TWI781293B - Electroplating grindstone - Google Patents

Electroplating grindstone Download PDF

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TWI781293B
TWI781293B TW108106102A TW108106102A TWI781293B TW I781293 B TWI781293 B TW I781293B TW 108106102 A TW108106102 A TW 108106102A TW 108106102 A TW108106102 A TW 108106102A TW I781293 B TWI781293 B TW I781293B
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grindstone
plated
talc
base
volume
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TW108106102A
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Chinese (zh)
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TW201936330A (en
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山本和寬
林毅
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日商迪思科股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0018Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for by electrolytic deposition
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D5/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor
    • B24D5/12Cut-off wheels
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated

Abstract

[課題]提供一種能夠抑制加工不良的產生之電鍍磨石。[解決手段]具備以包含鎳的電鍍層固定磨粒的磨石部,且磨石部中含有滑石。又,磨石部中,可以含有磨石部的2.0體積%以上15.0體積%以下的滑石。此外,磨石部中含有的滑石之平均粒徑可以為0.6μm以上10.0μm以下。又,電鍍磨石可以是僅由圓環狀的磨石部所構成。此外,電鍍磨石也可以是由具有把持部之圓環狀的基台,以及形成在基台的外緣部之磨石部所構成。[Problem] To provide a plated grindstone capable of suppressing occurrence of machining defects. [Solution] A grinding stone portion is provided in which abrasive grains are fixed by a plating layer containing nickel, and talc is contained in the grinding stone portion. Moreover, in a grindstone part, you may contain the talc of 2.0 volume% or more and 15.0 volume% or less of a grindstone part. Moreover, the average particle diameter of the talc contained in a grindstone part may be 0.6 micrometer or more and 10.0 micrometer or less. In addition, the plated grindstone may be constituted only by the circular grindstone portion. In addition, the plated grindstone may be composed of an annular base having a holding portion, and a grindstone portion formed on the outer edge of the base.

Description

電鍍磨石Electroplated grinding stone

本發明是關於一種具備以電鍍層固定磨粒的磨石部之電鍍磨石。The present invention relates to an electroplated grindstone having a grindstone portion in which abrasive grains are fixed by an electroplated layer.

切割裝置廣泛地用於各種工件的切割加工中。例如,將半導體晶圓分割為多片元件晶片時的切割加工是使用切割裝置來實施。此外,在LED(Light Emitting Diode,發光二極體)封裝中,使用將環氧樹脂含浸於玻璃纖維而形成的玻璃環氧基板等,在分割該玻璃環氧基板以獲得元件封裝時,藉由切割裝置進行切割加工。Cutting devices are widely used in the cutting process of various workpieces. For example, dicing processing when dividing a semiconductor wafer into a plurality of element wafers is performed using a dicing device. In addition, in LED (Light Emitting Diode, light-emitting diode) packages, glass epoxy substrates formed by impregnating glass fibers with epoxy resin, etc. are used, and when the glass epoxy substrates are divided to obtain element packages, by The cutting device performs cutting processing.

切割加工是使用安裝於切割裝置所具備的主軸之前端部上的圓環狀之磨石(切割刀片)而實施。該磨石是例如藉由以包含鎳等的電鍍層固定以金剛石等製成的磨粒所形成。在專利文獻1中,揭示了一種將電鍍用基盤浸漬於混入有金剛石等磨粒的硫酸鎳等電解液中,使該基盤上成長包含磨粒的電鍍層以製造圓環狀的磨石之方法。Cutting is carried out using a ring-shaped whetstone (cutting blade) attached to the front end of the main shaft of the cutting device. The grindstone is formed, for example, by fixing abrasive grains made of diamond or the like with a plating layer containing nickel or the like. Patent Document 1 discloses a method of immersing a base plate for electroplating in an electrolyte solution such as nickel sulfate mixed with abrasive grains such as diamond, and growing a plated layer containing abrasive grains on the base plate to produce a ring-shaped grinding stone. .

當使切割裝置的主軸旋轉,使圓環狀的磨石一邊旋轉一邊切入工件時,從磨石的電鍍層露出的磨粒會與工件接觸以切割工件。並且,若持續切割加工則電鍍層磨耗而露出的磨粒會脫落,新的磨粒會自電鍍層露出。此作用被稱作自銳性(self-sharpening),藉由自銳性維持磨石的切割功能。 [習知技術文獻] [專利文獻]When the main shaft of the cutting device is rotated and the annular whetstone cuts into the workpiece while rotating, the abrasive grains exposed from the plating layer of the whetstone come into contact with the workpiece to cut the workpiece. In addition, if the cutting process is continued, the exposed abrasive grains will fall off due to abrasion of the plating layer, and new abrasive grains will be exposed from the plating layer. This effect is called self-sharpening, and the cutting function of the whetstone is maintained by self-sharpening. [Prior art literature] [Patent Document]

[專利文獻1] 日本特開2000-87282號公報[Patent Document 1] Japanese Patent Laid-Open No. 2000-87282

[發明所欲解決的課題] 在以包含鎳的電鍍層固定磨粒的磨石中,磨粒相對強固地被固定在電鍍層上。因此,即使切割工件磨粒也難以自電鍍層脫落,而難以產生自銳性。若不適度地產生自銳性,則會產生例如切割屑堆積在露出的磨粒間而切割阻力增大(氣孔堵塞)、露出的磨粒由於磨耗而變平滑使磨石的銳利度降低(磨粒鈍化)等現象。若以此種狀態的磨石進行切割加工,會產生在工件上形成被稱作崩裂的崩缺等之加工不良。[Problems to be Solved by the Invention] In a grindstone having abrasive grains fixed with a nickel-containing plating layer, the abrasive grains are fixed relatively strongly on the plating layer. Therefore, even if the workpiece is cut, the abrasive grains are less likely to fall off from the plating layer, and self-sharpening is less likely to occur. If the self-sharpening is not properly generated, for example, cutting chips will accumulate between the exposed abrasive grains and the cutting resistance will increase (pore clogging), and the exposed abrasive grains will become smooth due to abrasion and the sharpness of the grinding stone will decrease (grinding). Particle passivation) and other phenomena. When cutting is performed with the grindstone in such a state, machining defects such as chipping called chipping may occur on the workpiece.

又,特別如玻璃、陶瓷、透明環氧樹脂,或樹脂與電極的複合材料等,被稱作難切割材料之切割加工困難的材料之切割加工中,難以產生自銳性。因此,當使用以包含鎳的電鍍層固定磨粒之磨石時,會有原來就難以切割的難切割材料之切割加工變得更加困難的問題。In addition, it is difficult to produce self-sharpening when cutting difficult-to-cut materials such as glass, ceramics, transparent epoxy resin, or composite materials of resin and electrodes. Therefore, when using a grindstone in which abrasive grains are fixed by a plating layer containing nickel, there is a problem that it becomes more difficult to cut difficult-to-cut materials that are difficult to cut.

本發明是有鑑於此種問題而提出,以提供一種能夠抑制加工不良的產生之電鍍磨石為課題。This invention was made in view of such a problem, and it makes it a subject to provide the electroplated grindstone which can suppress generation|occurrence|production of a processing defect.

[解決課題的技術手段] 根據本發明的一個態樣,提供一種電鍍磨石,其具備以包含鎳的電鍍層固定磨粒的磨石部,且該磨石部中含有滑石。[Technical means to solve the problem] According to one aspect of the present invention, there is provided a plated grindstone including a grindstone portion in which abrasive grains are fixed by a plating layer containing nickel, and including talc in the grindstone portion.

又,在本發明的一個態樣中,該磨石部中,可以含有磨石部的2.0體積%以上15.0體積%以下的滑石。此外,在本發明的一個態樣中,該磨石部中含有的滑石之平均粒徑可以為0.6μm以上10.0μm以下。Moreover, in one aspect of this invention, the said grindstone part can contain the talc of 2.0 volume% or more and 15.0 volume% or less of the grindstone part. Moreover, in one aspect of this invention, the average particle diameter of the talc contained in this grindstone part may be 0.6 micrometer or more and 10.0 micrometer or less.

又,在本發明的一個態樣中,該電鍍磨石可以是僅由圓環狀的該磨石部所構成。此外,在本發明的一個態樣中,該電鍍磨石也可以是由具有把持部之圓環狀的基台,以及形成在該基台的外緣部之該磨石部所構成。In addition, in one aspect of the present invention, the plated grindstone may be constituted only by the ring-shaped grindstone portion. In addition, in one aspect of the present invention, the electroplating grindstone may be composed of an annular base having a holding portion, and the grindstone portion formed on the outer edge of the base.

[發明功效] 根據本發明的一個態樣之電鍍磨石,具備含有滑石的磨石部,所述滑石為硬度比鎳低且具有潤滑性的材料。藉由使用該電鍍磨石進行切割加工,能夠促進電鍍磨石的自銳性並且降低電鍍磨石與工件之間的摩擦,且抑制加工不良的發生。[Efficacy of the invention] An electroplated grindstone according to one aspect of the present invention includes a grindstone portion containing talc which is a material having lubricity lower in hardness than nickel. By using the plated grindstone for cutting processing, the self-sharpening of the plated grindstone can be promoted, the friction between the plated grindstone and a workpiece can be reduced, and the occurrence of machining defects can be suppressed.

以下,參閱附圖說明本發明的實施方式。本實施方式是關於藉由電鍍所形成的磨石(電鍍磨石)。圖1(A)及圖1(B)中,顯示可以在本實施方式中使用的電鍍磨石之構成例。Hereinafter, embodiments of the present invention will be described with reference to the drawings. This embodiment relates to a grindstone formed by electroplating (electroplated grindstone). FIG. 1(A) and FIG. 1(B) show configuration examples of plated grindstones that can be used in this embodiment.

圖1(A)是顯示由磨石部3所組成的電鍍磨石1之構成例的立體圖。電鍍磨石1是僅由在中央部具有貫通孔3a之圓環狀的磨石部3所構成,其整體係藉由電鍍所形成的切削刀刃。磨石部3是藉由以例如包含鎳的電鍍層將金剛石等磨粒固定而形成。藉由圓環狀的磨石部3所構成之電鍍磨石1被稱作墊圈型式(washer type)。FIG. 1(A) is a perspective view showing a configuration example of a plated grindstone 1 composed of a grindstone portion 3 . The electroplating whetstone 1 is constituted only by the annular whetstone part 3 having a through-hole 3a in the center, and the whole is a cutting edge formed by electroplating. The grindstone part 3 is formed by fixing abrasive grains, such as diamond, with the electroplating layer containing nickel, for example. The electroplated grindstone 1 constituted by the circular grindstone portion 3 is called a washer type.

圖1(B)是顯示具備基台7及磨石部9的電鍍磨石5之構成例的立體圖。電鍍磨石5是由在中央部具有貫通孔7a之圓環狀的基台7以及在基台7的外緣部藉由電鍍形成的磨石部9所構成。磨石部9是藉由以例如包含鎳的電鍍層將金剛石等磨粒固定而形成。在基台7的外緣部電鍍有磨石部9之電鍍磨石5被稱作輪轂型式(hub type)。FIG. 1(B) is a perspective view showing a configuration example of a plated grindstone 5 including a base 7 and a grindstone portion 9 . The plated grindstone 5 is composed of an annular base 7 having a through hole 7 a in the center and a grindstone portion 9 formed by plating on the outer edge of the base 7 . The grindstone part 9 is formed by fixing abrasive grains, such as diamond, with the electroplating layer containing nickel, for example. The plated grindstone 5 in which the grindstone portion 9 is plated on the outer edge of the base 7 is called a hub type.

此外,基台7在其中央部具有在寬度方向突出之圓環狀的把持部7b。使用切割裝置進行切割加工時,切割裝置的使用者(操作員)可握著把持部7b以將電鍍磨石5安裝至切割裝置。In addition, the base 7 has an annular holding portion 7b protruding in the width direction at its central portion. When cutting using a cutting device, a user (operator) of the cutting device can hold the grip portion 7 b to attach the plated grindstone 5 to the cutting device.

電鍍磨石1及5是安裝於設置在切割裝置上的主軸之前端部。當在此狀態下使主軸旋轉時,電鍍磨石1及5以主軸的軸心作為旋轉軸而旋轉。然後,藉由在使電鍍磨石1及5旋轉的狀態下切入工件,實施工件的切割加工。The electroplated grinding stones 1 and 5 are installed on the front end of the main shaft arranged on the cutting device. When the main shaft is rotated in this state, the electroplating grindstones 1 and 5 rotate around the axis of the main shaft as a rotation axis. Then, the workpiece is cut by cutting into the workpiece while the plating grindstones 1 and 5 are being rotated.

另外,使用電鍍磨石1及5切割的工件之材料並沒有限制。可以使用在各種材料的切割加工中,例如矽或SiC等半導體材料、玻璃、陶瓷、玻璃環氧樹脂,或樹脂與電極的複合材料等。In addition, there is no limitation on the material of the workpiece cut using the electroplated grindstones 1 and 5 . It can be used in the cutting process of various materials, such as semiconductor materials such as silicon or SiC, glass, ceramics, glass epoxy resin, or composite materials of resin and electrodes, etc.

工件的切割是藉由從磨石部3及9的電鍍層露出之磨粒接觸工件而進行。並且,若持續切割加工則電鍍層磨耗而露出的磨粒會脫落,新的磨粒會自電鍍層露出。此作用被稱作自銳性,藉由自銳性維持磨石的切割功能。Cutting of the workpiece is performed by contacting the abrasive grains exposed from the plated layers of the grindstone portions 3 and 9 to the workpiece. In addition, if the cutting process is continued, the exposed abrasive grains will fall off due to abrasion of the plating layer, and new abrasive grains will be exposed from the plating layer. This effect is called self-sharpening, and the cutting function of the whetstone is maintained by self-sharpening.

然而,在以包含鎳的電鍍層固定磨粒的磨石部3及9中,磨粒相對強固地被固定在電鍍層上。因此,即使切割工件磨粒也難以自電鍍層脫落,而難以產生自銳性。特別是在切割玻璃、陶瓷、玻璃環氧樹脂,或樹脂與電極的複合材料等,切割加工困難的材料(難切割材料)的情況下,更是難以產生自銳性。若以此種狀態的磨石部3及9進行切割加工,會產生在工件上形成被稱作崩裂的崩缺等之加工不良。However, in the grinding stone portions 3 and 9 in which the abrasive grains are fixed by the plating layer containing nickel, the abrasive grains are fixed relatively strongly on the plating layer. Therefore, even if the workpiece is cut, the abrasive grains are less likely to fall off from the plating layer, and self-sharpening is less likely to occur. Especially when cutting glass, ceramics, glass epoxy resin, or composite materials of resin and electrodes, etc., it is difficult to produce self-sharpening when cutting materials that are difficult to process (difficult-to-cut materials). When cutting is performed with the grindstone portions 3 and 9 in such a state, machining defects such as chipping called chipping may occur on the workpiece.

於是,在本實施方式中,使電鍍磨石1的磨石部3及電鍍磨石5的磨石部9含有滑石(水合矽酸鎂(Mg3 Si4 O10 (OH)2 ))。滑石比鎳硬度低(莫氏硬度1),若使磨石部3及9含有滑石則電鍍層會變脆弱而容易磨耗,可以有望促進自銳性。藉由適度地使自銳性發生來維持電鍍磨石1及5的切割功能,能夠抑制切割加工時的加工不良的產生。Therefore, in this embodiment, the grindstone portion 3 of the plated grindstone 1 and the grindstone portion 9 of the plated grindstone 5 contain talc (hydrated magnesium silicate (Mg 3 Si 4 O 10 (OH) 2 )). Talc is lower in hardness than nickel (Mohs hardness 1), and if talc is included in the grinding stone portions 3 and 9, the plating layer becomes weak and easily abraded, and self-sharpening can be expected to be promoted. By appropriately generating self-sharpening and maintaining the cutting function of the plated grindstones 1 and 5, it is possible to suppress the occurrence of processing defects during cutting processing.

再來,由於滑石是具有潤滑性的材料,若使磨石部3及9含有滑石,則切割加工時能夠期待電鍍磨石1及5與工件之間的摩擦會降低。藉由此摩擦的降低,抑制切割加工時工件的崩缺(崩裂)等的切割不良之發生。Furthermore, since talc is a lubricating material, if the grindstone portions 3 and 9 contain talc, the friction between the plated grindstones 1 and 5 and the workpiece can be expected to decrease during cutting. This reduction in friction suppresses the occurrence of cutting failures such as chipping (cracking) of the workpiece during cutting.

磨石部3及9中含有的滑石量,能夠根據電鍍層的材料、磨粒的材料及粒徑、工件的材料等適當地設定,但較佳為設定在會降低加工不良且電鍍磨石1及5的強度能保持在一定以上的範圍。The amount of talc contained in the grinding stone parts 3 and 9 can be appropriately set according to the material of the plating layer, the material and particle size of the abrasive grains, the material of the workpiece, etc., but it is preferably set at such a level that the machining defects can be reduced and the plating grinding stone 1 and The strength of 5 can be kept above a certain range.

例如能夠使磨石部3及9中含有滑石,使相對於磨石部3及9的滑石含量為2.0體積%以上15.0體積%以下,較佳為2.2體積%以上15.0體積%以下,更佳為2.2體積%以上6.2體積%以下。該滑石的含量,可以藉由例如阿基米德法測量。For example, talc can be contained in the grinding stone parts 3 and 9, and the talc content relative to the grinding stone parts 3 and 9 is 2.0 volume % to 15.0 volume %, preferably 2.2 volume % to 15.0 volume %, more preferably 2.2 volume % % or more and 6.2 volume % or less. The talc content can be measured by, for example, the Archimedes method.

此外,滑石的粒徑也能夠和滑石的含量一樣地適當設定。例如,能夠使用以雷射繞射法測量時的平均粒徑為0.6μm以上10.0μm以下之滑石。In addition, the particle size of talc can also be appropriately set in the same manner as the content of talc. For example, talc having an average particle diameter of 0.6 μm or more and 10.0 μm or less when measured by a laser diffraction method can be used.

如以上所述,藉由在以包含鎳的電鍍層固定磨粒之磨石部3及9中含有滑石,能夠抑制切割加工時的加工不良。As described above, by including talc in the grindstone portions 3 and 9 in which the abrasive grains are fixed by the electroplating layer containing nickel, it is possible to suppress machining defects during cutting.

接著,說明關於在磨石部中含有滑石之電鍍磨石的製造方法之例子。圖1(A)所示電鍍磨石1及圖1(B)所示電鍍磨石5分別能夠使用電解電鍍等製造。Next, an example of a method for producing a plated grindstone containing talc in the grindstone portion will be described. The plated grindstone 1 shown in FIG. 1(A) and the plated grindstone 5 shown in FIG. 1(B) can be manufactured using electrolytic plating or the like, respectively.

圖2是示意性顯示用於墊圈型式電鍍磨石1之製造的製造裝置2之構成例的剖面圖。如圖2所示,製造電鍍磨石1時,首先準備容納混入有金剛石等磨粒之鎳電鍍液16的電鍍浴槽4。鎳電鍍液16的材料可以任意地選擇,例如能夠使用包含硫酸鎳或硝酸鎳等之鎳的電解液。FIG. 2 is a cross-sectional view schematically showing a configuration example of a manufacturing apparatus 2 for manufacturing a washer-type plated grindstone 1 . As shown in FIG. 2 , when manufacturing the electroplated grinding stone 1 , first, the electroplating bath 4 containing the nickel electroplating solution 16 mixed with abrasive grains such as diamond is prepared. The material of the nickel plating solution 16 can be selected arbitrarily, for example, an electrolytic solution containing nickel such as nickel sulfate or nickel nitrate can be used.

此外,在鎳電鍍液16中添加使電鍍磨石1的磨石部3含有的滑石。具體來說,如圖2所示,將滑石與界面活性劑混合而生成的混合液18被添加至鎳電鍍液16中。此界面活性劑具有使滑石在鎳電鍍液16中分散的功能。另外,界面活性劑的材料可以任意地選擇。當在鎳電鍍液16中添加混合液18時,滑石會概略均勻地分散在鎳電鍍液16中。In addition, talc contained in the grinding stone part 3 of the plating grinding stone 1 is added to the nickel plating solution 16 . Specifically, as shown in FIG. 2 , a mixed solution 18 obtained by mixing talc and a surfactant is added to the nickel plating solution 16 . This surfactant has the function of dispersing talc in the nickel plating solution 16 . In addition, the material of the surfactant can be selected arbitrarily. When the mixed solution 18 is added to the nickel electroplating solution 16 , the talc is roughly uniformly dispersed in the nickel electroplating solution 16 .

接著,將以不銹鋼和鋁等金屬材料形成的圓盤狀基台20與鎳電極6,浸漬於電鍍浴槽4內的鎳電鍍液16中。在基台20的表面上,形成有對應所需磨石部3之形狀的遮罩22例如,在形成如同圖1(A)所示的圓環狀磨石部3的情況下,形成為在俯視中具有圓環狀開口部的遮罩22。Next, the disk-shaped base 20 and the nickel electrode 6 formed of metal materials such as stainless steel and aluminum are immersed in the nickel plating solution 16 in the plating bath 4 . On the surface of the base 20, a mask 22 corresponding to the shape of the required grinding stone part 3 is formed. For example, in the case of forming an annular grinding stone part 3 as shown in FIG. A mask 22 having an annular opening.

此外,基台20經由開關8而連接到直流電源10的負端子(負極),鎳電極6連接至直流電源10的正端子(正極)。另外,開關8也可以配置於鎳電極6與直流電源10之間。In addition, the base 20 is connected to the negative terminal (negative pole) of the DC power supply 10 via the switch 8 , and the nickel electrode 6 is connected to the positive terminal (positive pole) of the DC power supply 10 . In addition, the switch 8 may be arranged between the nickel electrode 6 and the DC power supply 10 .

接著,一邊藉由馬達等旋轉驅動源12使葉片14旋轉以攪拌鎳電鍍液16,一邊使配置在基台20與直流電源10之間的開關8短路。藉此,將基台20作為陰極並將鎳電極6作為陽極以使直流電流在鎳電鍍液16中流通,在基台20的表面上遮罩22沒有覆蓋的區域中電鍍包含鎳的電鍍層,並且形成包含滑石及磨粒的磨石部3。Next, the switch 8 arranged between the base 20 and the DC power supply 10 is short-circuited while the blade 14 is rotated by the rotational drive source 12 such as a motor to stir the nickel plating solution 16 . Thereby, the base 20 is used as a cathode and the nickel electrode 6 is used as an anode so that a direct current flows through the nickel electroplating solution 16, and an electroplating layer comprising nickel is electroplated in an area not covered by the mask 22 on the surface of the base 20, And the grindstone part 3 containing talc and abrasive grains is formed.

圖3(A)是顯示磨石部3形成於基台20之表面的狀態之剖面圖。如圖3(A)所示,在基台20的表面上遮罩22沒有覆蓋的區域中,形成圓環狀的磨石部3,其包含鎳的電鍍層中滑石與磨粒概略均勻地分散。FIG. 3(A) is a cross-sectional view showing a state where the grindstone portion 3 is formed on the surface of the base 20 . As shown in FIG. 3(A), an annular grindstone portion 3 is formed on the surface of the base 20 where the mask 22 does not cover, and the talc and abrasive grains are roughly uniformly dispersed in the nickel-containing plating layer.

之後,將形成於基台20表面上的磨石部3從基台20剝離。圖3(B)是顯示磨石部3從基台20剝離的樣子之剖面圖。藉此,磨石部3自基台20分離,並得到由磨石部3所構成的墊圈型式的電鍍磨石1。Thereafter, the grindstone portion 3 formed on the surface of the base 20 is peeled off from the base 20 . FIG. 3(B) is a cross-sectional view showing how the grindstone portion 3 is peeled off from the base 20 . Thereby, the grindstone part 3 is separated from the base 20, and the plated grindstone 1 of the washer type constituted by the grindstone part 3 is obtained.

再者,圖1(B)所示的電鍍磨石5也能夠以與電鍍磨石1相同的方法製造。圖4是示意性顯示用於輪轂型式電鍍磨石5之製造的製造裝置24之構成例的剖面圖。另外,對於以下所說明的構成之外,可以參酌製造裝置2(圖2)的說明。In addition, the plating grindstone 5 shown in FIG.1(B) can also be manufactured by the same method as the plating grindstone 1. FIG. 4 is a cross-sectional view schematically showing a configuration example of a manufacturing device 24 used for manufacturing a hub-type plated grindstone 5 . In addition, the description of the manufacturing apparatus 2 ( FIG. 2 ) can be referred to other than the configuration described below.

首先,與電鍍磨石1的製造方法同樣地,準備容納混入有金剛石等磨粒之鎳電鍍液16的電鍍浴槽4。然後,將混合滑石與界面活性劑而生成的混合液18添加至鎳電鍍液16中。能夠用於鎳電鍍液16及混合液18的材料,與電鍍磨石1的製造方法相同所以省略說明。First, in the same manner as the manufacturing method of the electroplating grindstone 1, the electroplating bath 4 containing the nickel electroplating solution 16 in which abrasive grains such as diamonds are mixed is prepared. Then, a mixed solution 18 obtained by mixing talc and a surfactant is added to the nickel plating solution 16 . The materials that can be used for the nickel plating solution 16 and the mixed solution 18 are the same as those for the production method of the plating grinding stone 1, so the description thereof will be omitted.

接著,將以不銹鋼和鋁等金屬材料形成的基台26與鎳電極6,浸漬於電鍍浴槽4內的鎳電鍍液16中。另外,基台26經過之後的步驟而成為支撐電鍍磨石5之磨石部9的基台7(參閱圖1(B)),所以基台26的形狀是對應基台7的形狀。Next, the base 26 and the nickel electrode 6 formed of metal materials such as stainless steel and aluminum are immersed in the nickel plating solution 16 in the plating bath 4 . In addition, the base 26 becomes the base 7 supporting the grindstone portion 9 of the electroplating grindstone 5 through subsequent steps (see FIG. 1(B) ), so the shape of the base 26 corresponds to the shape of the base 7 .

具體來說,如圖5(A)所示,基台26是對應電鍍磨石5的基台7之形狀而形成為圓環狀,在其中心部設置有貫通孔26a。此貫通孔相當於設置在基台7的中央部之貫通孔7a(參閱圖1(B))。Specifically, as shown in FIG. 5(A), the base 26 is formed in an annular shape corresponding to the shape of the base 7 of the electroplating grindstone 5, and a through hole 26a is provided in the center thereof. This through-hole corresponds to the through-hole 7a provided in the center part of the base 7 (refer FIG.1(B)).

在基台26的表面上,形成有對應所需磨石部9之形狀的遮罩28。例如,在如同圖1(B)所示沿著基台7之外緣部形成圓環狀磨石部9的情況下,形成遮罩28,其在俯視中具有沿著基台26之外緣部形成的圓環狀開口部。然後,與電鍍磨石1的製造方法同樣地,在基台26的表面上遮罩28沒有覆蓋的區域中電鍍包含鎳的電鍍層,並且形成包含滑石及磨粒的磨石部9。On the surface of the base 26, a mask 28 corresponding to the shape of the desired grindstone portion 9 is formed. For example, in the case where the annular grindstone portion 9 is formed along the outer edge of the base 7 as shown in FIG. Formed circular opening. Then, in the same manner as the method of manufacturing the plated grindstone 1 , a plated layer containing nickel is plated on the surface of the base 26 where the mask 28 does not cover, and the grindstone portion 9 containing talc and abrasive grains is formed.

之後,將遮罩28自基台26去除。藉此,得到在表面上形成有磨石部9的基台26。圖5(A)是顯示磨石部9形成於基台26之表面的狀態之剖面圖。Afterwards, the mask 28 is removed from the submount 26 . Thereby, the base 26 with the grindstone part 9 formed on the surface is obtained. FIG. 5(A) is a cross-sectional view showing a state where the grindstone portion 9 is formed on the surface of the base 26 .

接著,藉由蝕刻基台26的外緣部,使覆蓋在基台26上的磨石部9之一部分露出。藉此,如圖5(B)所示,得到在基台7的外緣部形成有磨石部9之輪轂型式的電鍍磨石5。此外,也可以藉由上述蝕刻調整把持部7b的形狀。Next, by etching the outer edge of the base 26, a part of the grindstone portion 9 covering the base 26 is exposed. Thereby, as shown in FIG.5(B), the plated grindstone 5 of the hub type which formed the grindstone part 9 in the outer edge part of the base 7 was obtained. In addition, the shape of the gripping portion 7b can also be adjusted by the above-mentioned etching.

藉由使用以上的製造方法,能夠製造具備含有滑石之磨石部3及9的電鍍磨石1及5。By using the above manufacturing method, the plated grindstones 1 and 5 including the grindstone portions 3 and 9 containing talc can be manufactured.

接著,說明關於具備含有滑石之磨石部的電鍍磨石的評估結果。在此,以磨石部中含有的滑石量不同之多個電鍍磨石分別切割工件,測量由切割所產生在工件上的崩缺(崩裂)之尺寸,藉此評估加工的精確度。此外,測量在磨石部中含有的滑石量不同之多個電鍍磨石的彈性係數,並由此彈性係數評估電鍍磨石的強度。Next, the evaluation results about the plated grindstone provided with the grindstone portion containing talc will be described. Here, the workpiece is cut with a plurality of plated grindstones with different amounts of talc contained in the grindstone portion, and the size of the chipping (crack) on the workpiece generated by cutting is measured to evaluate the processing accuracy. In addition, the elastic coefficients of a plurality of plated grindstones differing in the amount of talc contained in the grindstone portion were measured, and the strength of the plated grindstones was evaluated from the elastic coefficients.

評估中,使用根據上述製造方法製造的、在磨石部中含有滑石之墊圈型式(參閱圖1(A))的電鍍磨石。電鍍磨石的外徑為53.4mm、內徑為40mm、厚度為0.10mm,磨粒是使用以篩子來分級時的平均粒徑為9μm的金剛石粒。另外,磨粒的集中度為50(12.5體積%)。In the evaluation, a plated grindstone of the washer type (see FIG. 1(A) ) containing talc in the grindstone portion manufactured according to the above-mentioned manufacturing method was used. The plated grindstone had an outer diameter of 53.4 mm, an inner diameter of 40 mm, and a thickness of 0.10 mm, and the abrasive grains used were diamond grains with an average particle diameter of 9 μm when classified by a sieve. In addition, the concentration of abrasive grains was 50 (12.5% by volume).

此外,為了評估滑石含量的影響,製作了磨石部中包含不同滑石量的7種電鍍磨石。在電鍍磨石的製作中,使用以雷射繞射法測量時的平均粒徑為0.8μm的滑石。使用阿基米德法測量所製作的7種電鍍磨石之磨石部中含有的滑石量後,在7種磨石部中分別含有相對磨石部為0.0體積%(未添加滑石的電鍍磨石)、1.0體積%、2.2體積%、6.2體積%、11.4體積%、15.0體積%及17.5體積%。Furthermore, in order to evaluate the influence of the talc content, seven types of plated grindstones containing different amounts of talc in the grindstone portion were produced. In preparation of the plated grindstone, talc having an average particle diameter of 0.8 μm as measured by a laser diffraction method was used. The amount of talc contained in the grinding stone part of the 7 types of plated grinding stones produced was measured using the Archimedes method, and each of the 7 types of grinding stones contained 0.0% by volume relative to the grinding stone part (the plated grinding stone without adding talc), 1.0% by volume, 2.2% by volume, 6.2% by volume, 11.4% by volume, 15.0% by volume and 17.5% by volume.

接著,分別將7種電鍍磨石整修形狀,磨銳並進行正圓校正。之後,由切割裝置的卡盤台吸引保持工件,並分別對7種電鍍磨石進行了一邊供給切割水至電鍍磨石(水溫20℃的純水)一邊使電鍍磨石切入工件以切割該工件的加工。Next, 7 types of electroplated grinding stones were trimmed, sharpened and corrected for a perfect circle. Afterwards, the workpiece is sucked and held by the chuck table of the cutting device, and each of the seven types of plated grindstones is cut while supplying cutting water to the plated grindstone (pure water at a water temperature of 20°C) and the plated grindstone is cut into the workpiece to cut the workpiece. Workpiece processing.

使用長度100mm、寬度100mm及厚度0.4mm的硼矽酸玻璃作為工件。接著,使電鍍磨石以每分鐘30000轉的速度旋轉,將電鍍磨石配置為其下端位於工件下端更下方,並通過沿著與工件的長度方向大致平行的方向使工件和電鍍磨石以5mm/s的速度相對地移動以切割工件。通過在工件寬度方向上以5.0mm間隔進行19次該切割加工,將工件分割為20小片。Borosilicate glass having a length of 100 mm, a width of 100 mm, and a thickness of 0.4 mm was used as a workpiece. Then, the electroplated grindstone is rotated at a speed of 30000 revolutions per minute, and the lower end of the electroplated grindstone is arranged below the lower end of the workpiece, and the workpiece and the electroplated grindstone are separated by 5 mm in a direction approximately parallel to the longitudinal direction of the workpiece. /s speed to move relatively to cut the workpiece. By performing this cutting process 19 times at intervals of 5.0 mm in the width direction of the workpiece, the workpiece was divided into 20 small pieces.

之後,使卡盤台在水平方向旋轉90度,並利用以同樣的條件沿著與其寬度方向大致平行的方向切割工件,將各小片進一步分割成20片。如此一來,將工件分割為400個晶片。Thereafter, the chuck table was rotated 90 degrees in the horizontal direction, and the workpiece was cut in a direction approximately parallel to its width direction under the same conditions to further divide each small piece into 20 pieces. In this way, the workpiece is divided into 400 wafers.

之後,從所獲得的400個晶片中選擇5個晶片,並分別對於5個晶片測量由於切割加工而產生在切割面上的崩裂之與工件厚度方向垂直方向上的長度。然後,將崩裂的最大長度作為崩裂尺寸,並計算出5個晶片之崩裂尺寸的平均值(平均崩裂尺寸)。After that, 5 wafers were selected from the obtained 400 wafers, and the lengths in the direction perpendicular to the workpiece thickness direction of the cracks generated on the cut surface due to the dicing process were measured for each of the 5 wafers. Then, the maximum length of the chipping was taken as the chipping size, and the average value (average chipping size) of the chipping sizes of five wafers was calculated.

對於各個使用滑石含量不同的7種電鍍磨石所得的晶片,進行上述平均崩裂尺寸的計算。圖6是顯示電鍍磨石的磨石部中含有的滑石量與平均崩裂尺寸之間的關係之圖形。另外,在圖6中,以使用未含有滑石的電鍍磨石(滑石的含量為0.0體積%的電鍍磨石)所得的晶片之平均崩裂尺寸作為基準(100%),並顯示使用其他電鍍磨石所得的晶片之平均崩裂尺寸的比率。The calculation of the above-mentioned average chipping size was carried out for each of the wafers obtained by using seven types of plated grindstones with different talc contents. Fig. 6 is a graph showing the relationship between the amount of talc contained in the grinding stone portion of the plated grinding stone and the average chipping size. In addition, in Fig. 6, the average chipping size of the wafer obtained by using a plated grindstone that does not contain talc (a plated grindstone with a talc content of 0.0% by volume) is used as a reference (100%), and it shows that using other plated grindstones The ratio of the average chipping size of the resulting wafers.

如圖6所示,滑石的含量為2.2體積%以上時平均崩裂尺寸會大幅地降低。這被推測為是因為當滑石的含量為2.2體積%以上時,磨石部所包含的電鍍層比滑石更脆弱而適度地產生自銳性,並且藉由滑石的潤滑性降低電鍍磨石與工件之間的摩擦,而加工的精確度提高了。從而,電鍍磨石的磨石部中含有的滑石量,特別較佳為在2.2體積%以上。As shown in FIG. 6 , when the content of talc is 2.2% by volume or more, the average crack size is significantly reduced. This is presumed to be because when the content of talc is 2.2% by volume or more, the plated layer included in the grinding stone part is weaker than talc and moderately produces self-sharpening, and the lubricating property of talc reduces the distance between the plated grinding stone and the workpiece. The friction between them, and the precision of processing is improved. Therefore, the amount of talc contained in the grindstone portion of the plated grindstone is particularly preferably 2.2% by volume or more.

此外,為了評估滑石的含量不同的7種電鍍磨石的強度,測量了各電鍍磨石的彈性係數。彈性係數是從在切割加工後的電鍍磨石之前端部負載預定的負重所得到的應力-歪斜曲線計算出來。然後,彈性係數高的電鍍磨石愈不容易變形且強度愈高,以此來評估電鍍磨石的強度。Furthermore, in order to evaluate the strength of seven kinds of plated grindstones having different talc contents, the modulus of elasticity of each plated grindstone was measured. The modulus of elasticity is calculated from the stress-deflection curve obtained by loading a predetermined load on the tip before cutting the processed plated grindstone. Then, the electroplated grindstone with high elastic modulus is less likely to be deformed and has higher strength, so as to evaluate the strength of the plated grindstone.

圖7是顯示電鍍磨石的磨石部中含有的滑石量與電鍍磨石彈性係數之間的關係之圖形。另外,在圖7中,以未含有滑石的電鍍磨石(滑石的含量為0.0體積%的電鍍磨石)的彈性係數作為基準(100%),並顯示其他電鍍磨石的彈性係數之比率。7 is a graph showing the relationship between the amount of talc contained in the grindstone portion of the plated grindstone and the elastic coefficient of the plated grindstone. In addition, in FIG. 7 , the ratio of the elastic coefficients of other plated grindstones is shown based on the modulus of elasticity of a plated grindstone not containing talc (plated grindstone with a talc content of 0.0% by volume) as a reference (100%).

根據圖7,滑石的含量為1.0體積%以上6.2體積%以下的電鍍磨石之彈性係數,比未含有滑石的電鍍磨石之彈性係數更高,且強度提高。雖並不是很清楚這樣少量添加滑石時電鍍磨石的彈性係數會上升的理由,但可以推測為是因為滑石的添加量為少量的情況下,滑石粒子在電鍍層的內部均勻地分散,會抑制電鍍層的轉移。According to FIG. 7 , the modulus of elasticity of the plated grindstone having a talc content of 1.0% to 6.2% by volume is higher than that of the plated grindstone not containing talc, and the strength is improved. The reason why the modulus of elasticity of the plated grinding stone increases when such a small amount of talc is added is not clear, but it is presumed that when the amount of talc added is small, the talc particles are uniformly dispersed inside the plating layer, which inhibits the Electroplating layer transfer.

滑石的含量從1.0體積%增加時,彈性係數會逐漸降低。這被推測為是因為根據滑石含量的增加,磨石部所包含的電鍍層變脆弱。然而,不論是哪個電鍍磨石,都沒有觀察到在切割加工時電鍍磨石會變形而蛇行的樣子,能夠確認各電鍍磨石皆具備對工件的切割所需的強度。When the content of talc increases from 1.0% by volume, the modulus of elasticity decreases gradually. This is presumed to be because the plating layer included in the grinding stone portion becomes weak due to the increase in the talc content. However, in any of the plated grindstones, it was not observed that the plated grindstone deformed and meandered during cutting, and it was confirmed that each plated grindstone had the strength required for cutting the workpiece.

但是,滑石的含量達到17.5體積%時彈性係數的比率約為30%,可知道彈性係數急劇地降低。以該電鍍磨石,會有特別是難切割材料等之加工變成困難的情況。因此,為了不使電鍍磨石的強度大幅降低而減少平均崩裂尺寸,特別較佳為將滑石的含量設為2.2體積%以上15.0體積%以下。However, when the talc content reaches 17.5% by volume, the ratio of the modulus of elasticity is about 30%, and it can be seen that the modulus of elasticity decreases rapidly. With this plated whetstone, it may become difficult to process especially difficult-to-cut materials. Therefore, in order to reduce the average chipping size without greatly reducing the strength of the plated grindstone, it is particularly preferable to make the content of talc 2.2 vol % or more and 15.0 vol % or less.

此外,特別是滑石的含量為6.2體積%以下的電鍍磨石,相較於未含有滑石的電鍍磨石彈性係數高,且電鍍磨石的強度會提高。因此,當將滑石的含量設為2.2體積%以上6.2體積以下時,能夠使電鍍磨石的強度提高並且抑制崩裂的產生。In addition, in particular, a plated grindstone having a talc content of 6.2% by volume or less has a higher modulus of elasticity than a plated grindstone not containing talc, and the strength of the plated grindstone increases. Therefore, when the content of talc is 2.2% by volume or more and 6.2% by volume or less, the strength of the plated grindstone can be improved and the occurrence of chipping can be suppressed.

根據以上的評估結果,藉由使用使磨石部含有滑石的電鍍磨石,能夠降低切割加工時的崩裂,並進行高精確度的切割加工。Based on the above evaluation results, by using a plated grindstone in which talc is contained in the grindstone portion, it is possible to reduce chipping during cutting and perform high-precision cutting.

其他,上述實施方式的構造、方法等,在不脫離本發明目的之範圍下,可作適當變更以實施。In addition, the structures, methods, etc. of the above-mentioned embodiments can be implemented with appropriate changes without departing from the scope of the purpose of the present invention.

1‧‧‧電鍍磨石 3‧‧‧磨石部 3a‧‧‧貫通孔 5‧‧‧電鍍磨石 7‧‧‧基台 7a‧‧‧貫通孔 7b‧‧‧把持部 9‧‧‧磨石部 2‧‧‧製造裝置 4‧‧‧電鍍浴槽 6‧‧‧鎳電極 8‧‧‧開關 10‧‧‧直流電源 12‧‧‧旋轉驅動源 14‧‧‧葉片 16‧‧‧鎳電鍍液 18‧‧‧添加劑 20‧‧‧基台 22‧‧‧遮罩 24‧‧‧製造裝置 26‧‧‧基台 28‧‧‧遮罩1‧‧‧Electroplated grindstone 3‧‧‧Millstone Department 3a‧‧‧through hole 5‧‧‧Electroplating grindstone 7‧‧‧Abutment 7a‧‧‧through hole 7b‧‧‧Control Department 9‧‧‧Millstone Department 2‧‧‧Manufacturing device 4‧‧‧Electroplating bath 6‧‧‧Nickel electrode 8‧‧‧Switch 10‧‧‧DC power supply 12‧‧‧rotary drive source 14‧‧‧blade 16‧‧‧Nickel plating solution 18‧‧‧Additives 20‧‧‧abutment 22‧‧‧Masking 24‧‧‧Manufacturing device 26‧‧‧Abutment 28‧‧‧Masking

圖1中圖1(A)是顯示由磨石部所組成的電鍍磨石之構成例的立體圖,圖1(B)是顯示具備基台及磨石部的電鍍磨石之構成例的立體圖。 圖2是示意性顯示用於墊圈型式電鍍磨石之製造的製造裝置之構成例的剖面圖。 圖3中圖3(A)是顯示磨石部形成於基台之表面的狀態之剖面圖,圖3(B)是顯示磨石部從基台剝離的樣子之剖面圖。 圖4是示意性顯示用於輪轂型式電鍍磨石之製造的製造裝置之構成例的剖面圖。 圖5中圖5(A)是顯示磨石部形成於基台之表面的狀態之剖面圖,圖5(B)是顯示使覆蓋在基台上的磨石部之一部分露出的狀態之剖面圖。 圖6是顯示電鍍磨石的磨石部中含有的滑石量與平均崩裂尺寸的比率之間的關係之圖形。 圖7是顯示電鍍磨石的磨石部中含有的滑石量與電鍍磨石彈性係數的比率之間的關係之圖形。1(A) in FIG. 1 is a perspective view showing a configuration example of an electroplated grindstone composed of a grindstone portion, and FIG. 1(B) is a perspective view showing a configuration example of an electroplated grindstone including a base and a grindstone portion. Fig. 2 is a cross-sectional view schematically showing a configuration example of a manufacturing apparatus used for manufacturing a washer-type plated grindstone. 3(A) in FIG. 3 is a cross-sectional view showing a state where the grindstone portion is formed on the surface of the base, and FIG. 3(B) is a cross-sectional view showing a state where the grindstone portion is peeled off from the base. Fig. 4 is a cross-sectional view schematically showing a configuration example of a manufacturing apparatus for manufacturing a hub-type plated grindstone. 5(A) is a cross-sectional view showing a state where a grindstone portion is formed on the surface of the base, and FIG. 5(B) is a cross-sectional view showing a state where a part of the grindstone portion covering the base is exposed. Fig. 6 is a graph showing the relationship between the ratio of the amount of talc contained in the grinding stone portion of the plated grinding stone and the ratio of the average chipping size. 7 is a graph showing the relationship between the amount of talc contained in the grindstone portion of the plated grindstone and the ratio of the elastic coefficient of the plated grindstone.

1‧‧‧電鍍磨石 1‧‧‧Electroplated grindstone

3‧‧‧磨石部 3‧‧‧Millstone Department

3a‧‧‧貫通孔 3a‧‧‧through hole

5‧‧‧電鍍磨石 5‧‧‧Electroplating grindstone

7‧‧‧基台 7‧‧‧Abutment

7a‧‧‧貫通孔 7a‧‧‧through hole

7b‧‧‧把持部 7b‧‧‧Control Department

9‧‧‧磨石部 9‧‧‧Millstone Department

Claims (5)

一種電鍍磨石,其特徵在於:具備以包含鎳的電鍍層固定磨粒的磨石部,該磨石部中含有該磨石部的2.2體積%以上15.0體積%以下的滑石。 An electroplated grindstone comprising a grindstone portion in which abrasive grains are fixed by a plating layer containing nickel, the grindstone portion containing talc in an amount of 2.2% by volume to 15.0% by volume of the grindstone portion. 如請求項1所述的電鍍磨石,其中,該磨石部中,含有該磨石部的2.2體積%以上6.2體積%以下的滑石。 The electroplated grindstone according to claim 1, wherein the grindstone portion contains talc in an amount of 2.2% by volume to 6.2% by volume of the grindstone portion. 如請求項1或2所述的電鍍磨石,其中,該磨石部中含有的滑石之平均粒徑為0.6μm以上10.0μm以下。 The plated grindstone according to claim 1 or 2, wherein the talc contained in the grindstone portion has an average particle diameter of 0.6 μm or more and 10.0 μm or less. 如請求項1或2所述的電鍍磨石,其中,該電鍍磨石是僅由圓環狀的該磨石部所構成。 The electroplated grindstone according to claim 1 or 2, wherein the electroplated grindstone is constituted only by the annular grindstone portion. 如請求項1或2所述的電鍍磨石,其中,該電鍍磨石是由具有把持部之圓環狀的基台,以及形成在該基台的外緣部之該磨石部所構成。 The electroplated grindstone according to claim 1 or 2, wherein the electroplated grindstone is composed of an annular base having a holding portion, and the grindstone portion formed on the outer edge of the base.
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