JP6096990B2 - 不連続な金属薄層を含むコーティングを備えた基材を得るための方法 - Google Patents
不連続な金属薄層を含むコーティングを備えた基材を得るための方法 Download PDFInfo
- Publication number
- JP6096990B2 JP6096990B2 JP2016525098A JP2016525098A JP6096990B2 JP 6096990 B2 JP6096990 B2 JP 6096990B2 JP 2016525098 A JP2016525098 A JP 2016525098A JP 2016525098 A JP2016525098 A JP 2016525098A JP 6096990 B2 JP6096990 B2 JP 6096990B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- coating
- laser
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 78
- 229910052751 metal Inorganic materials 0.000 title claims description 63
- 239000002184 metal Substances 0.000 title claims description 63
- 238000000576 coating method Methods 0.000 title claims description 60
- 239000011248 coating agent Substances 0.000 title claims description 56
- 238000000034 method Methods 0.000 title claims description 34
- 229910052709 silver Inorganic materials 0.000 claims description 33
- 239000004332 silver Substances 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 24
- 239000012212 insulator Substances 0.000 claims description 23
- 239000011521 glass Substances 0.000 claims description 17
- 230000004888 barrier function Effects 0.000 claims description 15
- 230000005855 radiation Effects 0.000 claims description 15
- 230000000737 periodic effect Effects 0.000 claims description 14
- 229910045601 alloy Inorganic materials 0.000 claims description 10
- 239000000956 alloy Substances 0.000 claims description 10
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052737 gold Inorganic materials 0.000 claims description 9
- 239000010931 gold Substances 0.000 claims description 9
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 239000011368 organic material Substances 0.000 claims description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 4
- 229910001887 tin oxide Inorganic materials 0.000 claims description 4
- 239000002241 glass-ceramic Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 144
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 31
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 20
- 238000000151 deposition Methods 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 13
- 230000008021 deposition Effects 0.000 description 12
- 239000011787 zinc oxide Substances 0.000 description 10
- 238000013532 laser treatment Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 7
- 229910052718 tin Inorganic materials 0.000 description 7
- 230000000903 blocking effect Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000011282 treatment Methods 0.000 description 6
- 238000009736 wetting Methods 0.000 description 6
- 238000000862 absorption spectrum Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 230000010287 polarization Effects 0.000 description 5
- 238000000411 transmission spectrum Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 3
- 238000009499 grossing Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000001000 micrograph Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- HZEWFHLRYVTOIW-UHFFFAOYSA-N [Ti].[Ni] Chemical compound [Ti].[Ni] HZEWFHLRYVTOIW-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- QHSJIZLJUFMIFP-UHFFFAOYSA-N ethene;1,1,2,2-tetrafluoroethene Chemical group C=C.FC(F)=C(F)F QHSJIZLJUFMIFP-UHFFFAOYSA-N 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000004579 marble Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910001000 nickel titanium Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
- JRFBNCLFYLUNCE-UHFFFAOYSA-N zinc;oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[Ti+4].[Zn+2] JRFBNCLFYLUNCE-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
- C23C14/5813—Thermal treatment using lasers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
- C03C17/3678—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use in solar cells
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/584—Non-reactive treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/45—Inorganic continuous phases
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Polarising Elements (AREA)
- Photovoltaic Devices (AREA)
- Laser Beam Processing (AREA)
- Surface Treatment Of Glass (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
・基材の少なくとも一方の面の少なくとも一部分に、銀、金、又はこれらの合金をベースとする連続な金属薄層を少なくとも一つ含むコーティングを配置し、次に、
・このようにしてコートされた基材を、前記コーティングに少なくとも1つの線の形状で集中させてレーザー光線を放射する少なくとも1つのレーザー装置に向かい合って走行させ、前記放射の出力を、ディウェッティングにより該金属薄層を不連続にすることができるように適合させる工程、
を含む。
・レーザー光線の波長。通常は、レーザー線が走行方向に垂直のとき、この周期はレーザー光線の波長の約2倍である。
・レーザー線と走行方向の間の角度。実際に、この周期はこの角度の正弦に実質的に比例している。
・コーティングの層の厚さ及び屈折率。これらはレーザー光線の干渉現象を制御する。
・金属層の下に配置され、それと直接接している下層の化学的性質及び厚さ。具体的にいうと、この層は銀の濡れ特性に影響を与える。
ガラス/Si3N4(26)/TiO2(7)/ZnO(6)/Ag(11)/TiOx(1)/ZnO(6)/Si3N4(35)/TiO2(2)。
Claims (12)
- 少なくとも一方の面の少なくとも一部分が銀、金、又はこれらの合金をベースとする少なくとも1つの不連続な金属薄層を含むコーティングによってコートされている基材を含む材料であり、該不連続な金属薄層は少なくとも2つの絶縁性の薄層の間に封入されており、かつ該不連続な金属薄層は周期的な幾何学パターンの形態をしている材料を得るための方法であって、下記の工程、すなわち、
・前記基材の少なくとも一方の面の少なくとも一部分に、銀、金、又はこれらの合金をベースとする連続な金属薄層を少なくとも1つ含むコーティングを被着させ、該連続な金属薄層を少なくとも2つの絶縁性薄膜の間に封入する工程、次に、
・このようにしてコートされた基材を、前記コーティングに少なくとも1つの線の形状で集中させてレーザー光線を放射する少なくとも1つのレーザー装置に向かいあって走行させ、前記放射の出力を、ディウェッティングにより該金属薄層を不連続にするために適合させる工程、
を含む、不連続な金属薄層を含むコーティングによってコートされている基材を含む材料を得るための方法。 - 前記周期的な幾何学的パターンが、0.1〜10マイクロメートル、特に0.3〜5マイクロメートルの範囲内の周期を有している、請求項1に記載の方法。
- 得られた前記幾何学的パターンが、基材の走行方向に延在する線である、請求項1又は2に記載の方法。
- 前記周期的なパターンが、互いに平行でない少なくとも2つの軸線に沿って周期性を有する、請求項1〜3のうち一項に記載の方法。
- 前記連続的金属薄層の物理的な厚さが2〜20nmの範囲内である、請求項1〜4のうち一項に記載の方法。
- 前記レーザー光線の波長が200〜2000nm、特に500〜1500nmの範囲内である、請求項1〜5のうち一項に記載の方法。
- 前記レーザー光線が連続である、請求項1〜6のうち一項に記載の方法。
- 前記基材がガラス、ガラスセラミック、又はポリマー有機材料により作られている、請求項1〜7のうち一項に記載の方法。
- 前記コーティングが、基材から始まり、少なくとも1つの第1の絶縁体層を含む第1のコーティング、少なくとも1つの金属薄層、任意選択的な上方遮断層、及び少なくとも1つの第2の絶縁体層を含む第2のコーティングを含む、請求項1〜8のうち一項に記載の方法。
- 前記第1の及び/又は第2の絶縁体層が酸化物、特に酸化スズ若しくは酸化チタン、又は窒化物、特に窒化ケイ素である、請求項9に記載の製造方法。
- 前記基材が少なくとも1m、特に2m、さらには3mの寸法を少なくとも1つ有する、請求項1〜10のうち一項に記載の方法。
- 前記コーティングをスパッタリングにより被着させる、請求項1〜11のうち一項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1358063 | 2013-08-20 | ||
FR1358063A FR3009833B1 (fr) | 2013-08-20 | 2013-08-20 | Procede d'obtention d'un substrat muni d'un revetement comprenant une couche mince metallique discontinue |
PCT/FR2014/051999 WO2015025093A1 (fr) | 2013-08-20 | 2014-07-31 | Procede d'obtention d'un substrat muni d'un revetement comprenant une couche mince metallique discontinue |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017500597A JP2017500597A (ja) | 2017-01-05 |
JP6096990B2 true JP6096990B2 (ja) | 2017-03-15 |
Family
ID=49753319
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016525098A Expired - Fee Related JP6096990B2 (ja) | 2013-08-20 | 2014-07-31 | 不連続な金属薄層を含むコーティングを備えた基材を得るための方法 |
Country Status (12)
Country | Link |
---|---|
US (1) | US9587303B2 (ja) |
EP (1) | EP3036352B1 (ja) |
JP (1) | JP6096990B2 (ja) |
KR (2) | KR20170065681A (ja) |
CN (1) | CN105452519B (ja) |
BR (1) | BR112016002542B1 (ja) |
EA (1) | EA029632B1 (ja) |
ES (1) | ES2623630T3 (ja) |
FR (1) | FR3009833B1 (ja) |
HU (1) | HUE034358T2 (ja) |
PL (1) | PL3036352T3 (ja) |
WO (1) | WO2015025093A1 (ja) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8815059B2 (en) * | 2010-08-31 | 2014-08-26 | Guardian Industries Corp. | System and/or method for heat treating conductive coatings using wavelength-tuned infrared radiation |
ES2473216B1 (es) * | 2014-02-20 | 2015-06-02 | Universitat De Barcelona | Superficie con propiedades de reducción de la luz difusa por condensación de agua y procedimiento de obtención de esta |
EP4235750A3 (en) * | 2016-02-15 | 2023-09-06 | Newport Corporation | Method of selectively varying the wetting characteristics of a surface |
JP6400062B2 (ja) * | 2016-10-24 | 2018-10-03 | 日東電工株式会社 | 電磁波透過性金属光沢部材、これを用いた物品、及び、金属薄膜 |
DE102016121462A1 (de) * | 2016-11-09 | 2018-05-09 | Aixtron Se | Strukturierte Keimschicht |
US20180190984A1 (en) * | 2016-12-30 | 2018-07-05 | Guardian Glass, LLC | Silver nano-metal mesh inclusive electrode, touch panel with silver nano-metal mesh inclusive electrode, and/or method of making the same |
CN110462570A (zh) * | 2017-02-08 | 2019-11-15 | 佳殿玻璃有限公司 | 含银纳米金属网的电极、带有含银纳米金属网的电极的触控面板和/或其制造方法 |
US10612145B2 (en) * | 2017-06-16 | 2020-04-07 | Lawrence Livermore National Security, Llc | Nanostructured layer for graded index freeform optics |
US11148228B2 (en) * | 2017-07-10 | 2021-10-19 | Guardian Glass, LLC | Method of making insulated glass window units |
FR3072958B1 (fr) * | 2017-10-30 | 2022-05-06 | Eurokera | Article vitroceramique muni d'une couche et procede d'obtention |
CN108118295A (zh) | 2017-12-21 | 2018-06-05 | 上海银之川金银线有限公司 | 一种非连续真空镀金属薄膜、金属丝及其制作方法 |
US10921495B2 (en) * | 2017-12-29 | 2021-02-16 | Vitro Flat Glass Llc | Solar control coatings and methods of forming solar control coatings |
CN108486536B (zh) * | 2018-02-05 | 2020-01-03 | 吉林大学 | 一种通过固态去润湿制备金属-陶瓷纳米复合薄膜的方法 |
US10830933B2 (en) * | 2018-06-12 | 2020-11-10 | Guardian Glass, LLC | Matrix-embedded metamaterial coating, coated article having matrix-embedded metamaterial coating, and/or method of making the same |
DE102018217970A1 (de) | 2018-10-19 | 2020-04-23 | Hegla Boraident Gmbh & Co. Kg | Verfahren zur Herstellung einer elektronischen Struktur auf einer Glasscheibe sowie Glastafel mit mindestens einer derartigen Glasscheibe |
US11751288B2 (en) * | 2018-12-14 | 2023-09-05 | Samsung Electronics Co., Ltd. | Heat-emitting transparent plate, method of manufacturing the heat-emitting transparent plate, heat-emitting device including the heat-emitting transparent plate and objects including the heat-emitting device |
TW202106650A (zh) * | 2019-04-10 | 2021-02-16 | 美商康寧公司 | 具有傳輸微波訊號並反射紅外線訊號的金屬層的窗 |
EP4118465A4 (en) | 2020-03-11 | 2024-03-13 | Labforinvention | ENERGY EFFICIENT WINDOW COVERINGS |
FR3111892B1 (fr) * | 2020-06-24 | 2022-07-22 | Saint Gobain | Materiau comportant un empilement a sous-couche dielectrique fine d’oxide a base de zinc et procede de depot de ce materiau |
EP3929324A1 (de) * | 2020-06-26 | 2021-12-29 | Bühler Alzenau GmbH | Beschichtungsverfahren und -vorrichtung |
US20220221636A1 (en) * | 2021-01-08 | 2022-07-14 | LabForInvention | Energy-efficient window coatings transmissible to wireless communication signals and methods of fabricating thereof |
RU2761391C1 (ru) * | 2021-01-12 | 2021-12-07 | Дмитрий Юрьевич Старцев | Способы нанесения на стеклянные изделия металлических покрытий из нитрида титана |
CN113735460B (zh) * | 2021-08-25 | 2023-04-07 | 福建省万达汽车玻璃工业有限公司 | 镀膜玻璃及其制造方法、以及车窗 |
FR3132382A1 (fr) * | 2022-01-28 | 2023-08-04 | Saint-Gobain Glass France | Procede d’obtention d’un substrat muni d’un revêtement comprenant une couche mince metallique discontinue |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2728559B1 (fr) | 1994-12-23 | 1997-01-31 | Saint Gobain Vitrage | Substrats en verre revetus d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire |
JP2006110807A (ja) | 2004-10-13 | 2006-04-27 | Central Glass Co Ltd | 電波透過性波長選択板 |
FR2911130B1 (fr) | 2007-01-05 | 2009-11-27 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
FR2943050A1 (fr) | 2009-03-11 | 2010-09-17 | Saint Gobain | Procede de depot de couche mince. |
JP2010241638A (ja) * | 2009-04-06 | 2010-10-28 | Riichi Murakami | 金属ナノ粒子層を挟んだ薄膜積層体 |
FR2946639B1 (fr) | 2009-06-12 | 2011-07-15 | Saint Gobain | Procede de depot de couche mince et produit obtenu. |
US9296183B2 (en) * | 2011-11-30 | 2016-03-29 | Corning Incorporated | Metal dewetting methods and articles produced thereby |
US20130183492A1 (en) * | 2012-01-17 | 2013-07-18 | Snu R&Db Foundation | Metal nanoparticles on substrate and method of forming the same |
-
2013
- 2013-08-20 FR FR1358063A patent/FR3009833B1/fr not_active Expired - Fee Related
-
2014
- 2014-07-31 WO PCT/FR2014/051999 patent/WO2015025093A1/fr active Application Filing
- 2014-07-31 US US14/913,110 patent/US9587303B2/en active Active
- 2014-07-31 EA EA201690433A patent/EA029632B1/ru not_active IP Right Cessation
- 2014-07-31 ES ES14790166.4T patent/ES2623630T3/es active Active
- 2014-07-31 PL PL14790166T patent/PL3036352T3/pl unknown
- 2014-07-31 HU HUE14790166A patent/HUE034358T2/en unknown
- 2014-07-31 EP EP14790166.4A patent/EP3036352B1/fr active Active
- 2014-07-31 KR KR1020177015049A patent/KR20170065681A/ko not_active Application Discontinuation
- 2014-07-31 CN CN201480046431.XA patent/CN105452519B/zh active Active
- 2014-07-31 JP JP2016525098A patent/JP6096990B2/ja not_active Expired - Fee Related
- 2014-07-31 BR BR112016002542-3A patent/BR112016002542B1/pt not_active IP Right Cessation
- 2014-07-31 KR KR1020167003996A patent/KR101923786B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR101923786B1 (ko) | 2018-11-29 |
KR20170065681A (ko) | 2017-06-13 |
US9587303B2 (en) | 2017-03-07 |
FR3009833A1 (fr) | 2015-02-27 |
CN105452519A (zh) | 2016-03-30 |
US20160201189A1 (en) | 2016-07-14 |
BR112016002542B1 (pt) | 2021-11-09 |
JP2017500597A (ja) | 2017-01-05 |
HUE034358T2 (en) | 2018-02-28 |
BR112016002542A2 (pt) | 2017-08-01 |
KR20160027207A (ko) | 2016-03-09 |
EA029632B1 (ru) | 2018-04-30 |
PL3036352T3 (pl) | 2017-08-31 |
CN105452519B (zh) | 2018-01-02 |
EA201690433A1 (ru) | 2016-06-30 |
EP3036352A1 (fr) | 2016-06-29 |
FR3009833B1 (fr) | 2015-10-16 |
ES2623630T3 (es) | 2017-07-11 |
WO2015025093A1 (fr) | 2015-02-26 |
EP3036352B1 (fr) | 2017-03-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6096990B2 (ja) | 不連続な金属薄層を含むコーティングを備えた基材を得るための方法 | |
JP6204454B2 (ja) | コーティングされた基材の製造方法 | |
JP6054890B2 (ja) | 被覆物を備えた基材を得る方法 | |
JP6612621B2 (ja) | 被膜の熱処理方法 | |
JP6764349B2 (ja) | 犠牲層を用い機能性層により被覆された基材を得るための方法 | |
JP6640561B2 (ja) | コーティングを備えた基材を得る方法 | |
US20160229741A1 (en) | Method for producing a substrate coated with a stack including a conductive transparent oxide film |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20161108 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170117 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170216 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6096990 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |