JP6163736B2 - Color filter forming substrate and organic EL display device - Google Patents

Description

  The present invention relates to a color filter forming substrate for an organic EL display device and an organic EL display device using the substrate, and more particularly to a color filter forming substrate for a white light emitting type organic EL display device.

In recent years, organic EL display devices are self-luminous and have excellent visibility and do not require a backlight. Therefore, they can be thin and light, have a simple structure and can be manufactured at low cost, and are suitable for displaying moving images. Therefore, research and development and commercialization of a flat display device (also referred to as a flat panel) following a liquid crystal display device and a plasma display device are being promoted.
In the white light emitting type organic EL display device, as shown in FIG. 16A, in order to achieve both high color purity and high luminance of display, each color of R, G, B for color filter is colored. In addition to pixels (also referred to as colored pixels) provided with layers, a color filter forming substrate 110 having high light-transmitting high light-transmitting pixels has come to be used.
A high light transmission pixel is usually provided with a resin layer that is not colored or a resin layer that is slightly colored in accordance with the combined colors of R, G, and B. The high light transmission pixel is referred to as a WHITE pixel, and the resin layer disposed in the WHITE pixel is referred to as a WHITE layer.
The organic EL display device is also referred to as an organic electroluminescence display device or an organic EL display device, and the display device is also referred to as a display panel.

In a white light emission type organic EL display device using a color filter forming substrate having such a WHITE pixel, light incident from the outside (hereinafter also referred to as external light) is transmitted through the WHITE pixel, and the organic EL There is a problem in that it is reflected by the electrode and metal wiring of the element (also referred to as an organic electroluminescence element or an organic EL light emitting element) and the contrast is lowered.
In the case of the organic EL display device shown in FIG. 16A, the reflectance of external light incident from the front surface (observer side) is usually about 97%.
In order to solve this problem, for example, as shown in FIG. 16B, a circularly polarizing plate 130 is provided on the front surface (observer side) of the white light emission type organic electroluminescence display device to reflect external incident light. The 1st form which reduces is taken.
However, in the case of the first embodiment, the circularly polarizing plate greatly reduces the transmittance, and as a result, the light emission efficiency of the organic EL element is remarkably lowered and the display luminance is lowered.
In the case of the organic EL display device shown in FIG. 16B, the reflectance of external light incident from the front surface (observer side) is usually about 0.1%, and the display brightness is shown in FIG. It is about 40% of the organic EL display device of the form shown in FIG.

Further, as shown in FIG. 16C, a second embodiment is also provided in which a layer made of a photosensitive resin in which a coloring material is dispersed is arranged in a region corresponding to a WHITE pixel, and this is used as a transmittance adjusting unit 113WA. It is taken. (See Patent Document 3)
In the case of this form, the transmittance adjusting unit 113WA can adjust the incidence of external light and the reflection of the incident external light on the electrode and metal wiring of the organic electroluminescence element.
However, in the case of this second embodiment, the reflection color of the interface between the base material 111 made of a transparent substrate and each colored layer for each color filter, and the interface between the base material 111 made of a transparent substrate and the transmittance adjusting unit 113WA is different. In addition, there is a problem that uneven reflection is easy to see because the transmittance of the pixel differs depending on the color of each color layer for the color filter.
In the case of the second mode, the reduction in reflection of external light is insufficient, and in order to sufficiently reduce the reflection of external light and eliminate uneven reflection, for example, an organic EL display of the mode shown in FIG. As in the apparatus, it is necessary to provide a circularly polarizing plate on the front surface (observer side).

  As described above, in order to achieve both high color purity and high luminance of display, in addition to the colored pixels of R, G, and B colors for color filters, a white light emitting organic In the EL device, the first mode, the second mode, the first mode, the first mode, or the second mode can be used to solve the problem that the WHITE pixel passes through the WHITE pixel and is reflected by the electrode and metal wiring of the organic EL element. However, none of these forms has achieved a reduction in reflection of external light and prevention of a decrease in display luminance, and is not satisfactory in terms of display quality.

JP 2008-47340 A JP 2002-377776 A Japanese Patent Application No. 2011-047924

As described above, in the white light emitting type organic EL display device, there is nothing particularly satisfactory in terms of external light reflection, and this countermeasure has been demanded.
This invention respond | corresponds to this, and it aims at providing the organic electroluminescence display which can make external light reflection reduction possible with a white light emission type organic electroluminescence display, Furthermore, external An object of the present invention is to provide an organic EL display device that can achieve a reduction in display luminance in addition to a reduction in light reflection, and that is satisfactory in terms of display quality.
It is another object of the present invention to provide a color filter forming substrate capable of manufacturing such an organic EL display device.

また、上記いずれかのカラーフィルタ形成基板であって、前記光吸収層の膜厚が１μｍ以上であることを特徴とするものである。
また、上記いずれかのカラーフィルタ形成基板であって、前記光吸収層の膜厚は、前記光吸収層を積層しない場合において透過率の高い画素領域ほど厚くなっていることを特徴とするものである。
また、上記いずれかのカラーフィルタ形成基板であって、前記光吸収層を積層した画素領域の最も外側に、散乱機能を有する層（散乱層とも言う）を配設していることを特徴とするものである。
また、上記いずれかのカラーフィルタ形成基板であって、前記積層構造は、光吸収層が基材と着色層との間に形成されている構造であることを特徴とするものであり、前記カラーフィルタ用の各色の着色層の画素領域を区分けする画素区分用遮光層（ブラックマトリクスとも言う）と、前記光吸収層とは、樹脂中に色材を分散させた感光性樹脂を用いてフォトリソ法により形成されたものであることを特徴とするものである。 The color filter forming substrate of the present invention is for a white light source type organic EL display device, and a colored layer for a color filter is divided into colors on a surface of a base material made of a transparent substrate to form a predetermined pixel region. A color filter forming substrate, wherein a colored layer and a light absorbing layer are laminated in a pixel region where one or more of the colored layers for the color filter are arranged. It is characterized by having a laminated structure.
And it is said color filter formation board | substrate, Comprising: As a pixel area | region of the colored layer of multiple colors for said color filters, it has a pixel area | region of the colored layer of three colors of R, G, B, and said R, In addition to the pixel area of the colored layer of each color of G and B, a WHITE pixel area is provided, and the light absorption layer includes the WHITE pixel area and the pixel area of the G colored layer for the color filter. , Is formed.
Further, in any one of the color filter forming substrates, the light absorption layer is formed in the entire pixel region.
In any one of the above color filter forming substrates, the light absorption layer contains carbon black dispersed as a coloring material in a resin.
Further, in any one of the above color filter forming substrates, an average transmittance of the light absorption layer in a C light source is 45% to 95%.
Here, the “average transmittance” is a value obtained by averaging the transmittance of the light absorption layer over the entire visible light region and the transmittance over the entire visible light region.
Here, the transmission spectrum is measured using a microspectroscope (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.). From the transmission spectrum obtained by the measurement, Y in the XYZ color system is obtained from the following equation (1). Is substantially equivalent to this.
In equation (1), P (λ) is the spectral composition of the light source, y (λ) is one of the color matching functions in the XYZ display system, and τ (λ) is the spectral transmission of the object here. The rate, k is a constant.

In any one of the above color filter forming substrates, the thickness of the light absorption layer is 1 μm or more.
Further, in any one of the above color filter forming substrates, the thickness of the light absorption layer is such that the pixel region having a higher transmittance is thicker when the light absorption layer is not stacked. is there.
In any one of the color filter forming substrates described above, a layer having a scattering function (also referred to as a scattering layer) is disposed on the outermost side of the pixel region where the light absorption layer is stacked. Is.
The color filter forming substrate according to any one of the above, wherein the laminated structure is a structure in which a light absorption layer is formed between a base material and a colored layer. A light-blocking layer for pixel division (also referred to as a black matrix) for dividing a pixel region of a colored layer for each color for a filter and the light absorption layer are a photolithographic method using a photosensitive resin in which a color material is dispersed in a resin. It is formed by these.

  The display device of the present invention is a white light source type organic EL display device having a structure in which an organic EL element forming substrate and a color filter forming substrate are laminated, and the color filter formation according to any one of claims 1 to 10 It is characterized by using a substrate.

特に、表示の際の可視光領域（４００ｎｍ〜７００ｎｍ波長領域）全体にわたり光吸収層の光透過率のバラツキが少ないフラットである場合、光吸収層を設けたことによる表示の際の色ずれを少ないものとできる。
また、光吸収層の形成は、フォトリソ法を前提として、膜形成後、現像してパターン形成するため、光吸収層としては膜厚が１μｍ以上が好ましい。
また、前記光吸収層の膜厚は、該光吸収層を積層しない場合において透過率の高い画素領域ほど厚くなっている請求項７の発明の形態とすることにより、各着色層の画素領域における外光反射のムラを少なくすることを可能としている。
また、光吸収層を積層した画素領域の最も外側に、散乱機能を有する層（散乱層とも言う）を配設している請求項８の発明の形態とすることにより、表示の際、見る方向による視差を少なくできるものとしている。
また、有機ＥＬ素子形成基板とカラーフィルタ形成基板とを積層した構造である有機ＥＬ表示装置においては、有機ＥＬ素子形成基板とカラーフィルタ形成基板との間隔を所定の間隔とするため、積層構造は、光吸収層が基材と着色層との間に形成されている構造である請求項９の発明の形態とすることにより、各色の画素領域において、有機ＥＬ素子とカラーフィルタ用の着色層との距離を、従来と同様にとれ、表示の際、見る方向による視差を少なくできる。
請求項９の形態において、カラーフィルタ用の各色の着色層の画素領域を区分けする画素区分用遮光層（ブラックマトリクスとも言う）と、前記光吸収層とは、樹脂中に色材を分散させた感光性樹脂を用いてフォトリソ法により形成されたものである請求項１０の形態とすることにより、画素区分用遮光層と光吸収層の形成工程を同じフォトリソ工程で一度にできるものとしており、工程の簡略化、材料の共通化が図れる。 (Function)
By adopting such a configuration, the color filter forming substrate of the present invention can reduce external light reflection in a white light emitting type organic EL display device. Further, in addition to reducing external light reflection, the display luminance can be reduced. It is possible to provide a color filter-formed substrate that can achieve the prevention of the deterioration of the image quality and can produce an organic EL display device that is satisfactory in terms of display quality.
The pixel region in which one or more colored layers of a plurality of colored layers for a color filter are arranged has a stacked structure in which a colored layer and a light absorbing layer are stacked. This makes it possible to reduce external light reflection.
Specifically, the pixel region of the three color layers of R, G, and B is provided as the pixel region of the color layers for the color filters, and the color layers of the respective colors of R, G, and B are used. 3. A WHITE pixel region is provided in addition to the pixel region, and the light absorption layer is formed in the WHITE pixel region and a pixel region of a G color coloring layer for the color filter. Examples of the invention may be mentioned.
In the case of this form, since the light absorption layer is formed in the pixel region of the G colored layer for the color filter having a high display luminance, the light absorption layer is provided in the pixel region of the other colored layers of the R and B colors. Even if it is not provided, it is possible to reduce external light reflection and prevent display luminance from being lowered.
Further, when the light absorption layer is formed in the whole pixel region, the reflection of outside light in all the pixel regions can be reduced.
Specific examples of the light absorbing layer include those in which carbon black is dispersed and contained as a coloring material in the resin, but is not limited thereto.
The average transmittance of the light absorption layer in the C light source is 45% to 95%. By adopting the form of claim 5, in addition to the effect of reducing the reflection of external light, the luminance at the time of display is reduced to a circularly polarizing plate. It can be made larger than the first embodiment shown in FIG.
Here, the “average transmittance” is a value obtained by averaging the transmittance of the light absorption layer over the entire visible light region and the transmittance over the entire visible light region.
Here, the transmission spectrum is measured using a microspectroscope (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.). From the transmission spectrum obtained by the measurement, Y in the XYZ color system is obtained from the following equation (1). Is substantially equivalent to this.
In equation (1), P (λ) is the spectral composition of the light source, y (λ) is one of the color matching functions in the XYZ display system, and τ (λ) is the spectral transmission of the object here. The rate, k is a constant.

In particular, in the case where the light absorption layer is flat with little variation in light transmittance over the entire visible light region (400 nm to 700 nm wavelength region) during display, there is little color shift during display due to the provision of the light absorption layer. I can do it.
In addition, since the light absorption layer is formed on the premise that a photolithographic method is formed and then developed to form a pattern, the light absorption layer preferably has a thickness of 1 μm or more.
The thickness of the light absorption layer is increased in a pixel region having a higher transmittance when the light absorption layer is not stacked. It is possible to reduce the unevenness of external light reflection.
In addition, a layer having a scattering function (also referred to as a scattering layer) is disposed on the outermost side of the pixel region in which the light absorption layers are stacked. It is assumed that the parallax due to the can be reduced.
In addition, in an organic EL display device having a structure in which an organic EL element forming substrate and a color filter forming substrate are stacked, the interval between the organic EL element forming substrate and the color filter forming substrate is set to a predetermined interval. The light absorbing layer has a structure formed between the base material and the colored layer. By adopting the form of the invention of claim 9, in the pixel region of each color, the organic EL element and the colored layer for the color filter Thus, the parallax depending on the viewing direction can be reduced during display.
10. The form according to claim 9, wherein the pixel classification light-shielding layer (also referred to as a black matrix) that separates the pixel regions of the color layers for the color filters and the light absorption layer are obtained by dispersing a color material in the resin. By forming the light-shielding layer for pixel division and the light absorption layer at the same time in the same photolithography process, the process according to claim 10, wherein the process is performed by photolithography using a photosensitive resin, Simplification and common use of materials.

  By adopting such a configuration, the display device of the present invention is satisfactory in terms of display quality and a white light emitting type provided with WHITE pixels in addition to colored pixels of R, G, and B colors for color filters. An organic EL display device that can be used is provided.

As described above, the present invention is a white light emitting type organic EL display device that can reduce external light reflection, and can achieve reduction of display luminance in addition to reduction of external light reflection, and It was possible to provide an organic EL display device that was satisfactory in terms of display quality.
At the same time, it is possible to provide a color filter forming substrate capable of manufacturing such an organic EL display device.

FIG. 1A is a partial sectional view of a first example of an embodiment of a color filter forming substrate of the present invention, and FIG. 1B is a color of the first example shown in FIG. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. FIG. 2A is a partial cross-sectional view of a second example of an embodiment of the color filter forming substrate of the present invention, and FIG. 2B is a color of the second example shown in FIG. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. 3A is a partial cross-sectional view of a third example of the embodiment of the color filter forming substrate of the present invention, and FIG. 3B is a color of the third example shown in FIG. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. FIG. 4A is a modification of the first example shown in FIG. 1A, and FIG. 4B is a modification of the second example shown in FIG. 2A. FIG. 5A is a partial cross-sectional view of the fourth example of the embodiment of the color filter forming substrate of the present invention, and FIG. 5B is the color of the fourth example shown in FIG. It is a partial sectional view of an organic EL display device using a filter formation substrate. 6A is a partial sectional view of a fifth example of the embodiment of the color filter forming substrate of the present invention, and FIG. 6B is a color of the fifth example shown in FIG. 6A. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. FIG. 7A is a partial cross-sectional view of the sixth example of the embodiment of the color filter forming substrate of the present invention, and FIG. 7B is the color of the sixth example shown in FIG. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. FIG. 8A is a partial cross-sectional view of the seventh example of the embodiment of the color filter forming substrate of the present invention, and FIG. 8B is the color of the seventh example shown in FIG. It is a partial cross section figure of the organic electroluminescence display which used the filter formation board | substrate. FIG. 9A is a partial cross-sectional view of a color filter forming substrate of a modification of the third example shown in FIG. 3A, and FIG. 9B is a modification of FIG. 9A. FIG. 9C is a partial cross-sectional view of the organic EL display device using the color filter forming substrate of FIG. 9 and is a partial view as seen from A1-A2 of FIG. It is the schematic layer block diagram which showed the structural example of the organic EL element. It is the figure which showed the spectral transmittance characteristic of the light absorption layer. It is the figure which showed the relationship between the transmittance | permeability of a light absorption layer, and the transmittance | permeability of the external light which passed the light absorption layer twice. FIG. 13A to FIG. 13D are process cross-sectional views illustrating a method for manufacturing the color filter forming substrate of the first example. FIG. 14A to FIG. 14D are process cross-sectional views illustrating a method for manufacturing the color filter forming substrate of the second example. FIG. 15A to FIG. 15C are process cross-sectional views illustrating a method for manufacturing a color filter forming substrate of the third example. FIG. 16A is a partial sectional view of a conventional organic EL display device provided with a WHITE layer, and FIG. 16B is a front view (observer side) of the display device shown in FIG. FIG. 16C is a partial cross-sectional view of an organic EL display device in which a circularly polarizing plate is provided. FIG. 16C is a display device shown in FIG. 16A in which a transmittance adjusting unit is provided in a conventional WHITE layer forming region. It is a partial cross section figure of an organic electroluminescence display.

First, the 1st example of embodiment of the color filter formation board | substrate of this invention is demonstrated based on Fig.1 (a).
The color filter forming substrate 10 of the first example is a color filter forming substrate used for a white light source type organic EL display device, and three colors of R, G, and B are used as the pixel regions of the colored layers for each color filter. And a WHITE pixel region in addition to the R, G, and B color layer pixel regions. In particular, the light absorption layer 15 includes a WHITE pixel region, a color layer, and a color layer. It is formed on the entire surface so as to cover the pixel region of the colored layers of R, G, and B for the filter.
As shown in FIG. 1A, the color filter forming substrate 10 of the first example has a pixel segmenting light shielding layer 12 formed on one surface of the base material 11 side, and covers the pixel segmenting light shielding layer 12. As described above, the colored layers 13R, 13G, 13B of each color and the WHITE layer 13W are arranged, and the light absorbing layer 15 is arranged so as to cover the colored layers 13R, 13G, 13B of each color and the WHITE layer 13W.
Examples of the organic EL display device include, but are not limited to, for mobile electronic devices such as mobile-type notebook personal computers and multi-function terminal devices (also referred to as high-function terminal devices).
The color filter forming substrate 10 of the first example has an organic EL element forming substrate 20 in which a white light emitting organic EL element 22 is formed for each pixel and an insulating resin layer 14 between them at a predetermined interval. As shown in FIG. 1B, the organic EL display device is laminated.

特に、表示の際の可視光領域（４００ｎｍ〜７００ｎｍ波長領域）全体にわたり光吸収層の光透過率のバラツキが少ないフラットである場合、光吸収層を設けたことによる表示の際の色ずれを少ないものとできる。 As described above, the color filter forming substrate 10 of the first example is provided with the light absorption layer 15 over the entire surface so as to cover the WHITE pixel region and the pixel region of the colored layers of R, G, and B for the color filter. Therefore, when the organic EL display device shown in FIG. 1B is manufactured using the color filter forming substrate 10 of the first example, external light is incident from the front surface (observer side) The reflected light of the external light reflected and emitted from the internal electrodes and wiring passes through the light absorption layer 15 twice at the time of incidence and at the time of emission and emission, and the reflected light to be emitted can be reduced. .
For example, in the visible light region (wavelength range of 400 nm to 700 nm), when the transmittance characteristic of the light absorption layer 15 is flat and 60%, the light passing through the light absorption layer 15 twice is substantially 60%, 60% 36%.
Further, since the light for display passes through the light absorbing layer 15 once and is emitted, the transmitted light is reduced by the light absorbing layer 15 only once. For example, the transmittance of the light absorbing layer 15 is set to 60. If%, the decrease in transmitted light due to passing through the light absorption layer 15 once is substantially 60%.
Therefore, when the color filter of the first example is used, external light is incident from the front surface (observer side) compared to the organic EL display device shown in FIG. As compared with the organic EL display device using the circularly polarizing plate shown in FIG. 16B, it is possible to reduce the reflected light of the external light reflected and emitted, and to reduce the reduction of the passing light at the time of display. Thus, it is possible to increase the amount of transmitted light during display.
For example, if the transmittance characteristic of the light absorption layer 15 is flat and 60% in the visible light region (wavelength range of 400 nm to 700 nm), the front surface (observation) as compared with the organic EL display device shown in FIG. External light is incident from the external side), reflected by the internal electrodes and wiring and emitted, the reflected light of the external light can be reduced to 36%, and the passing light at the time of display can be 60%, About the passage light at the time of display, the passage light at the time of display is increased as compared with the organic EL display device shown in FIG. 16B which is about 40% of the organic EL display device shown in FIG. be able to.
With respect to the transmittance of the light absorption layer 15, external light is incident from the front surface (observer side) and reflected by internal electrodes and wiring as compared with the conventional organic EL display device shown in FIG. Since the reflected light of the emitted external light can be reduced and the transmitted light at the time of display is increased as compared with the organic EL display device using the circularly polarizing plate shown in FIG. In this case, the average transmittance is preferably 45% to 95%.
Here, the “average transmittance” is a value obtained by averaging the transmittance of the light absorption layer over the entire visible light region and the transmittance over the entire visible light region.
Here, the transmission spectrum is measured using a microspectroscope (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.). From the transmission spectrum obtained by the measurement, Y in the XYZ color system is obtained from the following equation (1). Is substantially equivalent to this.
In equation (1), P (λ) is the spectral composition of the light source, y (λ) is one of the color matching functions in the XYZ display system, and τ (λ) is the spectral transmission of the object here. The rate, k is a constant.

In particular, in the case where the light absorption layer is flat with little variation in light transmittance over the entire visible light region (400 nm to 700 nm wavelength region) during display, there is little color shift during display due to the provision of the light absorption layer. I can do it.

The light absorbing layer 15 is formed by using carbon black as a main coloring material in the resin, BLUE pigment or the like for color adjustment, and dispersing them. By adjusting the concentration of the material, the intensity of light transmitted through the light absorption layer can be adjusted, and by appropriately including a color adjusting pigment, light can be emitted over the entire visible light region (400 nm to 700 nm wavelength region) during display. A flat transmittance characteristic with little variation in light transmittance of the absorption layer can be easily obtained.
By adjusting the concentration of carbon black as the main coloring material, various transmittances can be easily obtained as shown in FIG.
In FIG. 12, the transmissivity value of the light absorption layer is represented on the horizontal axis, and the transmissivity when the light absorption layer corresponding to the transmissivity value of the light absorption layer passes twice is represented on the vertical axis. The triangles in FIG. 12 indicate the transmittance (horizontal axis) of the light absorbing layer obtained by adjusting and measuring the carbon black concentration, and the transmittance when passing through the corresponding absorbing layer twice (vertical axis). Is shown.
In the case of the organic EL device shown in FIG. 1B, the reflected light of outside light passes through the light absorption layer twice at the time of incidence and at the time of emission, so here, the vertical axis in FIG. For convenience, the transmittance of outside light is used.
Further, by adjusting the content of the pigment for color adjustment, it is possible to easily obtain transmittance characteristics close to flat over the visible light region (wavelength range of 400 nm to 700 nm).
In the visible light region (wavelength range of 400 nm to 700 nm), the light absorption layer has a light transmission characteristic closer to a flat color shift due to the provision of the light absorption layer, and a color shift of transmitted light during display. The color shift of external light reflection can be reduced.
For example, when a light absorption layer having transmittance characteristics close to a flat as shown in FIG. 11 is used, there is no problem of color misregistration due to the provision of the light absorption layer.

Next, each member of the color filter forming substrate 10 shown in FIG. 1A and the organic EL display device shown in FIG.
<Substrate 11>
As the base material 11 made of the transparent substrate used in the first example, those conventionally used for color filters can be used, and flexible such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, etc. Non-transparent transparent inorganic substrate, and a transparent resin substrate having flexibility such as a transparent resin film and an optical resin plate. In particular, it is preferable to use an inorganic substrate. Among these, it is preferable to use a glass substrate.
Furthermore, it is preferable to use an alkali-free type glass substrate among the glass substrates.
This is because the alkali-free glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and since it does not contain an alkali component in the glass, it can be suitably used for a color filter for a display device. .
As the substrate, a transparent transparent substrate is usually used.

<Pixel classification light blocking layer (also referred to as black matrix) 12>
As the light-shielding colored layer for forming the pixel-segmenting light-shielding layer 12 that segments the pixel regions of the color layers for each color filter, for example, here, carbon black coated with a resin such as an epoxy resin is pigmented. A (pigment) dispersed in a binder resin is used.
In the case where carbon black is dispersed as a pigment (pigment) in a binder resin, the light-shielding resin layer can be formed with a relatively thin film thickness.
Here, the light-shielding colored layer of the pixel-segmenting light-shielding layer is formed by a photolithography method. In this case, examples of the binder resin include acrylate-based, methacrylate-based, polyvinyl cinnamate-based, or ring A photosensitive resin having a reactive vinyl group such as a synthetic rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a light-shielding layer for pixel classification containing a black colorant and a photosensitive resin, and further, a sensitizer and a coating property as necessary. An improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like may be added.
The light-shielding colored layer of the pixel-segmenting light-shielding layer may be formed by using a printing method or an ink-jet method. In this case, examples of the binder resin include polymethyl methacrylate resin and polyacrylate resin. , Polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin, etc. Is mentioned.
In addition, the opening pattern shape of the pixel classification light shielding layer and the arrangement of the colored layers of each color are not limited.

There are also examples in which the aperture pattern shape of the light-blocking layer for pixel division is a stripe shape, or the arrangement of the colored layers is changed, such as a dogleg shape or a delta arrangement.

<Colored layers 13R, 13G, 13B>
In this example, the colored layers for forming the color filters are the three colored layers of the red colored layer 13R, the green colored layer 13G, and the blue colored layer 13B.
The colored layer of each color is formed by using a resin composition for forming a colored portion in which a coloring material (also referred to as a coloring material) such as a pigment or dye of each color is dispersed or dissolved in a binder resin, and a photolithography method (also called a photolithography method). Say).
As the binder resin used in the colored layer, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.
In this case, a photopolymerization initiator may be added to the photosensitive resin composition for forming a colored part containing a colorant and a photosensitive resin, and further a sensitizer, a coating property improver, and a development as necessary. You may add an improving agent, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, etc.
The thickness of the colored layer of each color is usually set to about 1 μm to 5 μm.
The color of the colored layer is not particularly limited as long as it includes at least three colors of red, green, and blue. For example, three colors of red, green, and blue, or red, green, blue, and yellow Or five colors such as red, green, blue, yellow, and cyan.
Examples of the colorant used in the red (also referred to as R) colored layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. Can be mentioned.
These pigments may be used alone or in combination of two or more.
Examples of the colorant used in the green (also referred to as G) colored layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, and isoindoline pigments. Examples thereof include pigments and isoindolinone pigments.
These pigments or dyes may be used alone or in combination of two or more.
Examples of the colorant used in the blue (also referred to as B) coloring layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. .
These pigments may be used alone or in combination of two or more.

<WHITE layer 13W>
Here, a resin having a composition in which the coloring material (coloring material) is removed from the resin composition or the like for forming the pixel-segmenting light-shielding layer 12 and the colored layers 13R, 13G, and 13B is formed by a photolithography method. The formation method is not limited to this.

<Light absorption layer 15>
As a material for forming the light absorption layer 15, a resin containing carbon black as a coloring material, a BLUE pigment for color adjustment, and the like dispersed therein is used. A resin having a composition in which the color material is removed from the resin composition or the like that forms the pixel-segmenting light-shielding layer 12 and the colored layers 13R, 13G, and 13B is used for coating.
Examples of the coating method include photolithography (die coating method, spin coating method), ink jet method, and the like. Usually, coating is performed by photolithography.
In addition, it is preferable that the film thickness of the light absorption layer 15 is 0.3 micrometer or more from the surface of a coating-film property or external light reflection reduction.

<Insulating resin layer 14>
Examples of the material of the insulating resin layer 14 include a thermosetting resin composition and a photocurable resin composition.
The photocurable resin composition is the same as the binder resin used for the color layers for forming the color filter, for example, acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber A photosensitive resin having a reactive vinyl group is used.
In this case as well, a photopolymerization initiator may be added to the photosensitive resin composition for forming colored portions containing the photosensitive resin, and further, a sensitizer, a coating property improver, and a development improver as necessary. Further, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like may be added.
Examples of the thermosetting resin composition include those using an epoxy compound and those using a thermal radical generator.
Examples of the epoxy compound include known polyvalent epoxy compounds that can be cured by a carboxylic acid or an amine compound. Examples of such an epoxy compound include “Epoxy resin handbook” edited by Masaki Shinbo, published by Nikkan Kogyo Shimbun. (1987) and the like, and these can be used.
The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides.
Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, t-butyl Examples include til-4,4-di- (t-butylperoxy) butanate and dicumyl peroxide.

<Organic EL element formation substrate 20>
(1) Substrate 21
As the base material 21, basically, the same material as that of the base material 11 can be used. However, in the case of the display device shown in FIG. 1B using the color filter of the first example, the base material 11 is used. Since it is emitted from the side to the outside and displayed, it does not need to be transparent.

(2) Organic EL element 22
The white light-emitting organic EL element 22 shown in FIG. 1B is not explicitly shown in FIG. 1B, but has a material configuration as shown in FIG. 10, for example.
The organic EL element 22 shown in FIG. 10 uses three materials that emit red, green, and blue, and emits white light together.
(Organic EL layer 26)
The organic EL layer 26 forming the organic EL element 22 is composed of one or a plurality of organic layers including at least the light emitting layer 27.
Examples of the organic layer constituting the organic EL layer 26 other than the light emitting layer include a hole injection layer, a hole transport layer, an electron injection layer, and an electron transport layer.
This hole transport layer is often integrated with the hole injection layer by imparting a hole transport function to the hole injection layer.
In addition, as an organic layer constituting the organic EL layer, holes or electrons such as a hole blocking layer and an electron blocking layer are prevented from penetrating, and further, exciton diffusion is prevented and excitons are placed in the light emitting layer. By confining, a layer for increasing the recombination efficiency can be cited.
The organic EL layer may have a general configuration, and only the light emitting layer, hole injection layer / light emitting layer, hole injection layer / light emitting layer / electron injection layer, hole injection layer / hole blocking layer. / Light emitting layer / electron injection layer, hole injection layer / light emitting layer / electron transport layer, and the like can be exemplified.
The light emitting material in the white light emitting organic EL element 22 is hardly composed of a single compound, and generally, light emitting materials having two to three colors are used.
The emission spectrum is a combination of the spectra of the luminescent materials of each color.
(Anode 25, cathode 28)
As a conductive material for forming the electrode layers of the anode 25 and the cathode 28, a metal material is generally used. However, an organic material or an inorganic compound may be used, or a plurality of materials may be mixed and used.
In addition, the electrode layers of the anode and the cathode are appropriately selected as to whether or not they have transparency depending on the light extraction surface.
A conductive material having a high work function is preferably used for the anode 25 so that holes can be easily injected, and a conductive material having a low work function is preferably used for the cathode 28 so that electrons can be easily injected.
Examples of the conductive material include In—Zn—O (IZO), In—Sn—O (ITO), Zn—O—Al, and Zn—Sn—O when transparency is required. In the case where transparency is not required, metals can be used, specifically, Au, Ta, W, Pt, Ni, Al, Pd, Cr, Al alloy, Ni alloy, Cr alloy, etc. be able to.
Both the electrode layers of the anode 25 and the cathode 28 preferably have a relatively small resistance.
As a method for forming the electrode layer, a general method for forming an electrode can be used, and examples thereof include a sputtering method, an ion plating method, a vacuum deposition method, a CVD method, and a printing method.
An example of the patterning method for the electrode layer is a photolithography method.

As a modified example of the first example, as shown in FIG. 4A, the light absorbing layer may be divided for each pixel in the first example.
The modified example of the first example shown in FIG. 4A also basically exhibits the same operational effects as the first example.

Next, the 2nd example of embodiment of the color filter formation board | substrate of this invention is given.
In the second example, as shown in FIG. 2A, the light absorption layer 15 is arranged at a position different from that of the first example. The light absorption layer 15 is formed of the colored layers 13R, 13G, and 13B. The pixel-partitioning light-shielding layer 12 is formed on one surface of the base material 11 and the light-absorbing layer 15 is covered so as to cover the pixel-partitioning light-shielding layer 12. Further, the colored layers 13R, 13G, and 13B of each color and the WHITE layer 13W are disposed on the light absorption layer 15.
The rest is the same as the first example.
The second example is also used in a display device having the same application as the first example, but when used in the organic EL display device shown in FIG. 2B, the color filter of the first example is used. Similarly to the organic EL display device shown in FIG. 16A, external light is reflected from the front surface (observer side), reflected by internal electrodes and wiring, and emitted. It is possible to reduce the amount of light passing through the display, and to reduce the amount of light passing through the display compared to the organic EL display device shown in FIG.
In the case of the color filter forming substrate of the second example, the distance between the color filter 10a and the organic EL element 22 can be made narrower than when the display device is manufactured using the color filter forming substrate 10 of the first example. As a result, compared with the case where the color filter 10 of the first example is used, the color mixture at the time of display can be reduced.

As a modified example of the second example, as shown in FIG. 4B, in the second example, the light absorption layer may be divided for each pixel.
The modified example of the second example shown in FIG. 4B basically has the same function and effect as the second example.

Next, the 3rd example of embodiment of the color filter formation board | substrate of this invention is given.
In the third example, as shown in FIG. 3A, the light absorption layer 15 is laminated between the colored layers 13R, 13G, and 13B and the substrate 11 as in the case of the second example. However, in the third example, the pixel-segmenting light-blocking layer 12 and the light-absorbing layer 15 are formed of the same material, and the thickness of the light-absorbing layer 15 is made larger than the thickness of the pixel-segmenting light-shielding layer 12. It is also thin.
Here, the pixel-segmenting light-blocking layer 12 and the light-absorbing layer 15 are simultaneously formed by the photolithography method using the same negative photosensitive resin. For example, the exposure amount has gradation in the exposure. The exposure amount of the region where the light absorption layer 15 is formed is reduced compared to the exposure amount of the region where the pixel-segmenting light shielding layer 12 is formed using one gradation mask that can be applied to both regions simultaneously. By exposing and then developing, the film thickness of the pixel classification light blocking layer 12 and the light absorbing layer 15 to be formed is adjusted.
The gradation mask is also called a halftone mask.
The rest is the same as the second example.
The third example is also used for a display device having the same application as the first example and the second example. However, when used in the organic EL display device shown in FIG. 3B, the color of the first example is used. As in the case of using a filter, external light is incident from the front surface (observer side) and reflected and emitted from internal electrodes and wiring, compared to the organic EL display device shown in FIG. It is possible to reduce the reflected light of the light, reduce the reduction of the passing light at the time of display, and increase the passing light at the time of display as compared with the organic EL display device shown in FIG. It is possible.
In the case of the color filter forming substrate of the third example, as in the case of the second example, the color filter 10b and the organic filter are compared with the case where the display device is manufactured using the color filter forming substrate 10 of the first example. The distance from the EL element 22 can be narrowed, and as a result, compared with the case where the color filter 10 of the first example is used, the color mixture at the time of display can be reduced.

Next, the 4th example of embodiment of the color filter formation board | substrate of this invention is given.
In the fourth example, as shown in FIG. 5A, the light absorption layer 15 is disposed between the colored layers 13R, 13G, and 13B and the substrate 11 as in the second and third examples. In the case of the color filter forming substrate 10c of the fourth example, a light absorption layer 15 is disposed on one surface of the base material 11 so as to cover the one surface, and the light absorption is performed. On the layer 15, the pixel classification light-shielding layer 12, the colored layers 13 </ b> R, 13 </ b> G, and 13 </ b> B of each color and the WHITE layer 13 </ b> W are arranged.
Also in the case of the color filter forming substrate of the fourth example, as in the case of the second example and the third example, compared to the case where the display device is manufactured using the color filter forming substrate 10 of the first example, The distance between the color filter 10b and the organic EL element 22 can be narrowed. As a result, compared with the case where the color filter 10 of the first example is used, the color mixture at the time of display can be reduced.

Next, the 5th example of embodiment of the color filter formation board | substrate of this invention is given.
The fifth example shown in FIG. 6A increases the thickness of the pixel-segmenting light-shielding layer 12 with respect to the modification of the first example shown in FIG. The absorbent layer 15 is made to reach the surface on the side opposite to the base material 11 side, and other than that is the same as the modification of the first example. When the fifth example is used in an organic EL display device as shown in FIG. 6B, the organic EL display device shown in FIG. 16A is used in the same manner as when the color filter of the first example is used. Compared with, external light is incident from the front (observer side), reflected by the internal electrodes and wiring and emitted, and the reflected light of the external light can be reduced. As compared with the organic EL display device shown in FIG. 16B, it is possible to increase the light passing through the display.
Particularly, in the case of the fifth example, the pixel-segmenting light-shielding layer 12 has a structure that reaches from the one surface of the base material 11 to the surface of the light absorption layer 15 opposite to the base material 11 side. ), When used in an organic EL display device, it is possible to eliminate color mixing between adjacent pixels.

Next, the 6th example of embodiment of the color filter formation board of the present invention is given.
The sixth example shown in FIG. 7A is different from the modification of the second example shown in FIG. 4B in that the thickness of the pixel-segmenting light-shielding layer 12 is increased and each color from one surface of the substrate 11 is increased. The colored layers 13R, 13G, and 13B and the WHITE layer 13W are made to reach the surface on the side opposite to the base material 11 side, and the others are the same as the modified example of the second example.
When the sixth example is also used in the organic EL display device as shown in FIG. 7B, the organic EL display device shown in FIG. 16A is used as in the case of using the color filter of the first example. Compared with, external light is incident from the front (observer side), reflected by the internal electrodes and wiring and emitted, and the reflected light of the external light can be reduced. As compared with the organic EL display device shown in FIG. 16B, it is possible to increase the light passing through the display.
In the case of the sixth example, similarly to the fifth example, the pixel-segmenting light-shielding layer 12 is opposite to the base material 11 side of the colored layers 13R, 13G, 13B and WHITE layer 13W of each color from one surface of the base material 11. Since the structure reaches the surface on the side, when used in an organic EL display device as shown in FIG. 7B, it is possible to eliminate color mixing between adjacent pixels.

Next, the 7th example of embodiment of the color filter formation board | substrate of this invention is given.
In the seventh example shown in FIG. 8A, the thickness of the pixel-segmenting light-shielding layer 12 is increased from the fourth example shown in FIG. The surface of 13G, 13B or WHITE layer 13W is made to reach the surface on the side opposite to the substrate 11 side, and the rest is the same as the fourth example.
When the seventh example is also used in the organic EL display device as shown in FIG. 8B, the organic EL display device shown in FIG. 16A is used as in the case of using the color filter of the first example. Compared with, external light is incident from the front (observer side), reflected by the internal electrodes and wiring and emitted, and the reflected light of the external light can be reduced. As compared with the organic EL display device shown in FIG. 16B, it is possible to increase the light passing through the display.
Also in the case of the seventh example, the pixel-segmenting light-shielding layer 12 has a structure that reaches the surface of the colored layers 13R, 13G, 13B or WHITE layer 13W of each color from the light absorption layer 15 on the opposite side to the base material 11 side. Therefore, when used in an organic EL display device as shown in FIG. 8B, it is possible to eliminate color mixing between adjacent pixels.

The color filter forming substrate of the present invention is not limited to the above form.
For example, in the first example, the light absorption layer 15 is not formed on the entire surface so as to cover the WHITE pixel region and the color filter pixel regions of the R, G, and B colors. A mode in which the light absorption layer is formed so as to cover only the WHITE pixel region having a high rate and the pixel region of the G colored layer for the color filter is also exemplified.
Even when the color filter forming substrate of this form is used in an organic EL display device, the influence of external light reflection can be effectively reduced in substantially the same manner as in the first example.
Further, on the surface of the color filter forming substrate of each of the above forms that is not on the base material 11 side, that is, on the light absorbing layer 15 in each of the first example, the modified example of the first example, and the fifth example. Furthermore, in the second example, the modified example of the second example, the third example, the fourth example, the sixth example, and the seventh example, on the colored layer of each color, The thing of the form which formed the layer (it is also called a scattering layer) which has a scattering function is also mentioned.
By adopting a configuration in which the scattering layer is arranged, the parallax depending on the viewing direction of the observer can be improved as compared with the case where the scattering layer is not provided.
Moreover, the form which provided the insulating resin layer which covers the light emitting layer 22 in advance on the organic EL element formation board | substrate before providing for preparation of an organic EL display apparatus is also mentioned.
In each of the first to seventh examples and the modified examples, the light absorption layer 15 is made thicker in a pixel region having a higher transmittance when the light absorption layer 15 is not stacked. The form which has been mentioned is also mentioned.
By adopting such a form, it is possible to reduce the unevenness of external light reflection in the pixel region of each colored layer.
In addition, in the color filter forming substrate of each of the first to seventh examples and the modified examples, the WHITE layer may not be provided in the WHITE pixel region.
Similarly, in the organic EL display device using such a color filter forming substrate, as compared with the organic EL display device shown in FIG. As a result, it is possible to reduce the reflected light of the outside light that is reflected and emitted from the electrodes and wirings, and reduce the reduction of the passing light at the time of display, compared with the organic EL display device shown in FIG. , It is possible to increase the light passing through the display.

As a modification of the color filter forming substrate 10b of the third example, a color filter forming substrate 10bA in which the light absorption layer 15 has a cross-sectional shape shown in FIG.
Except for the shape of the light absorption layer 15, it is the same as the third example.
In the case of the modification shown in FIG. 9A, the light absorption layer 15 is formed to have the same thickness as the pixel classification light blocking layer 12.
In the case of this modified example, the pixel-type light shielding layer 12 and the light absorption layer 15 are simultaneously formed by the photolithography method using the same negative photosensitive resin. For example, during exposure in the photolithography method, Using a binary mask, the pixel-segmented light-blocking layer 12 and the light-absorbing layer 15 are simultaneously exposed with the same exposure amount with the same exposure amount, and then developed to form the pixel-segmented light-blocking layer 12 and the light-absorbing layer 15. To do.
In the case of the organic EL display device shown in FIG. 9B using the color filter forming substrate of this modification, it is the same as the case of the organic EL display device shown in FIG. 1B using the color filter of the first example. Compared with the organic EL display device shown in FIG. 16A, external light is incident from the front surface (observer side) and reflected by an internal electrode or wiring to be emitted. Therefore, it is possible to reduce the reduction of light passing through the display and to increase the light passing through the display as compared with the organic EL display device shown in FIG.
When an organic EL display device is manufactured using the color filter forming substrate of the modified example, the organic EL display device is used using the color filter forming substrate 10 of the first example, as in the second and third examples. The distance between the color filter 10c and the organic EL element 22 can be made narrower compared to the case where the color filter 10 is manufactured. As a result, compared with the case where the color filter 10 of the first example is used, there is less color mixing at the time of display. it can.
In the case of the organic EL display device shown in FIG. 9B, the light absorption layer 15 is opened, and the opening area is controlled to control the amount of light passing through each pixel portion. The transmittance is controlled.
Here, as an example of the opening shape of the light absorption layer, the shape shown in FIG. 9C is given, but the shape is not limited thereto.
The R colored layer 13R region in FIG. 9C corresponds to the opening region of the light absorption layer.
Moreover, in the case of a modification, the coloring layer of each color may change the ratio of opening by the pixel area | region and WHITE pixel which are arrange | positioned.

Next, a method for manufacturing the color filter forming substrate 10 of the first example will be briefly described with reference to FIG.
A transparent base material 11 is prepared in advance (FIG. 13A), and first, a pixel classification light shielding layer 12 is formed on one surface of the base material 11 by a general photolithography method (FIG. 13B). Then, the colored layers 13R, 13G, 13B, and the WHITE layer 13W for the respective color filters are sequentially formed in predetermined formation regions by a general photolithography method. (Fig. 13 (c))
Usually, each of the colored layers 13R, 13G, and 13B for each color for the pixel classification light shielding layer 12 and the color filter is a resin composition for forming a colored portion in which a colorant such as a pigment or a dye of each color is dispersed or dissolved in a binder resin. It is formed by a photolithography method (also called a photolithography method) using a material, but is not limited thereto.
It can also be formed by a printing method or an inkjet method.
The WHITE layer 13W is made of a resin having a composition in which the coloring material (coloring material) is removed from the resin composition for forming the pixel classification light shielding layer 12 and the colored layers 13R, 13G, and 13B. Although formed, the formation method is not limited to this.
It can also be formed by a printing method or an inkjet method.
Next, the light absorption layer 15 is formed so as to cover the colored layers 13R, 13G, 13B and the WHITE layer 13W. (Fig. 13 (d))
As a material for forming the light absorption layer 15, a resin containing carbon black as a coloring material, a BLUE pigment for color adjustment, and the like dispersed therein is used. A resin having a composition in which a coloring material (coloring material) is removed from a resin composition or the like that forms the pixel-segmenting light-shielding layer 12 and the colored layers 13R, 13G, and 13B is applied.
Examples of the coating method include a die coating method, a spin coating method, an ink jet method, and the like. Usually, the coating is performed by a die coating method and a spin coating method.

Next, a method for manufacturing the color filter forming substrate 10a of the second example will be briefly described with reference to FIG.
A transparent base material 11 is prepared in advance (FIG. 14A). First, as in the case of the manufacturing method of the first example shown in FIG. The pixel classification light shielding layer 12 is formed by the method. (Fig. 14 (b))
Next, the light absorption layer 15 is formed so as to cover the entire surface of the pixel classification light blocking layer 12 formation side. (Fig. 14 (c))
The light absorption layer 15 is formed in the same manner as in the first example shown in FIG.
Next, colored layers 13R, 13G, 13B and a WHITE layer 13W for each color filter are sequentially formed in a predetermined formation region by a general photolithography method. (Fig. 14 (d))
The colored layers 13R, 13G, 13B and the WHITE layer 13W for each color filter are formed in the same manner as in the first example shown in FIG.
The manufacturing method of the second example is the same as the first manufacturing method except that the order of processing is changed in the manufacturing method of the first example.

Next, a manufacturing method of the color filter forming substrate 10b of the third example will be briefly described based on FIG.
A transparent base material 11 is prepared in advance (FIG. 15A), and first, the pixel classification light-shielding layer 12 and the light absorption layer 15 are formed on one surface of the base material 11 by a general photolithography method. Form. (Fig. 15 (b))
Here, after applying a negative photosensitive material for forming the pixel-segmenting light-shielding layer 12 and the light-absorbing layer 15, one gradation mask that can give gradation to the exposure amount at the time of exposure. By using the exposure amount of the region for forming the light absorption layer 15 to be smaller than the exposure amount of the region for forming the pixel-segmenting light-shielding layer 12, exposing both regions simultaneously, and then developing, The pixel classification light blocking layer 12 and the light absorption layer 15 are formed.
Next, in the same manner as in the production of the first example shown in FIG. 13, the color layers 13R, 13G, and 13B and the WHITE layer 13W for forming the color filters are formed. (FIG. 15 (c)) The third example manufacturing method is to form the pixel-segmenting light-shielding layer 12 and the light absorption layer 15 at the same time by photolithography, and the first example manufacturing method, Compared to the manufacturing method of the example, the number of steps is reduced.
Further, in the manufacturing method of the third example, since the material for forming the pixel classification light blocking layer 12 and the material for forming the light absorption layer 15 are the same, the material can be effectively used.

The method for producing the color filter forming substrate 10A of the modification of the first example shown in FIG. 4A is different from the method of producing the light absorbing layer 15 in the method of producing the first example shown in FIG. The rest is the same.
In the production of the color filter forming substrate 10A of the modified example of the first example shown in FIG. 4A, the photocurable material for forming the light absorbing layer 15 is made of the colored layers 13R, 13G, 13B, and the WHITE layer 13W. The light-absorbing layer is dividedly formed for each pixel by coating and forming so as to cover, selectively exposing, and developing, but is not limited thereto.
Here, as the material for forming the light absorption layer 15, a resin containing carbon black as a coloring material, BLUE pigment for color adjustment, and the like dispersed therein is used. As a resin having a composition in which a coloring material (coloring material) is removed from a resin composition that forms the pixel-segmenting light-shielding layer 12 and the colored layers 13R, 13G, and 13B, a die coating method and a spin coating method) It is coated by an inkjet method or the like.
4B is different from the manufacturing method of the second example shown in FIG. 14 in the formation method of the light absorption layer 15 in the manufacturing method of the color filter forming substrate 10aA of the modified example of the second example. But otherwise it is the same.
Here, the light absorbing layer 15 is formed by applying and forming a photocurable material for forming the light absorbing layer 15 on the substrate surface on the side where the light blocking layer for pixel division is formed, selectively exposing, and developing. The light absorption layer is formed separately for each pixel, but is not limited thereto.
Further, the fourth example of the color filter forming substrate 10c shown in FIG. 5A is basically the same as that of the second example shown in FIG. Since the order of formation and formation of the light absorption layer 15 is changed, the rest is the same.
Further, the fifth example of the color filter forming substrate 10B shown in FIG. 6A is the same as the method of manufacturing the color filter forming substrate 10 of the first example shown in FIG. Further, the method for forming the light absorption layer 15 is changed, and a photo-curable material for forming the light absorption layer 15 is used on the side where the light blocking layer for pixel division, each colored layer, and the WHITE layer are formed. A light absorption layer is formed by dividing it on a pixel-by-pixel basis by coating and forming on a substrate surface, selective exposure and development.
Further, the method for manufacturing the color filter forming substrate 10aB of the sixth example shown in FIG. 7A is the same as the method for manufacturing the color filter forming substrate 10A of the modified example of the first example shown in FIG. The pixel classification light blocking layer 12 is made thicker.
Further, the seventh example of the color filter forming substrate 10cB shown in FIG. 8A is the same as the method of manufacturing the color filter forming substrate 10aA of the second example shown in FIG. 4B. The pixel classification light blocking layer 12 is made thicker.
A modification of the color filter forming substrate 10bA of the third example shown in FIG. 9A is basically the same as the manufacturing method of the third example.

[Example]
The present invention will be further described with reference to examples.
Example 1
Example 1 was prepared by preparing the color filter forming substrate 10 of the first example shown in FIG. 1 (a), and preparing and preparing a photocurable curable resin composition A as follows. Using the prepared curable resin composition A, a red curable resin composition for forming a color filter, a green curable resin composition, a blue curable resin composition, a curable resin composition for forming a WHITE layer, By producing a curable resin composition for forming a light-shielding layer for pixel classification and a curable resin composition for forming a light absorption layer, and using each of these curable resin compositions, a photolithography method is performed to obtain a color. Each color coloring layer for filters, WHITE layer, light blocking layer for pixel division is formed, and a light absorption layer is formed by coating.
Here, after forming the pixel-segmenting light-shielding layer 12 by the manufacturing method shown in FIG. 13, the red colored layer 13R, the green colored layer 13G, the blue colored layer 13B, and the WHITE layer 13W for the color filter are respectively formed. The color filter forming substrate 10 of the first example was manufactured by forming a light absorption layer 15 by the photolithography process.

(Preparation of curable resin composition A)
The polymerization tank is charged with 63 parts by weight of methyl methacrylate (MMA), 12 parts by weight of acrylic acid (AA), 6 parts by weight of 2-hydroxyethyl methacrylate (HEMA), and 88 parts by weight of diethylene glycol dimethyl ether (DMDG). After stirring and dissolving, 7 parts by weight of 2,2′-azobis (2-methylbutyronitrile) was added and dissolved uniformly.
Then, it stirred at 85 degreeC under nitrogen stream for 2 hours, and also was made to react at 100 degreeC for 1 hour.
7 parts by weight of glycidyl methacrylate (GMA), 0.4 parts by weight of triethylamine, and 0.2 parts by weight of hydroquinone were further added to the resulting solution, and the mixture was stirred at 100 ° C. for 5 hours to obtain a copolymer resin solution ( A solid content of 50%) was obtained.
Next, the following materials were stirred and mixed at room temperature to obtain a curable resin composition.
-Copolymer resin solution (solid content 50%): 16 parts by weight-Dipentaerythritol pentaacrylate (Sartomer SR399)
: 24 parts by weight-Orthocresol novolak type epoxy resin (Epicoat Shell Epoxy Co., Ltd. Epicoat 180S70): 4 parts by weight-2-Methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one: 4 parts by weight Parts ・ Diethylene glycol dimethyl ether: 52 parts by weight

(Formation of pixel classification light blocking layer (black matrix) 12)
First, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (Mitsubishi Chemical Corporation MS18E): 20 parts by weight Polymer dispersion (Bic Chemie Japan, Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 75 parts by weight The components were sufficiently mixed to obtain a light-shielding colored layer composition.
-Black pigment dispersion liquid: 43 parts by weight-Curable resin composition A: 19 parts by weight-Diethylene glycol dimethyl ether: 38 parts by weight The light-shielding composition for a colored layer on a glass substrate (Asahi Glass Co., Ltd., AN material) The mixture was applied with a spin coater and dried at 100 ° C. for 3 minutes to form a light-shielding colored layer.
A photomask is placed at a distance of 100 μm from the coating film and the light-shielding colored layer is exposed to a light-shielding pattern with an ultra-high pressure mercury lamp of 2.0 kW by a proximity aligner, and then with a 0.05 wt% potassium hydroxide aqueous solution. After development, the substrate was left to stand in an atmosphere of 230 ° C. for 30 minutes to perform heat treatment, thereby forming a light-shielding colored layer 13M in the display region and the frame portion 12 region.
Here, the adjusted colored layer was formed on the entire region, and the pixel-segmenting light-shielding layer and the light-shielding resin layer at the frame portion were formed by photolithography.
The formed film thickness after the heat treatment was 1.3 μm.
The resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation) has an average particle size of 25 nm.
The particle size is, for example, a laser Doppler scattered light analysis particle size analyzer (trade name “Microtrac 934UPA”) manufactured by Nikkiso Co., Ltd. The particle diameter in which the cumulative pigment particle diameter of the product occupies 50% is defined as 50% average particle diameter, and the value is measured and determined.

(Formation of red colored layer 13R)
On the black matrix, a red curable resin composition having the following composition was applied by spin coating, and then dried in an oven at 70 ° C. for 3 minutes.
Next, a photomask is placed at a distance of 100 μm from the coating film of the red curable resin composition, and ultraviolet rays are applied only to the region corresponding to the colored layer formation region using a 2.0 kW ultrahigh pressure mercury lamp by a proximity aligner. Irradiated for 10 seconds.
Subsequently, it was immersed in 0.05 wt% potassium hydroxide aqueous solution (liquid temperature 23 degreeC) for 1 minute, and alkali development was carried out, and only the uncured part of the coating film of a red curable resin composition was removed.
Thereafter, the substrate was left to stand in an atmosphere of 230 ° C. for 15 minutes to perform heat treatment to form a red pixel pattern in the display region.
The formed film thickness was 2.0 μm.
<Composition of red curable resin composition>
C. I. Pigment Red 177: 3 parts by weight C.I. I. Pigment Red 254: 4 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 23 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of green colored layer 13G)
Next, using the green curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.5 μm, and the green pixel is formed. A relief pattern composed of a green colored layer was formed in the display area.
<Composition of green curable resin composition>
C. I. Pigment Green 7: 6 parts by weight C.I. I. Pigment Yellow 150: 2 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 22 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of blue colored layer 13B)
Further, using the blue curable resin composition having the following composition, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the formed film thickness becomes 2.4 μm, and the display region is blue. The relief pattern was formed.
<Composition of blue curable resin composition>
C. I. Pigment Blue 15: 6: 5 parts by weight-Polysulfonic acid type polymer dispersant: 3 parts by weight-Curable resin composition A: 25 parts by weight-3-methoxybutyl acetate: 67 parts by weight

(Formation of WHITE layer 13W)
In this example, the coating film thickness is changed to 2.0 μm by changing the coating film thickness in the same process as the red relief pattern formation using the curable resin composition for forming the WHITE layer having the following composition. Thus, the relief pattern of the WHITE layer was formed in the display area.
<Composition of curable resin composition for WHITE layer formation>
-Curable resin composition A: 25 weight part-3-methoxybutyl acetate: 67 weight part

(Formation of the light absorption layer 15)
Furthermore, using the curable resin composition for forming a light absorption layer produced as described below, in the same process as the formation of the red relief pattern, the coating film thickness was changed to 1.0 μm. In this manner, a light absorption layer was formed on the entire surface so as to cover the colored layers 13R, 13G, 13B and the WHITE layer 13W for each color filter color filter.
<Preparation of curable resin composition for light absorption layer formation>
First, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation): 20 parts by weight I. Pigment Blue 15: 6: 2 parts by weight Polymer dispersing agent (Big Chemie Japan Co., Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 73 parts by weight Next, the following components are mixed thoroughly. A curable resin composition for forming a light absorption layer was obtained.
-Black pigment dispersion: 0.5 parts by weight-Curable resin composition A: 23 parts by weight-Diethylene glycol dimethyl ether: 75.5 parts by weight

As described above, the color filter forming substrate 10 of the first example shown in FIG.
Next, the formed color filter forming substrate 10 of the first example and the organic EL element forming plate 20 are laminated at a predetermined interval (about 1.2 mm) with the insulating resin layer 14 interposed therebetween. The organic EL display device shown in 1 (b) was produced.

(Example 2)
In Example 2, the color filter forming substrate 10a of the second example shown in FIG. 2 (a) was produced. The material for forming each part was the same as that in Example 1, and is shown in FIG. The formation process of each member was basically the same as in Example 1 by the manufacturing process.
Next, the formed color filter forming substrate 10a of the second example and the organic EL element forming plate 20a are laminated at a predetermined interval (about 1.2 mm) with the insulating resin layer 14 interposed therebetween. An organic EL display device shown in 2 (b) was produced.

(Example 3)
In Example 3, the color filter forming substrate 10b of the third example shown in FIG. 3A was produced, and the materials for forming the colored layers of the respective colors for forming the color filter were the same as those in Example 1. In addition, using the curable resin composition prepared as described below as a material for forming the pixel-segmenting light-shielding layer 12 and the light-absorbing layer 15, it was manufactured by the manufacturing process shown in FIG. 15.
Here, in the same process as the formation of the red relief pattern, the coating film thickness is changed so that the coating film thickness becomes 2.0 μm, and the colored layers 13R, 13G, 13B and WHITE layers for the respective colors for the color filter are used. A light-absorbing layer was applied over the entire surface so as to cover 13W, and the pixel-segmenting light-shielding layer 12 and the light-absorbing layer 15 were formed by photolithography.
<Preparation of curable resin composition for forming pixel-shading light-shielding layer and light-absorbing layer>
First, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation): 20 parts by weight I. Pigment Blue 15: 6: 2 parts by weight Polymer dispersing agent (Big Chemie Japan Co., Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 73 parts by weight Next, the following components are mixed thoroughly. A curable resin composition for forming a light absorption layer was obtained.
-Black pigment dispersion liquid: 0.65 parts by weight-Curable resin composition A: 30 parts by weight-Diethylene glycol dimethyl ether: 69.35 parts by weight Here, the formation of the pixel classification light-shielding layer 12 and the light absorption layer 15 is Using the following curable resin composition, when exposed, so that the thickness of the pixel classification light-shielding layer 12 is 4.5 μm and the thickness of the light absorption layer is 0.3 μm The region where the light absorption layer 15 was formed was slightly exposed.
Next, the formed color filter forming substrate 10b of the third example and the organic EL element forming plate 20b are laminated at a predetermined interval (about 1.2 mm) with the insulating resin layer 14 interposed therebetween. An organic EL display device shown in 2 (b) was produced.

(Comparative Example 1)
In Comparative Example 1, the color filter forming substrate 110 shown in FIG. 16A is produced in the same manner as in Example 1.
Then, the produced color filter forming substrate 110 and the organic EL element forming plate 120 are laminated at a predetermined interval (about 1.2 mm) with the insulating resin layer 14 interposed therebetween, and FIG. The organic EL display device shown was produced.

(Comparative Example 2)
In Comparative Example 2, the color filter forming substrate 110a shown in FIG. 16B is manufactured in the same manner as in Example 1.
Then, the produced color filter forming substrate 110a and the organic EL element forming plate 120a are laminated at a predetermined interval (about 1.2 mm) with the insulating resin layer 14 interposed therebetween, and FIG. The organic EL display device shown was produced.

(Comparative Example 3)
In Comparative Example 3, the color filter forming substrate 110b shown in FIG. 16C is manufactured, and is formed in the same manner as in Example 1 except for the formation of the transmittance adjusting unit 113WA.
The transmittance adjusting portion 113WA was formed by a photolithography method using a curable resin composition produced as follows.
<Preparation of curable resin composition for forming pixel-shading light-shielding layer and light-absorbing layer>
First, the following components were mixed and sufficiently dispersed with a bead mill to prepare a black pigment dispersion.
Resin-coated carbon black (MS18E manufactured by Mitsubishi Chemical Corporation): 20 parts by weight I. Pigment Blue 15: 6: 2 parts by weight Polymer dispersing agent (Big Chemie Japan Co., Ltd. Disperbyk 163): 5 parts by weight Solvent (diethylene glycol dimethyl ether): 73 parts by weight Next, the following components are mixed thoroughly. A curable resin composition for forming a light absorption layer was obtained.
-Black pigment dispersion: 0.5 parts by weight-Curable resin composition A: 23 parts by weight-Diethylene glycol dimethyl ether: 75.5 parts by weight And the produced color filter forming substrate 110b and the organic EL element forming plate 120b Are stacked at a predetermined interval (about 1.2 mm) with the insulating resin layer 14 interposed therebetween, and an organic EL display device shown in FIG.

ここでは、上記透過率特性の測定を、顕微分光測光装置（ＯＳＰ−ＳＰ２０００、ＯＬＹＭＰＵＳ（株）社製）を用いて、４００ｎｍ〜７００ｎｍの波長範囲で行い、得られた結果から、換算して、ＪＩＳ Ｚ８７０１のＸＹＺ表色系における色度座標（ｘ、ｙ）、明るさＹにて表した。
また、ここでは、表示装置の場合、外光が２回光吸収層を通過して外光反射となることを想定して、各光源からの光を光吸収層で２回通過させた場合の色度、明るさを、反射色度、明るさとして、ｘ、ｙ、Ｙで表している。 In addition, the light transmission characteristics in the visible light region of the light absorption layer 15 used in each of the color filter forming substrates 10, 10a, and 10b manufactured according to the respective Examples 1 to 3 are as shown in FIG. Furthermore, the transmittance characteristics close to a flat flatness with little variation in the light transmittance of the light absorption layer over the entire visible light region (400 nm to 700 nm wavelength region) during display were obtained.
As a result, the transmission chromaticity and reflection chromaticity of the light absorbing layer 15 in the XYZ color system of JIS Z8701 are as shown in Table 1.
Table 1 shows that the color misregistration chromaticity due to the reflected light is small when the C light source and the D65 light source are used. From Table 1, the color using the light absorption layer having such transmittance characteristics is shown. Similarly, in the organic EL display measures of the respective examples manufactured using the filter forming substrates 10, 10a, and 10b, it is determined that the color shift due to the light absorption layer is small.

Here, the transmittance characteristics are measured using a microspectrophotometer (OSP-SP2000, manufactured by OLYMPUS Co., Ltd.) in a wavelength range of 400 nm to 700 nm, and converted from the obtained results. Expressed in chromaticity coordinates (x, y) and brightness Y in the XYZ color system of JIS Z8701.
Here, in the case of a display device, assuming that external light passes through the light absorption layer twice and becomes external light reflection, light from each light source is passed through the light absorption layer twice. Chromaticity and brightness are represented by x, y, and Y as reflected chromaticity and brightness.

表２における評価は、目視にて、相対的に評価したものである。
表示輝度は、円偏光板を配設した比較例２の有機ＥＬ表示装置の評価を×とし、比較例２の有機ＥＬ表示装置より、輝度大のものを○としている。
外光反射の評価は、表示電源をＯＦＦにした状態のもので、比較例１の有機ＥＬ表示装置の評価を×とし、比較例２の有機ＥＬ表示装置の評価を△とし、比較例２よりも外光反射が少ないものを○としている。
視差は、見る方向による差が少ない状態を○、極めて少ない場合を◎としている。 Results of evaluating display luminance, external light reflection (when power is OFF), and parallax for organic EL display devices using the color filter forming substrates of Examples 1 to 3 and Comparative Examples 1 to 3 Was as shown in Table 2.

The evaluation in Table 2 is relatively evaluated visually.
For the display brightness, the evaluation of the organic EL display device of Comparative Example 2 in which the circularly polarizing plate is provided is evaluated as x, and the display luminance of the organic EL display device of Comparative Example 2 is evaluated as ◯.
The evaluation of external light reflection is in a state in which the display power supply is turned off. The evaluation of the organic EL display device of Comparative Example 1 is set as x, the evaluation of the organic EL display device of Comparative Example 2 is set as Δ, and Are marked with ○ that have little external light reflection.
For the parallax, a state where the difference depending on the viewing direction is small is indicated by ○, and a case where the difference is extremely small is indicated by ◎.

10, 10a, 10b, 10c Color filter forming substrate 10A, 10aA, 10bA Color filter forming substrate 10B, 10aB, 10cB Color filter forming substrate 11 Base material (also referred to as transparent substrate)
12 Pixel classification light blocking layer (also called black matrix)
13R Red colored layer 13G Green colored layer 13B Blue colored layer 13W WHITE layer 13RL Red display color 13GL Green display color 13BL Blue display color 14 Insulating resin layer 15 Light absorbing layers 20, 20a, 20b, 20c Organic EL element Formation substrate 20B, 20aB, 20cB Organic EL element formation substrate 20bA Organic EL element formation substrate 21 Base material (also referred to as transparent substrate)
22 Organic EL element 22W White light 25 Anode 26 Organic EL layer 27 Light emitting layer 28 Cathode 110, 110a, 110b, Color filter forming substrate 111 Base material (also referred to as transparent substrate)
112 Black matrix 113R Red colored layer 113G Green colored layer 113B Blue colored layer 113W WHITE layer 113WA Transmittance adjustment unit 113RL1, 113RL2, 113RL3 Red display color 113GL1, 113GL2, 113GL3 Green display color 113BL1, 113BL2, 113BL3 Blue display color 114 Insulating resin layer 120 Organic EL element forming substrate 121 Base material (also referred to as transparent substrate)
122 Organic EL element 122W White light

Claims (9)

A color filter forming substrate for a white light source type organic EL display device, in which a colored layer for a color filter is divided into each color and arranged in a predetermined pixel area on one surface of a substrate made of a transparent substrate. Because
The pixel region in which one or more colored layers of the plurality of colored layers for the color filter are arranged has a laminated structure in which a colored layer and a light absorbing layer are laminated,
The average transmittance of the light absorbing layer in the C light source is in the range of 45% to 95%,
A color filter forming substrate , wherein a difference between the maximum light transmittance and the minimum light transmittance of the light absorption layer in a wavelength region of 380 nm to 780 nm is within a range of 20% or less .   2. The color filter forming substrate according to claim 1, wherein the color filter has a pixel region of a colored layer of three colors of R, G, and B as a pixel region of a colored layer of a plurality of colors for the color filter, and In addition to the pixel region of the colored layer of each color of R, G, and B, a WHITE pixel region is provided, and the light absorption layer includes the WHITE pixel region and the pixel region of the G colored layer for the color filter And a color filter forming substrate.   3. The color filter forming substrate according to claim 1, wherein the light absorption layer is formed in the entire pixel region. 4.   The color filter forming substrate according to any one of claims 1 to 3, wherein the light absorption layer contains carbon black dispersed as a colorant in a resin. Color filter forming substrate. A color filter formation substrate according to any one of claims 1 to 4, the color filter formation substrate, wherein the thickness of the light absorbing layer is 1μm or more. A color filter formation substrate according to any one of claims 1 to 5, the thickness of the light absorption layer is thicker higher transmittance pixel region in the case of not stacking the light-absorbing layer A color filter forming substrate. A color filter formation substrate according to any one of claims 1 to 6, the outermost pixel region formed by laminating the light-absorbing layer, disposed a layer (also referred to as scattering layer) having a scattering function A color filter forming substrate characterized by comprising: A color filter formation substrate according to any one of claims 1 to 7, wherein the laminated structure, and wherein the light absorbing layer has a structure which is formed between the substrate and the colored layer Color filter forming substrate. A white light source type organic EL display device having a structure in which an organic EL element forming substrate and a color filter forming substrate are laminated, wherein the color filter forming substrate according to any one of claims 1 to 8 is used. A characteristic organic EL display device.

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