JP6113656B2 - 焼入れ可能な3層反射防止コーティングを含む被覆物品及び/又はその製造方法 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title claims description 29
- 238000000576 coating method Methods 0.000 claims description 179
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- 238000000151 deposition Methods 0.000 claims description 35
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 29
- 229910052710 silicon Inorganic materials 0.000 claims description 29
- 239000010703 silicon Substances 0.000 claims description 29
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 25
- 230000008021 deposition Effects 0.000 claims description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
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- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
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- 150000004706 metal oxides Chemical class 0.000 description 2
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- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
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- 238000001228 spectrum Methods 0.000 description 1
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- 238000004381 surface treatment Methods 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
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- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/365—Coating different sides of a glass substrate
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- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
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- Laminated Bodies (AREA)
Description
本発明は米国出願番号12/923,146の一部継続出願(CIP)であり、その内容を全て本明細書に参照として組み込む。
上述の通り、特定の材料は、AR層の焼入れ処理前後に望ましくないカラーシフトΔE*をもたらす可能性がある。よって、一般的な熱処理(例えば、焼入れ処理)環境に暴露した後で所望の光学特性を(例えば、最大限可能な限り)維持する材料を見出して3層反射防止コーティングに組み込む必要があることが分かるであろう。
図14は、特定の実施形態例による焼入れ処理環境への暴露前後における3層ARコーティングの表面反射率の比較を表すグラフである。例えば、ARコーティングは、基板から順に、次の層を包含していてよい。厚さ約60nmのSiOxNyからなる中程度の屈折性の層、厚さ約102nmのTiO2からなる高屈折性の層及び厚さ約93nmのSiO2からなる低屈折性の層。ARコーティングは、ソーダ石灰シリカガラス製の透明ガラス基板に適用されてよく、前記層はガラス基板上にスパッタ法又は他の好適な技法によって配置されてよい。本実施例では、ARコーティングはガラス基板の1主面のみに供給される(例えば、図12に示す通り)。その後、コーティングを最高温度650℃で焼入れ処理してよい。当然、上述の通り、前記と同一のコーティング又はそれと同様のコーティングをソーダ石灰ガラス基板の反対側の主面上に配置してもよい。
特定の実施態様例には、次の層が、基板から順に包含されていてよい。厚さ約61nmのSiOxNyからなる中程度の屈折性の層、厚さ約102nmのTiO2からなる高屈折性の層及び厚さ約87nmのSiO2からなる低屈折性の層。本実施例の3層ARコーティングは、ソーダ石灰シリカガラス製の透明ガラス基板に適用されてよく、前記層はガラス基板の両面にスパッタ法又は他の好適な技法によって堆積されてよい。前記実施例(例えば、図12)とは対照的に、本実施例のARコーティングはガラス基板の両方の主面上に供給されてよい(例えば、図13に示す通り)。次いで、3層ARコーティングを最高温度650℃で焼入れ処理してよい。
Claims (16)
- 被覆物品の製造方法であって、
ガラス基板を供給する工程と、
オキシ窒化ケイ素を含有する厚さが50から70nmの中程度の屈折性の層を前記基板の第1主面上に直接的に又は間接的に堆積させる工程と、
前記中程度の屈折性の層の上に前記中程度の屈折性の層と接触させて、チタン酸化物を含有する厚さが95から105nmの高屈折性の層を堆積させる工程と、
前記高屈折性の層の上に前記高屈折性の層と接触させて、ケイ素酸化物を含有する厚さが85から105nmの低屈折性の層を堆積させる工程と、
前記中程度の屈折性の層と、前記高屈折性の層と、前記低屈折性の層とを備える反射防止コーティングを有する前記基板を熱処理する工程と
を含み、
前記反射防止コーティングが熱処理後に正味の圧縮残留応力を有し、
前記被覆物品の堆積直後の状態から熱処理後の状態までのΔE*値が3未満である
被覆物品の製造方法。 - 前記中程度の屈折性の層は、380nmにおける屈折率が1.8から2.0であり、550nmにおける屈折率が1.7から1.8であり、780nmにおける屈折率が1.65から1.8であり、
前記高屈折性の層は、380nmにおける屈折率が2.7から2.9であり、550nmにおける屈折率が2.3から2.5であり、780nmにおける屈折率が2.2から2.4であり、
前記低屈折性の層は、380nm、550nm及び780nmにおける屈折率が1.45から1.55である、
請求項1に記載の被覆物品の製造方法。 - 前記低屈折性の層が酸化ケイ素を含む、
請求項1又は2に記載の被覆物品の製造方法。 - 前記中程度の屈折性の層の550nmにおける屈折率が1.7から1.8である、
請求項1から3のいずれか1項に記載の被覆物品の製造方法。 - 前記中程度の屈折性の層がオキシ窒化ケイ素からなり、550nmにおける屈折率が1.7から1.8であり、
前記低屈折性の層が、酸化ケイ素を含む、又は酸化ケイ素からなる、
請求項1から4のいずれか1項に記載の被覆物品の製造方法。 - ケイ素を含有する第2の中程度の屈折性の層を前記基板の第2主面上に直接的に又は間接的に堆積する工程と、
前記第2の中程度の屈折性の層の上に前記第2の中程度の屈折性の層と接触させて、厚さが少なくとも85nmである第2の高屈折性の層を堆積させる工程と、
前記第2の高屈折性の層の上に前記第2の高屈折性の層と接触させて第2の低屈折性の層を堆積する工程と
を更に含み、
前記第2の中程度の屈折性の層、前記第2の高屈折性の層及び前記第2の低屈折性の層は前記熱処理の前に前記基板上に配置される、
請求項1から5のいずれか1項に記載の被覆物品の製造方法。 - 被覆物品の堆積直後の状態から熱処理後の状態までのΔE*値が2未満である、
請求項1から6のいずれか1項に記載の被覆物品の製造方法。 - 被覆物品の堆積直後の状態から熱処理後の状態までのΔE*値が1.5以下である、
請求項1から7のいずれか1項に記載の被覆物品の製造方法。 - 被覆物品の製造方法であって、
ガラス基板を供給する工程と、
オキシ窒化ケイ素を含有する厚さが50から70nmの中程度の屈折性の層を前記基板の第1主面上に直接的に又は間接的に堆積させる工程と、
前記中程度の屈折性の層の上に前記中程度の屈折性の層と接触させて、チタン酸化物を含有する厚さが95から105nmの高屈折性の層を堆積させる工程と、
前記高屈折性の層の上に前記高屈折性の層と接触させて、ケイ素酸化物を含有する厚さが85から105nmの低屈折性の層を堆積させる工程と、
を含み、
前記中程度の屈折性の層と、前記高屈折性の層と、前記低屈折性の層とを備える反射防止コーティングが正味の圧縮残留応力を有し、かつ前記被覆物品のΔE*値が3未満となるように前記被覆物品を熱処理可能である
被覆物品の製造方法。 - 前記中程度の屈折性の層がオキシ窒化ケイ素からなり、550nmにおける屈折率が1.7から1.8であり、
前記低屈折性の層が、酸化ケイ素を含む、又は酸化ケイ素からなる、
請求項9に記載の被覆物品の製造方法。 - ケイ素を含有する第2の中程度の屈折性の層を前記基板の第2主面上に直接的に又は間接的に堆積させる工程と、
前記第2の中程度の屈折性の層の上に前記第2の中程度の屈折性の層と接触させて、厚さが少なくとも85nmである第2の高屈折性の層を堆積させる工程と、
前記第2の高屈折性の層の上に前記第2の高屈折性の層と接触させて第2の低屈折性の層を堆積させる工程と
を更に含み、
前記第2の中程度の屈折性の層、前記第2の高屈折性の層及び前記第2の低屈折性の層は前記熱処理の前に前記基板上に配置される、
請求項9又は10に記載の被覆物品の製造方法。 - 前記被覆物品はΔE*値が2未満となるように熱処理可能である、
請求項9から11のいずれか1項に記載の被覆物品の製造方法。 - 基板の第1主面で支持された反射防止コーティングを含む被覆物品であって、
前記反射防止コーティングが、前記基板から順に、
前記基板の第1主面上に直接的に又は間接的に堆積させられたオキシ窒化ケイ素を含有する厚さが50から70nmの中程度の屈折性の層と、
前記中程度の屈折性の層の上に前記中程度の屈折性の層と接触して堆積させられた、チタン酸化物を含有する厚さが95から105nmの高屈折性の層と、
前記高屈折性の層の上に前記高屈折性の層と接触して堆積させられた、ケイ素酸化物を含有する厚さが85から105nmの低屈折性の層と
を含み、
前記反射防止コーティングが正味の圧縮残留応力を有し、かつ前記被覆物品のΔE*値が2未満となるように前記被覆物品を熱処理可能である
被覆物品。 - 前記中程度の屈折性の層の波長380nm、550nm及び780nmにおける屈折率が1.65から2.0であり、
前記高屈折性の層の波長380nm、550nm及び780nmにおける屈折率が少なくとも2.0であり、
前記低屈折性の層の波長380nm、550nm及び780nmにおける屈折率が1.4から1.6である、
請求項13に記載の被覆物品。 - 前記中程度の屈折性の層の550nmにおける屈折率が1.7から1.8である、
請求項13又は14に記載の被覆物品。 - 前記基板の第2主面が第2反射防止コーティングを支持しており、前記第2反射防止コーティングが、前記基板から順に、
前記基板の前記第2主面上に直接的に又は間接的に堆積させられたケイ素を含有する第2の中程度の屈折性の層と、
前記第2の中程度の屈折性の層の上に前記第2の中程度の屈折性の層と接触して堆積させられた、厚さが少なくとも85nmである第2の高屈折性の層と、
前記第2の高屈折性の層の上に前記第2の高屈折性の層と接触して堆積させられた第2の低屈折性の層と
を含み、
前記層はいずれも熱処理前に前記基板上に配置される、
請求項13から15のいずれか1項に記載の被覆物品。
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Application Number | Priority Date | Filing Date | Title |
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US12/923,838 US9796619B2 (en) | 2010-09-03 | 2010-10-08 | Temperable three layer antirefrlective coating, coated article including temperable three layer antirefrlective coating, and/or method of making the same |
US12/923,838 | 2010-10-08 | ||
PCT/US2011/001655 WO2012047262A2 (en) | 2010-10-08 | 2011-09-26 | Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same |
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US8939606B2 (en) | 2010-02-26 | 2015-01-27 | Guardian Industries Corp. | Heatable lens for luminaires, and/or methods of making the same |
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WO2012047262A3 (en) | 2012-06-21 |
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CN108911526A (zh) | 2018-11-30 |
TW201718426A (zh) | 2017-06-01 |
TWI570085B (zh) | 2017-02-11 |
US20120057236A1 (en) | 2012-03-08 |
TW201223905A (en) | 2012-06-16 |
EP2625554A2 (en) | 2013-08-14 |
US10214446B2 (en) | 2019-02-26 |
JP2013544741A (ja) | 2013-12-19 |
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