JP6088360B2 - 濾過装置 - Google Patents
濾過装置 Download PDFInfo
- Publication number
- JP6088360B2 JP6088360B2 JP2013117283A JP2013117283A JP6088360B2 JP 6088360 B2 JP6088360 B2 JP 6088360B2 JP 2013117283 A JP2013117283 A JP 2013117283A JP 2013117283 A JP2013117283 A JP 2013117283A JP 6088360 B2 JP6088360 B2 JP 6088360B2
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- Prior art keywords
- filtration
- water
- filtration membrane
- membrane
- tank
- Prior art date
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- 238000001914 filtration Methods 0.000 title claims description 267
- 239000012528 membrane Substances 0.000 claims description 128
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 119
- 239000000919 ceramic Substances 0.000 claims description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 21
- 229910052710 silicon Inorganic materials 0.000 claims description 21
- 239000010703 silicon Substances 0.000 claims description 21
- 230000008021 deposition Effects 0.000 claims description 10
- 238000010030 laminating Methods 0.000 claims 1
- 230000004907 flux Effects 0.000 description 28
- 238000011001 backwashing Methods 0.000 description 20
- 238000000034 method Methods 0.000 description 18
- 230000008569 process Effects 0.000 description 15
- 239000002699 waste material Substances 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 11
- 230000007423 decrease Effects 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 230000018044 dehydration Effects 0.000 description 6
- 238000006297 dehydration reaction Methods 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000000706 filtrate Substances 0.000 description 5
- 239000002351 wastewater Substances 0.000 description 5
- 238000000227 grinding Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 239000010802 sludge Substances 0.000 description 4
- 239000012530 fluid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000001471 micro-filtration Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000013049 sediment Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/30—Wastewater or sewage treatment systems using renewable energies
- Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy
Landscapes
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Filtration Of Liquid (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Dicing (AREA)
Description
12 排水タンク
14 処理タンク
16 濾過膜
16A 濾過面
16B 空隙部
16C 濾過孔
18 濃縮水タンク
20 濾過水タンク
22 ポンプ
23 逆洗水タンク
24 ポンプ
26 ポンプ
28 圧力計
30 圧力計
32 堆積層
34 被処理水
36 濾過水
38 被除去物
V1、V2、V3、V4 バルブ
40 傾斜板
42 堆積物
Claims (5)
- 被除去物を含む水である被処理水が貯留されるタンクと、
前記被除去物よりも小さい濾過孔が形成される濾過面と、前記濾過孔と連通する内部空間とを有し、前記被処理水に浸漬される平膜状のセラミック濾過膜と、
パイプを経由して前記セラミック濾過膜の前記内部空間と連通し、前記内部空間に吸引圧を与える吸引手段と、
前記パイプを経由して前記セラミック濾過膜の前記内部空間と連通し、前記内部空間に加圧を与える加圧手段と、を備え、
前記セラミック濾過膜には、直方体形状を呈する前記内部空間が、前記濾過面に沿って複数配設され、
前記被処理水を濾過する際には、前記吸引手段で前記セラミック濾過膜に吸引圧を与えることで、前記セラミック濾過膜により濾過された濾過水を前記タンクから取り出し、前記セラミック濾過膜が有する濾過面の全体に前記被除去物から成る堆積層を積層させて脱水し、
前記濾過水の流量が低減したら、前記吸引手段による吸引を解除した後に、前記加圧手段で前記セラミック濾過膜の前記内部空間に加圧を与えることで、前記堆積層を前記濾過面から離脱させて前記タンクの下部に下降させることを特徴とする濾過装置。 - 前記吸引手段が前記セラミック濾過膜に与える吸引圧は、−10kPa以上0kPa未満であることを特徴とする請求項1に記載の濾過装置。
- 前記加圧手段が前記セラミック濾過膜に与える加圧は、20kPa以上100kPa以下であることを特徴とする請求項1または請求項2に記載の濾過装置。
- 前記被除去物はシリコン屑であることを特徴とする請求項1から請求項3の何れかに記載の濾過装置。
- 前記セラミック濾過膜の下方で傾斜して配置される傾斜板を更に備えることを特徴とする請求項1から請求項4の何れかに記載の濾過装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013117283A JP6088360B2 (ja) | 2013-06-03 | 2013-06-03 | 濾過装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013117283A JP6088360B2 (ja) | 2013-06-03 | 2013-06-03 | 濾過装置 |
Publications (2)
Publication Number | Publication Date |
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JP2014233684A JP2014233684A (ja) | 2014-12-15 |
JP6088360B2 true JP6088360B2 (ja) | 2017-03-01 |
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JP2013117283A Active JP6088360B2 (ja) | 2013-06-03 | 2013-06-03 | 濾過装置 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6441704B2 (ja) * | 2015-02-10 | 2018-12-19 | 株式会社ディスコ | 切削装置 |
JP6965154B2 (ja) * | 2017-12-26 | 2021-11-10 | オルガノ株式会社 | 膜ろ過装置 |
CN111939768A (zh) * | 2020-09-01 | 2020-11-17 | 侯梦斌 | 一种漂浮式取水设备与工艺 |
CN114699932B (zh) * | 2022-03-23 | 2023-05-16 | 深圳市东方祺胜实业有限公司 | 动态膜过滤器及其用于处理污水的方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2580092B2 (ja) * | 1992-02-18 | 1997-02-12 | 日本碍子株式会社 | 回転円板型分離装置 |
JP4353665B2 (ja) * | 2001-10-31 | 2009-10-28 | 三洋アクアテクノ株式会社 | 濾過装置 |
DE102006008453A1 (de) * | 2006-02-17 | 2007-08-23 | Itn Nanovation Ag | Reinigungsverfahren für Abwässer |
JP2009072714A (ja) * | 2007-09-21 | 2009-04-09 | Sanyo Electric Co Ltd | フッ化水素酸処理装置 |
JP5257591B2 (ja) * | 2008-08-07 | 2013-08-07 | 株式会社ウェルシィ | 水処理方法 |
JP4665054B1 (ja) * | 2010-01-29 | 2011-04-06 | 国立大学法人九州工業大学 | シリコン回収システムおよびシリコン回収方法 |
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- 2013-06-03 JP JP2013117283A patent/JP6088360B2/ja active Active
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