JP6019992B2 - Color filter forming substrate and display device - Google Patents

Description

  The present invention relates to a color filter forming substrate used in a color conversion type display device including a color conversion layer that converts blue light from a blue light source into red light and green light other than blue light, respectively. The present invention relates to a color filter forming substrate used in a color conversion type display device in which a light emitting organic EL (Electro-Luminescence) light emitting layer is arranged in all pixel regions and used as a blue light source.

  In recent years, the spread of display devices has been remarkable, and mobile laptop computers and multi-function terminal devices (also called high-function terminal devices) have become popular, and tablet-type multi-function terminal devices are expected to spread rapidly. As a display unit of these terminal devices (hereinafter referred to as mobile electronic devices), conventionally, an FPD (Flat Panel Display) using a liquid crystal has been mainstream, but recently, Unlike FPDs using liquid crystals, FPDs using organic EL (Electro-Luminescence), which are self-luminous ultra-thin solid-state devices, have a wide viewing angle, are thin, and are compatible with high-speed moving images have come to be used. .

As a full-color display device using organic EL, a white light emitting organic EL light emitting layer is used to appropriately emit white light for each pixel, and R (red) for a color filter corresponding to the pixel region. , G (green), and B (blue) colored resin layers of a first method (also referred to as a white light emission + CF (color filter) method) display device, R, G, and B for each pixel. A display device of the second method (also referred to as a three-color coating method) in which an organic EL light emitting layer for emitting each color is arranged and a circularly polarizing plate is arranged on the entire surface, or a blue light source that is usually not a white light source. A third method (color conversion method, also referred to as a color conversion materials (CCM) method) display device in which an organic EL light emitting layer is arranged on all pixels and emits red and green other than blue through a color conversion layer is known. ing
The display device of the first method is simple in forming a white light emitting organic light emitting layer and is advantageous in terms of yield and quality, but has low white light emission efficiency.
The second type of display device may have high light emission efficiency, but it is difficult to increase the area and definition, and the yield is low due to color separation, resulting in a reduction in quality.
In the display device of the third method, the process of the organic light emitting layer emitting blue light is simpler than the first method and the second method, but a color conversion layer process and a color filter process are required.

Conventionally, in the display device of the third method, as shown in FIG. 4B, the blue emitted light 122LB directly passes through a blue color filter cured film (also referred to as a colored resin layer) 113B, Further, by applying the blue emission light 122LB to the color conversion layers 123r and 123g, respectively, the red emission light 123LR and the green emission 123LG in the wavelength region not including the blue region are generated, and the generated light is R, G. By passing cured films (also referred to as colored resin layers) 113R and 113G for the respective color filters, light of each desired R, G, and B color was obtained.
FIG. 4B is a cross-sectional view showing a schematic configuration of the third type display device in a separated manner, and FIG. 4A is a color filter 110 used in the display device shown in FIG. FIG. 4C is a schematic cross-sectional view of the TFT forming substrate 120 used in the display device shown in FIG.
In the case of the display device of the third method, if the color conversion layers 123r and 123g are installed on the viewer side, the cause of deterioration in image quality such as color mixing due to the influence of external light and white floating at the time of black display Therefore, conventionally, cured films 113R, 113B, and 113G for color filters of R, G, and B are disposed on the viewer side to avoid color mixing and whitening caused by the influence of external light.
Here, the color conversion layers 123r and 123rg each perform color conversion by absorbing light having a short wavelength and emitting light having a longer wavelength than energy. In FIG. The conversion layer 123r absorbs blue light 122LB and emits R light, and the color conversion layer 123g absorbs blue light 122LB and emits G light.
However, this third type of display device has a simple process of forming a blue light-emitting organic light-emitting layer, but requires a color conversion layer process and a color filter process, and simplification of production has been desired.

Patent No. 1998223 JP 2003-187975 A

As described above, in recent years, the spread of display devices has been remarkable, and mobile laptop computers and multifunction terminal devices (also referred to as high-function terminal devices) have become popular, and tablet-type multifunction terminal devices have rapidly become popular. As the display unit of these terminal devices (hereinafter referred to as mobile electronic devices) has recently become widespread, unlike FPDs using liquid crystals, self-luminous ultra-thin solid-state devices are widely used. FPDs using organic EL (Electro-Luminescence), which has a thin viewing angle and is compatible with high-speed video, have come to be used. Among them, a blue light-emitting organic EL light-emitting layer is arranged on all pixels as a light source. A color conversion method (CCM (Color Conversion Materials method) that emits red and green other than blue through a color conversion layer. In the display device of the system, the quality manner can suppress color mixing and white floating due to the influence of external light, and, as it can simplify the fabrication has been demanded.
The present invention corresponds to this, and a color conversion method (CCM (Color Conversion Materials method) in which an organic EL light-emitting layer emitting blue light is arranged in all pixels and red and green other than blue are emitted through the color conversion layer. The display device of the third method is to provide a display device that can suppress color mixing and whitening due to the influence of external light and can be easily manufactured.
At the same time, an object of the present invention is to provide a color filter forming substrate that enables the production of such a display device.

The color filter forming substrate of the present invention is a color filter forming substrate for use in a color conversion type display device having each color conversion layer for converting blue light from a blue light source into red light and green light other than blue light. In the display device, a yellow cured film is disposed in a region corresponding to the red pixel and the green pixel, and a blue cured film is disposed in a region corresponding to the blue pixel region. Is.
And in said color filter formation board | substrate and the area | region corresponding to the pixel area | region of the said display apparatus, and the area | region where the said yellow cured film was distribute | arranged, the transmittance | permeability in the wavelength range of 400-450 nm is 1% or less It is characterized by being.
Moreover, in any one of the color filter forming substrates, the yellow cured film may be C.I. I. Pigment Yellow 139 is contained.
In any one of the above color filter forming substrates, the display device is a display device in which a blue light emitting organic EL light emitting layer is arranged in all pixel regions to form a blue light source. It is what.

  The display device of the present invention is characterized in that a display portion is formed using any of the color filter forming substrates described above.

(Function)
The color filter forming substrate according to the present invention has such a configuration, so that a blue light-emitting organic EL light-emitting layer is arranged as a light source in all pixels and emits red and green other than blue through the color conversion layer. A display device of the third method, which is a conversion method (CCM (Color Conversion Materials method)). In terms of quality, a display device that can suppress color mixing and whitening due to the influence of external light and can be easily manufactured is manufactured. It is possible to provide a color filter forming substrate that can be used.
Specifically, a yellow cured film is disposed in a region corresponding to the red pixel and the green pixel of the display device, and a blue cured film is disposed in a region corresponding to the blue pixel region. Have achieved.
In particular, in the region corresponding to the pixel region of the display device and in the region where the yellow cured film is disposed, the transmittance in the wavelength range of 400 to 450 nm is 1% or less. Since the light passing through the yellow cured film in the region corresponding to the red pixel and the green pixel of the display device from the observer side is almost cut off the light in the wavelength range of 400 to 450 nm by the yellow cured film, Light from the observer side (also referred to as external light) reaches the color conversion layer and can be prevented from emitting red light or green light, thereby avoiding color mixing or whitening caused by the influence of external light. .
Examples of the yellow cured film include C.I. I. And pigment yellow 139.
In addition, the display device is particularly effective in terms of quality and manufacturing when it is a display device in which a blue light emitting organic EL light emitting layer is arranged in the entire pixel region as a blue light source.

  The display device according to the present invention has such a configuration, so that a blue light-emitting organic EL light-emitting layer is arranged in all pixels as a light source, and red, green other than blue light is emitted through the color conversion layer. Provided is a display device of the third method (CCM (Color Conversion Materials method)), which can suppress color mixing and whitening due to the influence of external light and can be easily manufactured in terms of quality. Is possible.

  In this way, the present invention is a color conversion method (CCM (Color Conversion Materials method)) in which an organic EL light emitting layer that emits blue light is arranged in all pixels and red and green other than blue are emitted through the color conversion layer. A display device of a third type, which can suppress color mixing and whitening due to the influence of external light in terms of quality, and can provide a display device that can be easily manufactured, and such a display device can be manufactured. A color filter substrate can be provided.

FIG. 1A is a partial cross-sectional view showing a first example of an embodiment of a color filter forming substrate of the present invention, and FIG. 1B shows the color filter forming substrate shown in FIG. FIG. 1C is a cross-sectional view showing a schematic configuration of the color conversion type display device used separately, and FIG. 1C is a schematic cross-sectional view of the A0 portion of the TFT formation substrate 20 of the display device shown in FIG. Is shown. 2A is a partial cross-sectional view showing a second example of the embodiment of the color filter forming substrate of the present invention, and FIG. 2B shows the color filter forming substrate shown in FIG. FIG. 2C is a schematic cross-sectional view of the color conversion type display device used, and FIG. 2C is a schematic cross-sectional view of the TFT formation substrate of the display device shown in FIG. It is the figure which showed the spectral characteristic of the colored layer for color filters of each color of the display apparatus shown in FIG.1 (b), and the relative spectral-luminance characteristic of blue emitted light, red emitted light, and green emitted light. FIG. 4B is a cross-sectional view showing a schematic configuration of a conventional color conversion method (third method) display device separated from each other. FIG. 4A shows the display device shown in FIG. The color filter 110 used is shown, and FIG. 4C is a schematic sectional view of the B0 portion of the TFT forming substrate 120 shown in FIG.

First, the 1st example of embodiment of the color filter formation board | substrate of this invention is demonstrated based on FIG.
The color filter forming substrate 10 of the first example shown in FIG. 1A is a color conversion layer for red light emission and a color conversion for red light emission from blue light emitted from a blue light source having an organic EL element as a light emission source. A color filter forming substrate used in a display device of a color conversion system that converts red light other than blue light and green light by irradiating the layer, as shown in FIG. It is used for an organic EL display device of a mobile electronic device such as a personal computer or a multi-function terminal device (also referred to as a high-function terminal device).
The color filter forming substrate 10 of the first example uses a transparent substrate made of a glass substrate as a base material 11, and on one surface side of the base material 11, a pixel classification light shielding layer (also referred to as a black matrix) that divides a pixel area into a display area. 12) and a cured film (also referred to as a colored resin layer) of each color of yellow and blue for the color filter are arranged so as to cover the divided pixel regions, respectively. A yellow cured film 13Y is disposed in a region corresponding to the red pixel and the green pixel of the display device, and a blue cured film 13B is disposed in a region corresponding to the blue pixel region.
The display device shown in FIG. 1 (b) is simply blue light emitting between the electrodes of the TFT circuit (not shown) and the anode 25 and the cathode 28 on one surface side of the substrate 21 shown in FIG. 1 (c). An organic light-emitting device having an organic EL layer 26 including a layer 27, an oxygen blocking layer 28, and a color conversion layer 23 are stacked, and a TFT forming substrate 20 having a structure in which the substrate 11 shown in FIG. As shown in FIG. 1B, the color filter forming substrate 10 of the first example in which the pixel-partitioning light-shielding layer 12 is formed on one surface and the yellow cured film 13Y and the blue cured film 13B are further formed. Are stacked opposite to each other.
Normally, the color filter forming substrate 10 shown in FIG. 1 (a) is a protective layer (the protective layer 15 shown in FIG. 2 (a)) so as to cover the entire color film cured film 13B, 13Y forming side. 1), and is applied to the display device in this state. Although not specified in FIG. 1B, the color filter forming substrate 10 covering the protective film and the TFT formation shown in FIG. The substrate 20 is laminated via a filler or the like.

Here, with reference to FIG. 3, the display of each color of R (red), G (green), and B (blue) of the display device shown in FIG. 1B will be briefly described.
As shown in FIG. 3, the spectral characteristics of the yellow cured film 13 </ b> Y are the blue emission light 22 </ b> LB having the spectral luminance characteristic as shown by B <b> 1 in FIG. 3 from the blue emission layer 22 of the TFT formation substrate 20, respectively. The red light emission light 23LR and the green light emission light 23LG emitted when the color conversion layer 12r for red light emission and the color conversion layer 12g for green light emission are irradiated are sufficiently transmitted.
Therefore, in the red pixel region, the blue light emission light 22LB having the spectral luminance characteristic as shown in B1 of FIG. 3 from the blue light emission layer 22 of the TFT formation substrate 20 is irradiated to the color conversion layer 12r for red light emission. Then, red emission light 23LR having a red spectral luminance characteristic like R1 in FIG. 3 is generated, and most of the generated red emission light 23LR proceeds to the color filter forming substrate side, but the yellow cured film 13Y is Since the generated red emission light 23LR is almost transmitted, the light that reaches the observer side through the yellow cured film 13Y in the red pixel region is emitted as red light 13LR.
In the green pixel region, when the blue light emission light 22LB having the spectral luminance characteristic as shown in B1 of FIG. 3 from the blue light emission layer 22 of the TFT forming substrate 20 is irradiated to the green color conversion layer 12g, Green emission light 23LG having a green spectral luminance characteristic like G1 in FIG. 3 is generated, and most of the generated green emission light 23LG proceeds to the color filter forming substrate side, but the yellow cured film 13Y is generated. Since most of the green emission light 23LG is transmitted, the light that passes through the yellow cured film 13Y and reaches the viewer side in the green pixel region is emitted as green light 13LG.
On the other hand, in the blue pixel region, the blue light emission light 22LB having the spectral luminance characteristic as shown in B1 of FIG. 3 from the blue light emission layer 22 of the TFT formation substrate 20 passes through the transparent layer 23t, and the blue light emission light. 23LB (22LB) advances to the color filter forming substrate side, and the light passing through the blue cured film 13B and reaching the viewer side is emitted as blue light 13LB.
In this way, in the red pixel region, the green pixel region, and the blue pixel region, light of each color of R (red), G (green), and B (blue) is emitted, so that R, G, B The three primary colors are obtained, and a full color display can be performed with the three primary colors R, G, and B.
In FIG. 3, general spectral characteristics of a conventional cured film for a color filter of three colors R, G, and B are shown as R0, G0, and B0, respectively.

Here, the yellow cured film 13Y of the color filter forming substrate 10 shown in FIG. 1A arranged corresponding to the pixel region of the display device shown in FIG. 1B transmits in the wavelength range of 400 to 450 nm. The rate is 1% or less.
For this reason, in the display device shown in FIG. 1B, the blue emission light 22LB having the spectral luminance characteristic as shown in B1 of FIG. The red light emission light 23LR and the green light emission light 23LG that are emitted when the color conversion layer 23r for light emission and the color conversion layer 23g for green light emission are irradiated can be almost cut within a wavelength range of 400 to 450 nm. Further, light emission from the color conversion layer due to the influence of external light can be suppressed from the observer side.
That is, in the region where the red light emission light 23LR emits light and the region where the green light emission light 23LG emits light, it is possible to avoid color mixing and whitening due to the influence of external light from the viewer side.

Further, here, a display area when used in a display device is a display area.
Further, the cured film (also referred to as a colored resin layer) 13 is a generic term for the cured films 12B and 12Y for each color for the color filter and the cured film (colored resin layer) 12 for the light-shielding layer for pixel division.
In the display area, the color filter cured films 13B and 13Y are arranged in a predetermined arrangement so as to cover the opening (also referred to as an opening pattern) of the pixel area separated by the pixel classification light shielding layer 12. Is formed.
The shape of the opening pattern of the pixel classification light shielding layer 12 and the arrangement of the cured films of the respective colors are not particularly limited.
There are also examples in which the shape of the opening pattern of the pixel classification light shielding layer 12 is a stripe shape, or in which the arrangement of the cured films 13B and 13Y is changed, such as a dogleg shape or a delta arrangement.

Furthermore, the material of each part is described.
<Substrate 11>
As the base material 11 made of the transparent substrate used in the first example, those conventionally used for color filters can be used, and flexible such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, etc. Non-transparent transparent inorganic substrate, and a transparent resin substrate having flexibility such as a transparent resin film and an optical resin plate. In particular, it is preferable to use an inorganic substrate. Among these, it is preferable to use a glass substrate.
Furthermore, it is preferable to use an alkali-free type glass substrate among the glass substrates.
The alkali-free type glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and does not contain an alkali component in the glass. Therefore, it is suitably used for a color filter for an active matrix type color liquid crystal display device. Because it can.
As the substrate, a transparent substrate is usually used.

<Pixel classification light shielding layer 12>
As the pixel classification light shielding layer 12, for example, here, carbon black coated with a resin such as an epoxy resin is used as a pigment (pigment) dispersed in a binder resin.
In the case where carbon black is dispersed as a pigment (pigment) in a binder resin, the light-shielding resin layer can be formed with a relatively thin film thickness.
Here, the formation of the pixel classification light shielding layer 12 is performed by a photolithography method. In this case, examples of the binder resin include acrylate-based, methacrylate-based, polyvinyl cinnamate-based, and cyclized rubber-based materials. A photosensitive resin having a reactive vinyl group is used. In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a black matrix containing a black colorant and a photosensitive resin, and further, if necessary, a sensitizer, a coatability improver, A development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like may be added.
In some cases, the binder resin may be formed using a printing method or an ink jet method. In this case, examples of the binder resin include polymethyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, and hydroxy resin. Examples thereof include ethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin and the like.

<Yellow cured film 13Y, blue cured film 13B>
In this example, there are two types of cured films of each color for forming a color filter: a yellow cured film 13Y and a blue cured film 13B.
Each color is cured by dispersing or dissolving a colorant such as a pigment or dye in each color in a binder resin, and is formed by a photolithography method (also called a photolithography method).
As the binder resin used for the curing, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a colored part containing a colorant and a photosensitive resin, and further, a sensitizer, a coating property improver, and a development as necessary. You may add an improving agent, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc.
The thickness of the colored layer of each color is usually set to about 1 μm to 5 μm.
The color of the cured film is not particularly limited as long as it includes at least two colors of yellow and blue.
Examples of the color material used for curing yellow (also described as Y) include C.I. I. Pigment Yellow 139 is preferable, but is not limited thereto.
Examples of the color material used for the blue (also referred to as B) cured film include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. .
These pigments may be used alone or in combination of two or more.

<Organic EL element formation substrate 20>
(1) Substrate 21
As the base material 21, basically, the same material as that of the base material 11 can be used. However, in the case of the display device shown in FIG. 1B using the color filter of the first example, the base material 11 is used. Since it is emitted from the side to the outside and displayed, it does not need to be transparent.

(2) Blue light emitting layer 22
The blue light emitting layer 22 shown in FIG. 1B is not explicitly shown in FIG. 1B, but has a material configuration as shown in FIG. 1C, for example.
(Organic EL layer 26)
The organic EL layer 26 forming the organic EL element 27 is composed of one or a plurality of organic layers including at least a blue dopant layer (also referred to as a light emitting layer).
Examples of the organic layer constituting the organic EL layer 26 other than the blue dopant layer (light emitting layer) include a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer.
This hole transport layer is often integrated with the hole injection layer by imparting a hole transport function to the hole injection layer.
In addition, as an organic layer constituting the organic EL layer, holes or electrons such as a hole blocking layer and an electron blocking layer are prevented from penetrating, and further, exciton diffusion is prevented and excitons are placed in the light emitting layer. By confining, a layer for increasing the recombination efficiency can be cited.
The organic EL layer may have a general configuration, and only blue dopant: host layer (light emitting layer), hole injection layer / blue dopant: host layer (light emitting layer), hole injection layer / Blue dopant: host layer (light emitting layer) / electron injection layer, hole injection layer / hole blocking layer / blue dopant: host layer (light emitting layer) / electron injection layer, hole injection layer / blue dopant: host Examples thereof include a layer (light emitting layer) / electron transport layer.
Examples of the material for the blue dopant layer include fluorescent brighteners such as benzothiazole, benzimidazole, and benzoxazole disclosed in JP-A-8-279394, metal chelated oxinoid compounds, and styrylbenzene compounds. And distyrylpyrazine derivatives, aromatic dimethylidin compounds, and the like.
Specifically, benzothiazoles such as 2-2 '-(p-phenylenedivinylene) -bishenzothiazole; 2- [2- [4- (2-benzimidazolyl) phenyl] vinyl] benzimidazole, 2- [ Benzimidazoles such as 2- (4-carboxyphenyl) vinyl] benzimidazole; 2,5-bis (5,7-di-t-pentyl-2-benzoxazolyl) -1,3,4-thiadiazole, Benzoxazole series such as 4,4'-bis (5,7-t-pentyl-2-benzoxazolyl) stilbene, 2- [2- (4-chlorophenyl) vinyl] naphtho [1,2-d] oxazole And the like.
Examples of the metal chelated oxinoid compound include 8-hydroxyquinoline metal complexes such as tris (8-quinolinol) aluminum, bis (8-quinolinol) magnesium, and bis (benzo [f] -8-quinolinol) zinc. Examples include dilithium epinetridione.
Examples of the styrylbenzene compound include 1,4-bis (2-methylstyryl) benzene, 1,4-bis (3-methylstyryl) benzene, 1,4-bis (4-methylstyryl) benzene, Distyrylbenzene, 1,4-bis (2-ethylstyryl) benzene, 1,4-bis (3-ethylstyryl) benzene, 1,4-bis (2-methylstyryl) -2-methylbenzene, 1,4 -Bis (2-methylstyryl) -2-ethylbenzene and the like can be mentioned.
Examples of the distyrylpyrazine derivative include 2,5-bis (4-methylstyryl) pyrazine, 2,5-bis (4-ethylstyryl) pyrazine, and 2,5-bis [2- (1-naphthyl). Vinyl] pyrazine, 2,5-bis (4-methoxystyryl) pyrazine, 2,5-bis [2- (4-biphenyl) vinyl] pyrazine, 2,5-bis [2- (1-pyrenyl) vinyl] pyrazine Etc.
Examples of the aromatic dimethylidin compounds include 1,4-phenylene dimethylidin, 4,4-phenylene dimethylidin, 2,5-xylene dimethylidin, 2,6-naphthylene dimethylidin, , 4-biphenylenedimethylidin, 1,4-p-terephenylenedimethylidin, 9,10-anthracenediyldimethylidin, 4,4'-bis (2,2-di-t-butylphenylvinyl) Biphenyl, 4,4'-bis (2,2-diphenylvinyl) biphenyl, and the like, and derivatives thereof can be mentioned.
Further, examples of the material for the light emitting layer include compounds represented by the general formula (Rs-Q) 2-AL-OL described in JP-A-5-258862.
In the above formula, AL is a hydrocarbon having 6 to 24 carbon atoms including a benzene ring, OL is a phenylate ligand, Q is a substituted 8-quinolinolato ligand, and Rs is It represents an 8-quinolinolato substituent selected so as to sterically hinder the bonding of two or more substituted 8-quinolinolato ligands to an aluminum atom.
Specific examples include bis (2-methyl-8-quinolinolato) (paraphenylphenolate) aluminum (III), bis (2-methyl-8-quinolinolato) (1-naphtholato) aluminum (III), and the like.
There is no restriction | limiting in particular in the thickness of a light emitting layer, For example, it can be set as about 5 nm-5 micrometers.
As the material for the hole injection layer, an arbitrary material is selected from those conventionally used as the hole injection material for photoconductive materials and those used for the hole injection layer of organic EL devices. Can be used.
The material of the hole injection layer has either hole injection or electron barrier properties, and may be either organic or inorganic.
Specifically, triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, Examples thereof include hydrazone derivatives, stilbene derivatives, silazane derivatives, polysilane-based, aniline-based copolymers, and dielectric polymer oligomers such as thiophene oligomers.
Furthermore, examples of the material for the hole injection layer include a porphyrin compound, an aromatic tertiary amine compound, and a styrylamine compound. Examples of the porphyrin compound include polyfin, 1,10,15,20-tetraphenyl-21H, 23H-polyfin copper (II), aluminum phthalocyanine chloride, copper octamethylphthalocyanine, and the like.
In addition, aromatic tertiary amine compounds and styrylamine compounds include N, N, N ′, N′-tetraphenyl-4,4′-diaminophenyl, N, N′-diphenyl-N, N′-bis. (3-methylphenyl)-[1,1′-biphenyl] -4,4′-diamine, 4- (di-p-tolylamino) -4 ′-[4 (di-p-tolylamino) styryl] stilbene, 3, -Methoxy-4'-N, N-diphenylaminostilbenzene, 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl, 4,4 ', 4 "-tris [N- ( 3-methylphenyl) -N-phenylamino] triphenylamine, etc. The thickness of the hole injection layer is not particularly limited, and can be, for example, about 5 nm to 5 μm.
The material for the electron injection layer may be any material as long as it has a function of transmitting electrons injected from the cathode to the light emitting layer. can do.
Specifically, nitro-substituted fluorene derivatives, anthraquinodimethane derivatives, diphenylquinone derivatives, thiopyran dioxide derivatives, heterocyclic tetracarboxylic anhydrides such as naphthaleneperylene, carbodiimide, fluorenylidenemethane derivatives, anthraquinodimethane And anthrone derivatives, oxadiazole derivatives, thiazole derivatives in which the oxygen atom of the oxadiazole ring is substituted with a sulfur atom, quinoxaline derivatives having a quinoxaline ring known as an electron-withdrawing group, tris (8-quinolinol) aluminum And metal complexes of 8-quinolinol derivatives such as phthalocyanine, metal phthalocyanine, and distyrylpyrazine derivatives.
The thickness of the electron injection layer is not particularly limited, and can be, for example, about 5 nm to 5 μm.
(Anode 25, cathode 28)
As a conductive material for forming the electrode layers of the anode 25 and the cathode 28, a metal material is generally used. However, an organic material or an inorganic compound may be used, or a plurality of materials may be mixed and used.
In addition, the electrode layers of the anode and the cathode are appropriately selected as to whether or not they have transparency depending on the light extraction surface.
A conductive material having a high work function is preferably used for the anode 25 so that holes can be easily injected, and a conductive material having a low work function is preferably used for the cathode 28 so that electrons can be easily injected.
Examples of the conductive material include In—Zn—O (IZO), In—Sn—O (ITO), Zn—O—Al, and Zn—Sn—O when transparency is required. In the case where transparency is not required, metals can be used, specifically, Au, Ta, W, Pt, Ni, Al, Pd, Cr, Al alloy, Ni alloy, Cr alloy, etc. be able to.
Both the electrode layers of the anode 25 and the cathode 28 preferably have a relatively small resistance.
As a method for forming the electrode layer, a general method for forming an electrode can be used, and examples thereof include a sputtering method, an ion plating method, a vacuum deposition method, a CVD method, and a printing method.
An example of the patterning method for the electrode layer is a photolithography method.
(Oxygen barrier layer 29)
The oxygen blocking layer 29 is not limited as long as oxygen can block contact with the organic EL element 27.
The oxygen permeation amount of the oxygen blocking layer is preferably less than 0.1 cc / m ² · day, and more preferably less than 0.01 cc / m ² · day.
Specific materials include transparent inorganic materials, transparent resins, and sealing liquids.
First, a transparent inorganic substance is most preferable.
More specifically, SiO2, SiOx, SiOxNy, Si3N4, Al2O3, AlOxNy, TiO2, TiOx, ITO (In2O3-SnO2), IZO (In2O3-ZnO), SnO2, ZnO, indium copper (CuIn), Examples thereof include transparent inorganic substances such as gold, platinum, palladium and the like alone or in combination of two or more.
In this case, it is preferable to form the film at a low temperature (100 ° C. or less) and at a low film formation rate so as not to deteriorate the organic EL element or the color conversion layer. Specifically, sputtering, vapor deposition, CVD, A method such as ion plating is preferred.
These transparent inorganic materials are preferably amorphous because they have a high oxygen blocking effect.
Next, as transparent resins, resins such as polyvinyl alcohol, polyvinylidene chloride, polyacrylonitrile, cellophane, nylon 6, polyethylene terephthalate, polytrichloroethylene, PCTFE (polychlorotrifluoroethylene), PTFE (polytetrafluoroethylene) Fluorine) and other fluorine-containing resins are preferred.
These films may be formed into a film by a biaxial stretching method, or may be coated with other general-purpose resin films.
Next, as the sealing liquid, an inert liquid is preferable because it does not deteriorate the organic EL element, and specific examples thereof include fluorinated hydrocarbons and silicon oil.
Here, although the thickness of the oxygen blocking layer depends on the definition of the organic EL light emitting device, it is 0.1 μm to 1 mm, preferably 0.5 μm to 100 μm, more preferably 1 μm to 20 μm.
If it is smaller than 0.1 μm, the oxygen blocking effect is lost, and if it is larger than 1 mm, the light of the organic EL element diffuses and the incidence of the desired color conversion layer is hindered, so that the visibility is lowered (color bleeding, color mixing, Viewing angle dependent).

<Color conversion layer 23>
The material of the color conversion layer is not particularly limited. For example, the material includes only a fluorescent dye and a binder resin, or a fluorescent dye. The fluorescent dye and the binder resin dissolve the fluorescent dye in the pigment resin and / or the binder resin. Or the thing of the disperse | distributed solid state can be mentioned. For example, 2,3,5,6-1H, 4H-tetrahydro-8-trifluoromethylquinolidino (9,9a, 1) can be used for the fluorescent dye in the case where blue light emission in an organic EL element is converted into green light emission. -Gh) Coumarin (coumarin 153), 3- (2'-benzothiazolyl) -7-diethylaminocoumarin (coumarin 6), 3- (2'-benzimidazolyl) -7-N, N-diethylaminocoumarin (coumarin 7), etc. And coumarin dyes such as basic yellow 51, which is a coumarin dye-based dye, and naphthalimide dyes such as solvent yellow 11 and solvent yellow 116.
Moreover, about the fluorescent dye in the case of converting blue light emission in an organic EL element into red light emission, for example, 4-dicyanomethylene-2-methyl-6- (p-dimethylaminostyryl) -4H-pyran ( DCM), cyanine dyes such as 1-ethyl-2- (4- (p-dimethylaminophenyl) -1,3-butadienyl) -pyridinium-perchlorate (pyridine 1), rhodamine B, rhodamine Examples include rhodamine dyes such as 6G, and oxazine dyes.
Furthermore, various dyes (direct dyes, acid dyes, basic dyes, disperse dyes, etc.) can also be selected as fluorescent pigments if they are fluorescent.
Fluorescent dyes are kneaded in advance into pigment resins such as polymethacrylates, polyvinyl chloride, vinyl chloride vinyl acetate copolymers, alkyd resins, aromatic sulfonamide resins, urea resins, melanin resins, and benzoguanamine resins. It may be converted.
On the other hand, the binder resin is preferably a transparent material (light transmittance in visible light is 50% or more).
Examples thereof include transparent resins (polymers) such as polymethyl methacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinyl pyrrolidone, hydroxyethyl cellulose, and carboxymethyl cellulose.
In order to separate and arrange the fluorescent medium in a plane, a photosensitive resin to which a photolithography method can be applied is also selected.
For example, photocurable resist materials having reactive vinyl groups such as acrylic acid, methacrylic acid, polyvinyl cinnamate, and ring rubber are listed.
Moreover, when using a printing method, the printing ink (medium) using transparent resin is selected.
For example, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin monomer, oligomer, polymer, polymethyl methacrylate, polyacrylate, polycarbonate, polyvinyl alcohol Transparent resins such as polyvinyl pyrrolidone, hydroxyethyl cellulose, and carboxymethyl cellulose can be used.

In the case where the color conversion layer 23 is mainly composed of a fluorescent dye, it is preferable to form the film by vacuum deposition or sputtering through a mask from which a desired color conversion layer pattern can be obtained.
On the other hand, when the color conversion layer 23 is composed of a fluorescent dye and a resin, the fluorescent dye, the resin, and an appropriate solvent are mixed, dispersed, or solubilized to form a liquid, and the liquid is spin-coated, roll-coated, Form a film by a method such as a cast method, and then pattern it into a desired color conversion layer pattern by a photolithography method, or pattern it into a desired pattern by a method such as screen printing or an inkjet method to form a color conversion layer It is preferable to do this.

The thickness of the color conversion layer 23 is not particularly limited as long as the light emission (absorption) of the organic EL element is sufficiently received (absorbed) and the function of generating fluorescence is not hindered. 000 μm is preferable, 0.1 μm to 500 μm is more preferable, and 5 μm to 100 μm is further preferable.
This is because when the thickness of the color conversion layer is less than 10 nm, the mechanical strength may be reduced or it may be difficult to laminate.
On the other hand, when the thickness of the color conversion layer exceeds 1 mm, the light transmittance is remarkably lowered, the amount of light that can be taken out to the outside is reduced, or it is difficult to make the organic EL light emitting device thinner. .

Next, the 2nd example of embodiment of the color filter formation board | substrate of this invention is given.
As shown in FIG. 2A, the color filter forming substrate 10a of the second example is an area corresponding to the red pixel region with respect to the color filter forming substrate 10 of the first example shown in FIG. , The red light emitting color conversion layer 14r is formed on the yellow dura 13Y, and the green light emitting color conversion layer 14g is formed on the yellow dura 13Y in the region corresponding to the green pixel region. In the region corresponding to the blue pixel region, a color conversion layer is not provided on the blue hard film 13B, and the color filter cured film for each color and the color conversion layer are transparent so as to cover each color conversion layer. The protective layer 15 is provided with a flat surface.
The parts other than the protective film 15 are the same in function and material as in the first example.
The color filter forming substrate 10a of the second example is used in the display device shown in FIG.
2B, the display device shown in FIG. 2B is simply blue light emitting between the TFT circuit (not shown) on the one surface side of the base material 21 and the anode 25 and the cathode 28 shown in FIG. An organic light emitting device having an organic EL layer 26 including a layer 27, a TFT forming substrate 20a having a structure in which an oxygen blocking layer 28 is laminated, and a color conversion layer 14 (14r, 14g) shown in FIG. The color filter forming substrate 10a of the second example on which the film is formed is stacked so as to face each other as shown in FIG.
In the second example, the yellow cured film 13Y of the color filter forming substrate 10 shown in FIG. 2A arranged corresponding to the pixel region of the display device shown in FIG. The transmittance is set to 1% or less in the range of 450 nm.
In the display device shown in FIG. 2B using the color filter forming substrate 10a of the second example, the spectral luminance characteristic as shown by B1 in FIG. 3 from the blue light emitting layer 22 of the TFT forming substrate 20 is also shown. The red emission light 14LR and the green emission light 14LG, which are emitted when the blue emission light 22LB having the above, are irradiated to the color conversion layer 14r for red emission and the color conversion layer 14g for green emission, respectively, have a wavelength of 400 to 450 nm. As a result, light emission from the color conversion layer due to the influence of external light can be suppressed from the observer side.
That is, in the region where the red light emission light 14LR is emitted and the region where the green light emission light 14LG is emitted, color mixing and whitening due to the influence of external light can be avoided from the observer side.

<Protective layer 15>
Examples of the material for the protective layer 15 include a thermosetting resin composition and a photocurable resin composition.
The photo-curable resin composition is preferable for cutting into pieces after imposing the color filter-formed substrate on the surface.
The photo-curable resin composition for the protective layer is the same as the binder resin used for the colored layers for forming the color filters, for example, acrylate-based, methacrylate-based, polyvinyl cinnamate-based, or cyclized A photosensitive resin having a reactive vinyl group such as rubber is used.
In this case as well, a photopolymerization initiator may be added to the photosensitive resin composition for forming colored portions containing the photosensitive resin, and further, a sensitizer, a coating property improver, and a development improver as necessary. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.
In the first example, after the color filter forming substrate is formed by imposition, the resin composition is applied by a spin coating method. A protective layer is cut between the color filter substrates, and the cut is formed. In order to separate and separate into individual pieces, the resin composition for the protective layer is formed as a photocurable resin composition after application, dried, selectively irradiated with light only in a predetermined region, and developed. However, the method for forming the protective layer is not limited to this.
Examples of the thermosetting resin composition for the protective layer include those using an epoxy compound and those using a thermal radical generator.
Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid or an amine compound. Examples of such an epoxy compound include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used.
The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides.
Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t-butyl Examples include til-4,4-di- (t-butylperoxy) butanate and dicumyl peroxide.

The color filter forming substrate of the present invention is not limited to the above form.
For example, in the said 1st example, the form which covers the whole cured film formation side of each color with a protective layer (equivalent to the protective layer 15 of FIG. 2) is also mentioned.
Although the first example and the second example are applied to a blue light emitting type organic EL display device using an organic EL element as a light source, the present invention is not limited to this.
Other blue light emission methods may be used.

[Example]
The present invention will be further described with reference to examples.
Example 1
In Example 1, the color filter forming substrate 10 of the first example shown in FIG. 1 was produced, and the display device shown in FIG. 1B to which the color filter forming substrate 10 of the first example was applied was obtained. .
As shown below, a photocurable curable resin composition A is prepared and produced, and a blue curable resin composition for forming a color filter and a yellow curable resin are prepared using the produced curable resin composition A. A resin composition, a curable resin composition for forming a pixel classification light-shielding layer (also referred to as a black matrix) is prepared, and using these, each curable resin composition is subjected to a photolithography method, and each color for a color filter The cured film (colored resin layer) 13B, 13Y and the cured film (colored resin layer) for forming the pixel classification light-shielding layer 12 are formed.
Here, after forming a light-shielding cured film (colored resin layer) for the pixel-segmenting light-shielding layer 12, a blue cured film (colored resin layer) 13B for a color filter in the display region, and a yellow cured film ( Colored resin layer) 13Y was formed by a photolithography process, and the color filter forming substrate 10 of the first example was manufactured.

(Preparation of curable resin composition A)
The polymerization tank is charged with 63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by weight of diethylene glycol dimethyl ether (DMDG). After stirring and dissolving, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly.
Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour.
7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine, and 0.2 parts by weight of hydroquinone were further added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours to obtain a copolymer resin solution ( A solid content of 50%) was obtained.
Next, the following materials were stirred and mixed at room temperature to obtain a curable resin composition.
-Copolymer resin solution (solid content 50%): 16 parts by weight-Dipentaerythritol pentaacrylate (Sartomer SR399)
: 24 parts by weight-Orthocresol novolak type epoxy resin (Epicoat Shell Epoxy Co., Ltd. Epicoat 180S70): 4 parts by weight-2-Methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 weights Parts ・ Diethylene glycol dimethyl ether: 52 parts by weight

(Formation of pixel classification light blocking layer (also referred to as black matrix) 12)
First, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (Mitsubishi Chemical Corporation MS18E): 20 parts by weight Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 75 parts by weight The components were sufficiently mixed to obtain a light-shielding composition for forming a cured film.
-Black pigment dispersion: 43 parts by weight-Curable resin composition A: 19 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight The light-shielding cured film-forming composition on a glass substrate (Asahi Glass Co., Ltd., AN material) Was applied with a spin coater and dried at 100 ° C. for 3 minutes to form a light-shielding cured film.
A photomask is placed at a distance of 100 μm from the coating film and the light-shielding cured film is exposed to a light-shielding pattern with a 2.0 kW ultra-high pressure mercury lamp using a proximity aligner, and then with a 0.05 wt% potassium hydroxide aqueous solution. After the development, the substrate was left to stand in an atmosphere at 230 ° C. for 30 minutes to be heat-treated.
Here, the pixel classification light-shielding layer was formed by photolithography, but the formed film thickness was 1.3 μm.
The resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation) has an average particle size of 25 nm.
The particle size is, for example, a laser Doppler scattered light analysis particle size analyzer (trade name “Microtrac 934UPA”) manufactured by Nikkiso Co., Ltd. The particle diameter in which the cumulative pigment particle diameter of the product occupies 50% is defined as 50% average particle diameter, and the value is measured and determined.

(Formation of blue cured film 13B)
Further, a blue curable resin composition having the following composition was applied onto the pixel-shading light-shielding layer 12 by a spin coating method, and then dried in an oven at 70 ° C. for 3 minutes.
Next, a photomask is placed at a distance of 100 μm from the coating film of the blue curable resin composition, and ultraviolet rays are applied only to the region corresponding to the colored layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated for 10 seconds.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of a red curable resin composition was removed.
Thereafter, the substrate was left to stand in an atmosphere of 230 ° C. for 15 minutes to perform heat treatment to form a red pixel pattern in the display region.
The formed film thickness was 2.0 μm.
<Composition of blue curable resin composition>
C. I. Pigment Blue 15: 6: 5 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 25 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of yellow cured film 13Y)
Using the blue curable resin composition having the following composition, in the same process as the formation of the blue cured film 13Y, the coating film thickness is changed so that the formed film thickness becomes 2.0 μm. The relief pattern was formed.
<Composition of yellow curable resin composition>
C. I. Pigment Yellow 139: 5 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 25 parts by weight-3-methoxybutyl acetate: 67 parts by weight

With respect to the blue cured film 13B and the yellow cured film 13Y of the color filter forming substrate 10 of the first example shown in FIG. 1A thus manufactured, the transmittance is measured in the wavelength range of 400 nm to 700 nm. The results obtained are the graph of B0 and the graph of Y0 shown in FIG. 3, respectively.
As can be seen from the graph of Y0, the yellow cured film 13Y has a transmittance of 1% or less in the wavelength range of 400 nm to 450 nm.
The B0 graph, the G0 graph, and the R0 graph shown in FIG. 3 are cured for the color filters of B, G, and R in the conventional color filter forming substrate 110 shown in FIG. 4A, respectively. This corresponds to the transmittance characteristics of the films 113B, 113G, and 113R in the wavelength range of 400 nm to 700 nm.

(Formation of protective film)
The above-described curable resin is formed on the side where the blue cured film 13B and the yellow cured film 13Y are formed on the color filter forming substrate 10 of the first example shown in FIG. Composition A was applied by a spin coating method and dried to form a coating film having a dry coating film thickness of 2 μm, which was used as a protective film.
A photomask is placed at a distance of 100 μm from the coating film of the curable resin composition A, and an ultraviolet ray is applied only to the region corresponding to the protective layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner for 10 seconds. Irradiated.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid 23 degreeC) for 1 minute, and alkali image development was carried out, and only the uncured part of the coating film of curable resin composition was removed.
Thereafter, the substrate was left to stand in an atmosphere at 230 ° C. for 15 minutes to perform heat treatment to form a protective film.
In this way, a protective film was formed on the color filter forming substrate 10 of the first example shown in FIG.

Next, using the color filter forming substrate 10 of the first example in which the protective layer was formed, the display device shown in FIG. 1B was produced as follows.
(Create display device)
A TFT forming substrate 20 having a layer structure as shown in FIG. 1C is formed in advance, and the color filter forming substrate 10 provided with a protective layer and the TFT forming substrate 20 are filled (not shown). As shown in FIG. 1B, the display devices were stacked to face each other.
Although the formation of the organic EL element 27 on one surface of the substrate 21 is formed, the formation of the organic EL element 27 is general, and the description thereof is omitted here.
Here, a blue light emitting layer including a hole injection layer, a light emitting layer, and an electron injection layer was formed by a vacuum deposition method.
That is, first, 4,4 ′, 4 ″ -tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine was deposited to a thickness of 200 nm, and then formed into 4,4′-bis. [N- (1-naphthyl) -N-phenylamino] biphenyl was deposited to a thickness of 20 nm to form a hole injection layer.
Next, 4,4′-bis (2,2-diphenylvinyl) biphenyl was deposited to a thickness of 50 nm to form a light emitting layer.
Then, tris (8-quinolinol) aluminum was vapor-deposited to 20 nm thickness, and it was formed into an electron injection layer, and the blue light emitting layer 22 was formed.
Next, an oxygen blocking layer 29 and a color conversion layer 23 (23r, 23g) were formed as follows.
Here, the transparent layer 23t in FIG. 2B is a transparent resin layer, and corresponds to a transparent filler or the like when the color filter forming substrate and the TFT forming substrate are laminated.
(Formation of the color conversion layer 23)
The color conversion layer 23r for red light emission was formed by a screen printing method using the following coating liquid for red conversion phosphor layer as a material.
(Coating solution for red conversion phosphor layer)
・ Rhodamine B: 3 parts by weight ・ Methyl methacrylate-methacrylic acid copolymer: 47 parts by weight (methyl methacrylate: methacrylic acid = 2: 1)
・ Diglime [Bis (2-methoxyethyl) Ether] ... 50 parts by weight
(CH3OCH2CH2) 2O
The color conversion layer 23g for green light emission was formed by a screen printing method using the following coating liquid for green conversion phosphor layer as a material.
(Coating solution for green conversion phosphor layer)
Basic yellow 51 3 parts by weight Methyl methacrylate-methacrylic acid copolymer 47 parts by weight (methyl methacrylate: methacrylic acid = 2: 1)
・ Diglime [Bis (2-methoxyethyl) Ether] ... 50 parts by weight
(CH3OCH2CH2) 2O
The relative luminance characteristics of the color conversion layers 23r and 23g are as shown in the graph of R1 and the graph of G1 in FIG. 3, respectively.

The display device thus manufactured was evaluated visually, but the display state was similar to that of the conventional display device shown in FIG.
Further, the display device was turned off, and the standard light source (6500K) was used as the external light source. The presence or absence of light emission from the color conversion layer 23r for red light emission and the color conversion layer 23g for green light emission was examined. Luminescence could not be observed visually.
Needless to say, light emission could not be observed in the region where the color emission light 23LR emits and the region where the green emission light 23LG emits as shown in FIG.
From this, it can be determined that color mixing and whitening due to the influence of external light can be avoided in the region where the red light emission light 23LR emits and the region where the green light emission light 23LG emits as shown in FIG.

10, 10a Color filter forming substrate 11 Base material (transparent substrate)
12 Pixel classification light blocking layer (also called black matrix)
13 Color filter cured film (also called colored resin layer)
13B Blue cured film (also called blue colored resin layer)
13Y yellow cured film (also called yellow colored resin layer)
13LR Red light 13LB Blue light 13LG Green light 14r Red light emitting color conversion layer 14g Green light emitting color conversion layer 14LR Red light emitting light 14LB (22LB) Blue light emitting light 14LG Green light emitting light 15 Protective layer 20 20a TFT forming substrate 21 Base material 22 Blue light emitting layer 22LB Blue light emitting light 23 Color conversion layer 23r Color conversion layer 23g for red light emission Color conversion layer 23t for green light emission Transparent film 23LR Red light emission light 23LB (22LB) Blue Emitted light 23LG Green emitted light 24 Light shielding layer 25 Anode 26 Organic EL layer 27 Organic EL element 28 Cathode 29 Oxygen blocking layer (sealing material)
110 Color filter forming substrate 111 Base material (transparent substrate)
112 Light blocking layer for pixel classification (also called black matrix)
113 Color layer 113R for color filter Red cured film (also referred to as red colored resin layer)
113B Blue cured film (also called blue colored resin layer)
113G green cured film (also called green colored resin layer)
113LR Red light 113LB Blue light 113LG Green light 120 TFT forming substrate 121 Base material 122 Blue light emitting layer 122LB Blue light emitting light 123 Color conversion layer 123r Color conversion layer 123g for red light emission Color conversion layer 123t for green light emission Transparent film 123LR Red light 123LB Blue light 123LG Green light 124 Light shielding layer 125 Anode 126 Organic EL layer 127 Organic EL element 128 Cathode 129 Oxygen blocking layer (sealing material)

Claims (5)

A color filter forming substrate used in a color conversion type display device including each color conversion layer for converting blue light from a blue light source into red light other than blue light and green light, respectively.
A yellow cured film is disposed in a region corresponding to the red pixel and the green pixel of the display device, and a blue cured film is disposed in a region corresponding to the blue pixel region ,
The display device is an organic EL display device,
The color filter forming substrate, wherein the color filter forming substrate includes only the yellow cured film and the blue cured film as cured films .   2. The color filter forming substrate according to claim 1, wherein a transmittance in a wavelength range of 400 to 450 nm is 1 in a region corresponding to a pixel region of the display device and in which the yellow cured film is disposed. % Or less color filter forming substrate.   3. The color filter forming substrate according to claim 1, wherein the yellow cured film includes C.I. I. A color filter forming substrate containing Pigment Yellow 139.   4. The color filter forming substrate according to claim 1, wherein the display device is a display device in which a blue light-emitting organic EL light-emitting layer is arranged in all pixel regions to form a blue light source. A color filter forming substrate.   A display device, wherein a display portion is formed using the color filter forming substrate according to claim 1.

Images