed, and the performance is improved compared to the untreated wire saw. However, the occurrence of slightly dropped abrasive grains and slight peeling of the abrasive electrodeposition layer were confirmed, confirming that the surface treatment was somewhat excessive.
よって,実施例1で使用した球状ショットとの関係では,噴射圧力を0.20MPaとした場合に,砥粒電着層が最適な状態に処理できることが確認された。 Therefore, in relation to the spherical shot used in Example 1, it was confirmed that the abrasive electrodeposition layer can be processed in an optimum state when the injection pressure is 0.20 MPa.
〔実施例2〕
試験条件
表面処理において使用した球状ショットとして,ガラスビーズ(不二製作所製「FGB」)♯400を使用した点,噴射圧力を,0.20MPa,0.25MPa,0.30MPaの3パターンで行った点を除き,実施例1と同様である。
[Example 2]
Test conditions Glass beads (“FGB” manufactured by Fuji Seisakusho) # 400 were used as spherical shots used in the surface treatment, and the injection pressure was measured in three patterns of 0.20 MPa, 0.25 MPa, and 0.30 MPa. Except for this point, the second embodiment is the same as the first embodiment.
なお,実施例2で使用した球状ショットの組成及び物性は表3に示す通りである。 The composition and physical properties of the spherical shot used in Example 2 are as shown in Table 3.
試験結果
上記で説明した実施例2の製造条件に従い得られたワイヤソーの砥粒電着層の状態を確認した結果を,表4に示す。
Test Results Table 4 shows the results of confirming the state of the electrodeposited abrasive layer of the wire saw obtained according to the manufacturing conditions of Example 2 described above.
以上の結果,噴射圧力0.20〜0.30MPaの全範囲において,砥粒の露出による切り刃の形成と,ニッケル層の硬度上昇という効果が得られることが確認された。 As a result, it was confirmed that the effects of forming the cutting edge due to the exposure of the abrasive grains and increasing the hardness of the nickel layer were obtained in the entire range of the injection pressure of 0.20 to 0.30 MPa.
また,実施例2で使用した球状ショットとの関係では,噴射圧力を0.25MPaとした場合に,砥粒電着層が最適な状態に処理できることが確認された。 Further, in relation to the spherical shot used in Example 2, it was confirmed that the abrasive electrodeposition layer can be processed in an optimum state when the injection pressure is 0.25 MPa.
なお,上記実施例1との比較において,実施例1で使用した球状ショットに対し低密度で,低硬度の球状ショットを使用した実施例2では,実施例1の場合に比較して最適な噴射圧力が高圧側にシフトしていることが確認された。 In comparison with Example 1 above, in Example 2 using a low-density, low-hardness spherical shot compared to the spherical shot used in Example 1, the optimum injection compared to Example 1 was used. It was confirmed that the pressure shifted to the high pressure side.
〔実施例3〕
試験条件
表面処理において使用した球状ショットとして,セラミック系の硬質ビーズ(不二機販製「FHB」)♯600(粒径38〜10μm)を使用した点を除き,実施例1と同様である。
Example 3
Test conditions The same as in Example 1, except that ceramic hard beads (“FHB” manufactured by Fujiki Sales Co., Ltd.) # 600 (particle size 38 to 10 μm) were used as the spherical shot used in the surface treatment.
なお,実施例3で使用した球状ショットの組成及び物性は,粒径を除き表1に示した通りである。 The composition and physical properties of the spherical shot used in Example 3 are as shown in Table 1 except for the particle size.
試験結果
上記で説明した実施例3の製造条件に従い得られたワイヤソーの砥粒電着層の状態を確認した結果を,表5に示す。
Test Results Table 5 shows the results of confirming the state of the electrodeposited abrasive layer of the wire saw obtained according to the manufacturing conditions of Example 3 described above.
以上の結果,実施例1と同様,噴射圧力0.15〜0.25MPaの全範囲において,砥粒の露出による切り刃の形成と,ニッケル層の硬度上昇という効果が得られることが確認された。 As a result of the above, as in Example 1, it was confirmed that the effect of forming the cutting edge by exposing the abrasive grains and increasing the hardness of the nickel layer was obtained in the entire range of the injection pressure of 0.15 to 0.25 MPa. .
なお実施例3で使用したショットは,粒径が小さい点を除き実施例1で使用した球状ショットと同一のものであるが,この球状ショットにおける噴射圧力の最適値は,実施例1の場合と同様,0.20MPaであった。 The shot used in Example 3 is the same as the spherical shot used in Example 1 except that the particle size is small. The optimum value of the injection pressure in this spherical shot is the same as that in Example 1. Similarly, it was 0.20 MPa.
この実施例1と実施例3の比較結果より,使用する球状ショットの粒径変化は,噴射圧力の最適値の変化に対する影響が少ないことが判る。 From the comparison results of Example 1 and Example 3, it can be seen that the change in the particle size of the spherical shot used has little effect on the change in the optimum value of the injection pressure.
〔比較例1〕
試験条件
実施例1における表面処理に代え,アルミナ製のグリッド(不二製作所製「ホワイトアランダム」)♯400(粒径44〜37μm),硬度HV2000を使用して,噴射圧力0.10MPa,0.15MPaでサンドブラストによるエッチングを行った。その他の条件は実施例1と同様である。
[Comparative Example 1]
Test conditions Instead of the surface treatment in Example 1, a grid made of alumina (“White Alundum” manufactured by Fuji Seisakusho) # 400 (particle size 44 to 37 μm), hardness HV2000, injection pressure 0.10 MPa, 0 Etching was performed by sandblasting at 15 MPa. Other conditions are the same as in the first embodiment.
試験結果
上記で説明した比較例1の製造条件に従いサンドブラストによるエッチングを行った後の,砥粒電着層の状態を観察した結果を,表6に示す。
Test Results Table 6 shows the results of observing the state of the abrasive electrodeposition layer after etching by sandblasting according to the production conditions of Comparative Example 1 described above.
以上の結果,アルミナ製のグリッドを使用したサンドブラストによるエッチングでは,砥粒の好適な露出も,ニッケル層の硬度上昇も得られないことが確認された。 As a result, it was confirmed that the etching by sand blasting using the grid made of alumina did not provide a suitable exposure of the abrasive grains and an increase in the hardness of the nickel layer.
しかも,比較例1の方法で処理された砥粒電着層では,ニッケル層の表面が梨地状に粗れており,破壊の起点となる傷が全体に亘って形成されていることから,これによりニッケル層の強度の低下,更にはワイヤソー自身の強度低下が生じているものと考えられる。 In addition, in the abrasive electrodeposition layer treated by the method of Comparative Example 1, the surface of the nickel layer is roughened in a satin state, and scratches that are the starting points of fracture are formed throughout. As a result, the strength of the nickel layer is lowered, and further, the strength of the wire saw itself is lowered.
シリコンインゴットの切断試験
〔比較例2〕
前述した実施例1に記載の方法で製造した本発明のワイヤソー(実施例1)と,実施例1と同様の方法で砥粒電着層を形成した後,表面処理を行っていない状態のワイヤソー(比較例2)をそれぞれ使用し,シリコンインゴットの切断を行った。
Silicon ingot cutting test [Comparative Example 2]
The wire saw of the present invention manufactured by the method described in Example 1 (Example 1) and the wire saw in which no surface treatment is performed after forming the electrodeposited abrasive layer by the same method as in Example 1. Each (Comparative Example 2) was used to cut the silicon ingot.
実施例1のワイヤソーを使用して切断したシリコンインゴットの切断面(図9参照)は,比較例2のワイヤソーを使用して切断したシリコンインゴットの切断面(図13参照)に比較して,明らかに切削幅が小さく,切断面の粗れも少なく,凹凸が小さくきれいであり,しかも,真っ直ぐに切断できていた。 The cut surface of the silicon ingot cut using the wire saw of Example 1 (see FIG. 9) is clearer than the cut surface of the silicon ingot cut using the wire saw of Comparative Example 2 (see FIG. 13). In addition, the cutting width was small, the roughness of the cut surface was small, the unevenness was small and clean, and it was able to cut straight.
このことから,本発明のワイヤソーを使用することで,図6(B)を参照して説明した切断代δ,研磨代tのいずれ共に減少させることができ,その結果,同一長さのインゴットからより多くの製品を切り出すことができると共に,切り出し後の研磨時間を短縮できることが判る。 Therefore, by using the wire saw of the present invention, it is possible to reduce both the cutting allowance δ and the polishing allowance t described with reference to FIG. 6B. As a result, the ingot having the same length can be reduced. It can be seen that more products can be cut and the polishing time after cutting can be shortened.
しかも,比較例2のワイヤソーでは,表面に多数の凸部が存在していた使用前の状態(図12参照)に対し,使用後では表面の凸部が殆ど無くなっており(図14参照),シリコンインゴットを切断することで,電着によって表面に付着されていた砥粒が殆ど脱落してしまっており,再使用することはできない状態となっていた。 Moreover, in the wire saw of Comparative Example 2, the surface protrusions are almost eliminated after use (see FIG. 14), compared to the state before use (see FIG. 12) where many protrusions existed on the surface. By cutting the silicon ingot, most of the abrasive grains adhered to the surface by electrodeposition had fallen off and could not be reused.
これに対し実施例1のワイヤソーにあっては,切断に使用した後(図10参照)であっても,使用前(図8参照)と略同様の状態に凸部が残っていることが確認でき,本発明によれば,粗れの無いきれいな切断面が得られるだけでなく,砥粒の脱落が生じ難く長寿命のワイヤソーを提供できた。 On the other hand, in the wire saw of Example 1, it was confirmed that the convex portion remained in the same state as before use (see FIG. 8) even after being used for cutting (see FIG. 10). In addition, according to the present invention, it is possible to provide a long-life wire saw that not only provides a clean cut surface with no roughness but also prevents abrasive grains from falling off.
1 ワイヤソー
2 芯線
3 砥粒電着層
31 砥粒(ダイヤモンド砥粒)
31a 切り刃
32 ニッケル層
32’ めっき金属
4 低摩擦材料層
5 下地ニッケルめっき層
6 噴射ノズル
7 加工装置
71 キャビネット
72 載置台
73 ワイヤ導入孔
74 円筒管
δ 切断代
d ワイヤソーの間隔
t 研磨代
DESCRIPTION OF SYMBOLS 1 Wire saw 2 Core wire 3 Abrasive electrodeposition layer 31 Abrasive grain (diamond abrasive grain)
31a Cutting blade 32 Nickel layer 32 'Plating metal 4 Low friction material layer 5 Underlying nickel plating layer 6 Injection nozzle 7 Processing device 71 Cabinet 72 Mounting table 73 Wire introduction hole 74 Cylindrical tube δ Cutting allowance d Wire saw interval t Polishing allowance
Claims (3)
前記砥粒電着層が形成された前記芯線に,硬度がHV500〜1000,比重2.0〜3.0,平均粒子径10〜62μmの球状ショットを噴射圧力0.15〜0.30MPaで噴射すると共に衝突させる表面処理工程を含み,
前記表面処理工程において,前記球状ショットとの衝突によって前記砥粒の一部分を前記ニッケルめっき層上に露出させて前記砥粒電着層に切り刃を形成すると共に,
前記ショットとの衝突により前記砥粒の基部で前記ニッケルめっき層を強化し,かつ,前記ニッケルめっき層を,硬度が上昇した厚さ4〜10μmに形成したことを特徴とするワイヤソーの製造方法。 Forming an abrasive electrodeposition layer, which is a nickel plating layer in which abrasive grains having an average particle diameter of 8 to 35 μm are dispersed in a core wire by electrodeposition, in a spiral shape;
A spherical shot having a hardness of HV500 to 1000, a specific gravity of 2.0 to 3.0, and an average particle diameter of 10 to 62 μm is sprayed to the core wire on which the abrasive electrodeposition layer is formed at an injection pressure of 0.15 to 0.30 MPa. And a surface treatment process for colliding,
In the surface treatment step, a part of the abrasive grains are exposed on the nickel plating layer by collision with the spherical shot to form a cutting edge in the abrasive electrodeposition layer,
By colliding with previous SL shot enhance the nickel plating layer at the base of the abrasive grains, and a wire saw method for producing characterized in that said nickel plating layer, the hardness was formed to a thickness of 4~10μm elevated .
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JP2013083332A JP6245833B2 (en) | 2013-04-11 | 2013-04-11 | Wire saw manufacturing method |
TW103106232A TWI566864B (en) | 2013-04-11 | 2014-02-25 | Manufacture of wire saws and wire saws |
KR1020140023279A KR101563418B1 (en) | 2013-04-11 | 2014-02-27 | Wire saw and method for preparing the same |
CN201410126245.9A CN104097270B (en) | 2013-04-11 | 2014-03-31 | The manufacture method of scroll saw and scroll saw |
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CN104908500B (en) * | 2015-05-18 | 2017-08-25 | 刘肖梅 | A kind of engraving wheel of steel wire texture processing unit (plant) |
CN104849211B (en) * | 2015-05-27 | 2017-11-17 | 深圳市常兴技术股份有限公司 | Electroplate the detection method that abrasive surface diamond thickeies degree |
CN106086950B (en) * | 2016-06-24 | 2018-12-18 | 中国有色桂林矿产地质研究院有限公司 | A kind of preparation method of the interior circular knife of slot mosaic diamond |
CN108527664A (en) * | 2018-02-09 | 2018-09-14 | 江苏中博钻石科技有限公司 | Annular diamond wire saw cutting device |
CN110091435A (en) * | 2019-06-12 | 2019-08-06 | 成都易德莱斯科技有限公司 | Negative-feedback auto-control rope saw and regulation method |
CN110704985A (en) * | 2019-10-16 | 2020-01-17 | 北京航空航天大学 | Involute grinding wheel grinding surface appearance simulation method |
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KR100299102B1 (en) * | 1998-11-24 | 2001-11-22 | 홍영철 | Diamond electrodeposition wire for cutting brittle materials and manufacturing method |
JP2002075767A (en) * | 2000-08-31 | 2002-03-15 | Sumitomo Special Metals Co Ltd | Rare earth permanent magnet having corrosion-resistant covering, and its manufacturing method |
TW571000B (en) * | 2001-10-19 | 2004-01-11 | Nihon Parkerizing | Methods of preparing metal wires for plastic processing |
JP2004009238A (en) * | 2002-06-10 | 2004-01-15 | Kanai Hiroaki | Saw wire manufacturing method and saw wire |
JP2007152485A (en) * | 2005-12-05 | 2007-06-21 | Kanai Hiroaki | Manufacturing method of saw wire |
CN101090804A (en) * | 2005-12-27 | 2007-12-19 | 日本精细钢铁株式会社 | Fixed abrasive wire |
JP2007268627A (en) * | 2006-03-30 | 2007-10-18 | Noritake Super Abrasive:Kk | Electro-deposited wire saw |
JP5356071B2 (en) * | 2009-03-02 | 2013-12-04 | 住友電気工業株式会社 | Diamond wire saw, diamond wire saw manufacturing method |
US8425640B2 (en) * | 2009-08-14 | 2013-04-23 | Saint-Gobain Abrasives, Inc. | Abrasive articles including abrasive particles bonded to an elongated body |
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JP2012157908A (en) * | 2011-01-28 | 2012-08-23 | Sumco Corp | Method for slicing hard brittle material |
JP5863170B2 (en) * | 2011-01-31 | 2016-02-16 | サンコール株式会社 | Method for manufacturing fixed abrasive wire |
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US9375826B2 (en) * | 2011-09-16 | 2016-06-28 | Saint-Gobain Abrasives, Inc. | Abrasive article and method of forming |
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TWI566864B (en) | 2017-01-21 |
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