JP6053453B2 - 発光素子 - Google Patents
発光素子 Download PDFInfo
- Publication number
- JP6053453B2 JP6053453B2 JP2012237128A JP2012237128A JP6053453B2 JP 6053453 B2 JP6053453 B2 JP 6053453B2 JP 2012237128 A JP2012237128 A JP 2012237128A JP 2012237128 A JP2012237128 A JP 2012237128A JP 6053453 B2 JP6053453 B2 JP 6053453B2
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- JP
- Japan
- Prior art keywords
- light emitting
- group
- layer
- semiconductor layer
- emitting region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 claims description 197
- 229910052751 metal Inorganic materials 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 39
- 239000000758 substrate Substances 0.000 claims description 25
- 238000002161 passivation Methods 0.000 claims description 24
- 230000004888 barrier function Effects 0.000 claims description 17
- 230000008878 coupling Effects 0.000 claims description 7
- 238000010168 coupling process Methods 0.000 claims description 7
- 238000005859 coupling reaction Methods 0.000 claims description 7
- 230000007423 decrease Effects 0.000 claims description 5
- 239000007772 electrode material Substances 0.000 claims description 5
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 395
- 239000000463 material Substances 0.000 description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- 230000000903 blocking effect Effects 0.000 description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 7
- -1 Si 3 N 4 Inorganic materials 0.000 description 6
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 description 6
- 238000000605 extraction Methods 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 229910001887 tin oxide Inorganic materials 0.000 description 5
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000002356 single layer Substances 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 229910002704 AlGaN Inorganic materials 0.000 description 3
- 229910002601 GaN Inorganic materials 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 239000011135 tin Substances 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- YZZNJYQZJKSEER-UHFFFAOYSA-N gallium tin Chemical compound [Ga].[Sn] YZZNJYQZJKSEER-UHFFFAOYSA-N 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- HRHKULZDDYWVBE-UHFFFAOYSA-N indium;oxozinc;tin Chemical compound [In].[Sn].[Zn]=O HRHKULZDDYWVBE-UHFFFAOYSA-N 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- VRIVJOXICYMTAG-IYEMJOQQSA-L iron(ii) gluconate Chemical compound [Fe+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O VRIVJOXICYMTAG-IYEMJOQQSA-L 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 206010019332 Heat exhaustion Diseases 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910019897 RuOx Inorganic materials 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- DZLPZFLXRVRDAE-UHFFFAOYSA-N [O--].[O--].[O--].[O--].[Al+3].[Zn++].[In+3] Chemical compound [O--].[O--].[O--].[O--].[Al+3].[Zn++].[In+3] DZLPZFLXRVRDAE-UHFFFAOYSA-N 0.000 description 1
- QCSXNSFTJPBQOI-UHFFFAOYSA-N [Zn+2].[O-2].[Zn+2].[In+3] Chemical compound [Zn+2].[O-2].[Zn+2].[In+3] QCSXNSFTJPBQOI-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- SBYXRAKIOMOBFF-UHFFFAOYSA-N copper tungsten Chemical compound [Cu].[W] SBYXRAKIOMOBFF-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- SKRWFPLZQAAQSU-UHFFFAOYSA-N stibanylidynetin;hydrate Chemical compound O.[Sn].[Sb] SKRWFPLZQAAQSU-UHFFFAOYSA-N 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
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- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
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- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
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- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
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- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
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- H01L33/08—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a plurality of light emitting regions, e.g. laterally discontinuous light emitting layer or photoluminescent region integrated within the semiconductor body
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- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
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- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
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- H01L2224/48257—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
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- H01L2924/11—Device type
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- H01L2924/1203—Rectifying Diode
- H01L2924/12032—Schottky diode
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- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/24—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
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- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
- H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Devices (AREA)
Description
110 基板
115 バッファー層
P1〜Pn 発光領域
120 発光構造物
130 伝導層
140 絶縁層
150 第1の電極部
182、184、186 中間パッド
170 第2の電極部
Claims (37)
- 第1の半導体層、活性層、及び第2の半導体層を含む複数の発光領域を含む発光構造物;
前記複数の発光領域のうち第1の発光領域の第1の半導体層と連結された第1のパッド;
前記複数の発光領域のうち第2の発光領域の第2の半導体層と連結された第2のパッド;
前記複数の発光領域のうち第3の発光領域の第2の半導体層と連結された中間パッド;及び
前記複数の発光領域を順次直列に連結する連結電極;を含み、
前記直列に連結される複数の発光領域は第1のグループ〜第iのグループの発光領域に区分され、互いに異なるグループに属する発光領域の面積は互いに異なり(1<i≦j、iとjのそれぞれは自然数であり、jは最後の発光領域グループである)、
前記第1のグループ〜前記第iのグループのうち前記最後の発光領域グループを除いた残りのグループのそれぞれは、前記第3の発光領域を含み、
第1の電源は、前記第1のパッドに供給され、
第2の電源は、前記第2のパッド及び前記中間パッドのうちいずれか一つに供給され、
前記第2のパッド及び前記中間パッドのうち前記第2の電源が供給される地点が変わることによって、前記第1のグループ〜前記第iのグループのうち該当するグループに属する発光領域が発光し、
共通電極である前記第1のパッドに近接したグループであるほど、発光領域の面積がより大きい発光素子。 - 第1の半導体層、活性層、及び第2の半導体層を含む複数の発光領域を含む発光構造物;
前記複数の発光領域のうち第1の発光領域の第1の半導体層と連結された第1のパッド;
前記複数の発光領域のうち第2の発光領域の第2の半導体層と連結された第2のパッド;
前記複数の発光領域のうち第3の発光領域の第1の半導体層と連結された中間パッド;及び
前記複数の発光領域を順次直列に連結する連結電極;を含み、
前記直列に連結される複数の発光領域は、第1のグループ〜第iのグループの発光領域に区分され、互いに異なるグループに属する発光領域の面積は互いに異なり(1<i≦j、iとjのそれぞれは自然数であり、jは最後の発光領域グループである)、
前記第1のグループ〜前記第iのグループのうち前記最後の発光領域グループを除いた残りのグループのそれぞれは、前記第3の発光領域を含み、
第1の電源は、前記第1のパッド及び前記中間パッドのうちいずれか一つに供給され、
第2の電源は、前記第2のパッドに供給され、
前記第1のパッド及び前記中間パッドのうち前記第1の電源が供給される地点が変わることによって、前記第1のグループ〜前記第iのグループのうち該当するグループに属する発光領域が発光し、
共通電極である前記第2のパッドに近接したグループであるほど、発光領域の面積がより大きい発光素子。 - 前記第1のパッドは、
前記第1のグループに含まれる各発光領域のうち1番目の発光領域の第1の半導体層上に配置される、請求項1に記載の発光素子。 - 前記第2のパッドは、
前記第jのグループに含まれる各発光領域のうち最後の発光領域の第2の半導体層上に配置される、請求項3に記載の発光素子。 - 前記第1のパッドは、
前記第jのグループに含まれる各発光領域のうち最後の発光領域の第1の半導体層上に配置される、請求項2に記載の発光素子。 - 前記第2のパッドは、
前記第1のグループに含まれる各発光領域のうち1番目の発光領域の第2の半導体層上に配置される、請求項5に記載の発光素子。 - 同一のグループに属する各発光領域の面積は互いに同一である、請求項1〜6のいずれか1項に記載の発光素子。
- 前記互いに異なるグループに属する発光領域の横の長さ及び縦の長さのうち少なくとも一つは互いに異なる、請求項1〜7のいずれか1項に記載の発光素子。
- 第i―1のグループが第iのグループより前記共通電極にさらに近接し、
前記第i―1のグループに含まれる発光領域の面積は、前記第iのグループに含まれる発光領域の面積より大きい、請求項1〜8のいずれか1項に記載の発光素子。 - 前記第1のグループから前記第jのグループに行くほど、前記共通電極からより遠くなり、
前記第1のグループから前記第jのグループに行くほど、各グループに含まれる発光領域の面積は減少する、請求項1〜9のいずれか1項に記載の発光素子。 - 前記発光領域の横の長さ及び縦の長さのうちいずれか一つが減少する、請求項10に記載の発光素子。
- 前記中間パッドが配置された前記第3の発光領域は、
前記最後の発光領域グループを除いた前記残りのグループのそれぞれに属する各発光領域のうち最後の発光領域に該当する、請求項1、3、4及び7〜11のいずれか1項に記載の発光素子。 - 前記中間パッドが配置された前記第3の発光領域は、
前記最後の発光領域グループを除いた前記残りのグループのそれぞれに属する各発光領域のうち最後の発光領域に該当する、請求項2、5、6及び7〜11のいずれか1項に記載の発光素子。 - 前記中間パッドは、前記第3の発光領域内に位置する連結電極と電気的に連結される、請求項1、3、4、7〜11、及び12のいずれか1項に記載の発光素子。
- 前記複数の発光領域上に配置される絶縁層をさらに含み、前記連結電極は前記絶縁層上に配置される、請求項1〜14のいずれか1項に記載の発光素子。
- 前記連結電極は、
前記絶縁層を貫通して前記隣接する各発光領域のうちいずれか一つの第2の半導体層と接触する第1の部分を含む、請求項15に記載の発光素子。 - 前記連結電極は、前記絶縁層、前記第2の半導体層、及び前記活性層を貫通して前記隣接する各発光領域のうち残りの他の一つの第1の半導体層と接触する第2の部分をさらに含み、
前記絶縁層は、前記第2の部分と前記第2の半導体層との間、及び前記第2の部分と前記活性層との間に配置される、請求項15又は16に記載の発光素子。 - 前記発光構造物の下側に配置される基板;及び
前記各発光領域と前記絶縁層との間に配置される伝導層;をさらに含む、請求項15〜17のいずれか1項に記載の発光素子。 - 第1の半導体層、活性層、及び第2の半導体層を含む複数の発光領域を含む発光構造物;
前記複数の発光領域のそれぞれの第2の半導体層の下側に配置される各金属層;
前記複数の発光領域のうち第1の発光領域の第1の半導体層と連結された第1の電極部;
前記複数の発光領域のうち第2の発光領域の第2の半導体層と連結された金属層と電気的に連結される第2の電極部;
前記複数の発光領域を順次直列に連結する連結電極;
前記複数の発光領域のうち第3の発光領域の第1の半導体層と連結された中間パッド;及び
前記各金属層の相互間を電気的に絶縁させる絶縁層;を含み、
前記直列に連結される複数の発光領域は、第1のグループ〜第iのグループの発光領域に区分され、互いに異なるグループに属する発光領域の面積は互いに異なり(1<i≦j、iとjのそれぞれは自然数であり、jは最後の発光領域グループである)、
前記第1のグループ〜前記iのグループのうち前記最後の発光領域グループを除いた残りのグループのそれぞれは、前記第3の発光領域を含み、
第1の電源は、前記第1の電極部及び前記中間パッドのうちいずれか一つに供給され、
第2の電源は、前記第2の電極部に供給され、
前記第1の電極部及び前記中間パッドのうち前記第1の電源が供給される地点が変わることによって、前記第1のグループ〜前記第iのグループのうち該当するグループに属する発光領域が発光し、
共通電極である前記第2の電極部に近接したグループであるほど、発光領域の面積がより大きい発光素子。 - 前記第2の電極部は、前記第1のグループの各発光領域のうち1番目の発光領域の金属層と連結される、請求項19に記載の発光素子。
- 前記第1の電極部は、前記第jのグループの各発光領域のうち最後の発光領域の第1の半導体層上に配置される、請求項19又は20に記載の発光素子。
- 同一のグループに属する各発光領域の面積は互いに同一である、請求項19〜21のいずれか1項に記載の発光素子。
- 第i―1のグループは、第iのグループより前記共通電極にさらに近接し、
前記第i―1のグループに含まれる発光領域の面積は、前記第iのグループに含まれる発光領域の面積より大きい、請求項19〜21のいずれか1項に記載の発光素子。 - 前記第1のグループから前記第jのグループに行くほど、前記共通電極からより遠くなり、
前記第1のグループから前記第jのグループに行くほど、各グループに含まれる発光領域の面積は減少する、請求項19〜23のいずれか1項に記載の発光素子。 - 前記中間パッドが配置された前記第3の発光領域は、
前記最後の発光領域グループを除いた前記残りのグループのそれぞれに属する各発光領域のうち最後の発光領域に該当する、請求項19〜24のいずれか1項に記載の発光素子。 - 前記各金属層は、
オーミック層及び反射層のうち少なくとも一つを含む、請求項19〜25のいずれか1項に記載の発光素子。 - 前記複数の発光領域上に配置されるパッシベーション層をさらに含み、前記連結電極は前記パッシベーション層上に配置される、請求項19〜26のいずれか1項に記載の発光素子。
- 前記第2の電極部は、
前記複数の発光領域のうち前記他のいずれか一つの金属層と電気的に連結されるバリア層;及び
前記バリア層の下側に配置される支持層;を含む、請求項19〜27のいずれか1項に記載の発光素子。 - 前記連結電極は、
前記パッシベーション層、前記第1の半導体層、及び前記活性層を貫通して前記隣接する各発光領域のうちいずれか一つの第2の半導体層と接触する少なくとも一つの第1の部分;及び
前記パッシベーション層を貫通して前記隣接する各発光領域のうち残りの他の一つの第1の半導体層と接触する少なくとも一つの第2の部分;を含み、
前記パッシベーション層は、前記第1の部分と前記第1の半導体層との間、及び前記第1の部分と前記活性層との間に配置される、請求項27に記載の発光素子。 - 前記絶縁層は、
前記第2の電極部と電気的に連結される前記他のいずれか一つの金属層を除いた残りの金属層と前記第2の電極部の相互間を電気的に絶縁させる、請求項19〜29のいずれか1項に記載の発光素子。 - 前記第2の部分の下面は、前記活性層の下面より下側に位置する、請求項17に記載の発光素子。
- 前記第2の部分は、ホール又は溝に電極物質が充填された形態である、請求項17又は31のいずれか1項に記載の発光素子。
- 前記第1の部分の下面は、前記活性層の下面より下側に位置する、請求項29に記載の発光素子。
- 前記第1の部分は、ホール又は溝に電極物質が充填された形態である、請求項29又は33に記載の発光素子。
- 前記第1の半導体層の上面は凹凸(roughness)を含む、請求項19〜30のいずれか1項に記載の発光素子。
- 前記連結電極は前記伝導層と点接触する、請求項18に記載の発光素子。
- 前記連結電極は前記第1の半導体層と点接触する、請求項1〜18のいずれか1項に記載の発光素子。
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