JP6125005B2 - 電流測定式ガスセンサー - Google Patents
電流測定式ガスセンサー Download PDFInfo
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- JP6125005B2 JP6125005B2 JP2015520175A JP2015520175A JP6125005B2 JP 6125005 B2 JP6125005 B2 JP 6125005B2 JP 2015520175 A JP2015520175 A JP 2015520175A JP 2015520175 A JP2015520175 A JP 2015520175A JP 6125005 B2 JP6125005 B2 JP 6125005B2
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- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
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- 239000002086 nanomaterial Substances 0.000 description 1
- 201000009240 nasopharyngitis Diseases 0.000 description 1
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- AJCDFVKYMIUXCR-UHFFFAOYSA-N oxobarium;oxo(oxoferriooxy)iron Chemical compound [Ba]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O AJCDFVKYMIUXCR-UHFFFAOYSA-N 0.000 description 1
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- 229910052903 pyrophyllite Inorganic materials 0.000 description 1
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- 238000009790 rate-determining step (RDS) Methods 0.000 description 1
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- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical class FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
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Description
本発明は電流測定式ガスセンサーに関する。
(PEO)6−LiSbF6
[式中、PEOはポリ(エチレンオキシド)をいう]で表される結晶性ポリマーを含んでもよい。このポリマーは導電性を有する。理論に縛られることを望まないが、当該ポリマー鎖が折り重なって、内側でリチウムイオンがエーテル酸素により配位される円筒状トンネルが形成され、一方でアニオンは、カチオンとの相互作用を連動することなく、当該トンネルの外側に配置されるものと考えられる。従って、結晶性材料の向上されたイオン伝導性は、当該トンネルの中を通るカチオンの相対的に自由な動きによりもたらされる。
Claims (53)
- 被検体の濃度を測定するための電流測定式ガスセンサーであって、
非導電性ポリマーを含む固形支持体であって、前記被検体による接触がなければ絶縁体として構成されており、かつ、前記被検体が通過して拡散するように構成されている固形支持体;
該固形支持体と接触する作用電極;および
前記固形支持体と接触し、かつ前記作用電極からスペースをあけて離れている参照電極
を含み、
前記作用電極および前記参照電極が前記固形支持体の導電率を測定するように構成されており、
前記作用電極および前記参照電極は、前記被検体による接触前、互いに絶縁されており、
前記固形支持体は、前記被検体との接触時に導電率が増大するように構成されているガスセンサー。 - 前記固形支持体の少なくとも一部が非晶質である、請求項1に記載のセンサー。
- 前記固形支持体の少なくとも一部が結晶質である、請求項1に記載のセンサー。
- 前記固形支持体が、前記被検体による接触前、ドーパントの不存在により特徴付けられる、請求項1〜3のいずれかに記載のセンサー。
- 前記固形支持体が多孔性固形物を含み、該多孔性固形物の全体積で除した該多孔性固形物中の気孔体積が0.7以下、または0.1〜0.7、または0.3〜0.65の範囲内である、請求項1〜4のいずれかに記載のセンサー。
- 前記固形支持体が、ポリ(エチレンテレフタレート)、ポリ(エチレンオキシド)、ポリビニリデンフルオリド、ポリエチレン、ポリプロピレン、ポリエチレン−ナフトレート、ポリフェニレンスルフィド、ポリカーボネート、ポリテトラフルオロエチレン、ポリプロピレンオキシド、アクリル系樹脂、ポリスチレン、ポリ(スチレン−アクリロニトリル)、ポリ(アクリルニトリル−ブタジエン−スチレン)、ポリビニルクロリド、塩素化ポリエーテル、ポリ(クロロトリフルオロエチレン)、またはこれらの2種以上の混合物を含む、請求項1〜5のいずれかに記載のセンサー。
- 前記固形支持体がポリ(エチレンテレフタレート)を含む、請求項1〜5のいずれかに記載のセンサー。
- 前記固形支持体が、塩の不存在により特徴付けられる、請求項1〜7のいずれかに記載のセンサー。
- 前記固形支持体が、非導電性フィラーをさらに含む、請求項1〜8のいずれかに記載のセンサー。
- 前記作用電極が、貴金属を含む、請求項1〜9のいずれかに記載のセンサー。
- 前記作用電極が、金、白金、イリジウム、パラジウム、オスミウム、銀、ロジウム、ルテニウム、チタン、またはこれらの2種以上の混合物を含む、請求項1〜10のいずれかに記載のセンサー。
- 前記参照電極が、貴金属を含む、請求項1〜11のいずれかに記載のセンサー。
- 前記参照電極が、金、白金、イリジウム、パラジウム、オスミウム、銀、ロジウム、ルテニウム、チタン、またはこれらの2種以上の混合物を含む、請求項1〜12のいずれかに記載のセンサー。
- 前記被検体が、酸化ガスまたは還元ガスを含む、請求項1〜13のいずれかに記載のセンサー。
- 前記被検体が、蒸気状の過酸化水素、エチレンオキシド、オゾン、またはこれらの2種以上の混合物を含む、請求項1〜14のいずれかに記載のセンサー。
- 前記被検体が、蒸気状の過酸化水素を含む、請求項1〜14のいずれかに記載のセンサー。
- 前記被検体が、硫化水素、亜硫酸水素塩、アンモニア、メタン、エタン、プロパン、ブタン、一酸化炭素、シュウ酸、ギ酸、アスコルビン酸、亜リン酸、またはこれらの2種以上の混合物を含む、請求項1〜14のいずれかに記載のセンサー。
- 前記固形支持体がポリ(エチレンテレフタレート)を含み、前記作用電極がパラジウムを含み、前記被検体が蒸気状の過酸化水素を含む、請求項1〜17のいずれかに記載のセンサー。
- 前記固形支持体が、0.05〜0.6mm、または0.07〜0.5mm、または0.1〜0.3mm、または0.25mmの範囲内の厚みを有するポリ(エチレンテレフタレート)フィルムの形態である、請求項1〜18のいずれかに記載のセンサー。
- 前記作用電極および前記参照電極が固形支持体上にパラジウムをスパッタリングすることにより形成され、前記固形支持体がポリ(エチレンテレフタレート)フィルムを含む、請求項1〜19のいずれかに記載のセンサー。
- 前記作用電極および前記参照電極がパラジウムを含み、前記参照電極および前記作用電極の厚みが40〜150ナノメーター、または80〜120ナノメーター、または100ナノメーターの範囲内にある、請求項1〜20のいずれかに記載のセンサー。
- 前記固形支持体がポリ(エチレンテレフタレート)フィルムを含み、前記作用電極および前記参照電極が前記ポリ(エチレンテレフタレート)フィルム上にスパッタされたパラジウム電極を含み;これらの電極の厚みが40〜150ナノメーター、または80〜120ナノメーター、または100ナノメーターの範囲内にあり;前記ポリ(エチレンテレフタレート)フィルムの厚みが0.05〜0.6mm、または0.07〜0.5mm、または0.1〜0.3mm、または0.25mmの範囲内にあり;前記電極が互いに0.7〜0.9mm、または0.88mmだけ離れている、請求項1〜21のいずれかに記載のセンサー。
- 前記作用電極が電位制御に接続されて、前記参照電極に対して作用電極で安定な電位差を維持する、請求項1〜22のいずれかに記載のセンサー。
- 前記参照電極が電流増幅器に接続される、請求項23に記載のセンサー。
- 前記電流増幅器が電流フォロアに接続されて、ガス濃度と関係する電流を電圧に変換する、請求項24に記載のセンサー。
- 密閉空間中のガス状被検体の濃度を測定するための方法であって、以下の工程を含む方法:
請求項1〜13および18〜25のいずれかに記載の電流測定式ガスセンサーを密閉空間に設置する工程;
前記密閉空間に被検体を流してセンサーと接触させる工程;
前記センサーにおいて電流を測定する工程;および
前記電流測定式ガスセンサーを用いて前記密閉空間中の被検体の濃度を測定する工程。 - 前記被検体が、酸化ガスまたは還元ガスを含む、請求項26に記載の方法。
- 前記被検体が、蒸気状の過酸化水素、エチレンオキシド、オゾン、またはこれらの2種以上の混合物を含む、請求項26に記載の方法。
- 前記被検体が、蒸気状の過酸化水素を含む、請求項26に記載の方法。
- 前記被検体が、原子状水素、硫化水素、亜硫酸水素塩、アンモニア、一酸化炭素、シュウ酸、ギ酸、アスコルビン酸、亜リン酸、またはこれらの2種以上の混合物を含む、請求項26に記載の方法。
- 前記密閉空間の圧力が大気圧である、請求項26〜30のいずれかに記載の方法。
- 前記密閉空間の絶対圧力が1気圧〜2気圧の範囲内である、請求項26〜30のいずれかに記載の方法。
- 前記密閉空間の圧力が大気圧未満であるか、または0.1〜750Torr,または0.1〜700Torr,または0.1〜600Torr,または0.1〜500Torr,または0.1〜400Torr,または0.1〜300Torr,または0.1〜200Torr,または0.1〜100Torr,または1〜75Torr,または1〜50Torr,または1〜25Torr,または3〜25Torr,または5〜25Torr,または5Torr〜20Torrの絶対圧力の範囲内にある、請求項26〜30のいずれかに記載の方法。
- 前記密閉空間の温度が15〜90℃,または30〜70℃,または45℃〜65℃,または50℃〜60℃の範囲内である、請求項26〜33のいずれかに記載の方法。
- 殺菌処理中において減圧室での殺菌剤ガスの濃度を測定するための方法であって、以下の工程を含む方法:
請求項1〜25のいずれかに記載の電流測定式ガスセンサーを減圧室に設置する工程;
前記減圧室にて減圧下、殺菌剤ガスを用いて、殺菌処理を行う工程;
前記センサーにおいて電流を測定する工程;および
前記電流測定式ガスセンサーを用いて前記減圧室中の殺菌剤ガスの濃度を測定する工程。 - 前記殺菌剤ガスを前記減圧室に流し込み、前記電流測定式ガスセンサーと接触させる、請求項35に記載の方法。
- 前記殺菌剤ガスをキャリアガスと混合して、ガス状混合物を形成し、該ガス状混合物を前記減圧室に流し込み、前記電流測定式センサーと接触させる、請求項35に記載の方法。
- 前記方法が、パルス状の殺菌剤ガスを減圧室に注入する工程を含む、請求項35に記載の方法。
- 前記方法が、殺菌剤ガスおよびキャリアガスを含むパルス状のガス状混合物を減圧室に注入する工程を含む、請求項35に記載の方法。
- 前記減圧室内の圧力が大気圧未満であるか、または0.1〜750Torr,または0.1〜700Torr,または0.1〜600Torr,または0.1〜500Torr,または0.1〜400Torr,または0.1〜300Torr,または0.1〜200Torr,または0.1〜100Torr,または1〜75Torr,または1〜50Torr,または1〜25Torr,または3〜25Torr,または5〜25Torr,または5Torr〜20Torrの絶対圧力の範囲内にある、請求項35〜39のいずれかに記載の方法。
- 前記減圧室の温度が15〜90℃,または30〜70℃,または45℃〜65℃,または50℃〜60℃の範囲内である、請求項35〜40のいずれかに記載の方法。
- 前記殺菌剤ガスが、蒸気状の過酸化水素、エチレンオキシド、オゾン、またはこれらの2種以上の混合物を含む、請求項35〜41のいずれかに記載の方法。
- 前記殺菌剤ガスがアルカリ性ガスをさらに含む、請求項42に記載の方法。
- 前記殺菌剤ガスが、蒸気状の過酸化水素およびアンモニアを含む、請求項35〜43のいずれかに記載の方法。
- 殺菌されるべき物品を前記減圧室に配置する、請求項35〜44のいずれかに記載の方法。
- 前記殺菌されるべき物品が、1種以上の、隙間部、穴部、管状部、終端部が開口した管腔部、内側空洞部、デッドレッグ、平面部、またはこれらの2種以上の組み合わせを含む、請求項45に記載の方法。
- 前記殺菌されるべき物品が、医療用装置および/または歯科用装置を含む、請求項45に記載の方法。
- 前記殺菌されるべき物品が内視鏡を含む、請求項45に記載の方法。
- 前記殺菌されるべき物品が、化学的因子および/または生物学的作用物質で汚染されている、請求項45に記載の方法。
- 前記殺菌されるべき物品が、細菌胞子、増殖性細菌、ウイルス、カビ、菌類、またはこれらの2種以上の混合物で汚染されている、請求項45に記載の方法。
- 前記殺菌されるべき物品が、病原性化学的因子で汚染されている、請求項45に記載の方法。
- 前記殺菌されるべき物品が、タンパク性感染物質で汚染されている、請求項45に記載の方法。
- 前記殺菌されるべき物品が、ライノウイルス、オルトミクソウイルス、黄色ブドウ球菌、肺炎連鎖球菌、大腸菌、サルモネラ菌、クロストリジウム・ディフィシレ、バチルス・ステアロサーモフィルス、クロストリジウム・スポロゲネス、またはこれらの2種以上の混合物により汚染されている、請求項45に記載の方法。
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US20150021204A1 (en) | 2015-01-22 |
AU2013281144B2 (en) | 2015-11-05 |
ES2715310T3 (es) | 2019-06-03 |
US9995705B2 (en) | 2018-06-12 |
JP2015525361A (ja) | 2015-09-03 |
US20150021203A1 (en) | 2015-01-22 |
CA2876577A1 (en) | 2014-01-03 |
MX2014014780A (es) | 2015-04-10 |
EP2864769A1 (en) | 2015-04-29 |
US9459233B2 (en) | 2016-10-04 |
CA2876577C (en) | 2018-07-17 |
IN2014DN10309A (ja) | 2015-08-07 |
BR112014032200B1 (pt) | 2021-10-26 |
CN104395743A (zh) | 2015-03-04 |
EP2864769B1 (en) | 2019-01-16 |
MX369725B (es) | 2019-11-20 |
US10001455B2 (en) | 2018-06-19 |
WO2014003869A1 (en) | 2014-01-03 |
US20160363557A1 (en) | 2016-12-15 |
BR112014032200A2 (pt) | 2020-12-22 |
CN104395743B (zh) | 2018-07-03 |
US20130341206A1 (en) | 2013-12-26 |
US9995706B2 (en) | 2018-06-12 |
AU2013281144A1 (en) | 2015-01-15 |
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