JP2009072714A - フッ化水素酸処理装置 - Google Patents
フッ化水素酸処理装置 Download PDFInfo
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims abstract description 254
- 238000010306 acid treatment Methods 0.000 title claims abstract description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 285
- 239000002351 wastewater Substances 0.000 claims abstract description 99
- 238000006243 chemical reaction Methods 0.000 claims abstract description 42
- 239000011575 calcium Substances 0.000 claims abstract description 28
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 25
- 238000010979 pH adjustment Methods 0.000 claims abstract description 19
- 238000001914 filtration Methods 0.000 claims description 78
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 72
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 72
- 238000012545 processing Methods 0.000 claims description 62
- 239000000126 substance Substances 0.000 claims description 50
- 238000000926 separation method Methods 0.000 claims description 35
- 229910052731 fluorine Inorganic materials 0.000 claims description 28
- 239000011737 fluorine Substances 0.000 claims description 28
- 239000004065 semiconductor Substances 0.000 claims description 28
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 25
- 239000003929 acidic solution Substances 0.000 claims description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 238000012546 transfer Methods 0.000 claims description 2
- -1 fluoride ions Chemical class 0.000 abstract description 36
- 239000003795 chemical substances by application Substances 0.000 abstract description 10
- 239000003513 alkali Substances 0.000 abstract description 7
- 230000006866 deterioration Effects 0.000 abstract 1
- 229960002050 hydrofluoric acid Drugs 0.000 description 105
- 239000012528 membrane Substances 0.000 description 38
- 238000000034 method Methods 0.000 description 25
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- 239000002245 particle Substances 0.000 description 16
- 230000008569 process Effects 0.000 description 15
- 238000003860 storage Methods 0.000 description 15
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 14
- 239000007788 liquid Substances 0.000 description 14
- 239000007789 gas Substances 0.000 description 12
- 150000003839 salts Chemical class 0.000 description 12
- 239000001110 calcium chloride Substances 0.000 description 11
- 229910001628 calcium chloride Inorganic materials 0.000 description 11
- 230000004907 flux Effects 0.000 description 10
- 238000005530 etching Methods 0.000 description 8
- 239000012530 fluid Substances 0.000 description 7
- 239000003002 pH adjusting agent Substances 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- 239000002699 waste material Substances 0.000 description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000008399 tap water Substances 0.000 description 6
- 235000020679 tap water Nutrition 0.000 description 6
- 238000001784 detoxification Methods 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000004065 wastewater treatment Methods 0.000 description 4
- 229910004261 CaF 2 Inorganic materials 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 3
- 239000002440 industrial waste Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000005273 aeration Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 159000000007 calcium salts Chemical class 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000010792 warming Methods 0.000 description 2
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical class [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 241000208202 Linaceae Species 0.000 description 1
- 235000004431 Linum usitatissimum Nutrition 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229940043430 calcium compound Drugs 0.000 description 1
- 150000001674 calcium compounds Chemical class 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 235000011116 calcium hydroxide Nutrition 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
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- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- CUPFNGOKRMWUOO-UHFFFAOYSA-N hydron;difluoride Chemical compound F.F CUPFNGOKRMWUOO-UHFFFAOYSA-N 0.000 description 1
- 230000002706 hydrostatic effect Effects 0.000 description 1
- 230000003100 immobilizing effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000005374 membrane filtration Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000001139 pH measurement Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000003911 water pollution Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/26—Polyalkenes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02079—Cleaning for reclaiming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/147—Microfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0088—Physical treatment with compounds, e.g. swelling, coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
- C02F1/5236—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities using inorganic agents
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
- C02F1/583—Treatment of water, waste water, or sewage by removing specified dissolved compounds by removing fluoride or fluorine compounds
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2311/00—Details relating to membrane separation process operations and control
- B01D2311/04—Specific process operations in the feed stream; Feed pretreatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D2323/283—Reducing the pores
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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- C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
- C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
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- C02F2101/00—Nature of the contaminant
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- C02F2101/14—Fluorine or fluorine-containing compounds
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- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
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- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
Abstract
【解決手段】 pH調整部の処理槽にフッ酸が投入される際にアルカリ薬剤も投入し、処理槽内の第1の被処理水のpHを排水のpHより大きくする。また、処理槽に第3の経路P3(循環経路)を接続し、第1の被処理水を循環させて、所望の範囲のpH値を有する第2の被処理水が生成されるまでpH調整を行う。所望の値に調整したpH調整後の第2の被処理水をカルシウムと反応させる反応槽に移送するので、処理効率の低下を防げる。またpH計は循環経路に設けられ、排水に直接晒されることはなくフッ酸から保護することができる。
【選択図】 図1
Description
11A 処理槽
11B 反応槽
11C 分離槽
12 被処理水
12A 第1の被処理水
12B 第2の被処理水
13 濾過膜
14 pH計
15A 薬剤槽
15B 他の薬剤槽
15C 貯留槽
16 濾過水
17 フィルタープレス
18 散気装置
19 受入槽
100 フッ酸処理装置
P1 第1の経路
P2 第2の経路
P3 第3の経路
P4 第4の経路
Po1 第1のポンプ
Po2 第2のポンプ
Po3 第3のポンプ
AV1 第1のバルブ
AV2 第2のバルブ
AV3 第3のバルブ
Claims (12)
- クリーンルーム内でフッ素系材料を用いる半導体処理装置に近接して配置され、前記半導体処理装置から排出されるフッ化水素酸が混入した排水を前記クリーンルーム内から未搬出で処理するフッ化水素酸処理装置であって、
処理槽と、前記処理槽に接続する第1の経路および第2の経路と、該処理槽に設けられて循環する第3の経路とを有し、前記第1の経路を介して前記処理槽に前記排水を投入する際に、前記第2の経路からアルカリ薬剤を投入して前記排水より大きいpH値の第1の被処理水を生成し、該第1の被処理水が所望の範囲のpH値を有する第2の被処理水になるまで前記第3の経路で循環しながらpH値の測定および調整を行うpH調整部と、
前記第2の被処理水を移送する第4の経路と、
前記第2の被処理水にカルシウム分を添加してフッ化カルシウムを生成する反応槽と、
前記フッ化カルシウムを前記第2の被処理水から分離する分離槽とを具備することを特徴とするフッ化水素酸処理装置。 - 前記pH調整部は、前記第3の経路の途中に接続されたpH計を具備し、前記pH計の値により前記第3の経路の開閉を制御することを特徴とする請求項1に記載のフッ化水素酸処理装置。
- 前記pH調整部は、前記pH計の測定値が第1のpH値より低い場合に、前記第3の経路を閉じて前記処理槽内の前記第1の被処理水に前記アルカリ薬剤を投入することを特徴とする請求項2に記載のフッ化水素酸処理装置。
- 前記pH調整部は、前記pH計の測定値が第1のpH値以上で、第2のpH値より小さい場合に、前記第3の経路を開いたまま前記処理槽内の前記第1の被処理水に前記アルカリ薬剤を投入することを特徴とする請求項2に記載のフッ化水素酸処理装置。
- 前記pH調整部は、前記pH計の測定値が第2のpH値以上で第3のpH値以下の場合に、前記第3の経路を閉じて前記第2の被処理水を前記処理槽に貯留することを特徴とする請求項2に記載のフッ化水素酸処理装置。
- 前記pH調整部は、前記pH計の測定値が第3のpH値より大きい場合に、前記第3の経路を開いたまま前記処理槽内の前記第1の被処理水に酸性溶液を投入することを特徴とする請求項2に記載のフッ化水素酸処理装置。
- 前記pH調整部は、前記第1の被処理水の循環が開始されてから所定の時間経過後に該第1の被処理水のpH値を測定することを特徴とする請求項1に記載のフッ化水素酸処理装置。
- 前記pH調整部は、前記第1の被処理水のpH調整を行う酸性溶液に前記排水を用いることを特徴とする請求項1または請求項6に記載のフッ化水素酸処理装置。
- 前記第4の経路は、前記pH調整部内の前記第2の被処理水の全量を前記反応槽に移送することを特徴とする請求項1または請求項5に記載のフッ化水素酸処理装置。
- 前記第2の被処理水は、pH8以上pH10以下であることを特徴とする請求項1に記載のフッ化水素酸処理装置。
- 前記分離槽は、前記第2の被処理水に浸漬された濾過装置であることを特徴とする請求項1に記載のフッ化水素酸処理装置。
- 前記濾過装置の表面に形成された自己形成膜により、前記第2の被処理水を濾過することを特徴とする請求項11記載のフッ化水素酸処理装置。
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JP2007244964A JP2009072714A (ja) | 2007-09-21 | 2007-09-21 | フッ化水素酸処理装置 |
KR1020080088863A KR20090031236A (ko) | 2007-09-21 | 2008-09-09 | 불화 수소산 처리장치 |
US12/211,617 US20090101560A1 (en) | 2007-09-21 | 2008-09-16 | Hydrofluoric acid treatment apparatus |
TW097135572A TW200922883A (en) | 2007-09-21 | 2008-09-17 | Apparatus for treating hydrofluoric acid |
EP08016492A EP2039657A1 (en) | 2007-09-21 | 2008-09-18 | Hydrofluoric acid treatment apparatus |
CNA2008101887036A CN101439898A (zh) | 2007-09-21 | 2008-09-22 | 氢氟酸处理装置 |
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US (1) | US20090101560A1 (ja) |
EP (1) | EP2039657A1 (ja) |
JP (1) | JP2009072714A (ja) |
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Cited By (4)
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JP2014233683A (ja) * | 2013-06-03 | 2014-12-15 | パナソニック株式会社 | 濾過装置 |
JP2014233684A (ja) * | 2013-06-03 | 2014-12-15 | パナソニック株式会社 | 濾過装置 |
CN106830480A (zh) * | 2017-01-22 | 2017-06-13 | 冯合生 | 蚀刻高浓度废液回收再利用的处理系统及方法 |
WO2021241031A1 (ja) | 2020-05-29 | 2021-12-02 | 株式会社堀場アドバンスドテクノ | 測定装置及びガラス応答膜の交換時期判断方法 |
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CN102328945A (zh) * | 2009-08-03 | 2012-01-25 | 中昊晨光化工研究院 | 一种从含氟废水中制取氟化钙的装置及其应用方法 |
CN103172199B (zh) * | 2013-03-21 | 2015-03-25 | 深圳市超纯环保股份有限公司 | 氢氟酸废水的处理方法 |
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CN112758938B (zh) * | 2021-03-23 | 2023-08-08 | 烟台中瑞化工有限公司 | 一种利用氟化氢生产过程中尾气制备氟硅酸的系统 |
TWI788026B (zh) * | 2021-09-27 | 2022-12-21 | 鋒霈環境科技股份有限公司 | 自多重酸溶液生成晶體之環保節能回收系統及其方法 |
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CN106830480A (zh) * | 2017-01-22 | 2017-06-13 | 冯合生 | 蚀刻高浓度废液回收再利用的处理系统及方法 |
CN106830480B (zh) * | 2017-01-22 | 2020-12-18 | 冯合生 | 蚀刻高浓度废液回收再利用的处理系统及方法 |
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EP2039657A1 (en) | 2009-03-25 |
CN101439898A (zh) | 2009-05-27 |
US20090101560A1 (en) | 2009-04-23 |
TW200922883A (en) | 2009-06-01 |
KR20090031236A (ko) | 2009-03-25 |
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