JP6204107B2 - 多層構造メタルマスク及びその製造方法 - Google Patents

多層構造メタルマスク及びその製造方法 Download PDF

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JP6204107B2
JP6204107B2 JP2013160341A JP2013160341A JP6204107B2 JP 6204107 B2 JP6204107 B2 JP 6204107B2 JP 2013160341 A JP2013160341 A JP 2013160341A JP 2013160341 A JP2013160341 A JP 2013160341A JP 6204107 B2 JP6204107 B2 JP 6204107B2
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hardness
plating layer
layer
plate thickness
fine crystal
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JP2015030162A (ja
JP2015030162A5 (https=
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圭介 武井
圭介 武井
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Bon Mark Co Ltd
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Bon Mark Co Ltd
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  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP2013160341A 2013-08-01 2013-08-01 多層構造メタルマスク及びその製造方法 Active JP6204107B2 (ja)

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JP2013160341A JP6204107B2 (ja) 2013-08-01 2013-08-01 多層構造メタルマスク及びその製造方法

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JP2013160341A JP6204107B2 (ja) 2013-08-01 2013-08-01 多層構造メタルマスク及びその製造方法

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JP2015030162A JP2015030162A (ja) 2015-02-16
JP2015030162A5 JP2015030162A5 (https=) 2016-06-09
JP6204107B2 true JP6204107B2 (ja) 2017-09-27

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104626735B (zh) * 2015-03-11 2017-06-09 京东方科技集团股份有限公司 网版组件、网版印刷系统及网版印刷方法
JP7554035B2 (ja) * 2018-04-18 2024-09-19 太陽誘電株式会社 印刷用孔版及びその製造方法
JP6894141B2 (ja) * 2019-06-07 2021-06-23 株式会社プロセス・ラボ・ミクロン メタルマスク、及びその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2840666B2 (ja) * 1989-11-22 1998-12-24 九州日立マクセル株式会社 スクリーン印刷用メッシュ、並びにその製造方法
JP5291353B2 (ja) * 2007-02-08 2013-09-18 株式会社ボンマーク メタルマスク及びその製造方法
JP5394652B2 (ja) * 2007-04-10 2014-01-22 株式会社ボンマーク 多層構造メタルマスク及びその製造方法
JP2009233948A (ja) * 2008-03-26 2009-10-15 Bonmaaku:Kk スクリーン印刷用メタルマスク及びその製造方法
JP5441663B2 (ja) * 2009-12-16 2014-03-12 株式会社ソノコム 多層構造メタルマスク

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