JP6116668B2 - 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置及び有機ｅｌ表示装置 - Google Patents

感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置及び有機ｅｌ表示装置 Download PDF

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JP6116668B2
JP6116668B2 JP2015508531A JP2015508531A JP6116668B2 JP 6116668 B2 JP6116668 B2 JP 6116668B2 JP 2015508531 A JP2015508531 A JP 2015508531A JP 2015508531 A JP2015508531 A JP 2015508531A JP 6116668 B2 JP6116668 B2 JP 6116668B2
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group
structural unit
polymer
resin composition
photosensitive resin
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JPWO2014157171A1 (ja
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山田　悟
悟 山田
知樹 松田
知樹 松田
達也 霜山
達也 霜山
健太 山▲ざき▼
健太 山▲ざき▼
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Fujifilm Corp
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Fujifilm Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/124—Insulating layers formed between TFT elements and OLED elements

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
JP2015508531A 2013-03-27 2014-03-25 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置及び有機ｅｌ表示装置 Active JP6116668B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013066827 2013-03-27
JP2013066827 2013-03-27
PCT/JP2014/058230 WO2014157171A1 (fr) 2013-03-27 2014-03-25 Composition de résine photosensible, procédé de production de film polymérisé, film polymérisé, dispositif d'affichage à cristaux liquides et dispositif d'affichage électroluminescent organique

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JPWO2014157171A1 JPWO2014157171A1 (ja) 2017-02-16
JP6116668B2 true JP6116668B2 (ja) 2017-04-19

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JP2015508531A Active JP6116668B2 (ja) 2013-03-27 2014-03-25 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置及び有機ｅｌ表示装置

Country Status (5)

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JP (1) JP6116668B2 (fr)
KR (1) KR20150107847A (fr)
CN (1) CN105051608B (fr)
TW (1) TWI598686B (fr)
WO (1) WO2014157171A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102157641B1 (ko) * 2015-03-06 2020-09-18 동우 화인켐 주식회사 화학증폭형 감광성 수지 조성물 및 이로부터 제조된 절연막
JP6664164B2 (ja) * 2015-08-06 2020-03-13 東京応化工業株式会社 感光性組成物
TWI830850B (zh) * 2019-12-30 2024-02-01 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物及其應用
CN114276239B (zh) * 2021-12-29 2023-10-27 徐州博康信息化学品有限公司 一种含缩酮结构酸敏感光刻胶树脂单体的制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5445454B2 (ja) * 2008-07-15 2014-03-19 Ｊｓｒ株式会社 ポジ型感放射線性組成物及びレジストパターン形成方法
JP5452102B2 (ja) * 2009-07-02 2014-03-26 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法
CN102792227B (zh) * 2010-03-11 2014-11-12 富士胶片株式会社 正型感光性树脂组合物、固化膜的形成方法、固化膜、液晶显示装置、以及有机el显示装置
JP5658941B2 (ja) * 2010-08-05 2015-01-28 東京応化工業株式会社 レジストパターン形成方法
JP5650078B2 (ja) * 2010-08-30 2015-01-07 富士フイルム株式会社 感光性樹脂組成物、オキシムスルホネート化合物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5386527B2 (ja) * 2011-02-18 2014-01-15 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物、及びレジスト膜
JP5772184B2 (ja) * 2011-04-22 2015-09-02 Jsr株式会社 感放射線性樹脂組成物、表示素子用層間絶縁膜及びその形成方法
JP5772717B2 (ja) * 2011-05-30 2015-09-02 信越化学工業株式会社 パターン形成方法
US9134617B2 (en) * 2011-06-10 2015-09-15 Tokyo Ohka Kogyo Co., Ltd. Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer
JP5807510B2 (ja) * 2011-10-27 2015-11-10 信越化学工業株式会社 パターン形成方法及びレジスト組成物

Also Published As

Publication number Publication date
TW201500846A (zh) 2015-01-01
WO2014157171A1 (fr) 2014-10-02
CN105051608B (zh) 2020-03-13
JPWO2014157171A1 (ja) 2017-02-16
KR20150107847A (ko) 2015-09-23
TWI598686B (zh) 2017-09-11
CN105051608A (zh) 2015-11-11

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