JP2016061818A - Resin composition for light-scattering layer, light-scattering layer, and organic electroluminescence device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a resin composition for a light-scattering layer, which can be used in a wide wavelength region.SOLUTION: The resin composition for a light-scattering layer comprises light-scattering particles (A), metal oxide fine particles (B), and a dispersant (C), and satisfies the following conditions (i) to (v). (i) The light-scattering particles (A) are a copolymer prepared by using an acrylate or methacrylate having a polycyclic structure or an alkyl chain having 4 to 24 carbon atoms; (ii) the light-scattering particles (A) have an average particle diameter of 100 nm or more and less than 600 nm; (iii) the light-scattering particles (A) include particles having a particle diameter of 600 m or more by 20 vol.% or less with respect to the whole amount of the particles; (iv) the dispersant (C) has an ethylenically unsaturated double bond; and (v) the refractive index of a composition containing the metal oxide fine particles (B) and the dispersant (C) differs by 0.1 or more from the refractive index of the light-scattering particles (A).SELECTED DRAWING: Figure 1

Description

  The present invention is used for organic electroluminescence (organic EL) devices, light emitting diode (LED) devices, quantum dot display devices, various lighting devices, various light emitting element devices, solar cell members, photosensitive resin substrates, and the like. The present invention relates to a resin composition for a light scattering layer.

  The light scattering layer has a function of diffusing and scattering light, and is an organic EL device, an LED device, a quantum dot display, a liquid crystal display, a light emitting element device, a solar cell reflective film, a solar cell sealing material, and a photosensitive resin. It has been developed in the optical field such as a base material. Among these, active research is being conducted on resin compositions for light scattering layers that improve the light extraction efficiency of organic EL devices.

An organic EL element is a self-luminous element utilizing the principle that a fluorescent substance or the like emits light by recombination energy between holes injected from an anode and electrons injected from a cathode when an electric field is applied. In recent years, organic EL elements have been actively researched and developed in applications such as lighting devices and display devices.
In this specification, the “organic EL device” refers to all devices using organic EL elements such as an organic EL lighting device and an organic EL display device.

  For example, the organic EL display device has advantages in terms of visibility and viewing angle as compared with conventional CRTs and LCDs, and has excellent features such as weight reduction, thinning, and flexibility. However, in general, the refractive index of the organic layer including the light emitting layer is 1.6 to 2.1, which is higher than that of air. Therefore, total reflection or interference easily occurs at the interface of the emitted light, the light extraction efficiency is less than 20%, and most of the light is lost.

The basic structure of the organic EL device is a structure in which a translucent electrode, at least one organic layer including a light emitting layer, and a back electrode are sequentially stacked on a translucent substrate.
In an active matrix organic EL device, for example, a TFT substrate in which a plurality of pixel electrodes forming the back electrode and TFTs (thin film transistors) as switching elements are formed in a matrix is stacked on the organic layer. .

  Light emitted from the organic layer is reflected directly or by a back electrode formed of aluminum or the like, and is emitted from the translucent substrate. At that time, it is preferable that the generated light is efficiently extracted to the translucent substrate side. However, depending on the angle of incidence on the interface between adjacent layers having different refractive indexes, the light undergoes total reflection, and becomes guided light that is totally reflected in the surface direction inside the device, and is absorbed and attenuated inside to be extracted outside. I can't. The ratio of the guided light is determined by the relative refractive index of the adjacent layer. In the case of a general organic EL device, the relationship of the refractive index n is, for example, air (n = 1.0) / translucent substrate (n = 1.5) / translucent electrode (n = 2.0) / Organic layer (n = 1.7) / back electrode. In this case, the ratio of light that is not emitted to the atmosphere (air) but is guided inside the device is about 81%, and only about 19% of the total light emission amount can be effectively used.

  Providing a light scattering layer has been proposed as a method for improving the light extraction efficiency (see, for example, Patent Documents 1 to 3). In Patent Document 1, a light-transmitting layer having a refractive index equal to or higher than that of the light-emitting layer is provided on the light extraction surface side of the light-transmitting electrode, and adjacent to the light extraction surface side of the light-transmitting layer or An EL element in which a light scattering layer is substantially formed inside a light-transmitting layer is described. In Patent Documents 2 and 3, many proposals have been made regarding the characteristics of the light scattering particles of the light scattering layer, the difference in refractive index between the light scattering particles and the binder, and the characteristics such as the refractive index of the binder.

JP 2004-296429 A JP 2005-190931 A JP 2009-110930 A JP 11-329742 A JP 2007-109575 A JP 2014-17233 A

  The organic EL device includes a light emitting layer that emits white light, a light emitting layer that emits a specific color light such as blue, and three primary colors depending on the use of the lighting device or the display device. The thing using the multiple types of light emitting layer which light-emits different color light etc. are used. However, since the improvement rate of light extraction by the light scattering layer generally depends on the wavelength, the methods described in Patent Documents 1 to 3 have a problem that the color tone changes when used in a wide wavelength region.

  In particular, in a color display device using an organic EL element, a light scattering layer or the like is provided in order to enhance viewing angle characteristics and color purity (for example, Patent Document 4). The problem of collapse. Patent Document 5 discloses a method of adjusting the extraction efficiency by changing the thickness of the light scattering layer for each color of the EL element, but this method is not practical because it requires complicated steps.

  In some cases, scattering particles having a scattering effect may be added to the light scattering layer (for example, Patent Document 6). However, aggregation occurs due to scattering particles, scattering particles and binder, or binders, and flatness is lowered. There is. In addition, the occurrence of aggregation causes a problem that the difference in refractive index between the light scattering particles and the binder is reduced, and the scattering effect of the light scattering particles is not sufficiently exhibited.

In the organic EL device, the adhesion between the layers is an important point that affects the element performance. Among these, the adhesion between the substrate and the translucent electrode is particularly important. When providing a light-scattering layer on a translucent substrate, the "base material" said here is a translucent substrate which provided the light-scattering layer.
For example, in the step of forming a translucent electrode, a high temperature treatment for reducing the resistance value of the electrode and an etching treatment for forming an electrode pattern are performed, and before the organic layer is laminated on the formed translucent electrode. In addition, cleaning with a solvent for removing impurities is performed. At this time, if the adhesion between the base material and the translucent electrode is low, the translucent electrode may be finely cracked or peeled off. As a result, when the organic EL element is caused to emit light, dark spots, luminance unevenness, or lifetime reduction Will cause.
Further, the flatness of the substrate is also an important point. When unevenness on the surface of the substrate is large, unevenness of film thickness or formation of fine protrusions occurs on the translucent electrode formed on the substrate, resulting in a portion where a large current is locally generated, resulting in a short circuit or a decrease in life There is.
When a conventional light scattering layer formed on a translucent substrate is used as a base material, the adhesion between the base material and the translucent electrode and the flatness of the base material are not sufficient, and the above-mentioned problems may occur. is there.

  The present invention is an organic EL device, LED device, quantum dot display, various illumination devices, various light emitting device, solar cell member, photosensitive resin substrate, etc. An object of the present invention is to provide a resin composition for a light scattering layer, which has a small wavelength dependency of the light extraction efficiency improvement rate and can be used in a wide wavelength region.

The inventors of the present invention have reached the present invention as a result of intensive studies to solve the above-mentioned problems.
The resin composition for a light scattering layer of the present invention comprises light scattering particles (A), metal oxide fine particles (B), and a dispersant (C), and satisfies the following (i) to (v): The resin composition for a light scattering layer.
(I) The light scattering particle (A) is a copolymer using acrylate or methacrylate having a polycyclic structure or an alkyl chain having 4 to 24 carbon atoms.
(Ii) The light scattering particles (A) have an average particle diameter of 100 nm or more and less than 600 nm.
(Iii) The content of particles having a particle diameter of 600 nm or more with respect to the total amount of the light scattering particles (A) is 20% by volume or less.
(Iv) The dispersant (C) has an ethylenically unsaturated double bond.
(V) The refractive index difference between the composition containing the metal oxide fine particles (B) and the dispersant (C) and the light scattering particles (A) is 0.1 or more.

  In the resin composition for a light scattering layer of the present invention, the polycyclic structure is preferably a bridgehead structure.

  In the resin composition for a light scattering layer of the present invention, the acrylate or methacrylate having the bridgehead structure is norbornyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth). Group consisting of acrylate, dicyclopentenyloxyethyl (meth) acrylate, 2-methyl-2-adamantyl (meth) acrylate, 2-ethyl-2-adamantyl (meth) acrylate, 2-isopropyl-2-adamantyl (meth) acrylate It is preferable that it is at least one selected from more.

In the resin composition for a light scattering layer of the present invention, the coefficient of variation of the light scattering particles (A) is preferably 30% or less.
In the resin composition for a light scattering layer of the present invention, it is preferable that an average particle diameter of the metal oxide fine particles (B) is 100 nm or less.
In the light scattering layer resin composition of the present invention, the metal oxide fine particles (B) are preferably at least one metal oxide fine particle selected from the group consisting of ZrO ₂ and TiO ₂ .

  The light scattering layer of the present invention is formed using the above-described resin composition for a light scattering layer of the present invention.

An organic electroluminescence (EL) device according to the present invention includes a light-transmitting layer according to the present invention, a light-transmitting first electrode, and at least one organic layer including a light-emitting layer on a light-transmitting substrate. The second electrode having light reflectivity is sequentially laminated.
The organic EL device of the present invention can be applied to a lighting device or a display device.

  According to the present invention, there are few aggregates, the dispersibility is good, the flatness is excellent, it is used as a light diffusion layer and a scattering layer for improving the light extraction efficiency of the light emitting device, and the wavelength dependency of the light extraction efficiency improvement rate The resin composition for light-scattering layers which has small property and can be used in a wide wavelength region can be provided.

  According to the present invention, it is also used as a light scattering layer installed between the translucent electrode and the translucent substrate to improve the light extraction efficiency. A resin composition for a light scattering layer capable of realizing a light emitting device with high light extraction efficiency without inducing cracks, protrusions, or peeling, a light scattering layer formed using the same, and a light scattering layer A light-emitting display and a light-emitting device can be provided.

Schematic cross section of bottom emission EL element

  Embodiments of the present invention will be described in detail below, but the description of the constituent elements described below is an example (representative example) of an embodiment of the present invention, and the present invention does not exceed the gist thereof. Not specific to the content.

As described above, the resin composition for a light scattering layer of the present invention contains light scattering particles (A), metal oxide fine particles (B), and a dispersing agent (C). It is a composition.
The resin composition for a light scattering layer of the present invention can have the following first to fourth aspects.
<First aspect>
The resin composition for light scattering layers of the present invention includes an embodiment that does not contain an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000 and a resin (E) having a mass average molecular weight (Mw) of 5000 or more. can do.
<Second aspect>
The resin composition for light scattering layers of the present invention contains an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000 and does not contain a resin (E) having a mass average molecular weight (Mw) of 5000 or more. It can be set as an aspect.
<Third Aspect>
The resin composition for a light scattering layer of the present invention contains a resin (E) having a mass average molecular weight (Mw) of 5000 or more and does not contain an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000. It can be set as an aspect.
<Fourth aspect>
The resin composition for light scattering layers of the present invention includes an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000 and a resin (E) having a mass average molecular weight (Mw) of 5000 or more. be able to.
Each aspect will be described later.

<Light scattering particles (A)>
First, the common light scattering particles (A) will be described in the first to fourth aspects.
As organic particles, polyacrylate beads, polymethacrylate beads, acrylic-styrene copolymer beads, melamine resin beads, polycarbonate beads, cross-linked polystyrene beads, polyvinyl chloride beads, benzoguanamine-melamine formaldehyde condensate beads, etc. are used. However, it is not necessarily limited to these.

The light scattering particle (A) is a copolymer using acrylate or methacrylate having a polycyclic structure or an alkyl chain having 4 to 24 carbon atoms. In the present invention, acrylate or methacrylate is abbreviated as (meth) acrylate.
By using (meth) acrylate having a polycyclic structure or an alkyl chain having 4 or more and 24 or less carbon atoms, it is presumed that the obtained light scattering particles (A) are easily repelled sterically. As a result, it is considered that the aggregation of the metal oxide fine particles (B) described later can be suppressed and a coating film with good flatness can be formed.
Among the polycyclic structures, it is preferable to use an acrylate or methacrylate having a bridgehead structure.

Examples of (meth) acrylates having a polycyclic structure include (meth) acrylates having a bridgehead structure, (meth) acrylates having a plurality of cyclic structures continuous in the same plane, and having a plurality of independent cyclic structures (meta) ) Acrylate, and (meth) acrylate having a bridgehead structure is preferably used.
Examples of (meth) acrylates having a bridgehead structure include 2-norbornyl acrylate, 2-norbornyl methacrylate, isobornyl (meth) acrylate, boronyl (meth) acrylate, dicyclopentanyl (meth) acrylate, and dicyclo Pentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, 2-[(1 ′, 1 ′,
1'-trifluoro-2 '-(trifluoromethyl) -2'-hydroxy) propyl]-
3-norbornyl (meth) acrylate, 3-hydronopoxy-1-propyl (meth) acrylate, adamantyl (meth) acrylate, 2-methyl-2-adamantyl (meth) acrylate, 2-ethyl- 2-adamantyl (meth) acrylate, 2-isopropyl-2-adamantyl (meth) acrylate, 2-[(1 ′, 1 ′, 1′-trifluoro-2 ′-(trifluoromethyl) -2 '-Hydroxy) propyl] -3-norbornyl (meth) acrylate, (1R, 2S, 4S) -1,7,7-trimethylspiro [bicyclo [2.2.1] heptane-3,2' (3 'H)-[1H] indene] -2-ol (meta)
Acrylate, 1,3,3aα, 4,7,7aα-Hexahydro-1,3-dioxo-4β, 7β-epoxyisobenzofuran-4-methanol (meth) acrylate, (1S, 4S)- 7-oxabicyclo [2.2.1] hept-5-en-2β-yl (meth) acrylate, 1-methyl-1- (1-adamantyl) ethyl (meth) acrylate, 3-hydroxy-1-adamantyl ( (Meth) acrylate, 3,5-dihydroxy-1-adamantyl (meth) acrylate, 2- (norborna-2-en-5-ylmethyl) -1,1,1,3,3,3-hexafluoro-2-propano -L (meth) acrylate, 2- (norborna-2-en-5-yl) -1,1,1,3,3,3-hexafluoro-2-propanol (meth) acrylate, 4α, 7α-methano-3a, 4,5,6,7,7a-hexahydro-1H-indene-6-ol (meth) acrylate, and the like. These may be used alone or in combination of two or more, but are not necessarily limited thereto.

  The alkyl chain in the (meth) acrylate having an alkyl chain having 4 to 24 carbon atoms may have a cyclic or branched chain. The alkyl chain preferably has 4 to 16 carbon atoms.

As a (meth) acrylate having an alkyl chain having 4 to 24 carbon atoms,
n-butyl (meth) acrylate, s-butyl (meth) acrylate, 2-methylbutyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, cyclopentyl (meth) acrylate, 1,1-dimethylbutyl (Meth) acrylate, 1,1-dimethylpropyl (meth) acrylate, 2-ethylbutyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, 3-methylcyclohexyl (meth) acrylate, 4- Methylcyclohexyl (meth) acrylate, 2-methylpentyl (meth) acrylate, n-heptyl (meth) acrylate, n-octyl (meth) acrylate, 1-methylheptyl (meth) acrylate, 3,3,5-to Methylcyclohexyl (meth) acrylate, 6-methylheptyl (meth) acrylate, n-nonyl (meth) acrylate, 5-methyl-2- (1-methylethyl) cyclohexyl (meth) acrylate, n-undecyl (meth) acrylate, 4- (1,1-dimethylpropyl) cyclohexyl (meth) acrylate, isooctyl (meth) acrylate, 3,5,5-trimethylhexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isononyl (meth) acrylate, lauryl (Meth) acrylate, n-dodecyl (meth) acrylate, spiro [bicyclo [3.2.0] heptane-6,1′-cyclohexane] -7-yl (meth) acrylate, 7-butyl-7-ethylbicyclo [ 3.2.0] Hepta-6 (Meth) acrylate, n-tridecyl (meth) acrylate, cyclododecyl (meth) acrylate, 2-5-dipentylcyclohexyl (meth) acrylate, 4-cyclohexylcyclohexyl (meth) acrylate, [4- (1-methylethyl) Cyclohexyl] methyl (meth) acrylate, n-tetradecyl (meth) acrylate, n-hexadecyl (meth) acrylate, n-octadecyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, cetyl (meth) acrylate, docosyl (meth) ) Acrylate, stearyl (meth) acrylate, behenyl (meth) acrylate, and the like, but are not necessarily limited thereto.

  The light scattering particle (A) is obtained by polymerizing a (meth) acrylate having a polycyclic structure or an alkyl chain having 4 to 24 carbon atoms and another monomer capable of copolymerization, and is provided for copolymerization. In 100% by mass of the monomer, the (meth) acrylate having a polycyclic structure or an alkyl chain having 4 to 24 carbon atoms is preferably 1 to 50% by mass in total, more preferably 3 to 25% by mass, More preferably, it is 5-15 mass%. It is preferable that the amount of (meth) acrylate having a polycyclic structure or an alkyl chain having 4 to 24 carbon atoms is within the above range because the dispersion effect is more effectively exhibited.

  The light scattering particles (A) can be obtained by various methods, and can be obtained in a dispersion state. Examples thereof include emulsion polymerization (one embodiment of which is soap-free emulsion polymerization), dispersion polymerization, suspension polymerization, seed polymerization and the like. Among these, emulsion polymerization and dispersion polymerization are preferable because they can form particles having a relatively narrow particle size distribution and contribute to the reduction of wavelength dependency in the present invention. Moreover, the dispersibility by steric repulsion can be provided by setting it as the polymer containing various (meth) acrylates.

  It is important that the average particle diameter of the light scattering particles (A) obtained as described above is 100 nm or more and less than 600 nm. By using the light scattering particles (A) having an average particle diameter of 100 nm or more, a sufficient scattering effect can be exhibited and the refractive index of the binder is not affected. Further, by using the light scattering particles (A) having an average particle diameter of less than 600 nm, the scattering angle becomes wide even if the scattering intensity (haze value) is small, so that effective scattering for total reflection is obtained and the extraction efficiency is improved. It is difficult to change the color tone because it becomes higher or the change of the light extraction efficiency due to the wavelength becomes smaller. The average particle diameter of the light scattering particles (A) is preferably 200 nm to 500 nm, more preferably 250 nm to 400 nm.

When the content of particles having a particle diameter of 600 nm or more with respect to the total amount of the light-scattering particles (A) is 20% by volume or less, the change in the light extraction efficiency due to the wavelength becomes small, and the color tone hardly changes. In addition, since the surface roughness of the light scattering layer is reduced, unevenness in the film thickness or protrusions of the translucent electrode is difficult to occur, and unevenness in brightness is unlikely to occur, thereby extending the life. The content of particles of 600 nm or more is more preferably 15% by volume or less.
In addition, about the average particle diameter of light-scattering particle | grains (A), or content of particle | grains with a particle diameter of 600 nm or more, the light-scattering particle | grains (A) are made into a dispersion body beforehand, and the resin composition for light scattering layers is used for the said dispersion body. When obtaining a thing, it is set as content of the light-scattering particle (A) in the resin composition for light-scattering layers with the average particle diameter of the light-scattering particle (A) in the said dispersion.

In the present specification, the “average particle diameter” and “particle diameter” of the light scattering particles (A) are different from the average primary particle diameter described later, and light scattering taking into consideration the particle diameter of secondary particles due to aggregation. It is the dispersed particle size in the layer composition. These can be obtained by actual measurement with an optical microscope or by a dynamic light scattering method. Here, the reason for distinguishing from the average primary particle size is that the scattering state of the light scattering particles (A) in the composition for the light scattering layer is used even when the scattering particles having the same average primary particle size are used. This is because the average particle size and the particle size distribution may differ.
“Average particle size” is the value of the dispersed particle size in 50% by volume of the measurement sample, and the content of particles having a particle size of 600 nm or more is the volume% of the particle size of 600 nm or more in the dispersed particle size of the measurement sample. It is. These can be measured by “Nanotrack UPA” manufactured by Nikkiso Co., Ltd. in the dynamic light scattering method.

As the particle size distribution of the light scattering particles (A), the coefficient of variation is preferably 30% or less. The “variation coefficient” is expressed as a percentage of a value obtained by dividing the standard deviation of the particle diameter by the average particle diameter, and is an index of the degree of variation with respect to the average particle diameter.
If the coefficient of variation is greater than 30%, the change in the light extraction efficiency with the wavelength increases and the color tone tends to change, which may not be preferable. More preferably, the coefficient of variation is 20% or less.

  The average particle size of the light scattering particles (A), the content of particles having a particle size of 600 nm or more, and the particle size distribution are polymerization temperature, monomer composition, dispersion medium, stirring conditions, type / amount / addition method of polymerization initiator, emulsifier. It can be adjusted according to the conditions such as type and amount.

  As the light scattering particles (A), it is preferable to use a dispersion liquid previously dispersed in a solvent. At that time, an additive such as a surfactant for stabilizing the dispersion may be added.

<Metal oxide fine particles (B)>
The composition for light-scattering layers of the 1st-4th aspect contains metal oxide fine particles (B). It is important that the difference in refractive index between the composition containing the metal oxide fine particles (B) and the dispersant (C) described later and the light scattering particles (A) is 0.1 or more. By including the metal oxide fine particles (B), the difference in refractive index can be easily made 0.1 or more.
The metal oxide fine particles (B) used in the present invention desirably have a refractive index of 1.8 to 2.8 in the visible light region. Since the refractive index of the dispersant (C), the ethylenically unsaturated monomer (D), and the resin (E) described later is about 1.4 to 1.6, use such metal oxide fine particles (B). Therefore, the metal oxide fine particles (B) and the dispersant (C) are essential, and the refractive index of the binder containing the ethylenically unsaturated monomer (D) and the resin (E) described later can be increased.
In the present specification, the “refractive index of the metal oxide fine particles (B)” means the bulk refractive index of the material constituting the metal oxide fine particles. The refractive index of the bulk material can be measured using an Abbe refractometer or a V block refractometer.

Specific examples of the metal oxide fine particles (B) include titanium oxide (TiO ₂ ), zirconium oxide (ZrO ₂ ), cerium oxide (CeO ₂ ), hafnium oxide (HfO ₂ ), niobium pentoxide (Nb ₂ O). ₅ ), at least one selected from the group consisting of tantalum pentoxide (Ta ₂ O ₅ ), indium oxide (In ₂ O ₃ ), tin oxide (SnO ₂ ), indium tin oxide (ITO), and zinc oxide (ZnO). Examples include, but are not necessarily limited to, particles composed of seed materials.

In order to maintain the translucency of the light scattering layer, it is preferable that there is no strong aggregation between the particles. Therefore, the average primary particle diameter of the metal oxide fine particles (B) is preferably 100 nm or less. By defining the average primary particle size to 100 nm or less, a binder composition that is transparent in the visible light region can be obtained.
The “average primary particle diameter” in the present specification indicates individual particle diameters not taking aggregation into account, and is, for example, 50 measured using a transmission electron microscope (TEM) or a scanning electron microscope (SEM). It is the average value of the particle diameter.

As the metal oxide fine particles (B), powder can be used as it is, or a dispersion liquid previously dispersed in a solvent may be used. Among them, it is preferable to use a dispersion liquid in order to maintain a dispersion state with an average particle diameter of 200 nm or less.
The dispersing method is preferably a method using a dispersing agent in accordance with the surface state of the metal oxide fine particles (B) and using a disperser. Dispersers include paint conditioner (manufactured by Red Devil), ball mill, sand mill (such as “Dyno mill” manufactured by Shinmaru Enterprises), attritor, pearl mill (such as “DCP mill” manufactured by Eirich), coball mill, homomixer, Homogenizers (such as “Clairemix” manufactured by M Technique Co., Ltd.), wet jet mills (“Genus PY” manufactured by Genus, “Nanomizer” manufactured by Nanomizer), microbead mills (“Super Apeck Mill” manufactured by Kotobuki Industries Co., Ltd.) And “Ultra Apeck Mill”), an ultrasonic disperser, and the like.
When media are used in the disperser, glass beads, zirconia beads, alumina beads, magnetic beads, polystyrene beads, and the like are preferably used.
Regarding dispersion, two or more types of dispersers or two or more types of media having different sizes may be used and may be implemented step by step.

As the metal oxide fine particles (B), titanium oxide (TiO ₂ ), zirconium oxide (ZrO ₂ ), zinc oxide (ZnO), and tin oxide (SnO ₂ ) are preferable. Titanium oxide (TiO ₂ ) and zirconium oxide (ZrO ₂ ) are particularly preferable from the viewpoints of translucency, dispersibility, weather resistance, light resistance, and the like.
.

<Dispersant (C)>
The composition for light-scattering layers of the 1st-4th aspect contains a dispersing agent (C). The dispersant (C) has a function of stabilizing the dispersion by being adsorbed on the metal oxide fine particles (B) in a liquid dispersion medium. The dispersant (C) used in the present invention preferably contributes to the dispersion stabilization of the metal oxide fine particles (B) by having a site compatible with the metal oxide fine particles (B). As the dispersant (C), those having various molecular weights can be used. When the mass average molecular weight (Mw) is less than 1000, the dispersant (C) is adsorbed on the metal oxide fine particles (B). Desorption may also occur easily, and if the mass average molecular weight (Mw) is 50000 or more, interparticle cross-linking via the dispersant (C) occurs and aggregation may easily occur. As a preferable mass average molecular weight (Mw), it is 1000 or more and less than 50000, More preferably, it is 1000 or more and less than 30000, More preferably, it is 2000 or more and less than 20000.

The dispersant (C) has an ethylenically unsaturated double bond. If the dispersant (C) is used, ultraviolet rays and electrons can be used without using any ethylenically unsaturated monomer (D) described later or resin (E) described later having an ethylenically unsaturated double bond. The resin composition for light-scattering layers which can be hardened | cured with a line can be obtained.
The ethylenically unsaturated monomer (D) or resin (E) and the dispersant (C) are classified from the following viewpoints. That is, the dispersant (C) functions as a dispersant for the metal oxide fine particles (B) regardless of the molecular weight or the like. Specifically, with respect to 100 parts by mass of metal oxide fine particles (B), a film having a thickness of 1 μm formed from a dispersion obtained by mixing and dispersing 50 parts by mass of component “X” and 600 parts by mass of a liquid dispersion medium. If the dry film has a transmittance of 70% or more at a wavelength of 400 nm, the component “X” is defined as functioning as a dispersant.

Examples of the dispersant (C) used in the resin composition for light scattering layer of the present invention include those having a structure represented by the following general formula (1), polyester dispersants, polyurethane dispersants, and polyether dispersants. Examples thereof include a dispersant, a polyacrylate dispersant, and an epoxy resin type dispersant.
General formula (1):

Wherein R ^{1 to} R ⁴ each independently represents a hydrogen atom or a methyl group, and R ^{5 to} R ⁸ each independently represent an unsubstituted or substituted linear or branched alkylene group or alkylene ether chain. R ⁹ represents a tetravalent aromatic group or aliphatic group.)
In the above formula (1), examples of the unsubstituted or substituted linear or branched alkylene group represented by R ^{5 to} R ⁸ include alkylene groups such as a methylene group, an ethylene group, and a C3 to C10 polymethylene group. . Examples of the unsubstituted or substituted linear or branched alkylene ether chain include C3 alkylene-oxy C3 alkylene groups. Examples of the substituent that can be taken by the alkylene group or the alkylene ether chain include an alkyl group such as a methyl group and an ethyl group, a hydroxyl group, an acryloyloxymethyl group, an acryloyloxyethyl group, and a phenoxy group.
In the above formula (1), the R ⁹ tetravalent aromatic group specifically includes a phenyl skeleton, a benzophenone skeleton, a biphenyl skeleton, a phenyl ether skeleton, a diphenyl sulfone skeleton, a diphenyl sulfide skeleton, a perylene skeleton, a fluorene skeleton, a tetrahydro A naphthalene skeleton, a naphthalene skeleton, etc. are mentioned. Among them, R ⁹ is preferably at least one selected from the group consisting of a biphenyl skeleton, a naphthalene skeleton, a fluorene skeleton, and a tetrahydronaphthalene skeleton. These may be used alone or in combination of two or more, but are not necessarily limited thereto.

  The dispersant (C) can be adsorbed on the metal oxide fine particles (B) to be dispersed and can maintain a stable dispersed state. The particle diameter of the metal oxide fine particles (B) dispersed using a disperser is preferably 200 nm or less, more preferably 100 nm or less. Thereby, the resin composition for light scattering layers with a high transmittance can be obtained, and a light scattering layer with a high transmittance can be formed.

<First aspect>
As described above, the resin composition for a light scattering layer of the present invention can be in the first to fourth embodiments. The first aspect will be described. The second to fourth aspects will be described later.
The resin composition for light scattering layers according to the first aspect comprises an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000 and a resin (E) having a mass average molecular weight (Mw) of 5000 or more, which will be described later. Not included. As mentioned above. Since the dispersant (C) having an ethylenically unsaturated double bond is used, a resin composition for a light scattering layer that can be cured by ultraviolet rays or electron beams can be obtained. Moreover, if a high molecular weight thing is used as a dispersing agent (C), the resin composition for light-scattering layers which is more excellent in film forming property can be obtained.

In the first aspect, the refractive index of the composition containing the metal oxide fine particles (B) and the dispersant (C) (hereinafter also referred to as “the binder in the first aspect”) is 1.65 or more. preferable.
In the resin composition for a light scattering layer of the present invention, the difference in refractive index between the binder of each aspect containing the metal oxide fine particles (B) and the dispersant (C) and the light scattering particles (A) is 0.1 or more. is there. When the refractive index difference is 0.1 or more, the light guided by total reflection in the light emitting device is scattered at the interface between the binder and the light scattering particles (A), and the light extraction efficiency is improved. The light extraction efficiency improves as the refractive index difference increases.

Since the refractive index of the translucent substrate is about 1.5 and the refractive index of the translucent electrode is about 1.8 to 2, the refractive index of the binder is preferably 1.5 to 2. It is particularly desirable that the refractive index of the binder is 1.65 or more in that the refractive index with the translucent electrode is close and more light can be introduced and the wavelength dependence of the light extraction efficiency can be reduced.
As described above, since the refractive index of the light scattering particles (A) is usually about 1.4 to 1.8, the type of the metal oxide fine particles (B) having a refractive index of about 1.8 to 2.8 contained in the binder. By appropriately selecting the content, the refractive index of the binder can be made 1.5 to 2, and the refractive index difference from the light scattering particles (A) can be made 0.1 or more.

Moreover, the resin composition for light-scattering layers of a 1st aspect WHEREIN: 1-30 mass% of light-scattering particles (A) and metal oxide microparticles | fine-particles (B) in solid content 100 mass% of the resin composition for light-scattering layers ) Is preferably 20 to 75% by mass and the dispersant (C) is preferably 1 to 35% by mass, the light scattering particles (A) are 10 to 25% by mass, and the metal oxide fine particles (B) are 25 to 75% by mass. More preferably, the dispersant (C) is contained in an amount of 5 to 30% by mass, the light scattering particles (A) are 15 to 25% by mass, the metal oxide fine particles (B) are 30 to 70% by mass, and the dispersant (C). It is more preferable that 10-25 mass% is included.
The amount of the light scattering particles (A) is important in terms of expression of the light scattering effect and ensuring of the flatness of the light scattering layer. The amount of the metal oxide fine particles (B) is important in terms of suppressing aggregation of the particles and ensuring the strength of the formed light scattering layer. The amount of the dispersant (C) is important in terms of stabilizing the dispersion of the metal oxide fine particles (B).
In addition, the resin composition for light-scattering layers of a 1st aspect is about 30 mass% in total about the silane compound, photoinitiator, leveling agent, etc. which are mentioned later as components other than said (A)-(C). Can contain up to.

<Ethylenically unsaturated monomer (D)>
The ethylenically unsaturated monomer (D) used for the resin composition for light scattering layers according to the second to fourth aspects will be described.
The ethylenically unsaturated monomer (D) has an ethylenically unsaturated double bond, and has a mass average molecular weight (Mw) of less than 5000, preferably 200 or more and less than 5000. In order to improve etchant resistance, crosslink density and adhesion, the double bond equivalent of the ethylenically unsaturated monomer (D) is particularly preferably 80 g / mol or more and 140 g / mol or less.
A resin having an ethylenically unsaturated double bond and having a mass average molecular weight (Mw) of 5000 or more is referred to as a resin (E) described later.

Examples of the ethylenically unsaturated monomer (D) having a double bond equivalent of 80 g / mol or more and 140 g / mol or less include 1,6-hexanediol di (meth) acrylate, 1.4-butanediol di ( Tri (meth) acrylates such as (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, pentaerythritol triacrylate, and trimethylolpropane tri (meth) acrylate;
Aliphatic polyfunctional (meth) acrylates such as pentaerythritol tetraacrylate, di-trimethylolpropane tetraacrylate, and dipentaerythritol (monohydroxy) pentaacrylate;
Polyfunctional alicyclic (meth) acrylates such as dicyclopentadienyl di (meth) acrylate;
Other examples include bifunctional or higher functional polyurethane ether (meth) acrylate, polyester (meth) acrylate, and epoxy (meth) acrylate having a double bond equivalent of 80 g / mol or more and 140 g / mol or less, but are not necessarily limited thereto. It is not something.
These may be used singly or in combination of two or more at any ratio as necessary.

  Commercially available products include M-350 (trimethylolpropane ethylene oxide modified triacrylate), M-450 (pentaerythritol tri and tetraacrylate), M-402 (dipentaerythritol penta and hexaacrylate) (manufactured by Toa Gosei Co., Ltd.), Biscoat # 802 (tripentaerythritol octaacrylate (Osaka Organic Chemical Co., Ltd.), Kayarad DPCA30, Kayarad DPCA60 (caprolactone-modified dipentaerythritol hexaacrylate) (manufactured by Nippon Kayaku Co., Ltd.) and the like are mentioned. It is not limited to.

<Resin (E)>
The resin (E) used for the resin composition for light scattering layers of the second to fourth aspects will be described.
The resin (E) has a mass average molecular weight (Mw) of 5000 or more and transmits light emitted from the light emitting layer, for example, light in a predetermined wavelength band such as visible light, near infrared light, or near ultraviolet light. The resin is not particularly limited as long as it has a property. The mass average molecular weight (Mw) is preferably less than 20000.
For example, an organic EL device is manufactured by sequentially laminating a translucent electrode, an organic layer including a light emitting layer, and a back electrode on a translucent substrate. At this time, the adhesion between the layers is an important point that affects the performance of the organic EL device. Among these, the adhesion between the substrate and the translucent electrode is particularly important. For example, in the step of forming a translucent electrode, a high temperature treatment for reducing the resistance value of the electrode and an etching treatment for forming an electrode pattern are performed, and before the organic layer is laminated on the formed translucent electrode. In addition, cleaning with a solvent for removing impurities is performed. At this time, if the adhesion between the base material and the translucent electrode is low, the translucent electrode is finely cracked or peeled off. As a result, when the organic EL device is caused to emit light, dark spots, luminance unevenness, or life reduction Will cause.

  When the resin (E) has a mass average molecular weight (Mw) of 5000 or more, the chemical resistance of the light scattering layer is improved, and the light scattering layer or translucent electrode of the light scattering layer or the translucent electrode is removed in the solvent washing step before the organic layer is laminated. Peeling can be effectively suppressed / prevented. In addition, by using a resin (E) having a mass average molecular weight (Mw) of 20000 or less, the resin composition for the light scattering layer can have a low viscosity, and the light scattering particles (A) or the metal oxide fine particles (B) are aggregated. Can be suppressed and prevented, the surface of the light scattering layer can be made smoother, short-circuits during the formation of the translucent electrode can be suppressed and prevented, and the life can be extended.

  “Mass average molecular weight (Mw)” in the present specification is a value measured using gel permeation chromatography, and can be measured, for example, by gel permeation chromatography GPC-101 manufactured by Showa Denko K.K.

As the resin (E), a curable resin such as thermoplasticity, thermosetting property, light (electromagnetic wave) curable property by visible light, ultraviolet ray, infrared ray or the like, or electron beam curable property by electron beam irradiation is suitably used.
Examples of such resins include polycarbonate (PC), polystyrene (PS), polyether, polyester, polyarylate, polyamide, phenol-formaldehyde resin (phenol resin), polydiethylene glycol bisallyl carbonate, acrylonitrile / styrene copolymer. (AS resin), methyl methacrylate / styrene copolymer (MS resin), poly-4-methylpentene, norbornene polymer, urethane resin, epoxy resin, acrylic resin, silicone resin, etc. It is not limited. These can be used singly or as a mixture of two or more at any ratio as required.

The 5% thermal decomposition temperature of the resin (E) is preferably 200 ° C. or higher.
The “5% thermal decomposition temperature” in the present specification indicates a temperature when 5% of the mass is reduced by heating, and is a value measured by thermal mass measurement. For example, it can be measured by a differential thermothermal mass simultaneous measurement apparatus EXSTER TG / DTA6300 manufactured by Seiko Instruments Inc. When the 5% thermal decomposition temperature of the resin (E) is less than 200 ° C., the heat resistance is low, and it is not possible to sufficiently heat in the lamination step of the translucent electrode, and the resistance value of the electrode may not be lowered.

The resin (E) preferably contains a cyclic skeleton in the main chain or side chain from the viewpoints of translucency and etchant resistance. The “cyclic skeleton” referred to here is an aliphatic ring, an aromatic ring, and a heterocyclic ring containing an O atom and / or an N atom.
In particular,
Aliphatic rings such as hydrogenated bisphenol A skeleton, cyclohexyl skeleton, norbornene skeleton, and adamantane skeleton;
Aromatic rings such as phenyl, phenylene, indene, bisphenol A skeleton, and fluorene skeleton;
Ester resin having one or more cyclic skeletons selected from heterocycles containing O atoms and / or N atoms such as tetrahydrofuran skeleton, furan skeleton, tetrahydropyran skeleton, pyran skeleton, isocyanurate skeleton, and oxazolidone skeleton , Urethane resin, epoxy resin, and acrylic resin.
Among these, acrylic resins are preferably used from the viewpoints of heat resistance and light resistance.

  The resin (E) preferably has an ethylenically unsaturated double bond and / or a crosslinkable group, thereby improving heat resistance and chemical resistance. Moreover, resin (E) can contain an alkali availability group, and can provide developability by this.

Examples of the ethylenically unsaturated double bond include (meth) acrylate groups and unsaturated groups such as maleimide groups.
The crosslinkable group preferably has a heat crosslinkable group or an ultraviolet ray or electron beam crosslinkable group. Examples of thermally crosslinkable sites include hydroxyl groups, epoxy groups, oxetanyl groups, acid (carboxyl) groups, and isocyanate groups. Examples of the ultraviolet or electron beam crosslinkable site include an epoxy group and an oxetanyl group. These can be used alone or in combination of two or more.

  The resin (E) preferably contains an unsaturated group such as a (meth) acrylate group and a maleimide group, and the double bond equivalent is preferably 400 (g / mol) to 1600 (g / mol). . When the double bond equivalent of the resin (E) is 400 (g / mol) or more, curing shrinkage of the resin can be suppressed, and a fine crack or peeling is hardly generated in the translucent electrode. On the other hand, when the double bond equivalent is 1600 (g / mol) or less, the crosslinking density is increased, the etching resistance is improved, and the light scattering layer or the translucent electrode is peeled off in the solvent washing step before the organic layer lamination. Can be suppressed / prevented.

There is no restriction | limiting in particular as a method of obtaining resin which has an ethylenically unsaturated double bond suitable as resin (E) in the resin composition for light-scattering layers of this invention.
For example, an unsaturated monomer component containing an ethylenically unsaturated monomer having one or more functional groups selected from a hydroxyl group, an epoxy group, an acid (carboxyl) group, and an isocyanate group is polymerized. And a method of modifying the functional group in the copolymer with an ethylenically unsaturated monomer having a functional group capable of reacting with the functional group and an ethylenically unsaturated double bond.
The combination of the functional group of the copolymer and the functional group of the ethylenically unsaturated monomer used for modification is not particularly limited. For example, a hydroxyl group and an isocyanate group, a hydroxyl group and an epoxy group, and an epoxy group and an acid (carboxyl) ) Group and the like.

(Ethylenically unsaturated monomer having a hydroxyl group)
Examples of the ethylenically unsaturated monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2- or 3-hydroxypropyl (meth) acrylate, 2- or 3- or 4-hydroxybutyl (meth) acrylate, and glycerol. Examples include (meth) acrylates and hydroxyalkyl (meth) acrylates such as cyclohexanedimethanol mono (meth) acrylate, but are not necessarily limited thereto.

(Ethylenically unsaturated monomer having an epoxy group)
Examples of the ethylenically unsaturated monomer having an epoxy group include glycidyl (meth) acrylate, β-methylglycidyl (meth) acrylate, β-propylglycidyl (meth) acrylate, β-methylglycidyl-α-ethyl acrylate, 3-methyl-3,4-epoxybutyl (meth) acrylate, 4-methyl-4,5-epoxypentyl (meth) acrylate, 5-methyl-5,6-epoxyhexyl (meth) acrylate, glycidyl vinyl ether, etc. Although it is mentioned, it is not necessarily limited to these. Among these, glycidyl (meth) acrylate is preferable.

(Ethylenically unsaturated monomer having acid (carboxyl) group)
As an ethylenically unsaturated monomer having an acid group, for example,
(Meth) acrylic acid, itaconic acid, crotonic acid, o-, m-, p-vinylbenzoic acid, monocarboxylic acid such as α-position haloalkyl, alkoxyl, halogen, nitro, or cyano substituent of (meth) acrylic acid, etc. An ethylenically unsaturated monomer (unsaturated monobasic acid) having a carboxyl group;
Examples thereof include polybasic acid anhydrides such as tetrahydrophthalic anhydride, phthalic anhydride, hexahydrophthalic anhydride, succinic anhydride, and maleic anhydride.
Among these, (meth) acrylic acid is particularly preferable.

(Unsaturated monomer having an isocyanate group)
Examples of the ethylenically unsaturated monomer having an isocyanate group include 2- (meth) acryloyloxyethyl isocyanate and 1,1-bis [(meth) acryloyloxy] ethyl isocyanate, but are not necessarily limited thereto. It is not something.

  The other ethylenically unsaturated monomer component constituting the resin (E) is not particularly limited as long as it has an ethylenically unsaturated group, and examples thereof include (meth) acrylic acid esters, N-vinyl. Examples include, but are not necessarily limited to, pyrrolidone, styrenes, acrylamides, other vinyl compounds, and macromonomers.

Among these, as described above, it is preferable to copolymerize an ethylenically unsaturated monomer that introduces a cyclic skeleton into the main chain or side chain of the resin (E).
As an ethylenically unsaturated monomer that introduces a cyclic skeleton into the main chain,
Cyclic dienes such as indene, benzofuran, norbornene, and cyclohexene;
and,
Intramolecular cyclization reaction proceeds during copolymerization with methacrylic acid esters such as vinylcyclopropane and the like, and the like and the like are included, but it is not necessarily limited to these. It is not a thing.
As an ethylenically unsaturated monomer that introduces a cyclic skeleton into the side chain,
Aliphatic ring-containing (meth) acrylates such as isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, dicyclopentanyl (meth) acrylate, and 1-adamandane (meth) acrylate;
Aromatic ring-containing (meth) acrylates such as benzyl (meth) acrylate, phenyl (meth) acrylate, phenoxyethyl (meth) acrylate, and paracumyl EO modified (meth) acrylate;
Styrene and its derivatives, styrenes such as methylstyrene;
Tetrahydrofurfuryl (meth) acrylate, cyclic trimethylolpropane formal (meth) acrylate, (2-ethyl-2-methyl-1,3-dioxolan-4-yl) (meth) acrylate, (2-isobutyl-2- Methyl-1,3-dioxolan-4-yl) (meth) acrylate, (1,4-dioxaspiro [4.5] dec-2-yl) (meth) acrylate, pentamethylpiperidyl (meth) acrylate, and oxazolidone ( Heterocycle-containing (meth) acrylates containing O atoms and / or N atoms such as (meth) acrylates may be mentioned, but are not necessarily limited thereto.
These can be used singly or as a mixture of two or more at any ratio as required.

  The ratio of the ethylenically unsaturated monomer that introduces a cyclic skeleton into the main chain or the side chain is not particularly limited, but is 5 to 50 mass with respect to 100 mass% of the monomers constituting the resin (E). % Is preferred. When the amount of the ethylenically unsaturated monomer for introducing the cyclic skeleton into the main chain or the side chain is in the above range, the polymerization and the molecular weight can be easily controlled, and the etchant resistance can be secured.

Examples of other copolymerizable ethylenically unsaturated monomers other than the ethylenically unsaturated monomer containing a cyclic skeleton in the main chain or side chain include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meta ) Acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and 2-hydroxyethyl (meth) acrylate (meta) ) Acrylic esters;
Acrylamides such as (meth) acrylamide, methylol (meth) acrylamide, alkoxymethylol (meth) acrylamide, diacetone (meth) acrylamide;
Vinyl compounds such as (meth) acrylonitrile, ethylene, propylene, butylene, vinyl chloride, and vinyl acetate;
However, it is not necessarily limited to these.
These can be used singly or as a mixture of two or more at any ratio as required.

  The 5% thermal decomposition temperature and double bond equivalent of the resin (E) can be controlled by the type and blending of the ethylenically unsaturated monomer used for copolymerization and modification. The mass average molecular weight (Mw) can be controlled by polymerization conditions such as the type and amount of the polymerization initiator.

Resin (E) can impart any physical properties depending on the type and blending of the ethylenically unsaturated monomer used.
For example, when imparting developability to the resin (E), an acid group such as a carboxyl group is introduced in order to express alkali solubility. The method for introducing the acid group is not particularly limited. However, the above-described copolymer containing an ethylenically unsaturated monomer having an acid group is modified so that the acid group remains, or the hydroxyl group described above. And a method of modifying a copolymer containing an ethylenically unsaturated monomer having a polybasic acid anhydride as described above.
When imparting developability, the acid value of the resin (E) is preferably 30 mgKOH / g or more and less than 200 mgKOH / g. If the acid value is less than 30 mg KOH / g, sufficient developability cannot be ensured, and if it is 200 mg KOH / g or more, hydrolysis of a silane compound described later is promoted, and the adhesion of the light scattering layer may decrease with time. is there.
The “adhesiveness of the light-scattering layer” (hereinafter sometimes simply referred to as “adhesiveness”) referred to in this specification is the adhesiveness of the light-scattering layer to the translucent substrate and the translucent electrode.

In the synthesis of the resin (E), the ethylenically unsaturated monomer is copolymerized and modified in the presence of a polymerization initiator, under an inert gas stream, generally at 50 to 150 ° C. for 2 to 10 hours. I do. The method for the polymerization reaction is not particularly limited, and various conventionally known polymerization methods can be adopted, but the solution polymerization method is particularly preferable.
The polymerization temperature and the polymerization concentration defined by the following formula vary depending on the types and ratios of the monomer components used and the molecular weight of the target polymer, but preferably the polymerization temperature is 40 to 150 ° C. and the polymerization concentration is 5 to 50. More preferably, the polymerization temperature is 60 to 130 ° C., and the polymerization concentration is 10 to 40%.
Polymerization concentration (%) = [total mass of monomer component / (total mass of monomer component + solvent mass)] × 100

As the polymerization initiator used for the synthesis of the resin (E), organic peroxides and azo compounds can be used.
Examples of the organic peroxide include benzoyl peroxide, cumene hydroperoxide, t-butyl hydroperoxide, diisopropyl peroxycarbonate, di-t-butyl peroxide, and t-butyl peroxybenzoate.
Examples of the azo compound include azo compounds such as 2,2′-azobisisobutyronitrile.
The polymerization initiator is preferably used in the range of 1 to 20 parts by mass with respect to 100 parts by mass of the ethylenically unsaturated monomer.

Examples of the solvent used for the synthesis of the resin (E) include water, water-miscible organic solvents, acetate esters, ketones, xylene, and ethylbenzene.
Examples of the water-miscible organic solvent include alcohol solvents such as ethyl alcohol, isopropyl alcohol, and n-propyl alcohol, and mono- or dialkyl ethers of ethylene glycol or diethylene glycol.
Examples of acetates include ethyl cellosolve acetate and propylene glycol monomethyl ether acetate.
Examples of ketones include cyclohexanone and methyl isobutyl ketone.

Next, the resin composition for light scattering layers according to the second to fourth aspects will be described.
<Second aspect>
The resin composition for a light scattering layer of the second aspect contains an ethylenically unsaturated monomer (D) and does not contain a resin (E).
In the second embodiment, a composition comprising metal oxide fine particles (B), a dispersant (C) and an ethylenically unsaturated monomer (D) (hereinafter also referred to as “binder in the second embodiment”) The refractive index is preferably 1.65 or more.
About the refractive index of a binder and the refractive index difference with light-scattering particle | grains (A), it is the same as that of the case of a 1st aspect.

Moreover, the resin composition for light-scattering layers of a 2nd aspect WHEREIN: 1-30 mass% of light-scattering particles (A) and metal oxide microparticles | fine-particles (B) in 100 mass% of solid content of the resin composition for light-scattering layers ) Is preferably 20 to 75% by mass, the dispersant (C) is preferably 1 to 20% by mass, and the ethylenically unsaturated monomer (D) is preferably 1 to 30% by mass, and (A): 10 to 25% by mass. (B): 25 to 75% by mass, (C): 5 to 20% by mass, (D): 1 to 20% by mass, (A): 15 to 25% by mass, (B) : It is more preferable that 30-70 mass%, (C): 10-20 mass%, and (D): 3-15 mass% are included.
The amount of the light scattering particles (A) is important in terms of expression of the light scattering effect and ensuring of the flatness of the light scattering layer. The amount of the metal oxide fine particles (B) is important in terms of suppressing aggregation of the particles and ensuring the strength of the formed light scattering layer. The amount of the dispersant (C) is important in terms of stabilizing the dispersion of the metal oxide fine particles (B). The amount of the ethylenically unsaturated monomer (D) is important in terms of improving the adhesion between the light projecting electrode and the light scattering layer and improving the etchant resistance.
In addition, the resin composition for light-scattering layers of a 2nd aspect is about 30 mass% in total about the silane compound, photoinitiator, leveling agent, etc. which are mentioned later as components other than said (A)-(D). Can contain up to.

<Third Aspect>
Moreover, the resin composition for light-scattering layers of a 3rd aspect further contains resin (E), and does not contain an ethylenically unsaturated monomer (D).
In the third aspect, the refractive index of the composition containing the metal oxide fine particles (B), the dispersant (C) and the resin (E) (hereinafter also referred to as “binder in the third aspect”) is 1. It is preferable that it is 65 or more.
About the refractive index of a binder and the refractive index difference with light-scattering particle | grains (A), it is the same as that of the case of the 1st, 2nd aspect.

Moreover, the resin composition for light-scattering layers of a 3rd aspect WHEREIN: 1-30 mass% of light-scattering particles (A) and metal oxide microparticles | fine-particles (B) in 100 mass% of solid content of the resin composition for light-scattering layers ) Is preferably 20 to 75% by mass, the dispersant (C) is preferably 1 to 20% by mass, and the resin (E) is preferably 1 to 20% by mass. (A): 10 to 25% by mass, (B): 25 It is more preferable to contain -75 mass%, (C): 5-20 mass%, (E): 1-15 mass%, (A): 15-25 mass%, (B): 30-70 mass%. (C): It is more preferable that 10-20 mass% and (E): 2-10 mass% are included.
The amount of the light scattering particles (A) is important in terms of expression of the light scattering effect and ensuring of the flatness of the light scattering layer. The amount of the metal oxide fine particles (B) is important in terms of suppressing aggregation of the particles and ensuring the strength of the formed light scattering layer. The amount of the dispersant (C) is important in terms of stabilizing the dispersion of the metal oxide fine particles (B). The amount of the resin (E) is important in terms of suppressing curing shrinkage of the light scattering layer, suppressing fine cracks and peeling of the translucent electrode, and improving etchant resistance.
In addition, the resin composition for light-scattering layers of the 3rd aspect is a sum total of a silane compound, a photoinitiator, a leveling agent, etc. which are mentioned later as components other than said (A)-(C), (E). Up to about 30% by mass can be included.

Moreover, the resin composition for light-scattering layers of the 4th aspect further contains an ethylenically unsaturated monomer (D) and resin (E).
A 4th aspect is a composition (henceforth "the binder in a 4th aspect" containing metal oxide microparticles | fine-particles (B), a dispersing agent (C), an ethylenically unsaturated monomer (D), and resin (E). The refractive index is also preferably 1.65 or more.
About the refractive index of a binder and the refractive index difference with light-scattering particle | grains (A), it is the same as that of the case of the 1st-3rd aspect.

Moreover, the resin composition for light-scattering layers of the 4th aspect WHEREIN: 1-30 mass% of light-scattering particles (A) and metal oxide microparticles | fine-particles (B) in 100 mass% of solid content of the resin composition for light-scattering layers 20 to 75% by mass, 1 to 20% by mass of the dispersant (C), 1 to 30% by mass of the ethylenically unsaturated monomer (D), and 1 to 20% by mass of the resin (E). Preferably, (A): 10 to 25% by mass, (B): 25 to 75% by mass, (C): 5 to 20% by mass, (D): 1 to 20% by mass, (E): 1 to 15% by mass % (A): 15-25% by mass, (B): 30-70% by mass, (C): 10-20% by mass, (D): 3-15% by mass, (E ): It is more preferable that 2-10 mass% is included.
The amount of the light scattering particles (A) is important in terms of expression of the light scattering effect and ensuring of the flatness of the light scattering layer. The amount of the metal oxide fine particles (B) is important in terms of suppressing aggregation of the particles and ensuring the strength of the formed light scattering layer. The amount of the dispersant (C) is important in terms of stabilizing the dispersion of the metal oxide fine particles (B). The amount of the ethylenically unsaturated monomer (D) is important in terms of improving the adhesion between the light projecting electrode and the light scattering layer and improving the etchant resistance. The amount of the resin (E) is important in terms of suppressing curing shrinkage of the light scattering layer, suppressing fine cracks and peeling of the translucent electrode, and improving etchant resistance.
In addition, the resin composition for light-scattering layers of the 4th aspect is about 30 mass% in total about the silane compound, photoinitiator, leveling agent, etc. which are mentioned later as components other than said (A)-(E). Can contain up to.
Further, the binder in each embodiment may be simply referred to as a binder without being distinguished.

<Silane compound>
The resin composition for a light scattering layer of the present invention can further contain a silane compound. By including the silane compound used in the present invention, the adhesion between the translucent substrate or translucent electrode and the light scattering layer is improved.

  The mass average molecular weight (Mw) of the silane compound used in the present invention is preferably 100 or more and less than 5000. When the mass average molecular weight (Mw) of the silane compound is less than 100, sufficient adhesion may not be obtained, and when it is 5000 or more, the etchant resistance deteriorates, which may not be preferable.

As silane coupling agents, vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycid Xylpropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, p-styryltrimethoxysilane, 3- (meth) acryloxypropylmethyldimethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (Meth) acryloxypropylmethyldiethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, N-2- (aminoethyl) -3-aminopropylmethyldimethoxysilane, N-2- (aminoethyl) -3 -Aminopropyl Limethoxysilane, N-2- (aminoethyl) -3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-triethoxysilyl-N- (1,3- Dimethyl-butylidene) propylamine, N-phenyl-3-aminopropyltrimethoxysilane, N- (vinylbenzyl) -2-aminoethyl-3-aminopropyltrimethoxysilane hydrochloride, 3-ureidopropyltriethoxysilane, 3-chloropropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyltrimethoxysilane, bis (triethoxysilylpropyl) tetrasulfide, 3-isocyanatopropyltriethoxysilane, (3-carbamate ethyl) Propyltriethoxysilane, (3-carbamateethyl) propyltrimethoxysilane, (3-carbamateethyl) propyltripropoxysilane, (3-carbamatepropyl) propyltriethoxysilane, (3-carbamatepropyl) propyltrimethoxysilane , (3-carbamatepropyl) propyltripropoxysilane, (3-carbamatebutyl) propyltriethoxysilane, (3-carbamatebutyl) propyltrimethoxysilane, (3-carbamatebutyl) propyltripropoxysilane, (3- Carbamatebutyl) butyltripropoxysilane, (3-carbamatebutyl) propylmethyldiethoxysilane, (3-carbamatepentyl) propyltriethoxysilane, (3-carbamatehexyl) pro Pyrtriethoxysilane, (3-carbamate octyl) pentyl riboxysilane, (3-carbamateethyl) propylsilyltrichloride, (3-carbamateethyl) propyltrimethylsilane, (3-carbamateethyl) propyldimethylsilane, (3- Carbamateethyl) propyltributylsilane, (3-carbamateethyl) ethyl-p-xylenetriethoxysilane, (3-carbamateethyl) -p-phenylenetriethoxysilane, (3-carbamateethyl) propyltriethoxysilane, (3- Carbamateethyl) propyltrimethoxysilane, (3-carbamateethyl) propyltripropoxysilane, (3-carbamatepropyl) propyltriethoxysilane, (3-carbamatepropyl) propiyl Rutrimethoxysilane, (3-carbamatepropyl) propyltripropoxysilane, (3-carbamatebutyl) propyltriethoxysilane, (3-carbamatebutyl) propyltrimethoxysilane, (3-carbamatebutyl) propyltripropoxysilane, (3-carbamatebutyl) butyltripropoxysilane, (3-carbamatebutyl) propylmethyldiethoxysilane, (3-carbamatepentyl) propyltriethoxysilane, (3-carbamatehexyl) propyltriethoxysilane, (3-carbamate Octyl) pentyl riboxysilane, (3-carbamateethyl) propylsilyltrichloride, (3-carbamateethyl) propyltrimethylsilane, (3-carbamateethyl) propyldimethyl Silane, (3-carbamateethyl) propyltributylsilane, (3-carbamateethyl) ethyl-p-xylenetriethoxysilane, (3-carbamateethyl) -p-phenylenetriethoxysilane, 2- (3,4-epoxycyclohexyl) ) Ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxy Propyltrimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyl Trimethoxysilane, 3-glycidoxypropyl trimethoxysilane, 3-glycidoxypropyl methyl diethoxy silane, 3-glycidoxypropyl epoxysilanes such as triethoxy silane,
3- (meth) acryloxypropylmethyldimethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropylmethyldiethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, etc. Although it is mentioned, it is not necessarily limited to these.

These silane coupling agents can be used alone or in admixture of two or more at any ratio as required.
Further, the silane coupling agent may be a silanol compound produced by hydrolysis of the above compound or a polyorganosiloxane compound in which they are condensed.

  From the viewpoint of reactivity with the resin contained in the binder composition, 3-glycidoxypropyltrimethoxysilane (Shin-Etsu Silicone “KBM-403”), 3- (meth) acryloxypropyltrimethoxysilane (Shin-Etsu Silicone “ KBM-503 "), N-phenyl-3-aminopropyltrimethoxysilane (Shin-Etsu Silicone" KBM-573 "), (3-carbamateethyl) propyltriethoxysilane, or (3-carbamateethyl) propyltrimethoxysilane is preferred. 3-glycidoxypropyltrimethoxysilane is particularly preferred.

  The amount of the silane compound used in the resin composition for light scattering layer of the present invention is preferably 3% by mass or more and less than 50% by mass in 100% by mass of the solid content of the resin composition for light scattering layer. -40 mass% is more preferable. If it is less than 3% by mass, sufficient adhesion cannot be obtained, and if it exceeds 50% by mass, the transmittance may decrease.

<Photopolymerization initiator>
The resin composition for a light scattering layer of the present invention can be thermally polymerized without blending a polymerization initiator. However, when it is desired to cure in a short time with UV light, or when it is desired to form a light scattering layer by photolithography as a resin composition for a photosensitive light scattering layer of a solvent development type or an alkali development type, the present invention. A photopolymerization initiator can be added to the resin composition for a light scattering layer.

Examples of the photopolymerization initiator include 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- Hydroxycyclohexyl phenyl ketone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, and 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane Acetophenone-based photopolymerization initiators such as -1-one;
1,2-octanedione-1- [4- (phenylthio) phenyl] -2- (o-benzoyloxime) and ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole Oxime ester photopolymerization initiators such as -3-yl]-, 1- (o-acetyloxime);
Benzoin photopolymerization initiators such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzyldimethyl ketal;
Benzophenone-based photopolymerization initiators such as benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, and 4-benzoyl-4′-methyldiphenyl sulfide;
Thioxanthone photopolymerization initiators such as thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, and 2,4-diisopropylthioxanthone;
2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s -Triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl-4,6-bis (trichloromethyl) -s-triazine, 2,4-bis (trichloro) Methyl) -6-styryl-s-triazine, 2- (naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-naphth-1-yl) -4 , 6-bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl) -6-triazine, and 2,4-trichloromethyl (4'-methoxystyryl) -6 -Triazine photoinitiators such as triazine;
Borate photopolymerization initiator;
Carbazole photopolymerization initiator:
And imidazole-based photopolymerization initiators are used, but are not necessarily limited thereto.
These can be used alone or in admixture of two or more.

  Specific examples of commercially available photopolymerization initiators include Irgacure 907, Irgacure OXE01, and Irgacure OXE02 manufactured by BASF. However, it is not necessarily limited to these.

  Among these, oxime ester-based photopolymerization initiators are preferable because they have high sensitivity and may be added in a small amount, and the transmittance of the light scattering layer is increased. Furthermore, 1,2-octanedione-1- [4- (phenylthio) phenyl] -2- (o-benzoyloxime) does not turn yellow during the heating step, and therefore provides a light scattering layer with high transmittance. Is more preferable.

  The photopolymerization initiator is preferably used in an amount of 1 to 30% by mass in a solid content of 100% by mass of the resin composition for a light scattering layer, and is used in an amount of 1 to 10% by mass from the viewpoint of transmittance. More preferred.

The resin composition for a light scattering layer of the present invention further includes α-acyloxy ester, acylphosphine oxide, methylphenylglyoxylate, benzyl, 9,10-phenanthrenequinone, camphorquinone, ethyl as a sensitizer. Including anthraquinone, 4,4′-diethylisophthalophenone, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, diethylthioxanthone, 4,4′-diethylaminobenzophenone, etc. it can.
The sensitizer can be used in an amount of 0.1 to 150 parts by mass with respect to 100 parts by mass of the photopolymerization initiator.

  The resin composition for a light scattering layer of the present invention may be a monofunctional monomer, an ultraviolet absorber, an antioxidant, a heat stabilizer, a light stabilizer, an antistatic agent, a surfactant, and storage stability, if necessary. Agents, leveling agents, light stabilizers and the like can also be included.

<Thermal reactive compound>
The resin composition for a light scattering layer of the present invention can further contain a heat-reactive compound in order to further impart coating film durability. The thermoreactive compound is non-reactive at room temperature, but exhibits a crosslinking reaction, a polymerization reaction, a polycondensation reaction, or a polyaddition reactivity at a temperature of 100 ° C. or higher (preferably 150 ° C. or higher), for example. A compound. Although the molecular weight of a thermoreactive compound is not specifically limited, Preferably it is 50-2000, More preferably, it is 100-1000.

  Examples of thermally reactive compounds include melamine compounds, benzoguanamine compounds, carbodiimide compounds, epoxy compounds, oxetane compounds, phenolic compounds, benzoxazine compounds, blocked carboxylic acid compounds, blocked isocyanate compounds, acrylate monomers, and silane couplings. One or more compounds selected from the group consisting of agents can be used. Particularly preferred is a thermoreactive compound containing at least a melamine compound or a benzoguanamine compound.

  Examples of the melamine compound or benzoguanamine compound include those having an imino group, a methylol group, or an alkoxymethyl group. Among these, a melamine compound or a benzoguanamine compound containing an alkoxyalkyl group is preferable. When the melamine compound or benzoguanamine compound containing an alkoxyalkyl group is used, the storage stability of the resin composition for a light scattering layer of the present invention is remarkably improved.

  Examples of the melamine compound or benzoguanamine compound containing an alkoxyalkyl group include hexamethoxymethylol melamine, hexabutoxymethylol melamine, tetramethoxymethylol benzoguanamine, tetrabutoxymethylol benzoguanamine and the like, but are not necessarily limited thereto. .

  Specific examples of commercially available melamine compounds include the following. However, it is not necessarily limited to these.

  Nikarak MW-30M, MW-30, MW-22, MS-21, MS-11, MW-24X, MS-001, MX-002, MX-730, MX750, MX-708, MX- manufactured by Sanwa Chemical Co., Ltd. 706, MX-042, MX-035, MX-45, MX-500, MX-520, MX-43, MX-417, MX-410, MX-302, Cymel 300, 301, 303 manufactured by Nihon Cytex Industry 350, 370, 325, 327, 703, 712, 01, 285, 232, 235, 236, 238, 211, 254, 204, 202, 207, My Coat 506, 508, 212, 715, etc. It is not necessarily limited to these.

  Among them, an alkoxyalkyl group-containing melamine compound is preferable. Nikalac MW-30M, MW-30, MW-22, MS-21, MX-45, MX-500, MX-520, MX manufactured by Sanwa Chemical Co., Ltd. -43, MX-302, Cymel 300, 301, 303, 350, 285, 232, 235, 236, 238, My Coat 506, 508 manufactured by Nippon Cytex Industries.

  Specific examples of commercially available benzoguanamine compounds include, for example, Nikalac BX-4000, SB-401, BX-37, SB-355, SB-303, SB301, BL-60, SB-255, SB manufactured by Sanwa Chemical Co., Ltd. -203, SB-201, Scimel 1123 manufactured by Nippon Cytex Industries, Ltd., My Coat 105, 106, 1128, and the like, but are not necessarily limited thereto.

  Among these, Sanka Chemical's Nikalac BX-4000 and SB-401 and Nippon Cytex Industries' Cymel 1123, which are alkoxyalkyl group-containing benzoguanamine compounds, are preferable.

  Examples of the epoxy compound include bisphenol fluorenediglycidyl ether, biscresol fluorenediglycidyl ether, bisphenoxyethanol fluorenediglycidyl ether, neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerol polyglycidyl ether, Methylolpropane polyglycidyl ether, pentaerythritol polyglycidyl ether, diglycerol polyglycidyl ether, sorbitol polyglycidyl ether, diglycidyl terephthalate, diglycidyl o-phthalate, ethylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, and Polypropy Glycol polyol glycidyl ethers such as diglycidyl ether, may be mentioned polyglycidyl isocyanurate, not necessarily limited thereto.

  As the phenol compound, for example, both a novolac type phenol compound obtained by reacting phenols and aldehydes under an acidic catalyst and a resol type phenol compound obtained by reacting under a basic catalyst can be used. Examples of phenols include orthocresol, paracresol, paraphenylphenol, paranonylphenol, 2,3-xylenol, phenol, metacresol, 3,5-xylenol, resorcinol, catechol, hydroquinone, bisphenol A, bisphenol F, bisphenol. B, bisphenol E, bisphenol H, bisphenol S and the like. Examples of aldehydes include formaldehyde and acetaldehyde. Phenols and aldehydes may be used singly or in combination of two or more.

  Examples of the isocyanate compound of the blocked isocyanate compound include hexamethylenediisocyanate, isophorone diisocyanate, toluidine isocyanate, diphenylmethane-4,4′-diisocyanate, diphenylmethane-2,4′-diisocyanate, bis (4-isocyanatocyclohexyl) methane, tetra Diisocyanates such as methylxylylene diisocyanate, isocyanurates of these diisocyanates, trimethylolpropane adduct type, biuret type, prepolymer having an isocyanate residue (low polymer obtained from diisocyanate and polyol), uretdione having an isocyanate residue, etc. However, the present invention is not necessarily limited to this.

  Examples of the blocking agent for the blocked isocyanate compound include phenol (dissociation temperature of 180 ° C. or higher), ε-caprolactam (dissociation temperature of 160 to 180 ° C.), oxime (dissociation temperature of 130 to 160 ° C.), or active methylene (100 to 120 ° C.). ° C) and the like, but is not necessarily limited thereto. Moreover, it is used individually by 1 type or in combination of 2 or more types.

<Leveling agent>
In the light scattering resin composition of the present invention, it is preferable to add a leveling agent in order to improve the leveling property of the composition on the transparent substrate. As the leveling agent, dimethylsiloxane having a polyether structure or a polyester structure in the main chain is preferable. Specific examples of dimethylsiloxane having a polyester structure in the main chain include BYK-310 and BYK-370 manufactured by BYK Chemie. Specific examples of dimethylsiloxane having a polyester structure in the main chain include BYK-323, BYK-330, and BYK-348. Dimethylsiloxane having a polyether structure in the main chain and dimethylsiloxane having a polyester structure in the main chain can be used in combination. In general, the leveling agent is preferably used in an amount of 0.003 to 0.5 mass% in a total of 100 mass% of the inorganic fine particle dispersion.

  Particularly preferred as a leveling agent is a kind of so-called surfactant having a hydrophobic group and a hydrophilic group in the molecule, having a hydrophilic group but low solubility in water, and when added to a coloring composition, It has the characteristics of low surface tension reduction ability, and it is useful to have good wettability to the glass plate despite its low surface tension reduction ability. Those that can sufficiently suppress the chargeability can be preferably used. As a leveling agent having such preferable characteristics, dimethylpolysiloxane having a polyalkylene oxide unit can be preferably used. Examples of the polyalkylene oxide unit include a polyethylene oxide unit and a polypropylene oxide unit, and dimethylpolysiloxane may have both a polyethylene oxide unit and a polypropylene oxide unit.

  In addition, the bonding form of the polyalkylene oxide unit with dimethylpolysiloxane includes a pendant type in which the polyalkylene oxide unit is bonded in the repeating unit of dimethylpolysiloxane, a terminal-modified type in which the end of dimethylpolysiloxane is bonded, and dimethylpolysiloxane. Any of linear block copolymer types in which they are alternately and repeatedly bonded may be used. Dimethylpolysiloxane having a polyalkylene oxide unit is commercially available from Toray Dow Corning Co., Ltd., for example, FZ-2110, FZ-2122, FZ-2130, FZ-2166, FZ-2191, FZ-2203, FZ. -2207, but is not limited thereto.

  An anionic, cationic, nonionic or amphoteric surfactant can be supplementarily added to the leveling agent. Two or more kinds of surfactants may be mixed and used. Anionic surfactants added to the leveling agent as auxiliary agents include polyoxyethylene alkyl ether sulfate, sodium dodecylbenzene sulfonate, alkali salt of styrene-acrylic acid copolymer, sodium alkyl naphthalene sulfonate, alkyl diphenyl ether disulfonic acid Sodium, lauryl sulfate monoethanolamine, lauryl sulfate triethanolamine, ammonium lauryl sulfate, monoethanolamine stearate, sodium stearate, sodium lauryl sulfate, monoethanolamine of styrene-acrylic acid copolymer, polyoxyethylene alkyl ether phosphate Examples include esters.

  Examples of the chaotic surfactant that is supplementarily added to the leveling agent include alkyl quaternary ammonium salts and their ethylene oxide adducts. Nonionic surfactants added to the leveling agent as auxiliary agents include polyoxyethylene oleyl ether, polyoxyethylene lauryl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene alkyl ether phosphate ester, polyoxyethylene sorbitan monostearate And amphoteric surfactants such as alkyl dimethylamino acetic acid betaine and alkylimidazolines, and fluorine-based and silicone-based surfactants.

<Manufacturing method>
The method for producing the resin composition for a light scattering layer of the present invention is not particularly limited, and is used for uniformly mixing the light scattering particles (A), the metal oxide fine particles (B), and the dispersant (C). Any known method that is usually used may be used.

For example, each component constituting the resin composition for a light scattering layer of the present invention is prepared independently and then mixed or kneaded, previously prepared light scattering particles (A), metal oxide fine particles (B) And a method of mixing the dispersant (C) at a time and adding other components as necessary.
From the viewpoint of dispersion stability, a dispersion containing light scattering particles (A) and a metal oxide fine particle dispersion in which metal oxide fine particles (B) are dispersed by a dispersant (C) are obtained in advance. After mixing these, a method of uniformly mixing other components as necessary is preferable. Alternatively, a dispersion containing light scattering particles (A) added with a dispersant (C) and a metal oxide fine particle dispersion obtained by dispersing the metal oxide fine particles (B) with the dispersant (C) in advance. A method is preferred in which these are mixed and mixed, and then the other components are mixed uniformly as necessary.

"Light scattering layer"
The light scattering layer of the present invention is formed using the above-described resin composition for a light scattering layer of the present invention.
The light scattering layer of the present invention is, for example, coated with a resin composition for a light scattering layer on a light-transmitting substrate such as glass and dried, and the obtained coating film is heated or irradiated with ultraviolet rays or electron beams. It is obtained by applying and curing.
As a coating method, a known method can be used,
For example using lots or wire bars;
In addition, various coating methods such as micro gravure coating, gravure coating, die coating, curtain coating, lip coating, slot coating or spin coating can be used.
When patterning the light scattering layer on the translucent substrate using the resin composition for the light scattering layer, 1) a method of directly patterning on the translucent substrate by a printing method, and 2) by a photolithography method A patterning method can be used.
1) The printing method can be performed by a normal printing method such as flexographic printing, gravure printing, gravure offset printing, offset printing, reverse offset printing, screen printing, letterpress printing, and ink jet printing.
2) In the photolithography method, a photosensitive resin composition for a light scattering layer is used. In that case, 2-1) after directly applying and drying the resin composition for a light scattering layer of the present invention on a translucent substrate, or 2-2) using a solvent on a film substrate (hereinafter referred to as a separate film). After applying the dissolved resin composition, the photosensitive dry film obtained by drying the solvent is attached to the light-transmitting substrate, and then adhered to the light-transmitting substrate and air bubbles by laminating or vacuum laminating. After the light scattering layer is formed by removing and the like, pattern formation is performed by a solution development or alkali development process.
Although the thickness of a light-scattering layer is not specifically limited, Usually, it is preferable that it is 0.5-20 micrometers.

In addition, when the light scattering layer of the present invention is applied to an organic EL device, if the wavelength dependency of the refractive index of the light scattering layer is large, there is a problem that the luminance changes in each color pixel and the white balance is lost. The scattering layer preferably has a small difference in refractive index at each wavelength. In particular,
When the refractive indexes at wavelengths of 473 nm, 594 nm, and 633 nm measured by a prism coupler (Prism Coupler 2010 / M manufactured by Metricon) are n (473), n (594), and n (633), respectively, n (473) / The value of n (594), n (633) / n (594) is preferably 0.2 to 2.0, more preferably 0.5 to 1.5, and even more preferably 0. .95 to 1.05 is preferable.

"Organic EL device"
The organic EL device of the present invention includes an organic EL element having a light scattering layer formed from a resin composition for a light scattering layer. The structure of the organic EL element is not particularly limited. As an example of the basic structure, a translucent substrate, at least one organic layer (organic EL layer) including a light emitting layer, a back electrode, and a TFT substrate are provided on the translucent substrate. One example is a bottom emission structure in which layers are sequentially stacked and light is extracted from the anode side. As another example, at least one organic layer (organic EL layer) including a back electrode, a light emitting layer, a translucent electrode, and a sealing layer are sequentially stacked on a TFT substrate, and light is extracted from the cathode side. The structure of top emission can be mentioned. These methods and techniques are described in Shinji Kido, “All about organic EL”, published by Nihon Jitsugyo Shuppansha (published in 2003).

A structure of an organic EL device according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a schematic cross-sectional view of a bottom emission structure which is one example of the present embodiment.
The organic EL device 1 of the present embodiment includes at least one including a light scattering layer 12, a light-transmitting first electrode (anode, light-transmitting electrode) 13, and a light-emitting layer on a light-transmitting substrate 11. Two organic layers (organic EL layers) 14 and a second electrode (cathode, back electrode) 15 having light reflectivity are sequentially laminated.
The light scattering layer 12 is a layer formed using the above-described resin composition for a light scattering layer of the present invention.

The organic EL device can be used for an organic EL lighting device or an organic EL display device.
In an active matrix organic EL display device, a plurality of light emitting layers that emit different colors are arrayed in a matrix. In addition, a TFT substrate on which a pixel electrode composed of a second electrode (cathode, back electrode) 15 and a TFT (thin film transistor) as a switching element thereof is formed for each dot is provided.

As a site where the light scattering layer of the present invention is provided, for example, the following cases can be considered.
In the case of the bottom emission structure, for example, the following cases can be considered.
(1) Translucent substrate / light scattering layer / translucent electrode / organic EL layer / back electrode (2) Light scattering layer / translucent substrate / translucent electrode / organic EL layer / back electrode (3) Light Scattering layer / translucent substrate / light scattering layer / translucent electrode / organic EL layer / back electrode

In the case of the top emission structure, for example, the following cases can be considered.
(4) Substrate / Back electrode / Organic EL layer / Translucent or semi-transparent electrode / Light scattering layer / Protective substrate (5) Substrate / Back electrode / Organic EL layer / Translucent or semi-transparent electrode / Sealing layer / Light scattering layer / Protective substrate (6) Substrate / Back electrode / Organic EL layer / Translucent or semi-transparent electrode / Sealing layer / Protective substrate / Light scattering layer (7) Substrate / Back electrode / Organic EL layer / translucent or semi-transparent electrode / light scattering layer / protective substrate / light scattering layer At this time, an organic EL element including a light scattering layer between the translucent substrate and the translucent electrode is included. Those are more preferable from the viewpoint of light extraction efficiency.

As a manufacturing method of a bottom emission structure, after providing a light-scattering layer on a translucent substrate as mentioned above, a translucent electrode is formed on a light-scattering layer. As a material for the translucent electrode, a metal, an alloy, a metal oxide, an electrically conductive compound, or a mixture thereof can be used, and a material having a work function of 4 eV or more is preferable.
As a specific example,
Conductive metal oxides such as tin oxide, zinc oxide, indium oxide, and indium tin oxide (ITO);
Metals such as gold, silver, chromium and nickel;
Other inorganic conductive materials such as copper iodide and copper sulfide;
Organic conductive materials such as polyaniline, polythiophene, PEDOT / PSS, and polypyrrole;
And mixtures or laminates thereof.
A conductive metal oxide is preferable, and ITO is particularly preferable in terms of productivity, high conductivity, translucency, and the like.

Further, in order to control the injection property of electrons or holes into the organic EL layer while maintaining the translucency, it is possible to laminate a metal and ITO to form a translucent electrode. Here, the thickness of the ultrathin metal is preferably 0.1 nm to 20 nm from the viewpoint of maintaining translucency. In addition, as metals here,
Alkali metals (such as Li, Na, and K) and fluorides thereof;
Alkaline earth metals (such as Mg and Ca) and their fluorides;
Gold, silver, lead, aluminum, sodium-potassium alloys, and mixed metals containing them;
Lithium-aluminum alloys and mixed metals containing them;
LiF / Al alloys and mixed metals containing them;
Magnesium-silver alloys and mixed metals containing them;
And rare earth metals such as indium and ytterbium.
Of these, materials having a work function of 4 eV or less are preferable, and aluminum, lithium-aluminum alloys and mixed metals thereof, magnesium-silver alloys and mixed metals thereof, and the like are more preferable.

The film thickness of the translucent electrode can be appropriately selected depending on the material, but is usually preferably about 50 nm to 300 nm.
As a method for forming the translucent electrode, an electron beam method, a sputtering method, a resistance heating vapor deposition method, a chemical reaction method (such as a sol-gel method), and a method of applying a dissolved material or a dispersion material are used.
The formed translucent electrode is etched to form a pattern as desired. Furthermore, the driving voltage of the apparatus can be lowered and the light emission efficiency can be increased by washing and other processing. For example, in the case of ITO, UV-ozone treatment is effective.

Next, after providing a translucent electrode on the surface of the light scattering layer as described above, an organic EL layer is formed on the surface of the translucent electrode.
The organic EL layer includes a light emitting layer, and may include a hole injection layer, a hole transport layer, an electron injection layer, an electron transport layer, or the like. Each of these layers may have other functions.

  The material of the hole injection layer and the hole transport layer has either a function of injecting holes from the anode, a function of transporting holes, or a function of blocking electrons injected from the cathode. I just need it. Specific examples include carbazole derivatives, triazole derivatives, oxazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, styrylanthracene derivatives. , Fluorenone derivatives, hydrazone derivatives, stilbene derivatives, silazane derivatives, aromatic tertiary amine compounds, styrylamine compounds, aromatic dimethylidin compounds, porphyrin compounds, polysilane compounds, poly (N-vinylcarbazole) derivatives, anilines Examples thereof include copolymers, thiophene oligomers, and conductive polymer oligomers such as polythiophene.

The material of the light emitting layer can inject holes from the anode, hole injection layer, or hole transport layer when an electric field is applied, and can inject electrons from the cathode, electron injection layer, or electron transport layer. Any layer can be used as long as it can form a layer having a function, a function of transferring injected charges, and a function of emitting light by providing a recombination field of holes and electrons.
For example, benzoxazole derivatives, benzimidazole derivatives, benzothiazole derivatives, styrylbenzene derivatives, polyphenyl derivatives, diphenylbutadiene derivatives, tetraphenylbutadiene derivatives, naphthalimide derivatives, coumarin derivatives, perylene derivatives, perinone derivatives, oxadiazole derivatives, aldazines Derivatives, pyralidine derivatives, cyclopentadiene derivatives, bisstyrylanthracene derivatives, quinacridone derivatives, pyrrolopyridine derivatives, thiadiazolopyridine derivatives, cyclopentadiene derivatives, styrylamine derivatives, aromatic dimethylidin compounds, and 8-quinolinol derivative metal complexes or rare earths Various metal complexes represented by complexes;
and,
And polymer compounds such as polythiophene, polyphenylene, and polyphenylene vinylene.

  Specific examples of the light-emitting material that becomes the light-emitting layer are listed below, but are not limited to the following specific examples.

  Blue light emission is obtained by using, for example, perylene, 2,5,8,11-tetra-t-butylperylene (abbreviation: TBP), a 9,10-diphenylanthracene derivative, or the like as a guest material. In addition, styrylarylene derivatives such as 4,4′-bis (2,2-diphenylvinyl) biphenyl (abbreviation: DPVBi), 9,10-di-2-naphthylanthracene (abbreviation: DNA), and 9,10-bis It can also be obtained from an anthracene derivative such as (2-naphthyl) -2-tert-butylanthracene (abbreviation: t-BuDNA). A polymer such as poly (9,9-dioctylfluorene) may also be used.

Green light is emitted from coumarin dyes such as coumarin 30 and coumarin 6, bis [2- (2,4-difluorophenyl) pyridinato] picolinatoiridium (abbreviation: FIrpic), and bis (2-phenylpyridinato) acetyl. It can be obtained by using acetonatoiridium (abbreviation: Ir (ppy) (acac)) or the like as a guest material. Further, metals such as tris (8-hydroxyquinoline) aluminum (abbreviation: Alq ₃ ), BAlq, Zn (BTZ), and bis (2-methyl-8-quinolinolato) chlorogallium (abbreviation: Ga (mq) ₂ Cl) It can also be obtained from the complex. A polymer such as poly (p-phenylene vinylene) may also be used.

Light emission from orange to red is caused by rubrene, 4- (dicyanomethylene) -2- [p- (dimethylamino) styryl] -6-methyl-4H-pyran (abbreviation: DCM1), 4- (dicyanomethylene) -2- Methyl-6- (9-julolidyl) ethynyl-4H-pyran (abbreviation: DCM2), 4- (dicyanomethylene) -2,6-bis [p- (dimethylamino) styryl] -4H-pyran (abbreviation: BisDCM) Bis [2- (2-thienyl) pyridinato] acetylacetonatoiridium (abbreviation: Ir (thp) ₂ (acac)), and bis (2-phenylquinolinato) acetylacetonatoiridium (abbreviation: Ir (pq) ( acac)) and the like as a guest material. It can also be obtained from a metal complex such as bis (8-quinolinolato) zinc (abbreviation: Znq ₂ ) or bis [2-cinnamoyl-8-quinolinolato] zinc (abbreviation: Znsq ₂ ). A polymer such as poly (2,5-dialkoxy-1,4-phenylenevinylene) may be used.

  White light emission defines the energy level of each layer of the organic EL laminated structure and emits light using tunnel injection (European Patent No. 0390551). A light emitting element is described (Japanese Patent Laid-Open No. 3-230584), a light emitting layer having a two-layer structure is described (Japanese Patent Laid-Open No. 2-220390 and Japanese Patent Laid-Open No. Hei 2-216790), and a light emitting layer Are made of materials having different emission wavelengths (JP-A-4-51491), a blue light emitter (fluorescent peak 380 to 480 nm) and a green light emitter (480 to 580 nm). Laminated and further containing a red phosphor (Japanese Patent Laid-Open No. 6-207170), blue light emitting layer contains blue fluorescent dye, green light emitting layer is red fluorescent It includes an area containing iodine, etc. construction of what (JP-A-7-142169) and the like further containing a green phosphor.

The material for the electron injection layer and the electron transport layer only needs to have a function of injecting electrons from the cathode, a function of transporting electrons, or a function of blocking holes injected from the anode.
As a specific example,
Triazole derivatives, oxazole derivatives, oxadiazole derivatives, fluorenone derivatives, anthraquinodimethane derivatives, anthrone derivatives, diphenylquinone derivatives, thiopyrandioxide derivatives, carbodiimide derivatives, fluorenylidenemethane derivatives, distyrylpyrazine derivatives, naphthaleneperylene, etc. A metal complex of a heterocyclic tetracarboxylic anhydride, a silole derivative, a phthalocyanine derivative, and an 8-quinolinol derivative;
Examples thereof include various metal complexes represented by metal complexes having metal phthalocyanine, benzoxazole, and benzothiazole as a ligand.

The thicknesses of the hole injection layer, the hole transport layer, the light emitting layer, the electron injection layer, and the electron transport layer are not particularly limited, but are preferably 10 nm to 500 nm. Each layer may have a single layer structure, or a multilayer structure having the same composition or different compositions.
The formation method of these layers is not particularly limited, but resistance heating evaporation method, electron beam evaporation method, sputtering method, molecular lamination method, coating method (spin coating method, casting method, dip coating method, etc.), A method such as the LB (Langmuir Blodgett) method is used. The resistance heating vapor deposition method and the coating method are preferable.

Finally, a back electrode is formed on the surface of the organic EL layer.
The back electrode which is a negative electrode supplies electrons to an electron injection layer, an electron transport layer, a light emitting layer, or the like, and is selected in consideration of adhesion to an adjacent layer, ionization potential, stability, and the like.
The back electrode preferably has light reflectivity.
As a material for the back electrode, metals, alloys, conductive metal oxides, other conductive compounds, and mixtures thereof can be used.
As a specific example,
Alkali metals (such as Li, Na, and K) and fluorides thereof;
Alkaline earth metals (such as Mg and Ca) and their fluorides;
Gold, silver, lead, aluminum, sodium-potassium alloys, and mixed metals containing them;
Lithium-aluminum alloys and mixed metals containing them;
LiF / Al alloys and mixed metals containing them;
Magnesium-silver alloys and mixed metals containing them;
And rare earth metals such as indium and ytterbium.
A material having a work function of 4 eV or less is preferable, and aluminum, a lithium-aluminum alloy and a mixed metal thereof, a magnesium-silver alloy and a mixed metal thereof, and the like are more preferable.
Further, in order to control the injection property of electrons or holes into the organic layer while maintaining the light reflectivity, the back electrode material and ITO can be laminated to form the back electrode.

  Although the film thickness of a back electrode can be suitably selected with material, 100 nm-1 micrometer are preferable normally. For the production of the back electrode, methods such as electron beam vapor deposition, sputtering, resistance heating vapor deposition, and coating are used. A metal can be vapor-deposited alone or two or more components can be vapor-deposited simultaneously. It is possible to deposit a plurality of metals at the same time to form an alloy electrode, or a previously prepared alloy may be deposited.

  As a manufacturing method of the top emission structure, there is a method in which a back electrode, an organic EL layer, a translucent electrode, and a light scattering layer are sequentially laminated on a substrate such as a TFT. The back electrode, organic EL layer, translucent electrode, light scattering layer material, lamination method, and the like described here may be the same as those described in the bottom emission manufacturing method.

  In addition, in order to improve the stability of the organic EL element against temperature, humidity, atmosphere, etc., a protective layer may be provided on the element surface or between layers, or the whole element may be covered or sealed with a resin or the like. . In particular, when covering or sealing the entire device, a molten glass, a photocurable resin that is cured by light, or the like is preferably used.

  The current applied to the organic EL element having the light scattering layer of the present invention is usually a direct current, but a pulse current or an alternating current may be used. The current value and the voltage value are not particularly limited as long as the element is within a range not destroying the element. However, considering the power consumption and life of the element, it is desirable to efficiently emit light with as little electrical energy as possible.

  The driving method of the organic EL element having the light scattering layer of the present invention can be driven not only by the passive matrix method but also by the active matrix method. These methods and techniques are described in Shinji Kido, “All about organic EL”, published by Nihon Jitsugyo Shuppansha (published in 2003).

  The light emitted from the organic EL layer by applying a voltage between the translucent electrode and the back electrode of the organic EL device formed as described above is transmitted from the translucent electrode through the light scattering layer. Further, the light is transmitted through the translucent substrate and taken out. When the light emitted from the organic EL layer passes through the light scattering layer, the light is scattered and the directivity is changed, so that the totally reflected light is prevented from being guided.

The organic EL device having the light scattering layer of the present invention can be applied in various forms.
For example, the organic EL device comprising the light scattering layer of the present invention can be used as a full color display device.
The main methods of the full color method include a three-color painting method, a color conversion method, and a color filter method. In the three-color coating method, an evaporation method using a shadow mask, an ink jet method, and a printing method can be used. In addition, Special Table 2002-53482, S.I. T.A. Lee, et al. Proceedings of SID'02, p. 784 (2002) can also be used. The laser thermal transfer method (also referred to as Laser Induced Thermal Imaging, LITI method) can also be used. In the color conversion method, a light emitting layer that emits color light is used to convert green and red, which have wavelengths longer than colors, through a color conversion (CCM) layer in which fluorescent dyes are dispersed. The color filter method is a method of extracting light of three primary colors through a color filter for liquid crystal using a white light emitting organic EL light emitting element. In addition to these three primary colors, a part of white light is extracted and used for light emission. As a result, the luminous efficiency of the entire device can be increased.

  Furthermore, the organic EL element having the light scattering layer of the present invention may adopt a microcavity structure. This is because the organic EL element has a structure in which the light emitting layer is sandwiched between the anode and the cathode, and the emitted light causes multiple interference between the anode and the cathode, but the reflectance and transmission of the anode and the cathode. This is a technology that actively uses the multiple interference effect and controls the emission wavelength extracted from the device by appropriately selecting the optical characteristics such as the rate and the film thickness of the organic layer sandwiched between them. . Thereby, it is also possible to improve the emission chromaticity. For the mechanism of this multiple interference effect, see J.A. Yamada et al., AM-LCD Digest of Technical Papers, OD-2, p. 77-80 (2002).

  The organic EL element having the light scattering layer of the present invention may adopt a multi-photon emission element structure. Multi-photon emission is an element structure in which a plurality of light emitting units including at least one light emitting layer are stacked so as to be connected in series via a charge generation layer (see, for example, Japanese Patent No. 3933593). According to such an element structure, light emission from a plurality of light emitting layers can be obtained simultaneously with the same amount of current as that of one unit element, so that current efficiency and external quantum efficiency equivalent to the number of light emitting units can be obtained. .

  As described above, the organic EL device having the light scattering layer of the present invention is used as a flat panel display such as a wall-mounted television or various flat light emitters, and further as a light source such as a copying machine or a printer, a liquid crystal display or an instrument. Application to a light source such as a light source, a display board, a marker lamp, etc.

  EXAMPLES The present invention will be described more specifically with reference to the following examples. However, the following examples do not limit the scope of rights of the present invention. Unless otherwise specified, “part” represents “part by mass” and “%” represents mass%.

  First, the particle size of the light scattering particles (A) and the metal oxide fine particles (B), the double bond equivalent of the ethylenically unsaturated monomer (D) and the resin (E), and 5% thermal decomposition of the resin (E) A method for measuring the temperature, the mass average molecular weight (Mw) of the resin (E), and the acid value of the resin (E) will be described.

(Particle size)
The particle size was measured using “Nanotrack UPA” manufactured by Nikkiso Co., Ltd.

(Double bond equivalent)
Double bond equivalent is a measure of the amount of double bonds contained in a molecule. If the compounds have the same molecular weight, the amount of double bonds introduced increases as the double bond equivalent value decreases. .
The double bond equivalent was calculated by the following formula.
[Double bond equivalent] = [molecular weight of monomer component having double bond] / [mass ratio of monomer component having double bond to all monomers in molecule]

(5% thermal decomposition temperature)
As a 5% thermal decomposition temperature, a differential thermothermal mass simultaneous measurement device EXSTER TG / DTA6300 manufactured by Seiko Instruments Inc. was used and measured at a heating rate of 10 ° C./min in an air stream of 200 ml / min. The temperature at which the mass of the resin sample was 95% before the temperature increase was determined.

(Mass average molecular weight (Mw))
The mass average molecular weight (Mw) was measured using gel permeation chromatography GPC-101 manufactured by Showa Denko K.K. Using THF (tetrahydrofuran) as a solvent, the molecular weight in terms of polystyrene was determined.

(Acid value)
The acid value (JIS acid value) was determined by the following method.
1 g of a sample was dissolved in a titration solvent in which xylene and dimethylformamide were mixed at a mass ratio of 1: 1. Titration was performed using a 0.1 mol / L potassium hydroxide solution (solvent is ethanol) by potentiometric titration. The acid value was calculated from the following formula from the titration amount up to the end point of the potassium hydroxide solution with the inflection point on the titration curve as the end point.
A = (BC) × f × D / S
(The symbols in the formula are as follows.
A: Acid value (mgKOH / g), B: Addition amount (mL) of potassium hydroxide solution in this test, C: Addition amount (mL) of potassium hydroxide solution in blank test (measured without using measurement sample) , F: factor of potassium hydroxide solution, D: concentration conversion value = 5.611 mg / mL (equivalent amount of potassium hydroxide of 1 mL of 0.1 mol / L potassium hydroxide solution), S: sample (g))

(1) Preparation of light scattering particle (A) dispersion (Production Example 101)
Under N ₂ atmosphere, 50 g of trifluoroethyl methacrylate, 40 g of methyl methacrylate, 5 g of allyl methacrylate, and 5 g of isobornyl acrylate were added to 566.7 g of water and stirred vigorously. An aqueous solution in which 0.167 g of '-azobis (2-amidinopropane) dihydrochloride (hereinafter referred to as “V-50”) was dissolved in a very small amount of water was added at once and polymerized at 80 ° C. for 8 hours. After the polymerization, methoxypropyl acetate was added, water was removed by stripping, and a light scattering particle dispersion (A-1) (acrylic resin particle dispersion) adjusted to a solid content of 20% by mass was produced.
The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-1) is 290 nm, the content ratio of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 10%, the variation coefficient is 5%, and the refractive index. Was 1.45.

(Production Examples 102 to 108)
Light scattering particle dispersions (A-2) to (A-8) were obtained in the same manner as in Production Example 101 except that the charged composition was changed to that shown in Table 1. Table 1 shows the average particle diameter of the obtained light scattering particle dispersion, the content of particles of 600 nm or more, the variation coefficient, and the refractive index with respect to the total amount of the light scattering particles.

(Production Example 109)
Polymerization and stripping were carried out in the same composition as in Production Example 102 except that the amount of water was 900 g, to produce a light scattering particle dispersion (A-9) (acrylic resin particle dispersion) having a solid content of 20% by mass. did.
The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-9) is 120 nm, the content of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 4%, the variation coefficient is 5%, and the refractive index. Was 1.46.

(Production Example 110)
Polymerization and stripping were carried out in the same composition as in Production Example 2 except that the amount of water was changed to 400 g to produce a light scattering particle dispersion (A-10) (acrylic resin particle dispersion) having a solid content of 20% by mass. did.
The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-10) is 305 nm, the content of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 12%, the variation coefficient is 6%, and the refractive index. Was 1.46.

(Production Example 111)
Under N ₂ atmosphere, 50 g of trifluoroethyl methacrylate, 40 g of methyl methacrylate, 5 g of allyl methacrylate, and 5 g of isobornyl metallate were added to a mixed solvent of 365 g of methanol and 201.7 g of water, and the mixture was vigorously stirred and heated to 60 ° C. Then, an aqueous solution in which 0.167 g of “V-50” was dissolved in a very small amount of water was added all at once and polymerized at 60 ° C. for 8 hours. After the polymerization, methoxypropyl acetate was added, and methanol and water were removed by stripping to prepare a light scattering particle dispersion (A-11) (acrylic resin particle dispersion) adjusted to a solid content of 20% by mass.
The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-11) is 420 nm, the content ratio of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 12%, the variation coefficient is 11%, and the refractive index. Was 1.46.

(Production Examples 112-120)
Light scattering particle dispersions (A-12) to (A-20) were obtained in the same manner as in Production Example 101 except that the charged composition was changed to that shown in Table 1. Table 1 shows the average particle diameter of the obtained light scattering particle dispersion, the content of particles of 600 nm or more, the variation coefficient, and the refractive index with respect to the total amount of the light scattering particles.

(Production Example 121)
Polymerization and stripping were carried out with the same composition as in Production Example 115 except that 0.167 g of “V-50” dissolved in a very small amount of water was gradually added dropwise over 1 hour, and the solid content was 20% by mass. A light scattering particle dispersion (A-18) (acrylic resin particle dispersion) was prepared.
The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-21) is 380 nm, the content of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 15%, the variation coefficient is 40%, and the refractive index. Was 1.46.

(Production Example 122)
A light scattering particle dispersion (A-22) having a solid content of 20% by mass was polymerized and stripped in the same composition as in Production Example 1 except that the amount of methyl methacrylate was 45 g and isobornyl acrylate was not used. (Acrylic resin particle dispersion) was prepared.
The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-22) is 310 nm, the content ratio of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 6%, the variation coefficient is 10%, and the refractive index. Was 1.45.

(Production Example 123)
In a N ₂ atmosphere, 50 g of trifluoroethyl methacrylate, 40 g of methyl methacrylate, 5 g of allyl methacrylate, and 5 g of adamantyl acrylate were added to a mixed solvent of 409.2 g of methanol and 157.5 g of water. An aqueous solution prepared by dissolving 0.167 g of “V-50” in a very small amount of water was added at once and polymerized at 40 ° C. for 8 hours. After the polymerization, methoxypropyl acetate was added, and methanol and water were removed by stripping to prepare a light scattering particle dispersion (A-20) (acrylic resin particle dispersion) adjusted to a solid content of 20% by mass.
The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-23) is 620 nm, the content of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 15%, the variation coefficient is 15%, and the refractive index. Was 1.46.

(Production Example 124)
A light scattering particle dispersion (A-24) was obtained in the same manner as in Production Example 123 except that the charged composition was changed to that shown in Table 1. The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-24) is 632 nm, the content of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 18%, the variation coefficient is 12%, and the refractive index. Was 1.46.

(Production Example 125)
In both cases, light is dispersed with respect to 100 parts by mass of the light scattering particle dispersion (A-4) obtained by polymerizing monomers of trifluoroethyl methacrylate: methyl methacrylate: allyl methacrylate: adamantyl acrylate = 50: 40: 5: 5 (mass ratio). 30 parts by volume of the scattering particle dispersion (A-23) was added to obtain a light scattering particle dispersion (A-25). The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-25) is 310 nm, the content ratio of particles of 600 nm or more with respect to the total amount of the light scattering particles is 31%, the variation coefficient is 25%, and the refractive index. Was 1.46.

(Production Example 126)
In both cases, 100 parts by mass of the light scattering particle dispersion (A-15) obtained by polymerizing a monomer of trifluoroethyl methacrylate: methyl methacrylate: allyl methacrylate: cyclohexyl acrylate = 50: 40: 5: 5 (mass ratio) 30 parts by volume of the scattering particle dispersion (A-24) was added to obtain a light scattering particle dispersion (A-26). The average particle diameter of the light scattering particles in the obtained light scattering particle dispersion (A-26) is 390 nm, the content ratio of the particles of 600 nm or more with respect to the total amount of the light scattering particles is 31%, the variation coefficient is 27%, and the refractive index. Was 1.46.

(Production Examples 127 and 128)
As shown in Table 1, in place of 5 g of isobornyl acrylate, 5 parts of propyl acrylate having an alkyl chain having 3 carbon atoms (Production Example 127) and hexacosyl acrylate having an alkyl chain having 26 carbon atoms are used. Light scattering particle dispersions (A-27) and (A-28) were obtained in the same manner as in Production Example 101 except that 5 parts (Production Example 128) were used. Table 1 shows the average particle diameter of the obtained light scattering particle dispersion, the content of particles of 600 nm or more, the variation coefficient, and the refractive index with respect to the total amount of the light scattering particles.

(2) Preparation of dispersant (C) solution (Production Example 201)
In a 4-neck flask equipped with a stirrer, reflux condenser, dry air inlet tube, and thermometer, 80.0 parts of biphenyltetracarboxylic dianhydride, pentaerythritol triacrylate (manufactured by Nippon Kayaku Co., Ltd., product) Name: KAYARAD PET-30) 250.0 parts, hydroquinone 0.16 parts, and cyclohexanone 141.2 parts were charged, and the temperature was raised to 85 ° C. Next, 1.65 parts of 1,8-diazabicyclo [5.4.0] -7-undecene was added as a catalyst and reacted at 85 ° C. for 8 hours. After confirming that the peaks of acid anhydride groups, that is, peaks near 1780 cm ⁻¹ and 1850 cm ^−1, disappeared by IR measurement of the reaction product, the reaction product was cooled to stop the reaction. At this point, the acid value of the reaction product was measured by a conventional method and found to be 93 mgKOH / g. Subsequently, 77.3 parts of glycidyl methacrylate and 33.9 parts of cyclohexanone were added to this solution, and then 2.65 parts of dimethylbenzylamine was added as a catalyst, followed by reaction at 85 ° C. for 6 hours. While the reaction temperature is continued, the acid value of the reaction product is measured periodically. When the acid value of the reaction product becomes 7 mgKOH / g or less, the reaction solution is cooled to room temperature, and the dispersant solution has a solid content of 70% by mass. (C-1) was obtained. The acid value was 5 mgKOH / g, and the mass average molecular weight (Mw) was 3130.

(Production Example 202)
In a four-necked flask equipped with a stirrer, reflux condenser, dry air inlet tube, thermometer, 80.0 parts biphenyltetracarboxylic dianhydride, 250.0 parts pentaerythritol triacrylate, 0.24 parts methylhydroquinone, cyclohexanone 217.83 parts were added and the temperature was raised to 85 ° C. Next, 1,8-diazabicyclo [5.4.0] -7-undecene as a catalyst 65 parts was added and reacted at 90 ° C. for 8 hours. After confirming that the peaks of acid anhydride groups, that is, peaks near 1780 cm ⁻¹ and 1850 cm ^−1, disappeared by IR measurement of the reaction product, the reaction product was cooled to stop the reaction. At this point, the acid value of the reaction product was measured by a conventional method and found to be 93 mgKOH / g. Subsequently, 134.3 parts of lauryl glycidyl ether, 86.9 parts of cyclohexanone, and 2.82 parts of dimethylbenzylamine were added to the solution, and the temperature was gradually raised and reacted at 100 degrees. The acid value of the reaction product was measured periodically while continuing the reaction temperature. When the acid value of the reaction product became 7 mgKOH / g or less, the reaction product was cooled to room temperature and a dispersant solution (C- 2) was obtained. The acid value was 4 mgKOH / g, and the mass average molecular weight (Mw) was 3500.

(Production Example 203)
A reaction vessel equipped with a gas introduction tube, a thermometer, a condenser, and a stirrer was charged with 108 parts of 1-thioglycerol, 174 parts of pyromellitic anhydride, 650 parts of methoxypropyl acetate, and 0.2 part of monobutyltin oxide as a catalyst. After replacing with nitrogen gas, the reaction was carried out at 120 ° C. for 5 hours (first step). It was confirmed by acid value measurement that 95% or more of the acid anhydride was half-esterified.
Next, 160 parts of the compound obtained in the first step, 200 parts of 2-hydroxypropyl methacrylate, 200 parts of ethyl acrylate, 150 parts of t-butyl acrylate, 200 parts of 2-methoxyethyl acrylate, 200 parts of methyl acrylate Parts, 50 parts of methacrylic acid and 663 parts of methoxypropyl acetate, the reaction vessel was heated to 80 ° C., and 1.2 parts of 2,2′-azobis (2,4-dimethylvaleronitrile) was added. The reaction was continued for 2 hours (second step). It was confirmed that 95% had reacted by solid content measurement.
Finally, 500 parts of a 50% methoxypropyl acetate solution of the compound obtained in the second step, 27 parts of 2-methacryloyloxyethyl isocyanate (MOI) and 0.1 part of hydroquinone were charged, and 2270 cm based on isocyanate groups by IR. ^The reaction was continued until the disappearance of the peak at ^-1 was confirmed (third step). After confirming the disappearance of the peak, the reaction solution was cooled and the solid content was adjusted with methoxypropyl acetate to obtain a dispersant solution (C-3) having a solid content of 50% by mass. The obtained dispersant had an acid value of 68.4 mgKOH / g, an unsaturated double bond equivalent of 1593, and a mass average molecular weight of 13,000.

(3) Production of metal oxide fine particle dispersion (BC-1) (Production Example 301)
To 10 g of titanium oxide (TiO ₂ ) fine particles having an average primary particle diameter of 15 nm, 84.3 g of methoxypropyl acetate as a dispersion medium, and 5.7 g (about 3.3) of the dispersant solution (C-1) obtained in Production Example 201. 99 g of dispersant) was added. A two-stage dispersion treatment was performed on the obtained liquid. As pre-dispersion, zirconia beads (average diameter: 1.25 mm) were used as media and dispersed for 1 hour with a paint shaker. As this dispersion, zirconia beads (average diameter: 0.1 mm) were used as media, and the dispersion was carried out for 7 hours with a disperser UAM-015 manufactured by Kotobuki Industries Co., Ltd. As described above, a metal oxide fine particle dispersion (BC-1) (titanium oxide fine particle dispersion) was produced. The average particle diameter of the titanium oxide fine particles in the dispersion was 80 nm. The dispersion contains 50% non-volatile components, titanium oxide contained in 100% non-volatile components is about 71.5%, and the dispersant is about 28.5%.

(Production Example 302)
To 10 g of titanium oxide (TiO ₂ ) fine particles having an average primary particle diameter of 15 nm, 83.3 g of methoxypropyl acetate as a dispersion medium, and 6.7 g of the dispersant solution (C-2) obtained in Production Example 202 (about 4. 02 g of dispersant) was added. A two-stage dispersion treatment was performed on the obtained liquid. As pre-dispersion, zirconia beads (average diameter: 1.25 mm) were used as media and dispersed for 1 hour with a paint shaker. As this dispersion, zirconia beads (average diameter: 0.1 mm) were used as media, and the dispersion was carried out for 7 hours with a disperser UAM-015 manufactured by Kotobuki Industries Co., Ltd. As described above, a metal oxide fine particle dispersion (BC-2) (titanium oxide fine particle dispersion) was produced. The average particle diameter of the titanium oxide fine particles in the dispersion was 60 nm. The dispersion contains 50% non-volatile components, titanium oxide contained in 100% non-volatile components is about 71.3%, and the dispersant is about 28.7%.

(Production Example 303)
To 10 g of titanium oxide (TiO ₂ ) fine particles having an average primary particle diameter of 15 nm, 88.3 g of methoxypropyl acetate as a dispersion medium, and 1.7 g of the dispersant solution (C-2) obtained in Production Example 202 (about 1. 02 g of dispersant) was added. A two-stage dispersion treatment was performed on the obtained liquid. As pre-dispersion, zirconia beads (average diameter: 1.25 mm) were used as media and dispersed for 1 hour with a paint shaker. As this dispersion, zirconia beads (average diameter: 0.1 mm) were used as media, and the dispersion was carried out for 7 hours with a disperser UAM-015 manufactured by Kotobuki Industries Co., Ltd. As described above, a metal oxide fine particle dispersion (BC-3) (titanium oxide fine particle dispersion) was produced. The average particle diameter of the titanium oxide fine particles in the dispersion was 70 nm. The dispersion contains 50% non-volatile components, titanium oxide contained in 100% non-volatile components is about 90.7%, and the dispersant is about 9.3%.

(Production Example 304)
To 10 g of titanium oxide (TiO ₂ ) fine particles having an average primary particle diameter of 15 nm, 86.7 g of methoxypropyl acetate as a dispersion medium, and 3.3 g (about 1.3) of the dispersant solution (C-2) obtained in Production Example 202. 98 g of dispersant) was added. A two-stage dispersion treatment was performed on the obtained liquid. As pre-dispersion, zirconia beads (average diameter: 1.25 mm) were used as media and dispersed for 1 hour with a paint shaker. As this dispersion, zirconia beads (average diameter: 0.1 mm) were used as media, and the dispersion was carried out for 7 hours with a disperser UAM-015 manufactured by Kotobuki Industries Co., Ltd. As described above, a metal oxide fine particle dispersion (BC-4) (titanium oxide fine particle dispersion) was produced. The average particle diameter of the titanium oxide fine particles in the dispersion was 50 nm. The dispersion contains 50% non-volatile components, titanium oxide contained in 100% non-volatile components is about 83.5%, and the dispersant is 16.5%.

(Production Example 305)
10 g of titanium oxide (TiO ₂ ) fine particles having an average primary particle diameter of 15 nm, 82.0 g of methoxypropyl acetate as a dispersion medium, and 8 g of dispersant solution (C-3) obtained in Production Example 203 (about 4 g of dispersant) Added). A two-stage dispersion treatment was performed on the obtained liquid. As pre-dispersion, zirconia beads (average diameter: 1.25 mm) were used as media and dispersed for 1 hour with a paint shaker. As this dispersion, zirconia beads (average diameter: 0.1 mm) were used as media, and the dispersion was carried out for 7 hours with a disperser UAM-015 manufactured by Kotobuki Industries Co., Ltd. As described above, a metal oxide fine particle dispersion (BC-5) (titanium oxide fine particle dispersion) was produced. The average particle diameter of the titanium oxide fine particles in the dispersion was 80 nm. The dispersion contains 50% non-volatile components, titanium oxide contained in 100% non-volatile components is about 71.4%, and the dispersant is 28.6%.

(4) Preparation of resin (E) solution (Production Example 401)
Step 1:
In a reaction vessel equipped with a stirrer, a thermometer, a dropping device, a reflux condenser, and a gas introduction tube, 100 parts of methoxypropyl acetate as a solvent was placed. The container was heated to 80 ° C. while injecting nitrogen gas. While maintaining this temperature, a mixture of 5 parts of styrene (St), 15.9 parts of cyclohexyl methacrylate (CHMA), 31.7 parts of methacrylic acid (MAA), and 3 parts of 2,2′-azobisisobutyronitrile. The polymerization reaction was performed dropwise over 1 hour. After completion of the dropwise addition, the mixture was further reacted at 70 ° C. for 3 hours, and then 0.5 parts of azobisisobutyronitrile dissolved in 40 parts of methoxypropyl acetate was added, and then stirring was continued at the same temperature for 3 hours. Thus, a copolymer was obtained.
Step 2:
Next, dry air was introduced into the reaction vessel, and 50 parts of glycidyl methacrylate (GMA), 37 parts of methoxypropyl acetate, 0.6 part of dimethylbenzylamine, and 0.1 part of methoquinone were charged, and then at the same temperature for 10 hours. Stirring was continued. After cooling to room temperature, the resin solution (E-1) having a solid content of 35% by mass was obtained by diluting with methoxypropyl acetate.
Table 2 shows main reaction conditions (prepared composition and reaction temperature) and evaluation results of the obtained resin.

(Production examples 402 to 410)
Resin solutions (E-2) to (E-10) were obtained in the same manner as in Production Example 401 except that the reaction conditions (charged composition and reaction temperature) were changed to those shown in Table 2.

Each abbreviation in Table 2 is as follows.
PGMEA: methoxypropyl acetate,
DCPMA: dicyclopentanyl methacrylate,
CHMA: cyclohexyl methacrylate,
St: Styrene,
M-110: paracumylphenol ethylene oxide modified acrylate,
HEMA: hydroxyethyl methacrylate,
MAA: methacrylic acid,
GMA: glycidyl methacrylate,
MMA: methyl methacrylate.
The unit of the blending amount in Table 2 is “part”.

(5) Preparation of resin composition for light scattering layer (Example 1)
16 g of metal oxide fine particle dispersion (BC-1) (about 5.72 g of titanium oxide and about 2.28 g of dispersant) with respect to 10 g of light scattering particle dispersion (A-1) containing 2 g of light scattering particles 40.67 g of methoxypropyl acetate was added, and the mixture was stirred and mixed so as to be uniform. The mixture was filtered through a filter having a mesh diameter of 5 μm to prepare a resin composition for a light scattering layer. The mass ratio of the solid content in this composition was light scattering particles (A-1): metal oxide fine particle dispersion (BC-1) = 20.0: 80.0. At this time, the mass ratio in the metal oxide fine particle dispersion (BC-1) was metal oxide fine particles (B): dispersion (C) = 57.2: 22.8.

(Examples 2-62, Comparative Examples 1-8)
A resin composition for a light scattering layer was obtained in the same manner as in Example 1 except that the composition shown in Tables 3 to 5 was used.

Each abbreviation in Tables 3-5 is as follows.
<Ethylenically unsaturated monomer (D)>
・ V # 802: Biscoat # 802 manufactured by Osaka Organic Chemical Industry Co., Ltd.
DPCA30: Kayrad DPCA30 manufactured by Sartomer
DPCA60: Kayrad DPCA60 manufactured by Sartomer
<Silane compound>
KBM-403: Shin-Etsu Silicone KBM-403
・ KBM-573: Shin-Etsu Silicone KBM-573
<Photopolymerization initiator>
・ Irg907: Irgacure 907 manufactured by BASF
OXE01: BASF Irgacure OXE01
OXE02: BASF's Irgacure OXE02
<Leveling agent>
BYK330: BYK330 manufactured by Big Chemie.

(6) Evaluation The obtained resin composition for light scattering layers was evaluated by the following apparatus or method. The evaluation results are shown in Tables 7-9.
(Refractive index of binder and difference in refractive index between binder and light scattering particle (A))
The binder was applied to a PEN (polyethylene naphthalate) film using a spin coater so that the finished film thickness was 2.0 μm. Next, the obtained coated substrate was held on a hot plate heated to 110 ° C. for 2 minutes, and then subjected to ultraviolet exposure at an illuminance of 20 mW / cm ² and an exposure amount of 50 mJ / cm ² using an ultrahigh pressure mercury lamp. . The coated substrate was heated at 200 ° C. for 30 minutes and allowed to cool, and then the refractive index (n1) of the binder composition was measured with an Abbe refractometer in accordance with Japanese Industrial Standards: JIS K7142 “Plastic Refractive Index Measuring Method”. Further, the difference between the refractive index (n1) of the binder composition and the refractive index (n2) of the light scattering particles was determined. Evaluation was made based on the following criteria.
-Refractive index of binder 1.65 or more: good (○),
Less than 1.65: Possible (△)
-Refractive index difference between the binder and the light scattering particles (A) 0.1 ≦ | n1-n2 |: “Good (◯)”,
0.1> | n1-n2 |: “impossible (×)”

(Visible light transmittance of light scattering layer)
The finished film thickness after heating the resin composition for light scattering layer to a glass substrate of 100 mm × 100 mm and 0.7 mm thickness (Corning glass “Eagle 2000”) at 230 ° C. for 20 minutes using a spin coater is 2. It apply | coated so that it might be set to 0 micrometer. Next, the obtained coated substrate was held on a hot plate heated to 110 ° C. for 2 minutes, and then subjected to ultraviolet exposure at an illuminance of 20 mW / cm ² and an exposure amount of 50 mJ / cm ² using an ultrahigh pressure mercury lamp. . The coated substrate was heated at 230 ° C. for 20 minutes and allowed to cool, and then the transmittance at a wavelength of 400 nm of the obtained coating film was determined using a microspectrophotometer (“OSP-SP100” manufactured by Olympus Optical Co., Ltd.). Evaluation was made based on the following criteria.
Transmittance of 70% or higher: Good (○),
Transmittance less than 70%: Possible (△)

(Heat resistance; measurement of transmittance after additional baking)
A resin composition-coated substrate for a light scattering layer obtained by the same method as that prepared for transmittance measurement was heated at 300 ° C. for 20 minutes, allowed to cool, and then a microspectrophotometer (“OSP-SP100” manufactured by Olympus Optical Co., Ltd.) Was used to determine the transmittance of the obtained coating film at a wavelength of 400 nm. Evaluation was made based on the following criteria.
Transmittance of 70% or higher: Good (○),
Transmittance less than 70%: Possible (△)

(Dispersibility)
In the resin composition-coated substrate for light scattering layer obtained by the same method as that prepared for the measurement of transmittance, the number of aggregates as viewed from the coated surface was evaluated based on the following criteria.
0 aggregates: excellent (◎)
1 to 3 aggregates: good (○)
Aggregates 4-9: Possible (△)
10 or more aggregates: Impossible (x)

(Wavelength dependence I)
The wavelength dependence of the light scattering layer was evaluated by the presence or absence of a change in the shape of the transmission spectrum between the substrate not coated with the resin composition for the light scattering layer and the coated substrate. The transmission spectrum was performed using U-4100 manufactured by Hitachi High-Technologies Corporation. Evaluation was made based on the following criteria.
・ Wavelength dependence I
The difference between the red, blue and green transmission spectrum values is less than 10% and the white spectrum shape does not change: Good (O),
The difference between the transmission spectrum values of red, blue, and green is 10% or more and less than 20%, and the white spectrum shape is not changed: Yes (Δ),
The difference between the red, blue, and green transmission spectrum values is 20% or more and the white spectrum shape is changed: Impossible (×)

(Light extraction efficiency I)
Using an ITO ceramic target (In ₂ O ₃ : SnO ₂ = 90: 10 (mass ratio)) on a resin composition-coated substrate for a light scattering layer obtained by the same method as that prepared for measuring transmittance, DC An ITO film having a thickness of 150 nm was formed by sputtering. Next, Table 6. Was formed to a thickness of 150 nm. The substrate was taken out from the vacuum deposition base, placed on a UV irradiator with a wavelength of 365 nm, and the front luminance was measured with a luminance meter “LS-100” manufactured by Konica Minolta. The front luminance improvement rate (extraction efficiency I) was calculated based on the front luminance created with the substrate on which the light scattering layer was not formed. ・ Light extraction efficiency Front luminance improvement rate 2.4 times or more: Excellent (◎),
Front luminance improvement rate 1.5 times or more to less than 2.4 times: good (◯),
Front brightness improvement rate less than 1.5 times: Possible (△)

(Evaluation of EL element with bottom emission structure (light extraction efficiency II, light emission appearance (dark spot, unevenness), wavelength dependence))
Using the ITO ceramic target (In ₂ O ₃ : SnO ₂ = 90: 10 (mass ratio)) on the light scattering layer resin composition-coated substrate obtained by the same method as that prepared for the measurement of transmittance, An ITO film having a thickness of 150 nm was formed by a DC sputtering method to obtain a translucent electrode (anode).
The ITO film was etched using a photoresist to form a pattern so that the light emission area was 5 mm × 5 mm. After ultrasonic cleaning, ozone cleaning was performed using a low-pressure ultraviolet lamp. Next, organic EL layers were sequentially formed on the ITO surface by vacuum deposition as follows.
First, CuPc was formed to a thickness of 15 nm as a hole injection layer. Next, α-NPD was formed to a thickness of 50 nm as a hole transport layer. Next, the red light emitting layer shown in Table 6 was formed to a thickness of 40 nm, and the electron injection layer shown in Table 6 was formed to a thickness of 30 nm.
Thereafter, Mg and Ag were co-evaporated to form MgAg with a thickness of 100 nm, and from the viewpoint of preventing MgAg oxidation, 50 nm of Ag was further formed thereon to form a back electrode (cathode).
After taking out from the vacuum deposition apparatus, an ultraviolet curable epoxy resin was dropped onto the cathode electrode side, and a slide glass was placed thereon, the epoxy resin was cured using a high-pressure ultraviolet lamp, and the device was sealed.
In the same manner as described above, light emitting elements of blue, green, and white were prepared using the light emitting layer and the electron injection layer shown in Table 6.
Separately, an organic EL element was obtained by the same method as above except that a glass substrate on which a light scattering layer was not formed was used as a base material for evaluation.

About each light emitting element obtained using the light emitter of Table 6, a forward current of 10 mA / cm ^{2 was} applied at room temperature, and the appearance of light emission (dark spots, unevenness) was observed. In addition, the front luminance was measured with a spectral radiance meter “CS-2000” manufactured by Konica Minolta Sensing Co., Ltd., and white light emission was obtained based on the front luminance of the organic EL device produced on the substrate on which the light scattering layer was not formed. The improvement rate (extraction efficiency II) of the front luminance of the element was calculated. In addition, the wavelength dependence II of the light scattering layer is shown in Table 6 in terms of the difference in front luminance in the light emitting device using the red, blue, and green light emitting layers, and the change in the shape of the emission spectrum in the light emitting device using the white light emitting layer. It was evaluated by the presence or absence of. The emission spectrum was measured using MCPD-9800 manufactured by Otsuka Electronics Co., Ltd. Evaluation was made based on the following criteria.
・ Luminescent appearance (dark spots, unevenness)
Dark spots and unevenness are not observed: Good (○),
Dark spots and unevenness are slightly observed: Yes (△),
Dark spots and unevenness are observed: Impossible (×)
・ Light extraction efficiency II
Front brightness improvement rate 1.5 times or more: Excellent (◎),
Front brightness improvement rate of 1.2 times to less than 1.5 times: good (○),
Front brightness improvement rate less than 1.2 times: Possible (△)
・ Wavelength dependence II
The difference in the value of the front luminance improvement rate of each of red, blue, and green is less than 10% and the white spectrum shape is not changed: Good (◯),
The difference in the value of the front luminance improvement rate for each of red, blue, and green is 10% or more and less than 20%, and the white spectrum shape is not changed: Yes (△),
The difference between the values of the front luminance improvement ratios of red, blue, and green is 20% or more and the white spectrum shape is changed: Impossible (×)

The other physical property evaluation methods are shown below.
(Measurement of adhesion to glass and ITO)
About the resin composition coating substrate for light scattering layers obtained by the same method as that prepared for the measurement of transmittance, the adhesion of the coating film is evaluated by an adhesion (cross-cut method) test according to JISK5600-5-6. The number of peels in 25 grids was counted.
As the substrate, Corning glass “Eagle 2000” and Geomatek ITO film were used. Evaluation was made based on the following criteria.
Number of cross-cuts peeled 0: Excellent (◎)
The number of peeling of the grid is less than 1 (edge peeling: level at which the border of the grid cuts off): good (○),
Number of cross-cuts 1 to 3: Yes (△),
More than 3 grids peeled: Impossible (×)

(ITO etchant resistance)
A coating film was formed on the ITO substrate by the same method as that prepared for measuring transmittance. The obtained resin composition-coated substrate for light scattering layer was immersed in a solution of nitric acid / hydrochloric acid / water = 0.1 / 1/1 (mass ratio) at 40 ° C. for 5 minutes, washed with pure water, and then 24 hours. I left it alone. The obtained substrate was evaluated for the adhesion of the coating film by an adhesion (cross-cut method) test according to JIS K5600-5-6, and the number of peels in 25 grids was counted. As the substrate, an ITO film manufactured by Geomatek Co. was used. Evaluation was made based on the following criteria.
Number of cross-cuts peeled 0: Excellent (◎)
The number of peeling of the grid is less than 1 (edge peeling: level at which the border of the grid cuts off): good (○),
Number of cross-cuts 1 to 3: Yes (△),
More than 3 grids peeled: Impossible (×)

(chemical resistance)
The light scattering layer resin composition-coated substrate obtained by the same method as that prepared for the measurement of transmittance was immersed in acetone or isopropyl alcohol, and each was ultrasonically cleaned at 25 ° C. for 10 minutes. The obtained substrate was evaluated for the adhesion of the coating film by an adhesion (cross-cut method) test according to JIS K5600-5-6, and the number of peels in 25 grids was counted. Evaluation was made based on the following criteria.
Number of cross-cuts peeled 0: Excellent (◎)
The number of peeling of the grid is less than 1 (edge peeling: level at which the border of the grid cuts off): good (○),
Number of cross-cuts 1 to 3: Yes (△),
More than 3 grids peeled: Impossible (×)

(Flatness)
About the resin composition coated substrate for the light scattering layer obtained by the same method as that prepared for the transmittance measurement, the surface roughness of the coating film was measured with a stylus-type film thickness meter DECTAC-3 manufactured by ULVAC. . Evaluation was made based on the following criteria.
Surface roughness less than 100 mm: Excellent (◎),
Surface roughness of 100 mm or more and less than 150 mm: good (◯),
Surface roughness of 150 to 250 mm: possible (△),
Surface roughness greater than 250 mm: Impossible (×)

In Comparative Example 1 using the light scattering particles (A-22) not containing (meth) acrylate having a polycyclic structure or an alkyl chain having 4 to 24 carbon atoms in the resin composition for light scattering layer, the dispersibility is It was bad and the flatness was getting worse. On the other hand, in Examples 1 to 62 using these (meth) acrylates, no aggregate was observed, the dispersibility was good, the wavelength dependency was good, and the flatness was also good. On the other hand, in Comparative Examples 2 and 3 using light scattering particles containing an acrylate having an alkyl chain with less than 4 carbon atoms or 24 or more as the light scattering particles (A), sufficient steric repulsion between the light scattering particles does not occur. Dispersibility did not improve. The condition that the average particle size in the resin composition for light scattering layer is 100 nm or more and less than 600 nm and the content of particles having a particle size of 600 nm or more with respect to the total amount of light scattering particles is 20% by volume or less is not satisfied. In Comparative Examples 4 to 7 using light scattering particles, the wavelength dependency was large, and a decrease in extraction efficiency was observed. In Comparative Example 8 in which the difference in refractive index between the composition containing the metal oxide fine particles (B) and the dispersant (C) and the light scattering particles (A) is less than 0.1, the light scattering layer provides sufficient scattering. Did not occur, and the extraction efficiency was not improved.
In Examples 39 to 44 using the ethylenically unsaturated monomer (D), a coating film having good glass, ITO adhesion, and etchant resistance was obtained. Moreover, Examples 45-56 using resin (E)
In the results, good chemical resistance was obtained. In Examples 57 to 62 using both of them, good adhesion, etchant resistance, and chemical resistance were obtained.

<Evaluation of organic EL element with top emission structure and coating type structure (light extraction efficiency, light emission appearance (dark spot, unevenness))>
(Top emission structure A)
An aluminum film is formed by vacuum deposition on a glass substrate that is ultrasonically cleaned with isopropyl alcohol and then dried with dry nitrogen gas under a condition of a thickness of 100 nm, and then an ITO ceramic target (In ₂ O ₃ : SnO _2). = 90% by mass: 10% by mass), an ITO film having a thickness of 20 nm is formed by a DC sputtering method, and is patterned so as to have a light emitting area of 5 mm × 5 mm. An electrode (anode) was formed. Next, without taking out from the vacuum, organic EL layers were sequentially formed on the ITO surface by vacuum deposition as follows. First, α-NPD was formed to a thickness of 40 nm as a hole injection / hole transport layer. Next, H1 and Ir-1 shown in Table 10 were adjusted to a deposition rate of 100: 6 and formed to a thickness of 30 nm. Next, BAlq was formed to a thickness of 10 nm as a hole blocking layer. Further, Alq3 was formed to a thickness of 20 nm as an electron transport layer. Next, magnesium is formed to a thickness of 2 nm by vacuum deposition, and further, a thickness of 100 nm is formed by DC sputtering from an ITO ceramic target (In ₂ O ₃ : SnO ₂ = 90 mass%: 10 mass%). The ITO film was formed to form a translucent electrode (cathode) made of a laminate of magnesium and ITO.
Finally, the glass substrate and Examples 1 to 62 prepared for measuring transmittance and the resin composition-coated substrate for light scattering layer of Comparative Example 1 were used as a sealing substrate, and an epoxy-based photocuring was used as a sealing material around. A mold adhesive was applied, which was brought into close contact with the scattering film side of the substrate, and irradiated with UV light from the glass substrate side to be cured and sealed. What was sealed only with the glass substrate is referred to as Comparative Example 9.
The light emitting appearance and the light emission efficiency of the obtained light emitting device were measured by the above method as in the case of the bottom emission structure. The results are listed in Tables 12-13.

(Top emission structure B)
On a glass substrate that has been ultrasonically cleaned with isopropyl alcohol and then dried with dry nitrogen gas, aluminum is deposited by vacuum deposition under a thickness of 100 nm, and then lithium fluoride is deposited by vacuum deposition. Then, a lithium fluoride film having a thickness of 0.5 nm was formed and patterned so as to have a light emitting area of 5 mm × 5 mm to form a back electrode (cathode) made of a laminate of aluminum and lithium fluoride. Subsequently, without taking out from a vacuum, the organic EL layer was sequentially formed on the lithium fluoride surface by a vacuum deposition method as follows. First, Alq3 was formed to a thickness of 20 nm as an electron transport layer. Next, BAlq was formed to a thickness of 10 nm as a hole blocking layer. Next, H1 and Ir-1 shown in Table 10 were adjusted to a deposition rate of 100: 6 and formed to a thickness of 30 nm. Next, α-NPD was formed to a thickness of 40 nm as a hole injection / hole transport layer. Next, an ITO film having a thickness of 150 nm is formed by a DC sputtering method from an ITO ceramic target (In ₂ O ₃ : SnO ₂ = 90% by mass: 10% by mass), and an ITO translucent electrode (anode) is formed. did.
Finally, the glass substrate and Examples 1 to 62 prepared for measuring transmittance and the resin composition-coated substrate for light scattering layer of Comparative Example 1 were used as a sealing substrate, and an epoxy-based photocuring was used as a sealing material around. A mold adhesive was applied, which was brought into close contact with the scattering film side of the substrate, and irradiated with UV light from the glass substrate side to be cured and sealed. What was sealed only with the glass substrate is referred to as Comparative Example 10.
The light emitting appearance and the light emission efficiency of the obtained light emitting device were measured by the above method as in the case of the bottom emission structure. The results are listed in Tables 12-13.

(Coating structure)
An ITO ceramic target (In ₂ O ₃ : SnO ₂ = 90) was applied on the resin composition-coated substrate for light scattering layer of Examples 1 to 62 and Comparative Example 1 obtained by the same method as that prepared for the measurement of transmittance. An ITO film having a thickness of 150 nm was formed by a DC sputtering method to obtain a light-transmitting electrode (anode). Separately from this, an ITO film was formed directly on the glass substrate in the same manner as described above without forming a light scattering layer, thereby obtaining a translucent electrode (anode).
Thereafter, the ITO film was etched using a photoresist with respect to both the translucent electrodes to form a pattern so that the light emission area was 5 mm × 5 mm. After ultrasonic cleaning, ozone cleaning was performed using a low-pressure ultraviolet lamp. PEDOT / PSS (poly (3,4-ethylenedioxy) -2,5-thiophene / polystyrene sulfonic acid, BAYTRON PVP CH8000 manufactured by Bayer) is formed on a cleaned glass plate with an ITO electrode by spin coating. As a result, a hole injection layer having a thickness of 40 nm was obtained.
Subsequently, PVK (Poly (9-vinylcarbazole), manufactured by Sigma-Aldrich) was 60%, and Ir-2 listed in Table 11 was 3% and ETM-1 was 37% in mass ratio to a total concentration of 2.0 wt%. Then, it was dissolved in toluene so that a light emitting layer having a thickness of 70 nm was obtained by a spin coating method. Furthermore, after depositing 20 nm of Ca thereon, 200 nm of Al was deposited to form an electrode to obtain an organic EL device.
Finally, an ultraviolet curable epoxy resin was dropped on the cathode electrode side, and a glass slide was placed thereon, the epoxy resin was cured using a high pressure ultraviolet lamp, and the device was sealed. A glass substrate is used as Comparative Example 11.
The light emitting appearance and the light emission efficiency of the obtained light emitting device were measured by the above method as in the case of the bottom emission structure. The results are listed in Tables 12-13.

  As described in Tables 12 to 13, the same results as those of the bottom emission type were obtained in both the top emission structure and the coating type structure.

DESCRIPTION OF SYMBOLS 1 Organic electroluminescent apparatus 11 Translucent board | substrate 12 Light-scattering layer 13 Translucent electrode 14 At least 1 organic layer (organic EL layer) containing a light emitting layer
15 Back electrode

Claims (21)

A resin composition for a light scattering layer, comprising light scattering particles (A), metal oxide fine particles (B), and a dispersant (C) and satisfying the following (i) to (v):
(I) The light scattering particle (A) is a copolymer using acrylate or methacrylate having a polycyclic structure or an alkyl chain having 4 to 24 carbon atoms.
(Ii) The light scattering particles (A) have an average particle diameter of 100 nm or more and less than 600 nm.
(Iii) The content of particles having a particle diameter of 600 nm or more with respect to the total amount of the light scattering particles (A) is 20% by volume or less.
(Iv) The dispersant (C) has an ethylenically unsaturated double bond.
(V) The refractive index difference between the composition containing the metal oxide fine particles (B) and the dispersant (C) and the light scattering particles (A) is 0.1 or more.   The resin composition for a light scattering layer according to claim 1, wherein the polycyclic structure is a bridgehead structure.   An acrylate or methacrylate having a bridgehead structure is norbornyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentenyl (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, 2 The at least one selected from the group consisting of -methyl-2-adamantyl (meth) acrylate, 2-ethyl-2-adamantyl (meth) acrylate, and 2-isopropyl-2-adamantyl (meth) acrylate. A resin composition for light scattering.   The resin composition for light scattering according to any one of claims 1 to 3, wherein the coefficient of variation of the light scattering particles (A) is 30% or less.   The resin composition for a light scattering layer according to any one of claims 1 to 4, wherein the metal oxide fine particles (B) have an average particle diameter of 100 nm or less. The light according to claim 1, wherein the metal oxide fine particles (B) are at least one metal oxide fine particle selected from the group consisting of ZrO ₂ and TiO _2. Resin composition for scattering layer.   The resin composition for a light scattering layer does not contain an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000 and a resin (E) having a mass average molecular weight (Mw) of 5000 or more. The resin composition for light-scattering layers of Claims 1-6.   The resin composition for a light scattering layer according to claim 7, wherein the refractive index of the composition containing the metal oxide fine particles (B) and the dispersant (C) is 1.65 or more.   1-100 mass% of light scattering particles (A), 20-75 mass% of metal oxide fine particles (B), and 1- 1 of dispersant (C) in a solid content of 100 mass% of the resin composition for a light scattering layer. The resin composition for light scattering of Claim 7 or 8 containing 35 mass%.   The resin composition for a light scattering layer contains an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000 and does not contain a resin (E) having a mass average molecular weight (Mw) of 5000 or more. The resin composition for light scattering layers according to claim 1.   The refractive index of the composition containing the metal oxide fine particles (B), the dispersant (C), and the ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000 is 1.65 or more. 10. The resin composition for a light scattering layer according to 10.   1-100 mass% of light scattering particles (A), 20-75 mass% of metal oxide fine particles (B), and 1- 1 of dispersant (C) in a solid content of 100 mass% of the resin composition for a light scattering layer. The resin composition for light scattering according to claim 10 or 11, comprising 1 to 30% by mass of an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000% by mass.   The resin composition for a light scattering layer contains a resin (E) having a mass average molecular weight (Mw) of 5000 or more and does not contain an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000. The resin composition for light scattering layers according to claim 1.   The light scattering layer according to claim 13, wherein the refractive index of the composition comprising the metal oxide fine particles (B), the dispersant (C), and the resin (E) having a mass average molecular weight (Mw) of 5000 or more is 1.65 or more. Resin composition.   1-100 mass% of light scattering particles (A), 20-75 mass% of metal oxide fine particles (B), and 1- 1 of dispersant (C) in a solid content of 100 mass% of the resin composition for a light scattering layer. The resin composition for light scattering of Claim 13 or 14 containing 1-20 mass% of resin (E) of 20 mass% and mass mean molecular weight (Mw) 5000 or more.   The resin composition for a light scattering layer contains an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000 and a resin (E) having a mass average molecular weight (Mw) of 5000 or more. Item 7. A resin composition for a light scattering layer according to item 1-6.   Metal oxide fine particles (B), a dispersant (C), an ethylenically unsaturated monomer (D) having a mass average molecular weight (Mw) of less than 5000, and a resin (E) having a mass average molecular weight (Mw) of 5000 or more. The resin composition for a light scattering layer according to claim 16, wherein the refractive index of the composition is 1.65 or more.   1-100 mass% of light scattering particles (A), 20-75 mass% of metal oxide fine particles (B), and 1- 1 of dispersant (C) in a solid content of 100 mass% of the resin composition for a light scattering layer. The resin composition for light scattering of Claim 16 or 17 containing 20 mass%, 1-30 mass% of ethylenically unsaturated monomers (D), and 1-20 mass% of resin (E).   The light-scattering layer formed using the resin composition for light-scattering layers of any one of Claims 1-18.   The light-scattering layer according to claim 19, a first electrode having a light-transmitting property, at least one organic layer including a light-emitting layer, and a second electrode having a light-reflecting property on a light-transmitting substrate. Organic electroluminescence device stacked sequentially. The organic electroluminescence device according to claim 20, which is a lighting device or a display device.

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