JP6048552B1 - オンライン移送した分析試料の分析システム - Google Patents
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/714—Sample nebulisers for flame burners or plasma burners
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
- G01N27/622—Ion mobility spectrometry
- G01N27/623—Ion mobility spectrometry combined with mass spectrometry
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N2001/002—Devices for supplying or distributing samples to an analysing apparatus
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/02—Devices for withdrawing samples
- G01N1/10—Devices for withdrawing samples in the liquid or fluent state
- G01N2001/1006—Dispersed solids
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N2021/8411—Application to online plant, process monitoring
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- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
Description
N ネブライザー
C スプレーチャンバー
P プラズマトーチ
D ドレイン
Ar アルゴンガス
M メイクアップガス
La アクション経路
Ls スタンバイ経路
J 合流地点
Claims (6)
- 分析試料を霧化するネブライザー、霧化した分析試料を粒径により選別するスプレーチャンバー、及び、スプレーチャンバーからプラズマトーチまで分析試料をオンライン移送する試料移送経路からなる試料別移送手段と、
オンライン移送した分析試料をプラズマ炎中に送り込むプラズマトーチ、及び、誘導結合プラズマ若しくはマイクロ波プラズマを利用した分析装置からなる共通分析手段と、を備えた分析システムであって、
2以上の試料別移送手段を備えるとともに、試料別移送手段の各試料移送経路が、共通分析手段のプラズマトーチと接続しており、
各試料移送経路には、スプレーチャンバーからプラズマトーチまで分析試料を移送するメイン流路と、メイン流路にメイクアップガスを供給するメイクアップガス供給路と、メイクアップガス供給路とスプレーチャンバーとの間に設けられ、メイクアップガス及び/又は分析試料をメイン流路から排出するドレイン流路と、を有し、
メイン流路は、分析試料の移送経路にポンプ及び弁を有しない構成となっており、
プラズマトーチは、霧化した分析試料を導入する試料導入管を有し、
ドレイン流路の内径(Dd)は、プラズマトーチの試料導入管のプラズマ導入側付近の内径(Dt)と同じ(Dd=Dt)、又は、Dtよりも大きい(Dd>Dt)ことを特徴とする分析システム。 - 1以上の試料移送経路のドレイン流路は、流路空間を縮小する絞り部を有する請求項1に記載された分析システム。
- 試料別移送手段は脱溶媒装置を備え、スプレーチャンバーは脱溶媒装置内に配置される請求項1又は請求項2に記載された分析システム。
- ネブライザーによる霧化前の分析試料に、標準試料を添加する標準試料添加装置を有する請求項1〜請求項3のいずれかに記載された分析システム。
- 分析試料をネブライザーで霧化し、霧化した分析試料をスプレーチャンバーで粒径により選別した後、スプレーチャンバーからプラズマトーチまで試料移送経路により分析試料をオンライン移送する試料別移送段階と、
オンライン移送した分析試料をプラズマトーチによりプラズマ炎中に送り込み、前記分析試料を分析装置により誘導結合プラズマ分析又はマイクロ波プラズマ分析する共通分析段階と、からなる分析方法であって、
試料別移送段階では、2以上の試料移送経路より、それぞれ分析試料をオンライン移送した後、いずれか1の分析試料をプラズマトーチに送液し、各分析試料を交互に共通分析段階に供するものであり、
オンライン移送は、スプレーチャンバーからプラズマトーチまで、メイン流路により分析試料を移送するものであり、メイン流路に対し、メイクアップガス供給路を通じてメイクアップガスを供給するとともに、ドレイン流路よりメイクアップガス及び/又は分析試料を排出し、
共通分析段階を実行中の分析試料の試料移送経路をアクション経路、共通分析段階を実行していない分析試料の試料移送経路をスタンバイ経路とした場合において、スタンバイ経路には、メイクアップガス供給路とプラズマトーチ側の経路端部との間に、メイクアップガスのみ供給されるようにすることを特徴とする分析方法。 - 標準添加法により、霧化前の分析試料に標準試料を添加する請求項5に記載された分析方法。
Priority Applications (7)
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JP2015163751A JP6048552B1 (ja) | 2015-08-21 | 2015-08-21 | オンライン移送した分析試料の分析システム |
KR1020177019475A KR101931463B1 (ko) | 2015-08-21 | 2016-08-16 | 온라인 이송된 분석 시료의 분석 시스템 |
PCT/JP2016/073880 WO2017033796A1 (ja) | 2015-08-21 | 2016-08-16 | オンライン移送した分析試料の分析システム |
EP16839143.1A EP3236243B1 (en) | 2015-08-21 | 2016-08-16 | Analysis system for online-transferred analysis samples |
US15/540,320 US10024801B2 (en) | 2015-08-21 | 2016-08-16 | Analysis system for online-transferred analysis sample |
CN201680008778.4A CN107209124B (zh) | 2015-08-21 | 2016-08-16 | 在线移送的分析样品的分析系统 |
TW105126224A TWI625759B (zh) | 2015-08-21 | 2016-08-17 | 線上移送之分析樣本的分析系統及分析方法 |
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EP (1) | EP3236243B1 (ja) |
JP (1) | JP6048552B1 (ja) |
KR (1) | KR101931463B1 (ja) |
CN (1) | CN107209124B (ja) |
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JP6779469B2 (ja) * | 2018-03-27 | 2020-11-04 | 信越半導体株式会社 | 試料分析方法、試料導入装置 |
US11441978B1 (en) * | 2018-04-12 | 2022-09-13 | Elemental Scientific, Inc. | Automatic evaporative sample preparation |
WO2020033850A1 (en) * | 2018-08-10 | 2020-02-13 | Nathan Saetveit | Preconcentration of fluid samples with alternating dual loop introduction |
CN110108779A (zh) * | 2019-06-13 | 2019-08-09 | 西安奕斯伟硅片技术有限公司 | 用icp-ms对液体材料进行定量检测的方法 |
JP6695088B1 (ja) * | 2019-08-29 | 2020-05-20 | 株式会社 イアス | 金属微粒子の分析方法および誘導結合プラズマ質量分析方法 |
DE102021002086A1 (de) * | 2020-04-23 | 2021-10-28 | National Institute Of Advanced Industrial Science And Technology | Probeneinführungsvorrichtung, Analysevorrichtung mit induktiv gekoppeltem Plasma und Analyseverfahren |
CN112378988A (zh) * | 2020-09-18 | 2021-02-19 | 瑞莱谱(杭州)医疗科技有限公司 | 一种基于icp-ms高通量分析的装置 |
US12040172B1 (en) * | 2021-04-26 | 2024-07-16 | Elemental Scientific, Inc. | Method for ICPMS instrument stability control with strong acid resistant spray chamber |
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JPS62298749A (ja) * | 1986-06-18 | 1987-12-25 | Shimadzu Corp | Icp分析方法 |
JPH05296933A (ja) * | 1992-04-22 | 1993-11-12 | Shimadzu Corp | Icp発光分光分析装置 |
JPH06109638A (ja) * | 1992-09-30 | 1994-04-22 | Shimadzu Corp | Icp発光分光分析装置 |
JPH10106483A (ja) * | 1996-09-30 | 1998-04-24 | Shimadzu Corp | Icp分析装置 |
JP2000100374A (ja) * | 1998-09-24 | 2000-04-07 | Shimadzu Corp | Icp−ms分析装置 |
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JP2017040614A (ja) | 2017-02-23 |
WO2017033796A1 (ja) | 2017-03-02 |
EP3236243A1 (en) | 2017-10-25 |
TWI625759B (zh) | 2018-06-01 |
EP3236243B1 (en) | 2019-11-27 |
EP3236243A4 (en) | 2018-01-10 |
CN107209124A (zh) | 2017-09-26 |
KR101931463B1 (ko) | 2018-12-20 |
TW201717249A (zh) | 2017-05-16 |
CN107209124B (zh) | 2019-11-22 |
US10024801B2 (en) | 2018-07-17 |
KR20170093975A (ko) | 2017-08-16 |
US20180024068A1 (en) | 2018-01-25 |
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