JP5935607B2 - Color filter forming substrate and organic EL display device - Google Patents

Description

  The present invention relates to a color filter forming substrate for an organic EL display device and an organic EL display device using the substrate, and more particularly to a color filter forming substrate for a white light emitting type organic EL display device.

In recent years, organic EL display devices are self-luminous and have excellent visibility and do not require a backlight. Therefore, they can be thin and light, have a simple structure and can be manufactured at low cost, and are suitable for displaying moving images. Therefore, research and development and commercialization of a flat display device (also referred to as a flat panel) following a liquid crystal display device and a plasma display device are being promoted.
In the white light emitting type organic EL display device, as shown in FIG. 7A, in order to achieve both high color purity and high luminance of display, each color of R, G, and B for color filter is colored. In addition to a pixel (also referred to as a colored pixel) provided with a layer, a color filter forming substrate 110 provided with a high light transmissive pixel (hereinafter also referred to as a WHITE pixel) having high light transmittance has been used.
A high light transmission pixel is usually provided with a resin layer that is not colored or a resin layer that is slightly colored in accordance with the combined colors of R, G, and B. The high light transmission pixel is referred to as a WHITE pixel, and the resin layer disposed in the WHITE pixel is referred to as a WHITE layer 113W.
In FIG. 7A, the light-transmitting regions divided by the pixel-segmenting light-shielding portion (also referred to as a black matrix) 112 are colored layers 113R for the R, G, and B colors for color filters, respectively. The regions where 113G and 113B are arranged correspond to the colored pixel regions 113RS, 113GS and 113BS, and are light-transmitting regions divided by the pixel-partitioning light-shielding portion 112 and regions where the WHITE layer 113W is arranged. , Corresponding to the WHITE pixel region 113WS.
The organic EL display device is also referred to as an organic electroluminescence display device or an organic EL display device, and the display device is also referred to as a display panel.

In a white light emission type organic EL display device using a color filter forming substrate having such a WHITE pixel, light incident from the outside (hereinafter also referred to as external light) is transmitted through the WHITE pixel, and the organic EL There is a problem in that it is reflected by the electrode and metal wiring of the element (also referred to as an organic electroluminescence element or an organic EL light emitting element) and the contrast is lowered.
In the case of the organic EL display device shown in FIG. 7A, the reflectance of external light incident from the front surface (observer side) is usually about 97%.
In order to solve this problem, for example, as shown in FIG. 7B, a circularly polarizing plate 130 is provided on the front surface (observer side) of the white light emitting organic electroluminescence display device to reflect external incident light. The 1st form which reduces is taken.
However, in the case of the first embodiment, the circularly polarizing plate 130 greatly reduces the transmittance, and as a result, the light emission efficiency of the organic EL element is remarkably lowered and the display luminance is lowered.
In the case of the organic EL display device shown in FIG. 7B, the reflectance of external light incident from the front surface (observer side) is usually about 0.1%, and the display brightness is shown in FIG. It is about 40% of the organic EL display device of the form shown in FIG.

Further, as shown in FIG. 7C, in the second embodiment, a layer made of a photosensitive resin in which a coloring material is dispersed is arranged in a region corresponding to a WHITE pixel, and this is used as a transmittance adjusting unit 113WA. It is taken. (See Patent Document 3)
In the case of this form, the transmittance adjusting unit 113WA can adjust the incidence of external light and the reflection of the incident external light on the electrode and metal wiring of the organic electroluminescence element.
However, in the case of this second embodiment, the reflection color of the interface between the base material 111 made of a transparent substrate and each colored layer for each color filter, and the interface between the base material 111 made of a transparent substrate and the transmittance adjusting unit 113WA is different. In addition, there is a problem that uneven reflection is easy to see because the transmittance of the pixel differs depending on the color of each color layer for the color filter.
In the case of the second mode, the reduction in reflection of external light is insufficient, and in order to sufficiently reduce the reflection of external light and eliminate uneven reflection, for example, an organic EL display of the mode shown in FIG. As in the apparatus, it is necessary to provide a circularly polarizing plate on the front surface (observer side).

  As described above, in order to achieve both high color purity and high luminance of display, in addition to the colored pixels of R, G, and B colors for color filters, a white light emitting organic In the EL device, the first mode, the second mode, the first mode, the first mode, or the second mode can be used to solve the problem that the WHITE pixel passes through the WHITE pixel and is reflected by the electrode and metal wiring of the organic EL element. Although both forms have been dealt with, both forms cannot achieve both reduction of external light reflection and prevention of lowering display brightness, and in particular, can reduce variations in external light reflection. There was no.

JP 2008-47340 A JP 2002-377776 A Japanese Patent Application No. 2011-047924

As described above, there is no white light source type organic EL display device that can achieve both reduction of external light reflection and prevention of lowering display luminance, and this is required.
The present invention is corresponding to this, and in particular, it is intended to provide an organic EL display device that can achieve both reduction of external light reflection and prevention of lowering of display luminance, and can reduce variations in external light reflection. Is.
It is another object of the present invention to provide a color filter forming substrate capable of manufacturing such an organic EL display device.

また、上記いずれかのカラーフィルタ形成基板であって、前記光吸収層の膜厚が１μｍ以上であることを特徴とするものである。
また、上記いずれかのカラーフィルタ形成基板であって、前記光吸収層の上側に、散乱機能を有する層（散乱層とも言う）を配設していることを特徴とするものである。 The color filter forming substrate of the present invention is a color filter forming substrate used in a white light source type organic EL display device, and separately from a colored pixel region which is a pixel region in which a colored layer of each color for a color filter is arranged. A color filter forming substrate having a WHITE pixel region that is a light-transmitting pixel region higher than the colored pixel region, wherein a laminated structure in which a colored layer and a light absorbing layer for the color filter are laminated on the colored pixel region. And the WHITE pixel region has a laminated structure in which a WHITE resin layer and the light absorption layer are laminated, or a single layer structure including only the light absorption layer, and the light pixel in the colored pixel region or the WHITE pixel region. For each color layer of the color filter for the color filter and the WHITE resin layer laminated with an absorption layer, the average transmission The thickness of the WHITE pixel region is reduced and the single-layer structure of the WHITE pixel region is formed by stacking the WHITE resin layer and the light absorption layer when the WHITE resin layer has a thickness of zero. In view of the region having any one of the laminated structures, the resin layers and the light absorption layer are laminated by increasing the thickness of the light absorption layer in the order of decreasing film thickness of the resin layers. It is characterized by that.
And it is said color filter formation board | substrate, Comprising: As a pixel area of the colored layer for said color filters, it has a pixel area | region which has arrange | positioned the colored layer of three colors of R, G, and B, and said light absorption layer Are formed in the WHITE pixel region and the pixel region of the G colored layer for the color filter.
In any one of the color filter forming substrates, the light absorption layer is formed in the entire pixel region.
In any one of the above color filter forming substrates, the light absorption layer contains carbon black dispersed as a coloring material in a resin.
Moreover, it is a color filter formation board | substrate of any one of the said, Comprising: The average transmittance | permeability in C light source of the said light absorption layer is 45%-95%, It is characterized by the above-mentioned.
Here, the “average transmittance” is a value obtained by averaging the transmittance of the light absorption layer over the entire visible light region and the transmittance over the entire visible light region.
Here, the transmission spectrum was measured using a microspectroscope (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.). From the transmission spectrum obtained by the measurement, the brightness of the XYZ color system was obtained from the following equation (1). The value of Y (also referred to as luminance) is obtained, which is substantially equivalent to this.
In equation (1), P (λ) is the spectral composition of the light source, y (λ) is one of the color matching functions in the XYZ display system, and τ (λ) is the spectral transmission of the object here. The rate, k is a constant.

In any one of the above color filter forming substrates, the thickness of the light absorption layer is 1 μm or more.
In any one of the above color filter forming substrates, a layer having a scattering function (also referred to as a scattering layer) is disposed above the light absorption layer.

  The display device of the present invention is a white light source type organic EL display device having a structure in which an organic EL element formation substrate and a color filter formation substrate are laminated, and the color filter formation according to any one of claims 1 to 7 It is characterized by using a substrate.

(Function)
By adopting such a configuration, the color filter forming substrate of the present invention can achieve both reduction of external light reflection and prevention of lowering of display luminance in a white light emitting type organic EL display device, and external light. It is possible to provide a color filter forming substrate capable of producing an organic EL display device capable of reducing the variation in reflection.
Specifically, the colored pixel region has a laminated structure in which a colored layer for a color filter and a light absorbing layer are laminated, and the WHITE pixel region has a laminated structure in which a WHITE resin layer and the light absorbing layer are laminated, or For each resin layer of the color filter layer, the color filter layer for the color filter, and the WHITE resin layer, in which the light absorption layer is laminated in the color pixel region or the WHITE pixel region. In order of increasing average transmittance, the film thickness is reduced and the single layer structure of the WHITE pixel region is laminated with the WHITE resin layer and the light absorption layer when the WHITE resin layer has a zero film thickness. In the region having any one of the laminated structures, the thickness of the light absorption layer is increased in the order of decreasing the thickness of each resin layer, By being laminated with fat layer and the light absorption layer, thereby allowing a reduction in external light reflection, it is made possible to further reduce the unevenness of the external light reflection.
Specifically, the pixel region of the colored layer for the color filter has a pixel region in which colored layers of three colors of R, G, and B are arranged, and the light absorption layer includes the WHITE pixel region. The invention according to claim 2 is formed in the pixel region of the G colored layer for the color filter.
In this embodiment, since the light absorption layer is formed in the colored pixel region in which the G colored layer for the color filter having a high display luminance is arranged, the colored pixel in which the other colored layers of R and B are arranged. Even if a light absorption layer is not provided in the region, it is possible to reduce external light reflection and prevent display luminance from being lowered.
Further, when the light absorption layer is formed in the entire pixel region, the external light reflection can be reduced in all the pixel regions.
Specific examples of the light absorbing layer include those in which carbon black is dispersed and contained as a coloring material in the resin, but is not limited thereto.
Further, the transmittance of the light absorption layer in the C light source is 45% to 95%. By adopting the form of claim 5, in addition to the effect of reducing the reflection of external light, the luminance at the time of display is reduced by using a circularly polarizing plate. It can be made larger than the first embodiment shown in FIG.
The “transmittance” here is a value obtained by averaging the transmittance of the light absorbing layer over the entire visible light region and averaging the transmittance over the entire visible light region.
In particular, when the light absorption layer is flat so that the light transmittance does not vary widely over the entire visible light region (400 nm to 700 nm wavelength region) during display, there is little color shift during display due to the provision of the light absorption layer. I can do it.
In addition, since the light absorption layer is formed on the premise that a photolithographic method is formed and then developed to form a pattern, the light absorption layer preferably has a thickness of 1 μm or more.
Further, by providing a layer having a scattering function (also referred to as a scattering layer) above the light absorption layer, the parallax depending on the viewing direction can be reduced during display. It is said.

  By adopting such a configuration, the display device of the present invention is satisfactory in terms of display quality and a white light emitting type provided with WHITE pixels in addition to colored pixels of R, G, and B colors for color filters. An organic EL display device that can be used is provided.

As described above, the present invention is a white light emitting type organic EL display device, and can achieve both reduction of external light reflection and prevention of lowering display luminance in the white light emitting type organic EL display device, It has become possible to provide an organic EL display device that can reduce variations in reflection.
At the same time, it is possible to provide a color filter forming substrate capable of manufacturing such an organic EL display device.

FIG. 1A is a partial sectional view of a first example of an embodiment of a color filter forming substrate of the present invention, and FIG. 1B is a color of the first example shown in FIG. It is a partial sectional view of an organic EL display device using a filter formation substrate. FIG. 2A is a partial cross-sectional view of a second example of an embodiment of the color filter forming substrate of the present invention, and FIG. 2B is a color of the second example shown in FIG. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. FIG. 3A to FIG. 3D are process cross-sectional views illustrating a method for manufacturing the color filter forming substrate of the first example. It is the schematic layer block diagram which showed the structural example of the organic EL element. It is the figure which showed the spectral transmittance characteristic of the light absorption layer. It is the figure which showed the relationship between the transmittance | permeability of a light absorption layer, and the transmittance | permeability of the external light which passed the light absorption layer twice. FIG. 7A is a partial sectional view of a conventional organic EL display device provided with a WHITE layer, and FIG. 7B is a front view (observer side) of the display device shown in FIG. FIG. 7C is a partial cross-sectional view of an organic EL display device in which a circularly polarizing plate is provided. FIG. 7C is a display device shown in FIG. 7A in which a transmittance adjusting unit is provided in a conventional WHITE layer forming region. It is a partial cross section figure of an organic electroluminescence display.

First, the 1st example of embodiment of the color filter formation board | substrate of this invention is demonstrated based on Fig.1 (a).
The color filter forming substrate 10 of the first example is a color filter forming substrate for a white light source type organic EL display device, and is also a colored layer (also referred to as a colored resin layer) of R, G, and B colors for a color filter. ) A color filter forming substrate having a WHITE pixel region 13WS, which is a pixel region having higher light transmittance than the colored pixel regions 13RS, 13GS, 13BS, separately from the colored pixel regions 13RS, 13GS, 13BS, which are pixel regions provided with 13R, 13G, 13B. All of the colored pixel regions 13RS, 13GS, and 13BS for each color have a laminated structure in which the colored layer for each color filter and the light absorption layer 15 are laminated, and all of the WHITE pixel regions 13WS are The WHITE resin layer 13W and the light absorption layer 15 are stacked.
A light absorption layer 15 is provided over the entire surface so as to cover the WHITE pixel region 13WS and the colored pixel regions 13RS, 13GS, and 13BS provided with colored layers of R, G, and B colors for color filters.
In particular, the light absorbing layer is laminated in the colored pixel regions 13RS, 13GS, 13BS or WHITE pixel region 13WS in which the colored layers 13R, 13G, and 13B of the respective colors are arranged, and the light absorbing layer 15 Although it has a laminated structure, the resin layers of the color filter color layer (colored resin layer) and the WHITE resin layer are made thinner in order of increasing average transmittance. The thickness of the light absorption layer 15 to be laminated is increased in order of increasing film thickness.
As shown in FIG. 1B, the color filter forming substrate 10 of the first example includes an organic EL element forming substrate 20 in which a white light emitting organic EL element 22 is formed for each pixel, and an insulating resin layer 14. Are stacked at a predetermined interval to form an organic EL display device.
Examples of the organic EL display device in which the color filter forming substrate 10 of the first example is used include display devices for mobile electronic devices such as mobile notebook computers and multifunction terminal devices (also referred to as high function terminal devices). However, the application is not limited to these devices.
In FIG. 1A, the light-transmitting regions divided by pixel-shading light-shielding portions (also referred to as black matrix) 12 are colored layers 13R and 13G for R, G, and B colors for color filters. , 13B correspond to the colored pixel regions 13RS, 13GS, and 13BS, respectively, and are light-transmitting regions divided by the pixel-partitioning light-shielding portion 12, and regions where the WHITE layer 13W is arranged, This corresponds to the WHITE pixel region 13WS.

In this way, the color filter forming substrate 10 of the first example covers the WHITE pixel region 13WS and the colored pixel regions 13RS, 13GS, and 13BS in which the colored layers of the R, G, and B colors for the color filter are arranged. By providing the light absorption layer 15 over the entire surface, when the organic EL display device shown in FIG. 1B is manufactured using the color filter forming substrate 10 of the first example, the front surface (observer side) The external reflected light is reflected by the internal electrode or wiring and emitted, and the reflected light of the external light passes through the light absorption layer 15 twice at the time of incidence and at the time of emission. Reflected light can be reduced.
For example, in the visible light region (wavelength range of 400 nm to 700 nm), when the transmittance characteristic of the light absorption layer 15 is flat and 60%, the light passing through the light absorption layer 15 twice is substantially 60%, 60% 36%.
Further, since the light for display passes through the light absorbing layer 15 once and is emitted, the transmitted light is reduced by the light absorbing layer 15 only once. For example, the transmittance of the light absorbing layer 15 is set to 60. If%, the decrease in transmitted light due to passing through the light absorption layer 15 once is substantially 60%.
Therefore, when the color filter of the first example is used, external light is incident from the front surface (observer side) compared to the organic EL display device shown in FIG. The reflected light of the external light that is reflected and emitted can be reduced, and the reduction of the passing light at the time of display is reduced, compared with the organic EL display device using the circularly polarizing plate shown in FIG. Thus, it is possible to increase the amount of transmitted light during display.
For example, if the transmittance characteristic of the light absorption layer 15 is flat and 60% in the visible light region (wavelength range of 400 nm to 700 nm), the front surface (observation) as compared with the organic EL display device shown in FIG. External light is incident from the external side), reflected by the internal electrodes and wiring and emitted, the reflected light of the external light can be reduced to 36%, and the passing light at the time of display can be 60%, About the passage light at the time of display, the passage light at the time of display is increased as compared with the organic EL display device shown in FIG. 7B which is about 40% of the organic EL display device shown in FIG. be able to.
The transmittance of the light absorption layer 15 is such that external light is incident from the front surface (observer side) and reflected by internal electrodes and wiring as compared to the conventional organic EL display device shown in FIG. Since the reflected light of the emitted external light can be reduced and the transmitted light at the time of display is increased as compared with the organic EL display device using the circularly polarizing plate shown in FIG. In this case, it is preferably 45% to 95%.
The “transmittance” here is a value obtained by averaging the transmittance of the light absorbing layer over the entire visible light region and averaging the transmittance over the entire visible light region.
In particular, in the case where the light absorption layer is flat with little variation in light transmittance over the entire visible light region (400 nm to 700 nm wavelength region) during display, there is little color shift during display due to the provision of the light absorption layer. I can do it.

In particular, in the case of the color filter forming substrate 10 of the first example, the light absorption layer 15 is laminated in the colored pixel regions 13RS, 13GS, 13BS or the WHITE pixel region 13WS where the colored layers 13R, 13G, and 13B of the respective colors are arranged. The resin layers of the color filter color layer (colored resin layer) and the WHITE resin layer that form a laminated structure with the light absorption layer 15 are made thinner in order of increasing average transmittance. By increasing the thickness of the light absorption layer 15 to be laminated in the order of increasing the thickness of each resin layer, the transmittance over the entire region of the colored pixel regions 13RS, 13GS, 13BS and the WHITE pixel region 13WS. It is supposed to be able to reduce the variation of.
In the case of the first example, the resin layers of the color filter color layers 13R, 13G, 13B and the WHITE resin layer 13W are formed on one surface of the base material 11 which is a transparent substrate by controlling the film thickness. After that, by forming the light absorption layer 15 flat on the entire surface so as to cover these resin layers, the thickness of the light absorption layer 15 can be increased in the order of decreasing the thickness of each resin layer.

In the formation of the light absorption layer 15, carbon black is contained as a main coloring material in the resin, and a BLUE pigment or the like is contained for color adjustment, and these are dispersed. By adjusting the concentration, the intensity of the light transmitted through the light absorption layer can be adjusted, and by appropriately including a color adjusting pigment, the light absorption layer over the entire visible light region (400 nm to 700 nm wavelength region) during display. It is possible to easily obtain a flat transmittance characteristic with little variation in light transmittance.
As shown in FIG. 6, various transmittances can be easily obtained by adjusting the concentration of carbon black as the main color material.
In FIG. 6, the transmittance value of the light absorption layer is represented by the horizontal axis, and the transmittance when the light absorption layer corresponding to the transmittance value of the light absorption layer is passed twice is represented by the vertical axis. The triangles in FIG. 6 indicate the transmittance (horizontal axis) of the light absorbing layer obtained by adjusting and measuring the carbon black concentration, and the transmittance when passing through the corresponding absorbing layer twice (vertical axis). Is shown.
In the case of the organic EL device shown in FIG. 1B, the reflected light of outside light passes through the light absorption layer twice at the time of incidence and at the time of emission, so here, the vertical axis in FIG. For convenience, the transmittance of outside light is used.
Further, by adjusting the content of the pigment for color adjustment, it is possible to easily obtain transmittance characteristics close to flat over the visible light region (wavelength range of 400 nm to 700 nm).
In the visible light region (wavelength range of 400 nm to 700 nm), the light absorption layer has a light transmission characteristic closer to a flat color shift due to the provision of the light absorption layer, and a color shift of transmitted light during display. The color shift of external light reflection can be reduced.
For example, when a light absorption layer having a transmittance characteristic close to a flat shown in FIG. 5 is used, there is no problem of color misregistration due to the provision of the light absorption layer.

Next, each member of the color filter forming substrate 10 shown in FIG. 1A and the organic EL display device shown in FIG.
<Substrate 11>
As the base material 11 made of the transparent substrate used in the first example, those conventionally used for color filters can be used, and flexible such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, etc. Non-transparent transparent inorganic substrate, and a transparent resin substrate having flexibility such as a transparent resin film and an optical resin plate. In particular, it is preferable to use an inorganic substrate. Among these, it is preferable to use a glass substrate.
Furthermore, it is preferable to use an alkali-free type glass substrate among the glass substrates.
This is because the alkali-free glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and since it does not contain an alkali component in the glass, it can be suitably used for a color filter for a display device. .
As the substrate, a transparent transparent substrate is usually used.

<Pixel classification light blocking portion (also referred to as black matrix) 12>
As the light-shielding colored layer for forming the pixel-segmenting light-shielding portion 12 that segments the pixel regions of the color layers for each color filter, for example, here, carbon black coated with a resin such as an epoxy resin is pigmented. A (pigment) dispersed in a binder resin is used.
In the case where carbon black is dispersed as a pigment (pigment) in a binder resin, the light-shielding resin layer can be formed with a relatively thin film thickness.
Here, the formation of the light-shielding colored layer of the pixel classification light-shielding layer uses a photolithography method. In this case, as the binder resin, for example, an acrylate-based, a methacrylate-based, a polyvinyl cinnamate-based, or A photosensitive resin having a reactive vinyl group such as a cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a black matrix containing a black colorant and a photosensitive resin, and further, if necessary, a sensitizer, a coatability improver, A development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like may be added.
The light-blocking colored layer of the black matrix may be formed using a printing method or an inkjet method. In this case, examples of the binder resin include polymethyl methacrylate resin, polyacrylate resin, and polycarbonate resin. , Polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin, etc. .
The opening pattern shape of the pixel-segmenting light shielding layer 12 and the arrangement of the colored layers of each color are not limited.
There are also examples in which the shape of the opening pattern of the pixel classification light shielding layer 12 is a stripe shape, or in which the arrangement of the colored layers is changed such as a dogleg shape or a delta arrangement.

<Colored layers 13R, 13G, 13B>
In this example, the colored layers 13R, 13G, and 13B for forming the color filters are colored layers of three colors of R (red), G (green), and B (blue), respectively.
The colored layer of each color is formed by using a resin composition for forming a colored portion in which a coloring material (also referred to as a coloring material) such as a pigment or dye of each color is dispersed or dissolved in a binder resin, and a photolithography method (also called a photolithography method). Say).
As the binder resin used in the colored layer, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a colored part containing a colorant and a photosensitive resin, and further a sensitizer, a coating property improver, and a development as necessary. You may add an improving agent, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc.
The thickness of the colored layer of each color is usually set to about 1 μm to 5 μm.
The color of the colored layer is not particularly limited as long as it includes at least three colors of red, green, and blue. For example, three colors of red, green, and blue, or red, green, blue, and yellow Or five colors such as red, green, blue, yellow, and cyan.
Examples of the colorant used in the red (also referred to as R) colored layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. Can be mentioned.
These pigments may be used alone or in combination of two or more.
Examples of the colorant used in the green (also referred to as G) colored layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, and isoindoline pigments. Examples thereof include pigments and isoindolinone pigments.
These pigments or dyes may be used alone or in combination of two or more.
Examples of the colorant used in the blue (also referred to as B) coloring layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. .
These pigments may be used alone or in combination of two or more.

<WHITE layer 13W>
Here, a resin having a composition in which the coloring material (coloring material) is removed from the resin composition or the like for forming the pixel-segmenting light-shielding layer 12 and the colored layers 13R, 13G, and 13B is formed by a photolithography method. The formation method is not limited to this.

<Light absorption layer 15>
As a material for forming the light absorption layer 15, a resin containing carbon black as a coloring material, a BLUE pigment for color adjustment, and the like dispersed therein is used. A resin having a composition in which the color material is removed from the resin composition or the like that forms the pixel-segmenting light-shielding layer 12 and the colored layers 13R, 13G, and 13B is used for coating.
Examples of the coating method include photolithography (die coating method, spin coating method), ink jet method, and the like. Usually, coating is performed by photolithography.
In addition, it is preferable that the film thickness of the light absorption layer 15 is 0.3 micrometer or more from the surface of a coating-film property or external light reflection reduction.

<Insulating resin layer 14>
Examples of the material of the insulating resin layer 14 include a thermosetting resin composition and a photocurable resin composition.
The photocurable resin composition is the same as the binder resin used for the color layers for forming the color filter, for example, acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber A photosensitive resin having a reactive vinyl group is used.
In this case as well, a photopolymerization initiator may be added to the photosensitive resin composition for forming colored portions containing the photosensitive resin, and further, a sensitizer, a coating property improver, and a development improver as necessary. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.
Examples of the thermosetting resin composition include those using an epoxy compound and those using a thermal radical generator.
Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid or an amine compound. Examples of such an epoxy compound include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used.
The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides.
Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t-butyl Examples include til-4,4-di- (t-butylperoxy) butanate and dicumyl peroxide.

<Organic EL element formation substrate 20>
(1) Substrate 21
As the base material 21, basically, the same material as that of the base material 11 can be used. However, in the case of the display device shown in FIG. 1B using the color filter of the first example, the base material 11 is used. Since it is emitted from the side to the outside and displayed, it does not need to be transparent.

(2) Organic EL element 22
The white light emitting organic EL element 22 shown in FIG. 1B is not explicitly shown in FIG. 1B, but has a material configuration as shown in FIG. 4, for example.
The organic EL element 22 shown in FIG. 5 uses three materials that emit red, green, and blue, and emits white light together.
(Organic EL layer 26)
The organic EL layer 26 forming the organic EL element 22 is composed of one or a plurality of organic layers including at least the light emitting layer 27.
Examples of the organic layer constituting the organic EL layer 26 other than the light emitting layer include a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer.
This hole transport layer is often integrated with the hole injection layer by imparting a hole transport function to the hole injection layer.
In addition, as an organic layer constituting the organic EL layer, holes or electrons such as a hole blocking layer and an electron blocking layer are prevented from penetrating, and further, exciton diffusion is prevented and excitons are placed in the light emitting layer. By confining, a layer for increasing the recombination efficiency can be cited.
The organic EL layer may have a general configuration, and only the light emitting layer, hole injection layer / light emitting layer, hole injection layer / light emitting layer / electron injection layer, hole injection layer / hole blocking layer. / Light emitting layer / electron injection layer, hole injection layer / light emitting layer / electron transport layer, and the like can be exemplified.
The light emitting material in the white light emitting organic EL element 22 is hardly composed of a single compound, and generally, light emitting materials having two to three colors are used.
The emission spectrum is a combination of the spectra of the luminescent materials of each color.
(Anode 25, cathode 28)
As a conductive material for forming the electrode layers of the anode 25 and the cathode 28, a metal material is generally used. However, an organic material or an inorganic compound may be used, or a plurality of materials may be mixed and used.
In addition, the electrode layers of the anode and the cathode are appropriately selected as to whether or not they have transparency depending on the light extraction surface.
A conductive material having a high work function is preferably used for the anode 25 so that holes can be easily injected, and a conductive material having a low work function is preferably used for the cathode 28 so that electrons can be easily injected.
Examples of the conductive material include In—Zn—O (IZO), In—Sn—O (ITO), Zn—O—Al, and Zn—Sn—O when transparency is required. In the case where transparency is not required, metals can be used, specifically, Au, Ta, W, Pt, Ni, Al, Pd, Cr, Al alloy, Ni alloy, Cr alloy, etc. be able to.
Both the electrode layers of the anode 25 and the cathode 28 preferably have a relatively small resistance.
As a method for forming the electrode layer, a general method for forming an electrode can be used, and examples thereof include a sputtering method, an ion plating method, a vacuum deposition method, a CVD method, and a printing method.
An example of the patterning method for the electrode layer is a photolithography method.

Next, the 2nd example of embodiment of the color filter formation board | substrate of this invention is given.
In the second example, as shown in FIG. 2A, in the first example, the WHITE pixel region 13WS is not provided with the WHITE layer 13W, and only the light absorption layer 15 is provided in the WHITE pixel region 13WS. It is what you are doing.
In the second example in which the WHITE layer 13W is not disposed in the WHITE pixel region 13WS but only the light absorption layer 15 is disposed, the thickness of the WHITE layer 13W is set to zero in the first example. Here, the WHITE pixel region 13WS in the second example is treated as a region having a stacked structure in which the WHITE layer 13W having a zero thickness and the light absorption layer 15 are stacked.
The rest is the same as the first example.
The second example is also used in a display device having the same application as the first example, but when used in the organic EL display device shown in FIG. 2B, the color filter of the first example is used. Similarly to the organic EL display device shown in FIG. 7A, external light is reflected from the front surface (observer side), reflected by internal electrodes and wiring, and emitted. As a result, the amount of light passing through the display can be increased compared to the organic EL display device shown in FIG.

The color filter forming substrate of the present invention is not limited to the above form.
For example, in the first example, the light absorption layer 15 is not formed on the entire surface so as to cover the WHITE pixel region and the colored pixel region where the colored layers of R, G, and B for the color filter are arranged. Another example is a mode (also referred to as a third example) in which a light absorption layer is formed so as to cover only a WHITE pixel region having a high average transmittance and a colored pixel region in which a G colored layer for a color filter is disposed. .
Even when the color filter forming substrate of this form is used in an organic EL display device, the influence of external light reflection can be effectively reduced in substantially the same manner as in the first example.
Further, a layer having a scattering function (also referred to as a scattering layer) on the light absorption layer 15 in the first example and the second example, or on the light absorption layer 15 and the colored layer in the third example. The form which formed can also be mentioned.
By adopting a configuration in which the scattering layer is arranged, the parallax depending on the viewing direction of the observer can be improved as compared with the case where the scattering layer is not provided.
In addition, although not shown in FIGS. 1B and 2B, an embodiment in which an insulating resin layer covering the light absorption layer 15 is provided in advance before being provided for the manufacture of the organic EL display device is also given. It is done.

Next, a method for manufacturing the color filter forming substrate 10 of the first example will be briefly described with reference to FIG.
A transparent plate-like base material 11 is prepared in advance (FIG. 3A). First, a pixel classification light shielding layer 12 is formed on one surface of the base material 11 by a general photolithography method (see FIG. 3). 3 (b)), and then, the colored layers 13R, 13G, 13B and the WHITE layer 13W for each color filter are sequentially formed in a predetermined formation region by a general photolithography method. (Fig. 3 (c))
Here, the resin layers of the colored layers 13R, 13G, 13B and the WHITE layer 13W for each color filter are formed thinly in order of increasing average transmittance.
Usually, each of the colored layers 13R, 13G, and 13B for each color for the pixel classification light shielding layer 12 and the color filter is a resin composition for forming a colored portion in which a colorant such as a pigment or a dye of each color is dispersed or dissolved in a binder resin. It is formed by a photolithography method (also called a photolithography method) using a material, but is not limited thereto.
It can also be formed by a printing method or an inkjet method.
The WHITE layer 13W is made of a resin having a composition in which the coloring material (coloring material) is removed from the resin composition for forming the pixel classification light shielding layer 12 and the colored layers 13R, 13G, and 13B. Although formed, the formation method is not limited to this.
It can also be formed by a printing method or an inkjet method.
Next, the light absorption layer 15 is formed so as to cover the colored layers 13R, 13G, 13B and the WHITE layer 13W. (Fig. 3 (d))
The resin layers of the colored layers 13R, 13G, 13B and the WHITE resin layer 13W for the color filter are formed on one surface of the base material 11 which is a transparent substrate after controlling the film thickness, and then these resin layers are covered. Thus, by forming the light absorption layer 15 flat on the entire surface, the thickness of the light absorption layer 15 can be increased in ascending order of the thickness of each resin layer.
As a material for forming the light absorption layer 15, a resin containing carbon black as a coloring material, a BLUE pigment for color adjustment, and the like dispersed therein is used. A resin having a composition in which a coloring material (coloring material) is removed from a resin composition or the like that forms the pixel-segmenting light-shielding layer 12 and the colored layers 13R, 13G, and 13B is applied.
Examples of the coating method include photolithography (die coating method, spin coating method), ink jet method, and the like. Usually, coating is performed by photolithography.

  The second example of the method for manufacturing the color filter forming substrate 10a is the same as the method for manufacturing the color filter forming substrate 10 of the first example, except that the WHITE layer 13W is not formed. This is the same as the manufacturing method of the color filter forming substrate 10 in the example.

[Example]
The present invention will be further described with reference to examples.
Example 1
Example 1 was prepared by preparing the color filter forming substrate 10 of the first example shown in FIG. 1 (a), and preparing and preparing a photocurable curable resin composition A as follows. Using the prepared curable resin composition A, a curable resin composition for forming a light-shielding portion for pixel classification, a red curable resin composition for forming a color filter, a green curable resin composition, and a blue curable resin By preparing a composition, a curable resin composition for forming a WHITE layer, and a curable resin composition for forming a light absorbing layer, and using these curable resin compositions, respectively, by performing a photolithographic method, A light-blocking part for pixel classification, colored layers for color filters, and a WHITE layer are formed, and a light-absorbing layer is formed by coating.
Here, after forming the pixel-partitioning light-shielding portion 12 by the manufacturing method shown in FIG. 3, the red colored layer 13R, the green colored layer 13G, the blue colored layer 13B, and the WHITE layer 13W for the color filter are respectively formed. The color filter forming substrate 10 of the first example was manufactured by forming a light absorption layer 15 by the photolithography process.
Regarding the resin layers of the color layers (colored resin layers) and WHITE resin layers for color filters, the film thickness is decreased in the order of increasing average transmittance, and the resin layers are further decreased in order of thickness. In the first embodiment, the thicknesses of the colored layers 13R, 13G, 13B, and the WHITE layer 13W for each of the colors R, G, and B are set to 3.0 μm. , 2.5 μm, 3.3 μm, and 1.0 μm, and further, a light absorption layer is formed so as to be 1.0 μm from the upper surface of the B colored layer 13B.

(Preparation of curable resin composition A)
The polymerization tank is charged with 63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by weight of diethylene glycol dimethyl ether (DMDG). After stirring and dissolving, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly.
Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour.
7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine, and 0.2 parts by weight of hydroquinone were further added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours to obtain a copolymer resin solution ( A solid content of 50%) was obtained.
Next, the following materials were stirred and mixed at room temperature to obtain a curable resin composition.
-Copolymer resin solution (solid content 50%): 16 parts by weight-Dipentaerythritol pentaacrylate (Sartomer SR399)
: 24 parts by weight-Orthocresol novolak type epoxy resin (Epicoat Shell Epoxy Co., Ltd. Epicoat 180S70): 4 parts by weight-2-Methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 weights Parts ・ Diethylene glycol dimethyl ether: 52 parts by weight

(Formation of light-blocking portion for pixel division (also referred to as black matrix) 12)
First, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (Mitsubishi Chemical Corporation MS18E): 20 parts by weight Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 75 parts by weight The components were sufficiently mixed to obtain a light-shielding colored layer composition.
-Black pigment dispersion liquid: 43 parts by weight-Curable resin composition A: 19 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight The light-shielding composition for a colored layer on a glass substrate (Asahi Glass Co., Ltd., AN material) The mixture was applied with a spin coater and dried at 100 ° C. for 3 minutes to form a light-shielding colored layer.
A photomask is placed at a distance of 100 μm from the coating film and the light-shielding colored layer is exposed to a light-shielding pattern with an ultra-high pressure mercury lamp of 2.0 kW by a proximity aligner, and then with 0.05 wt% potassium hydroxide aqueous solution After development, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment, thereby forming a light-shielding colored layer 13M in the display region and the frame portion 12 region.
Here, the adjusted colored layer was formed on the entire region, and a black matrix and a light-shielding resin layer at the frame portion were formed by photolithography.
The formed film thickness after the heat treatment was 1.3 μm.
The resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation) has an average particle size of 25 nm.
The particle size is, for example, a laser Doppler scattered light analysis particle size analyzer (trade name “Microtrac 934UPA”) manufactured by Nikkiso Co., Ltd. The particle diameter in which the cumulative pigment particle diameter of the product occupies 50% is defined as 50% average particle diameter, and the value is measured and determined.

(Formation of red colored layer 13R)
On the black matrix, a red curable resin composition having the following composition was applied by spin coating, and then dried in an oven at 70 ° C. for 3 minutes.
Next, a photomask is placed at a distance of 100 μm from the coating film of the red curable resin composition, and ultraviolet rays are applied only to the region corresponding to the colored layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated for 10 seconds.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of a red curable resin composition was removed.
Thereafter, the substrate was left in an atmosphere at 230 ° C. for 15 minutes to perform heat treatment to form a red colored layer in the display region.
The formed film thickness was 3.0 μm.
<Composition of red curable resin composition>
C. I. Pigment Red 177: 2.0 parts by weight I. Pigment Red 254: 2.7 parts by weight-Polysulfonic acid type polymer dispersant: 2.0 parts by weight-Curable resin composition A: 26.3 parts by weight-3-methoxybutyl acetate: 67.0 parts by weight

(Formation of green colored layer 13G)
Next, using the green curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.5 μm, and the green pixel is formed. A relief pattern composed of a green colored layer was formed in the display area.
<Composition of green curable resin composition>
C. I. Pigment Green 7: 6.0 parts by weight I. Pigment Yellow 150: 2.0 parts by weight-Polysulfonic acid type polymer dispersant: 3.0 parts by weight-Curable resin composition A: 22.0 parts by weight-3-methoxybutyl acetate: 67.0 parts by weight

(Formation of blue colored layer 13B)
Further, using the blue curable resin composition having the following composition, the coating film thickness is changed in the same process as the red relief pattern formation so that the formed film thickness becomes 3.3 μm. The relief pattern was formed.
<Composition of blue curable resin composition>
C. I. Pigment Blue 15: 6: 3.6 parts by weight Polysulfonic acid type polymer dispersant: 2.2 parts by weight Curable resin composition A: 27.2 parts by weight 3-methoxybutyl acetate: 67.0 parts by weight Part

(Formation of WHITE layer 13W)
In this example, the coating film thickness is changed to 2.0 μm by changing the coating film thickness in the same process as the red relief pattern formation using the curable resin composition for forming the WHITE layer having the following composition. Thus, the relief pattern of the WHITE layer was formed in the display area.
<Composition of curable resin composition for WHITE layer formation>
-Curable resin composition A: 25.0 parts by weight-3-methoxybutyl acetate: 67.0 parts by weight

(Formation of the light absorption layer 15)
Further, the light absorbing layer is formed on the entire surface so as to cover the colored layers 13R, 13G, 13B and the WHITE layer 13W for each color filter using the curable resin composition for forming the light absorbing layer produced as described below. As shown in FIG. 1B, the light absorption layer 15 was formed flat on the entire surface.
Here, the light absorption layer 15 was formed flat on the entire surface so that the thickness from the upper surface of the thick blue colored layer 13B could be kept at 1.0 μm.
<Preparation of curable resin composition for light absorption layer formation>
First, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation): 20.0 parts by weight Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 163): 5.0 parts by weight Solvent (diethylene glycol dimethyl ether): 75.0 parts by weight Next, the following amounts of components were sufficiently mixed to obtain a curable resin composition for forming a light absorption layer.
-Black pigment dispersion: 2.6 parts by weight-C.I. I. Pigment Blue 15: 6: 1.0 part by weight-Polysulfonic acid type polymer dispersant: 0.6 part by weight-Curable resin composition A: 13.0 parts by weight-Diethylene glycol dimethyl ether: 82.8 parts by weight

As described above, the color filter forming substrate 10 of the first example shown in FIG.
Next, the formed color filter forming substrate 10 of the first example and the organic EL element forming plate 20 are laminated at a predetermined interval (about 6 mm) with the insulating resin layer 14 interposed therebetween, and FIG. An organic EL display device shown in b) was produced.

(Example 2)
In Example 2, the color filter forming substrate 10a of the second example shown in FIG. 2A was produced, and the same material as that used in Example 1 was used for forming each part, as shown in FIG. The formation process of each member was basically the same as in Example 1 by the manufacturing process.
Next, the formed color filter forming substrate 10a of the second example and the organic EL element forming plate 20a are laminated at a predetermined interval (about 6 mm) with the insulating resin layer 14 interposed therebetween, and FIG. An organic EL display device shown in b) was produced.

(Comparative Example 1)
In Comparative Example 1, the conventional color filter forming substrate 110 shown in FIG.
In Comparative Example 1, each of the color layers (colored resin layers) 113R, 113G, 113B, and WHITE resin layer 113W for the color filter has a thickness of approximately 2.5 μm, and the average transmittance is The WHITE resin layer 113W, the G colored layer 113G, the R colored layer 113R, and the B colored layer 113B are arranged in order from the highest.
In the formation of the color filter forming substrate of Comparative Example 1, the following curable resins for forming the respective color layers (colored resin layers) 113R, 113G, 113B and WHITE resin layer 113W for the color filters are used. Was used.
The pixel-partitioning light-shielding portion (also referred to as a black matrix) 12 was formed in the same manner as in Example 1.
<Composition of red curable resin composition>
C. I. Pigment Red 177: 5 parts by weight C.I. I. Pigment Red 254: 6 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 19 parts by weight-3-methoxybutyl acetate: 67 parts by weight <Composition of green curable resin composition >
C. I. Pigment Green 58: 7 parts by weight C.I. I. Pigment Yellow 138: 1 part by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 22 parts by weight-3-methoxybutyl acetate: 67 parts by weight <Composition of blue curable resin composition >
C. I. Pigment Blue 15: 6: 8 parts by weight-Polysulfonic acid type polymer dispersant: 4 parts by weight-Curable resin composition A: 19 parts by weight-3-methoxybutyl acetate: 67 parts by weight <Curing for forming WHITE layer Of Resin Composition>
-Curable resin composition A: 25 weight part-3-methoxybutyl acetate: 67 weight part And the produced color filter formation board | substrate 110 and the organic EL element formation board 120 are used for the insulating resin layer 14. The organic EL display device shown in FIG. 11A was fabricated by sandwiching and laminating at a predetermined interval (about 6 mm).

(Comparative Example 2)
Comparative Example 2 is a color filter forming substrate 110a shown in FIG. 7B. The comparative example 1 does not have a WHITE layer and is a colored layer (colored resin layer) 113R for each color filter. , 113G, 113B, and WHITE resin layer 113W, each of the resin layers had a thickness of approximately 2.5 μm, and was fabricated in the same manner as in Comparative Example 1.
Also in Comparative Example 2, the average transmittance is, in descending order, the WHITE resin layer 113W, the G colored layer 113G, the R colored layer 113R, and the B colored layer 113B.
Then, the produced color filter forming substrate 110a and the organic EL element forming plate 120a are laminated at a predetermined interval (about 6 mm) with the insulating resin layer 14 interposed therebetween, and the organic material shown in FIG. An EL display device was produced.

(Comparative Example 3)
In Comparative Example 3, the color filter forming substrate 110b shown in FIG. 7C is manufactured, and is formed in the same manner as Comparative Example 1 except for the formation of the transmittance adjusting portion 113WA.
The transmittance adjusting portion 113WA was formed by a photolithography method using a curable resin composition produced as follows.
<Preparation of curable resin composition>
First, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation): 20.0 parts by weight Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 163): 5.0 parts by weight Solvent (diethylene glycol dimethyl ether): 75.0 parts by weight Next, the following amounts of components were sufficiently mixed to obtain a curable resin composition for forming a light absorption layer.
-Black pigment dispersion: 2.6 parts by weight-C.I. I. Pigment Blue 15: 6: 1.0 part by weight-Polysulfonic acid type polymer dispersant: 0.6 part by weight-Curable resin composition A: 13.0 parts by weight-Diethylene glycol dimethyl ether: 82.8 parts by weight The formed color filter forming substrate 110b and the organic EL element forming plate 120b are laminated at a predetermined interval (about 6 mm) with the insulating resin layer 14 interposed therebetween, and the organic EL display device shown in FIG. Was made.

ここでは、上記透過率特性の測定を、顕微分光測光装置（ＯＳＰ−ＳＰ２０００、ＯＬＹＭＰＵＳ（株）製）を用いて、４００ｎｍ〜７００ｎｍの波長範囲で行い、得られた結果から、換算して、ＪＩＳ Ｚ８７０１のＸＹＺ表色系における色度座標（ｘ、ｙ）、明るさＹにて表した。 In addition, as shown in FIG. 5, the light transmission characteristics in the visible light region of the light absorption layer 15 used in each color filter forming substrate 10, 10a produced in each example of Example 1 and Example 2 are as follows. The transmittance characteristics close to a flat flat were obtained over the entire visible light region (wavelength region of 400 nm to 700 nm) during display, with little variation in the light transmittance of the light absorption layer.
As a result, the transmission chromaticity and reflection chromaticity of the light absorbing layer 15 in the XYZ color system of JIS Z8701 are as shown in Table 1.
Table 1 shows that the color misregistration chromaticity due to the reflected light is small when the C light source and the D65 light source are used. From Table 1, the color using the light absorption layer having such transmittance characteristics is shown. Similarly, in the organic EL display measures of the respective examples manufactured using the filter forming substrates 10, 10a, and 10b, it is determined that the color shift due to the light absorption layer is small.

Here, the transmittance characteristics are measured in a wavelength range of 400 nm to 700 nm using a microspectrophotometer (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.), converted from the obtained results, and converted into JIS. This is represented by chromaticity coordinates (x, y) and brightness Y in the XYZ color system of Z8701.

表２における評価は、目視にて、相対的に評価したものである。
表示輝度は、円偏光板を配設した比較例２の有機ＥＬ表示装置の評価を×とし、比較例２の有機ＥＬ表示装置より、輝度大のものを○としている。
外光反射量の評価は、表示電源をＯＦＦにした状態のもので、比較例１の有機ＥＬ表示装置の評価を×とし、比較例３の有機ＥＬ表示装置の評価を△とし、比較例２よりも外光反射が少ないものを○としている。
外光反射ムラ（バラツキ）の評価は、表示電源をＯＦＦにした状態のもので、ムラの程度が良くない比較例１、比較例３の各有機ＥＬ表示装置を×とし、これよりムラの程度が良い実施例１、実施例２の各有機ＥＬ表示装置を○とし、最もムラの程度が良い比較例２の有機ＥＬ表示装置を二重丸◎とした。
視差は、見る方向による差が少ない状態を○、極めて少ない場合を◎としている。 Regarding the organic EL display device using the color filter forming substrate of each of Examples 1, 2 and Comparative Examples 1 to 3, display luminance, external light reflection (when the power is OFF), reflection unevenness (variation) The results of evaluating the parallax are shown in Table 2.

The evaluation in Table 2 is relatively evaluated visually.
For the display brightness, the evaluation of the organic EL display device of Comparative Example 2 in which the circularly polarizing plate is provided is evaluated as x, and the display luminance of the organic EL display device of Comparative Example 2 is evaluated as ◯.
The evaluation of the external light reflection amount is in a state where the display power is turned off, the evaluation of the organic EL display device of Comparative Example 1 is set as x, the evaluation of the organic EL display device of Comparative Example 3 is set as Δ, and the comparative example 2 The one with less external light reflection is marked with ○.
External light reflection unevenness (variation) was evaluated when the display power supply was turned off, and each organic EL display device of Comparative Example 1 and Comparative Example 3 where the degree of unevenness was not good was evaluated as x. Each of the organic EL display devices of Examples 1 and 2 with good quality was marked with ◯, and the organic EL display device of Comparative Example 2 with the best degree of unevenness was marked with double circle ◎.
For the parallax, a state where the difference depending on the viewing direction is small is indicated by ○, and a case where the difference is extremely small is indicated by ◎.

10, 10a Color filter forming substrate 11 Base material (also called transparent substrate)
12 Pixel classification light blocking layer (also called black matrix)
13R Red colored layer 13G Green colored layer 13B Blue colored layer 13W WHITE layer 13RL Red display color 13GL Green display color 13BL Blue display color 13RS Colored pixel region 13GS (with a red color layer disposed) Colored pixel region 13BS (with a colored layer) Colored pixel region 13WS (with a blue colored layer) WS WHITE pixel region 14 Insulating resin layer 15 Light absorbing layer 20 Organic EL element forming substrate 21 Base material (also referred to as transparent substrate) )
22 Organic EL element 22W White light 25 Anode 26 Organic EL layer 27 Light emitting layer 28 Cathode 110, 110a, 110b, Color filter forming substrate 111 Base material (also referred to as transparent substrate)
112 Pixel-shading part (also called black matrix)
113R Red colored layer 113G Green colored layer 113B Blue colored layer 113W WHITE layer 113WA Transmittance adjuster 113RL1, 113RL2, 113RL3 Red display color 113GL1, 113GL2, 113GL3 Green display color 113BL1, 113BL2, 113BL3 Blue display color 113RS Colored pixel region 113GS (with a red colored layer provided) Colored pixel region 113BS (with a green colored layer provided) Colored pixel region 113BS (with a blue colored layer provided) 113 WHITE pixel region 114 Insulating resin layer 120 Organic EL element forming substrate 121 Base material (also called transparent substrate)
122 Organic EL element 122W White light

Claims (8)

  A color filter forming substrate used in a white light source type organic EL display device, and has a higher light transmittance than the colored pixel region separately from the colored pixel region which is a pixel region in which a colored layer for each color filter is arranged. A color filter forming substrate having a WHITE pixel region which is a pixel region of the color filter, wherein the colored pixel region has a laminated structure in which a colored layer for a color filter and a light absorption layer are laminated, and the WHITE pixel region is The color filter having a laminated structure in which a WHITE resin layer and the light absorbing layer are laminated, or a single layer structure having only the light absorbing layer, and the light absorbing layer is laminated in the colored pixel region or the WHITE pixel region. For each color layer for each color, and for each resin layer of the WHITE resin layer, the film thickness is decreased in order of increasing average transmittance, and Regarding the single layer structure of the WHITE pixel region as a stacked structure in which the WHITE resin layer and the light absorption layer are stacked when the film thickness of the WHITE resin layer is zero, the region having any one of the above stacked structures The color filter forming substrate, wherein the resin layers and the light absorption layer are laminated by increasing the thickness of the light absorption layer in the order of decreasing film thickness of the resin layers.   2. The color filter forming substrate according to claim 1, further comprising: a pixel region in which three color layers of R, G, and B are arranged as a pixel region of the color layer for the color filter, and the light A color filter forming substrate, wherein an absorption layer is formed in the WHITE pixel region and the pixel region of the G colored layer for the color filter.   3. The color filter forming substrate according to claim 1, wherein the light absorption layer is formed in all pixel regions. 4.   The color filter forming substrate according to any one of claims 1 to 3, wherein the light absorption layer contains carbon black dispersed as a colorant in a resin. Color filter forming substrate.   5. The color filter forming substrate according to claim 1, wherein an average transmittance of the light absorption layer in a C light source is 45% to 95%. 6.   The color filter forming substrate according to claim 1, wherein the light absorption layer has a thickness of 1 μm or more.   7. The color filter forming substrate according to claim 1, wherein a layer having a scattering function (also referred to as a scattering layer) is disposed above the light absorption layer. Filter forming substrate.   A white light source type organic EL display device having a structure in which an organic EL element forming substrate and a color filter forming substrate are laminated, wherein the color filter forming substrate according to any one of claims 1 to 7 is used. A characteristic organic EL display device.

Images