JP6082743B2 - 放射源、リソグラフィ装置、ノズル、およびノズルを形成する方法 - Google Patents
放射源、リソグラフィ装置、ノズル、およびノズルを形成する方法 Download PDFInfo
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- JP6082743B2 JP6082743B2 JP2014527559A JP2014527559A JP6082743B2 JP 6082743 B2 JP6082743 B2 JP 6082743B2 JP 2014527559 A JP2014527559 A JP 2014527559A JP 2014527559 A JP2014527559 A JP 2014527559A JP 6082743 B2 JP6082743 B2 JP 6082743B2
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- 229910001887 tin oxide Inorganic materials 0.000 claims description 6
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- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
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- 239000011159 matrix material Substances 0.000 description 2
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- 229910004261 CaF 2 Inorganic materials 0.000 description 1
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- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
[0001] 本出願は、2012年9月2日に出願の米国特許仮出願第61/530,796号の利益を主張し、その全体が参照により本明細書に組み込まれる。
四の態様に適用可能であるということが認識される。
きる。
Claims (12)
- プラズマ形成位置に向かう軌跡に沿って液体小滴の流れを誘導するノズルと、
使用中、放射生成プラズマを生成するよう前記プラズマ形成位置における前記液体小滴にレーザ放射を誘導するレーザと、を備え、
前記ノズルは、前記液体小滴を形成するために使用される液体において存在する汚染がその内面に堆積することを防止するように構成された内面を有し、前記内面は、コーティングを備え、前記コーティングは、ポリテトラフルオロエチレン又はゾルゲルコーティング法に由来する材料を含む、
放射源。 - 前記コーティングは、前記コーティングが塗布される材料よりも汚染に対してより平滑又はより粘着性の少ない表面を提供する、請求項1に記載の放射源。
- 前記コーティングは、232℃よりも高い温度を耐えることができる、請求項1又は2に記載の放射源。
- 前記内面は、ノズルを形成するために使用される材料体の表面である、請求項1に記載の放射源。
- 前記材料体は、ダイヤモンド、又はガラス、又は鉄、又はセラミックを含む、請求項4に記載の放射源。
- 前記液体はスズを含み、及び/又は、前記汚染は酸化スズ粒子を含む、請求項1から5のいずれか一項に記載の放射源。
- 請求項1から6のいずれか一項に記載の放射源と、
放射ビームを提供する照明システムと、
前記放射ビームの断面にパターンを付与するパターニングデバイスと、
基板を保持する基板ホルダと、
前記基板のターゲット部分上に前記パターン付与された放射ビームを投影する投影システムと、を備える、
リソグラフィ装置。 - EUV放射源の液体小滴ジェネレータ用のノズルであって、
液体小滴を形成するために使用される液体において存在する汚染がその内面に堆積することを防止するように構成された内面を有し、
前記内面は、コーティングを備え、
前記コーティングは、ポリテトラフルオロエチレン又はゾルゲルコーティング法に由来する材料を含む、ノズル。 - EUV放射源の液体小滴ジェネレータ用のノズルを形成する方法であって、
材料体からノズルを形成することと、
前記ノズルに、液体小滴を形成するために使用される液体において存在する汚染がその内面に堆積することを防止するように構成された内面を提供することであって、コーティングの形態で前記内面を提供するためにウェットコーティング法が使用されることと、を含む方法。 - 前記コーティングは、ゾルゲルコーティング法を使用して、又は、流体懸濁液におけるコーティングを使用して提供される、請求項9に記載の方法。
- 前記ウェットコーティング法において使用された液体は、塗布された後に硬化される、請求項9又は10に記載の方法。
- 前記内面は、前記ノズルを形成するために使用される前記材料体を通る導管を形成することによって提供される、請求項9に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161530796P | 2011-09-02 | 2011-09-02 | |
US61/530,796 | 2011-09-02 | ||
PCT/EP2012/064793 WO2013029898A1 (en) | 2011-09-02 | 2012-07-27 | Radiation source |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2014525676A JP2014525676A (ja) | 2014-09-29 |
JP2014525676A5 JP2014525676A5 (ja) | 2015-09-10 |
JP6082743B2 true JP6082743B2 (ja) | 2017-02-15 |
Family
ID=46640659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014527559A Active JP6082743B2 (ja) | 2011-09-02 | 2012-07-27 | 放射源、リソグラフィ装置、ノズル、およびノズルを形成する方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9192039B2 (ja) |
EP (1) | EP2752098A1 (ja) |
JP (1) | JP6082743B2 (ja) |
KR (1) | KR101958850B1 (ja) |
CN (1) | CN103748969A (ja) |
NL (1) | NL2009241A (ja) |
SG (1) | SG2014007694A (ja) |
TW (1) | TWI577244B (ja) |
WO (1) | WO2013029898A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2014019803A1 (en) * | 2012-08-01 | 2014-02-06 | Asml Netherlands B.V. | Method and apparatus for generating radiation |
JPWO2014024865A1 (ja) * | 2012-08-08 | 2016-07-25 | ギガフォトン株式会社 | ターゲット供給装置及び極端紫外光生成装置 |
EP2703339A1 (en) * | 2012-09-04 | 2014-03-05 | Casale Chemicals S.A. | Burner for the production of synthesis gas |
JPWO2016001973A1 (ja) * | 2014-06-30 | 2017-04-27 | ギガフォトン株式会社 | ターゲット供給装置、ターゲット物質の精製方法、ターゲット物質の精製プログラム、ターゲット物質の精製プログラムを記録した記録媒体、および、ターゲット生成器 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2912525B2 (ja) | 1993-07-01 | 1999-06-28 | 株式会社日立製作所 | Bwrプラントの炉水制御方法およびその装置 |
US6385290B1 (en) | 1998-09-14 | 2002-05-07 | Nikon Corporation | X-ray apparatus |
US7405416B2 (en) | 2005-02-25 | 2008-07-29 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery |
DE60331453D1 (de) | 2002-09-24 | 2010-04-08 | Konica Minolta Holdings Inc | Kopfs mit elektrostatischer anziehung, verfahren zur herstellung einer düsenplatte |
US6809328B2 (en) * | 2002-12-20 | 2004-10-26 | Intel Corporation | Protective coatings for radiation source components |
WO2007050689A1 (en) * | 2005-10-25 | 2007-05-03 | Nd Industries, Inc. | Protective coating and coated welding tip and nozzle assembly |
JP5076087B2 (ja) * | 2006-10-19 | 2012-11-21 | ギガフォトン株式会社 | 極端紫外光源装置及びノズル保護装置 |
JP2009023334A (ja) * | 2007-06-21 | 2009-02-05 | Ricoh Co Ltd | 液体吐出装置用ヘッドのノズル板及び液体吐出装置用ヘッド、並びに液体吐出装置及び液体吐出方法、インクジェット記録装置及びインクジェット記録方法 |
JP5362515B2 (ja) | 2008-10-17 | 2013-12-11 | ギガフォトン株式会社 | 極端紫外光源装置のターゲット供給装置及びその製造方法 |
JP2012507417A (ja) * | 2008-10-31 | 2012-03-29 | フジフィルム ディマティックス, インコーポレイテッド | ノズル噴出口成形 |
JP5455661B2 (ja) * | 2009-01-29 | 2014-03-26 | ギガフォトン株式会社 | 極端紫外光源装置 |
CN101629295A (zh) * | 2009-08-05 | 2010-01-20 | 中国人民解放军第五七一九工厂 | 一种抗燃油喷嘴积碳的表面处理方法 |
JP5649395B2 (ja) | 2009-10-08 | 2015-01-07 | 富士フイルム株式会社 | インクジェット記録装置及び方法並びに異常ノズル検知方法 |
NL2005449A (en) * | 2009-11-16 | 2012-04-05 | Asml Netherlands Bv | Lithographic method and apparatus. |
-
2012
- 2012-07-27 NL NL2009241A patent/NL2009241A/en not_active Application Discontinuation
- 2012-07-27 CN CN201280040931.3A patent/CN103748969A/zh active Pending
- 2012-07-27 JP JP2014527559A patent/JP6082743B2/ja active Active
- 2012-07-27 US US14/241,993 patent/US9192039B2/en active Active
- 2012-07-27 EP EP12745662.2A patent/EP2752098A1/en not_active Withdrawn
- 2012-07-27 WO PCT/EP2012/064793 patent/WO2013029898A1/en active Application Filing
- 2012-07-27 KR KR1020147008520A patent/KR101958850B1/ko active IP Right Grant
- 2012-07-27 SG SG2014007694A patent/SG2014007694A/en unknown
- 2012-08-24 TW TW101130890A patent/TWI577244B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN103748969A (zh) | 2014-04-23 |
EP2752098A1 (en) | 2014-07-09 |
WO2013029898A1 (en) | 2013-03-07 |
TW201316840A (zh) | 2013-04-16 |
US9192039B2 (en) | 2015-11-17 |
SG2014007694A (en) | 2014-03-28 |
TWI577244B (zh) | 2017-04-01 |
JP2014525676A (ja) | 2014-09-29 |
KR101958850B1 (ko) | 2019-03-15 |
US20140203193A1 (en) | 2014-07-24 |
NL2009241A (en) | 2013-03-05 |
KR20140068124A (ko) | 2014-06-05 |
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